CN104781705B - 用于远紫外光源的视口保护器 - Google Patents

用于远紫外光源的视口保护器 Download PDF

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Publication number
CN104781705B
CN104781705B CN201380058123.4A CN201380058123A CN104781705B CN 104781705 B CN104781705 B CN 104781705B CN 201380058123 A CN201380058123 A CN 201380058123A CN 104781705 B CN104781705 B CN 104781705B
Authority
CN
China
Prior art keywords
viewport
light
protector
wavelength
accessory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201380058123.4A
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English (en)
Chinese (zh)
Other versions
CN104781705A (zh
Inventor
V·塞尼克里姆延
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of CN104781705A publication Critical patent/CN104781705A/zh
Application granted granted Critical
Publication of CN104781705B publication Critical patent/CN104781705B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/007—Pressure-resistant sight glasses
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16B—DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B2200/00—Constructional details of connections not covered for in other groups of this subclass
    • F16B2200/60—Coupler sealing means

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
  • High Energy & Nuclear Physics (AREA)
CN201380058123.4A 2012-11-07 2013-10-22 用于远紫外光源的视口保护器 Expired - Fee Related CN104781705B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/671,378 US9341752B2 (en) 2012-11-07 2012-11-07 Viewport protector for an extreme ultraviolet light source
US13/671,378 2012-11-07
PCT/US2013/066239 WO2014074302A1 (en) 2012-11-07 2013-10-22 Viewport protector for an extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
CN104781705A CN104781705A (zh) 2015-07-15
CN104781705B true CN104781705B (zh) 2017-12-15

Family

ID=50622109

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380058123.4A Expired - Fee Related CN104781705B (zh) 2012-11-07 2013-10-22 用于远紫外光源的视口保护器

Country Status (6)

Country Link
US (1) US9341752B2 (enExample)
JP (1) JP6388869B2 (enExample)
KR (2) KR102081862B1 (enExample)
CN (1) CN104781705B (enExample)
TW (1) TWI612849B (enExample)
WO (1) WO2014074302A1 (enExample)

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US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
JP2017520010A (ja) * 2014-05-01 2017-07-20 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング装置及び関連する低圧チャンバ装置
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
EP3457430B1 (en) 2014-05-15 2023-10-25 Excelitas Technologies Corp. Laser driven sealed beam lamp with dual focus regions
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9576785B2 (en) * 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) * 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10429314B2 (en) * 2017-07-31 2019-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. EUV vessel inspection method and related system
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US11466228B1 (en) * 2018-11-02 2022-10-11 Endress+Hauser Optical Analysis, Inc. Friction control and captive sealant for pressed windows
RU188876U1 (ru) * 2018-12-25 2019-04-25 Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) Пространственный фильтр для мощных многокаскадных лазерных усилителей
JP7630515B2 (ja) * 2019-12-23 2025-02-17 エーエスエムエル ネザーランズ ビー．ブイ． コレクタ流リング
WO2022002560A1 (en) * 2020-07-01 2022-01-06 Asml Netherlands B.V. Precise vacuum window viewports and pellicles for rapid metrology recovery
KR102476767B1 (ko) 2021-03-17 2022-12-09 피에스케이홀딩스 (주) 플라즈마 감지 장치
US11647578B2 (en) 2021-08-31 2023-05-09 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography thermal control
KR20250022035A (ko) * 2022-06-13 2025-02-14 에이에스엠엘 네델란즈 비.브이. 극자외선 광원을 위한 뷰포트 어셈블리

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US20070002474A1 (en) * 2004-03-18 2007-01-04 Mitsuaki Amemiya Apparatus for evalulating EUV light source, and evaluation method using the same
CN101194341A (zh) * 2005-06-08 2008-06-04 西默股份有限公司 使等离子体-生成的离子偏转以防止离子到达euv光源的内部元件的系统和方法
CN101694287A (zh) * 2009-10-13 2010-04-14 中国航天科技集团公司第五研究院第五一〇研究所 一种近紫外辐照设备中过滤红外光和可见光的装置
US20110248191A1 (en) * 2010-04-09 2011-10-13 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma euv light source
US20120228523A1 (en) * 2009-11-09 2012-09-13 Tata Institute Of Fundamental Research Biological laser plasma x-ray point source

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Publication number Priority date Publication date Assignee Title
US20070002474A1 (en) * 2004-03-18 2007-01-04 Mitsuaki Amemiya Apparatus for evalulating EUV light source, and evaluation method using the same
CN101194341A (zh) * 2005-06-08 2008-06-04 西默股份有限公司 使等离子体-生成的离子偏转以防止离子到达euv光源的内部元件的系统和方法
CN101694287A (zh) * 2009-10-13 2010-04-14 中国航天科技集团公司第五研究院第五一〇研究所 一种近紫外辐照设备中过滤红外光和可见光的装置
US20120228523A1 (en) * 2009-11-09 2012-09-13 Tata Institute Of Fundamental Research Biological laser plasma x-ray point source
US20110248191A1 (en) * 2010-04-09 2011-10-13 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma euv light source

Also Published As

Publication number Publication date
US20140126043A1 (en) 2014-05-08
US9341752B2 (en) 2016-05-17
TWI612849B (zh) 2018-01-21
KR20150082296A (ko) 2015-07-15
WO2014074302A1 (en) 2014-05-15
CN104781705A (zh) 2015-07-15
TW201433215A (zh) 2014-08-16
JP2016505863A (ja) 2016-02-25
KR20200021002A (ko) 2020-02-26
KR102159046B1 (ko) 2020-09-24
KR102081862B1 (ko) 2020-02-26
JP6388869B2 (ja) 2018-09-12

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Granted publication date: 20171215

Termination date: 20211022