JP6388869B2 - 極紫外光源のためのビューポートプロテクタ - Google Patents

極紫外光源のためのビューポートプロテクタ Download PDF

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Publication number
JP6388869B2
JP6388869B2 JP2015540706A JP2015540706A JP6388869B2 JP 6388869 B2 JP6388869 B2 JP 6388869B2 JP 2015540706 A JP2015540706 A JP 2015540706A JP 2015540706 A JP2015540706 A JP 2015540706A JP 6388869 B2 JP6388869 B2 JP 6388869B2
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JP
Japan
Prior art keywords
viewport
protector
wavelength
light
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2015540706A
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English (en)
Japanese (ja)
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JP2016505863A (ja
JP2016505863A5 (enExample
Inventor
ヴァハン セネケリムヤン
ヴァハン セネケリムヤン
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ASML Netherlands BV
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ASML Netherlands BV
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Publication date
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Publication of JP2016505863A publication Critical patent/JP2016505863A/ja
Publication of JP2016505863A5 publication Critical patent/JP2016505863A5/ja
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/007—Pressure-resistant sight glasses
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16B—DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B2200/00—Constructional details of connections not covered for in other groups of this subclass
    • F16B2200/60—Coupler sealing means

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
  • High Energy & Nuclear Physics (AREA)
JP2015540706A 2012-11-07 2013-10-22 極紫外光源のためのビューポートプロテクタ Expired - Fee Related JP6388869B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/671,378 US9341752B2 (en) 2012-11-07 2012-11-07 Viewport protector for an extreme ultraviolet light source
US13/671,378 2012-11-07
PCT/US2013/066239 WO2014074302A1 (en) 2012-11-07 2013-10-22 Viewport protector for an extreme ultraviolet light source

Publications (3)

Publication Number Publication Date
JP2016505863A JP2016505863A (ja) 2016-02-25
JP2016505863A5 JP2016505863A5 (enExample) 2016-11-04
JP6388869B2 true JP6388869B2 (ja) 2018-09-12

Family

ID=50622109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015540706A Expired - Fee Related JP6388869B2 (ja) 2012-11-07 2013-10-22 極紫外光源のためのビューポートプロテクタ

Country Status (6)

Country Link
US (1) US9341752B2 (enExample)
JP (1) JP6388869B2 (enExample)
KR (2) KR102081862B1 (enExample)
CN (1) CN104781705B (enExample)
TW (1) TWI612849B (enExample)
WO (1) WO2014074302A1 (enExample)

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US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
JP2017520010A (ja) * 2014-05-01 2017-07-20 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング装置及び関連する低圧チャンバ装置
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
EP3457430B1 (en) 2014-05-15 2023-10-25 Excelitas Technologies Corp. Laser driven sealed beam lamp with dual focus regions
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9576785B2 (en) * 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) * 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10429314B2 (en) * 2017-07-31 2019-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. EUV vessel inspection method and related system
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US11466228B1 (en) * 2018-11-02 2022-10-11 Endress+Hauser Optical Analysis, Inc. Friction control and captive sealant for pressed windows
RU188876U1 (ru) * 2018-12-25 2019-04-25 Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) Пространственный фильтр для мощных многокаскадных лазерных усилителей
JP7630515B2 (ja) * 2019-12-23 2025-02-17 エーエスエムエル ネザーランズ ビー．ブイ． コレクタ流リング
WO2022002560A1 (en) * 2020-07-01 2022-01-06 Asml Netherlands B.V. Precise vacuum window viewports and pellicles for rapid metrology recovery
KR102476767B1 (ko) 2021-03-17 2022-12-09 피에스케이홀딩스 (주) 플라즈마 감지 장치
US11647578B2 (en) 2021-08-31 2023-05-09 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography thermal control
KR20250022035A (ko) * 2022-06-13 2025-02-14 에이에스엠엘 네델란즈 비.브이. 극자외선 광원을 위한 뷰포트 어셈블리

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US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
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US20050115941A1 (en) 2002-07-31 2005-06-02 Sukhman Yefim P. Laser containment structure allowing the use of plastics
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JP2005268035A (ja) 2004-03-18 2005-09-29 Canon Inc Ｅｕｖ光源の評価用評価装置、およびそれを用いた評価方法
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US7196343B2 (en) 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
JP2006259162A (ja) 2005-03-16 2006-09-28 Olympus Imaging Corp 防塵機能付き光学装置
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
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DE102008041827A1 (de) * 2008-09-05 2010-03-18 Carl Zeiss Smt Ag Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung
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CN101694287A (zh) * 2009-10-13 2010-04-14 中国航天科技集团公司第五研究院第五一〇研究所 一种近紫外辐照设备中过滤红外光和可见光的装置
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Also Published As

Publication number Publication date
US20140126043A1 (en) 2014-05-08
US9341752B2 (en) 2016-05-17
TWI612849B (zh) 2018-01-21
KR20150082296A (ko) 2015-07-15
WO2014074302A1 (en) 2014-05-15
CN104781705A (zh) 2015-07-15
TW201433215A (zh) 2014-08-16
JP2016505863A (ja) 2016-02-25
KR20200021002A (ko) 2020-02-26
CN104781705B (zh) 2017-12-15
KR102159046B1 (ko) 2020-09-24
KR102081862B1 (ko) 2020-02-26

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