JP6307825B2 - 防着板支持部材、プラズマ源およびイオンビーム照射装置 - Google Patents
防着板支持部材、プラズマ源およびイオンビーム照射装置 Download PDFInfo
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- JP6307825B2 JP6307825B2 JP2013197960A JP2013197960A JP6307825B2 JP 6307825 B2 JP6307825 B2 JP 6307825B2 JP 2013197960 A JP2013197960 A JP 2013197960A JP 2013197960 A JP2013197960 A JP 2013197960A JP 6307825 B2 JP6307825 B2 JP 6307825B2
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- Prior art keywords
- plasma
- adhesion
- support member
- wall surface
- preventing plate
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- 238000010884 ion-beam technique Methods 0.000 title claims description 9
- 230000001681 protective effect Effects 0.000 title description 2
- 230000008021 deposition Effects 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 28
- 230000002265 prevention Effects 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013197960A JP6307825B2 (ja) | 2013-09-25 | 2013-09-25 | 防着板支持部材、プラズマ源およびイオンビーム照射装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013197960A JP6307825B2 (ja) | 2013-09-25 | 2013-09-25 | 防着板支持部材、プラズマ源およびイオンビーム照射装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015065010A JP2015065010A (ja) | 2015-04-09 |
| JP2015065010A5 JP2015065010A5 (cg-RX-API-DMAC7.html) | 2016-03-24 |
| JP6307825B2 true JP6307825B2 (ja) | 2018-04-11 |
Family
ID=52832749
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013197960A Active JP6307825B2 (ja) | 2013-09-25 | 2013-09-25 | 防着板支持部材、プラズマ源およびイオンビーム照射装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6307825B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7237877B2 (ja) * | 2020-03-13 | 2023-03-13 | 株式会社東芝 | イオン源装置 |
| US12154753B2 (en) * | 2021-09-13 | 2024-11-26 | Applied Materials, Inc. | Device to control uniformity of extracted ion beam |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002151473A (ja) * | 2000-11-13 | 2002-05-24 | Tokyo Electron Ltd | プラズマ処理装置及びその組立方法 |
| US7374636B2 (en) * | 2001-07-06 | 2008-05-20 | Applied Materials, Inc. | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
| JP2003247057A (ja) * | 2002-02-20 | 2003-09-05 | Seiko Epson Corp | 防着治具および薄膜形成装置 |
| JP5329072B2 (ja) * | 2007-12-03 | 2013-10-30 | 東京エレクトロン株式会社 | 処理容器およびプラズマ処理装置 |
| JP5578865B2 (ja) * | 2009-03-25 | 2014-08-27 | 東京エレクトロン株式会社 | 誘導結合プラズマ処理装置のカバー固定具およびカバー固定装置 |
| TWI502617B (zh) * | 2010-07-21 | 2015-10-01 | 應用材料股份有限公司 | 用於調整電偏斜的方法、電漿處理裝置與襯管組件 |
| JP2013020737A (ja) * | 2011-07-08 | 2013-01-31 | Nissin Ion Equipment Co Ltd | 防着板支持部材およびこれを備えたイオン源 |
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2013
- 2013-09-25 JP JP2013197960A patent/JP6307825B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015065010A (ja) | 2015-04-09 |
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