JP6385524B2 - 大気圧プラズマコーティング装置 - Google Patents
大気圧プラズマコーティング装置 Download PDFInfo
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- JP6385524B2 JP6385524B2 JP2017107939A JP2017107939A JP6385524B2 JP 6385524 B2 JP6385524 B2 JP 6385524B2 JP 2017107939 A JP2017107939 A JP 2017107939A JP 2017107939 A JP2017107939 A JP 2017107939A JP 6385524 B2 JP6385524 B2 JP 6385524B2
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- nozzle
- atmospheric pressure
- precursor
- pressure plasma
- tubular electrode
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- 239000011248 coating agent Substances 0.000 title claims description 80
- 238000000576 coating method Methods 0.000 title claims description 80
- 239000002243 precursor Substances 0.000 claims description 79
- 230000007423 decrease Effects 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nozzles (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Coating Apparatus (AREA)
Description
Claims (10)
- 管状電極と、前記管状電極の下に設けられ、且つプラズマを噴射するために配置されるノズルであって、噴口及び滑らかな輪郭を有し、前記噴口が前記ノズルの底部に配置され、前記滑らかな輪郭の外径が前記管状電極から前記噴口へ次第に縮小するノズルと、を含む大気圧プラズマ発生器と、
前記管状電極及び前記ノズルに隣設され、且つコーティング前駆体が前記滑らかな輪郭に沿って前記噴口の前に流れるように、前記ノズルの前記滑らかな輪郭にコーティング前駆体を噴射するように構成される少なくとも1つの前駆体フィード治具であって、少なくとも1つの開口を有し、前記少なくとも1つの開口は前記ノズルの最上部より上に配置される前駆体フィード冶具と、
を備える大気圧プラズマコーティング装置。 - 前記大気圧プラズマ発生器は、前記管状電極内に設けられる棒状電極を更に含む請求項1に記載の大気圧プラズマコーティング装置。
- 前記滑らかな輪郭は、流線形輪郭である請求項1乃至請求項2のいずれか1項に記載の大気圧プラズマコーティング装置。
- 前記少なくとも1つの前駆体フィード治具は、前記管状電極の外に環設される複数の前駆体フィード治具を含む請求項1乃至請求項3のいずれか1項に記載の大気圧プラズマコーティング装置。
- 前記前駆体フィード治具の間に同一の間隔を有する請求項4に記載の大気圧プラズマコーティング装置。
- 前記少なくとも1つの前駆体フィード治具は、前記管状電極の外に環設される環状前駆体フィード治具である請求項1乃至請求項3のいずれか1項に記載の大気圧プラズマコーティング装置。
- 前記環状前駆体フィード治具は、環状流路を有する請求項6に記載の大気圧プラズマコーティング装置。
- 前記少なくとも1つの開口は環状の開口であり、前記環状の開口は前記管状電極に対向して位置する請求項7に記載の大気圧プラズマコーティング装置。
- 前記少なくとも1つの開口は複数の開口から成り、前記複数の開口は前記管状電極に対向して位置する請求項7に記載の大気圧プラズマコーティング装置。
- 前記複数の開口の間に同じ間隔を有する請求項9に記載の大気圧プラズマコーティング装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106103033A TWI598465B (zh) | 2017-01-25 | 2017-01-25 | 常壓電漿鍍膜裝置 |
TW106103033 | 2017-01-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018119206A JP2018119206A (ja) | 2018-08-02 |
JP6385524B2 true JP6385524B2 (ja) | 2018-09-05 |
Family
ID=60719304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017107939A Expired - Fee Related JP6385524B2 (ja) | 2017-01-25 | 2017-05-31 | 大気圧プラズマコーティング装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6385524B2 (ja) |
CN (1) | CN108342713B (ja) |
TW (1) | TWI598465B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108611623B (zh) * | 2018-06-28 | 2020-07-31 | 中国科学院电工研究所 | 抑制固体介质材料二次电子产额的喷涂镀膜装置及方法 |
TWI666339B (zh) * | 2018-08-21 | 2019-07-21 | 馗鼎奈米科技股份有限公司 | 電漿鍍膜裝置 |
CN109267037A (zh) * | 2018-11-21 | 2019-01-25 | 新疆大学 | 常压等离子体增强化学气相沉积方法及采用该方法的设备 |
TWI686106B (zh) * | 2019-01-25 | 2020-02-21 | 國立清華大學 | 場發射手持式常壓電漿產生裝置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0385564A (ja) * | 1989-08-30 | 1991-04-10 | Canon Inc | 画像形成装置 |
JP2000096247A (ja) * | 1998-09-22 | 2000-04-04 | Komatsu Ltd | 表面処理装置 |
JP3649378B2 (ja) * | 1999-08-26 | 2005-05-18 | シャープ株式会社 | プラズマ処理装置およびプラズマ処理方法 |
GB0208261D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
CN2735710Y (zh) * | 2004-09-11 | 2005-10-19 | 石家庄钢铁股份有限公司 | 一种等离子体驱动装置 |
CN101163370A (zh) * | 2006-10-10 | 2008-04-16 | 馗鼎奈米科技股份有限公司 | 等离子导引机构及应用该导引机构的等离子放电装置 |
GB0717430D0 (en) * | 2007-09-10 | 2007-10-24 | Dow Corning Ireland Ltd | Atmospheric pressure plasma |
US20090142511A1 (en) * | 2007-11-29 | 2009-06-04 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
US10167556B2 (en) * | 2014-03-14 | 2019-01-01 | The Board Of Trustees Of The University Of Illinois | Apparatus and method for depositing a coating on a substrate at atmospheric pressure |
-
2017
- 2017-01-25 TW TW106103033A patent/TWI598465B/zh active
- 2017-03-17 CN CN201710161397.6A patent/CN108342713B/zh active Active
- 2017-05-31 JP JP2017107939A patent/JP6385524B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2018119206A (ja) | 2018-08-02 |
TW201827625A (zh) | 2018-08-01 |
CN108342713B (zh) | 2020-06-26 |
CN108342713A (zh) | 2018-07-31 |
TWI598465B (zh) | 2017-09-11 |
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