JP6370247B2 - 高色再現が可能な着色光硬化性樹脂組成物、カラーフィルタおよびこれを備えた液晶表示装置 - Google Patents

高色再現が可能な着色光硬化性樹脂組成物、カラーフィルタおよびこれを備えた液晶表示装置 Download PDF

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Publication number
JP6370247B2
JP6370247B2 JP2015048154A JP2015048154A JP6370247B2 JP 6370247 B2 JP6370247 B2 JP 6370247B2 JP 2015048154 A JP2015048154 A JP 2015048154A JP 2015048154 A JP2015048154 A JP 2015048154A JP 6370247 B2 JP6370247 B2 JP 6370247B2
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resin composition
photocurable resin
weight
compound
pigment
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Japanese (ja)
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JP2015184675A (ja
Inventor
ジェ−ボム ヨー
ジェ−ボム ヨー
チャン−ホ ウー
チャン−ホ ウー
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2015048154A 2014-03-21 2015-03-11 高色再現が可能な着色光硬化性樹脂組成物、カラーフィルタおよびこれを備えた液晶表示装置 Active JP6370247B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2014-0033244 2014-03-21
KR1020140033244A KR101917406B1 (ko) 2014-03-21 2014-03-21 고색재현이 가능한 착색 광경화성 수지조성물, 컬러필터 및 이를 구비한 액정표시장치

Publications (2)

Publication Number Publication Date
JP2015184675A JP2015184675A (ja) 2015-10-22
JP6370247B2 true JP6370247B2 (ja) 2018-08-08

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JP2015048154A Active JP6370247B2 (ja) 2014-03-21 2015-03-11 高色再現が可能な着色光硬化性樹脂組成物、カラーフィルタおよびこれを備えた液晶表示装置

Country Status (4)

Country Link
JP (1) JP6370247B2 (zh)
KR (1) KR101917406B1 (zh)
CN (1) CN104932201B (zh)
TW (1) TWI615674B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6341351B1 (ja) * 2016-09-16 2018-06-13 三菱ケミカル株式会社 感光性樹脂組成物、硬化物及び画像表示装置
JPWO2023119900A1 (zh) 2021-12-21 2023-06-29

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347154B2 (zh) * 1974-01-23 1978-12-19
US6090900A (en) * 1997-02-25 2000-07-18 Eastman Chemical Company Polymers containing functionalized olefin monomers
US6794110B2 (en) * 2002-03-04 2004-09-21 International Business Machines Corporation Polymer blend and associated methods of preparation and use
JP4142973B2 (ja) * 2003-03-28 2008-09-03 株式会社日本触媒 硬化性樹脂組成物およびその用途
JP4368282B2 (ja) * 2004-09-24 2009-11-18 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
JP2008020779A (ja) * 2006-07-14 2008-01-31 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
EP1975702B1 (en) * 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP5092590B2 (ja) * 2007-07-03 2012-12-05 三菱化学株式会社 着色光重合性組成物、カラーフィルター及び液晶表示装置
JP5334624B2 (ja) * 2008-03-17 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5491019B2 (ja) * 2008-11-25 2014-05-14 株式会社Ｄｎｐファインケミカル 感光性着色組成物及びそれを用いたカラーフィルター
JP5689628B2 (ja) * 2009-09-04 2015-03-25 株式会社日本触媒 架橋性化合物
EP2316407B1 (en) * 2009-10-30 2021-04-28 Dentsply DeTrey GmbH Dental composition
JP2013167786A (ja) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp 有機絶縁膜用硬化性樹脂組成物、硬化物、ｔｆｔアクティブマトリックス基板及び液晶表示装置
JP2013228727A (ja) * 2012-03-29 2013-11-07 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP5954892B2 (ja) * 2012-06-06 2016-07-20 富士フイルム株式会社 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法

Also Published As

Publication number Publication date
CN104932201A (zh) 2015-09-23
KR20150109843A (ko) 2015-10-02
JP2015184675A (ja) 2015-10-22
TW201537291A (zh) 2015-10-01
CN104932201B (zh) 2019-10-22
TWI615674B (zh) 2018-02-21
KR101917406B1 (ko) 2018-11-09

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