JP6291505B2 - 非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス - Google Patents
非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス Download PDFInfo
- Publication number
- JP6291505B2 JP6291505B2 JP2015545421A JP2015545421A JP6291505B2 JP 6291505 B2 JP6291505 B2 JP 6291505B2 JP 2015545421 A JP2015545421 A JP 2015545421A JP 2015545421 A JP2015545421 A JP 2015545421A JP 6291505 B2 JP6291505 B2 JP 6291505B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- less
- titania
- silica
- doped silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011521 glass Substances 0.000 title claims description 165
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims description 91
- 239000004071 soot Substances 0.000 claims description 44
- 229910052731 fluorine Inorganic materials 0.000 claims description 38
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 34
- 239000011737 fluorine Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 30
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 239000002019 doping agent Substances 0.000 claims description 16
- 239000002243 precursor Substances 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052734 helium Inorganic materials 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 2
- 241000338670 Clossiana titania Species 0.000 claims 1
- 238000000137 annealing Methods 0.000 description 32
- 229910052736 halogen Inorganic materials 0.000 description 27
- 150000002367 halogens Chemical class 0.000 description 27
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 238000007596 consolidation process Methods 0.000 description 12
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 230000006872 improvement Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 230000009467 reduction Effects 0.000 description 7
- 238000003980 solgel method Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000012159 carrier gas Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000003825 pressing Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000013081 microcrystal Substances 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000006121 base glass Substances 0.000 description 2
- 235000008429 bread Nutrition 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012025 fluorinating agent Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 235000013372 meat Nutrition 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- -1 4 or the like Chemical compound 0.000 description 1
- 239000005347 annealed glass Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 231100000206 health hazard Toxicity 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000033772 system development Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
- C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/32—Doped silica-based glasses containing metals containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261731621P | 2012-11-30 | 2012-11-30 | |
| US61/731,621 | 2012-11-30 | ||
| US13/835,039 US8901019B2 (en) | 2012-11-30 | 2013-03-15 | Very low CTE slope doped silica-titania glass |
| US13/835,039 | 2013-03-15 | ||
| PCT/US2013/072146 WO2014085529A1 (en) | 2012-11-30 | 2013-11-27 | Very low cte slope doped silica-titania glass |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016502495A JP2016502495A (ja) | 2016-01-28 |
| JP2016502495A5 JP2016502495A5 (OSRAM) | 2016-11-24 |
| JP6291505B2 true JP6291505B2 (ja) | 2018-03-14 |
Family
ID=50826009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015545421A Expired - Fee Related JP6291505B2 (ja) | 2012-11-30 | 2013-11-27 | 非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8901019B2 (OSRAM) |
| EP (1) | EP2925686A1 (OSRAM) |
| JP (1) | JP6291505B2 (OSRAM) |
| WO (1) | WO2014085529A1 (OSRAM) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| DE102013112396B3 (de) * | 2013-11-12 | 2014-11-13 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
| US9382150B2 (en) * | 2014-03-14 | 2016-07-05 | Corning Incorporated | Boron-doped titania-silica glass having very low CTE slope |
| EP3000791B1 (de) * | 2014-09-24 | 2017-04-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines Rohlings aus Fluor- und Titan-dotiertem, hochkieselsäurehaltigem Glas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
| US9580350B2 (en) | 2014-11-19 | 2017-02-28 | Corning Incorporated | High hydroxyl TiO2-SiO2 glass |
| EP3858795A1 (en) * | 2014-11-26 | 2021-08-04 | Corning Incorporated | Method for making halogen doped optical element |
| JP2017536323A (ja) * | 2014-11-26 | 2017-12-07 | コーニング インコーポレイテッド | 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法 |
| US9611169B2 (en) * | 2014-12-12 | 2017-04-04 | Corning Incorporated | Doped ultra-low expansion glass and methods for making the same |
| US9822030B2 (en) * | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| JP2018513093A (ja) * | 2015-03-26 | 2018-05-24 | コーニング インコーポレイテッド | 極紫外線リソグラフィーに使用するためのガラス複合体 |
| US9932261B2 (en) * | 2015-11-23 | 2018-04-03 | Corning Incorporated | Doped ultra-low expansion glass and methods for annealing the same |
| US10464840B2 (en) * | 2016-10-05 | 2019-11-05 | Corning Incorporated | Near infrared shielding and laser-resistant window |
| CN115189015B (zh) | 2016-12-21 | 2025-12-05 | 康宁股份有限公司 | 烧结系统和烧结制品 |
| US11270724B1 (en) * | 2021-03-04 | 2022-03-08 | Western Digital Technologies, Inc. | Glass substrates for heat assisted magnetic recording (HAMR) and methods and apparatus for use with the glass substrates |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4792706B2 (ja) | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| DE202004021665U1 (de) | 2003-04-26 | 2009-11-26 | Schott Ag | Glaskörper aus dotiertem Quarzglas |
| DE102004060600A1 (de) | 2003-12-18 | 2005-07-14 | Schott Ag | Mit Fluor dotiertes Silicatglas und Verwendung eines solchen |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| DE102007029403A1 (de) * | 2006-06-28 | 2008-01-03 | Corning Incorporated | Glas mit sehr geringer Ausdehnung und Verfahren zu dessen Herstellung |
| JP5042714B2 (ja) * | 2007-06-06 | 2012-10-03 | 信越化学工業株式会社 | ナノインプリントモールド用チタニアドープ石英ガラス |
| EP2217539A4 (en) | 2007-11-30 | 2015-07-01 | Corning Inc | LOW DILATION GLASS MATERIAL HAVING A LOW GRADIENT OF EXPANSION POWER |
| TW200940472A (en) | 2007-12-27 | 2009-10-01 | Asahi Glass Co Ltd | TiO2-containing silica glass |
| JP5428323B2 (ja) * | 2007-12-27 | 2014-02-26 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| WO2009107869A1 (en) | 2008-02-29 | 2009-09-03 | Asahi Glass Co., Ltd. | Tio2-containing silica glass and optical member for lithography using the same |
| JP5644058B2 (ja) | 2008-03-21 | 2014-12-24 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| JP2010135732A (ja) | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Ｅｕｖマスクブランクス用基板 |
| US8735308B2 (en) | 2009-01-13 | 2014-05-27 | Asahi Glass Company, Limited | Optical member comprising TiO2-containing silica glass |
| EP2463250B2 (en) | 2009-05-13 | 2019-09-25 | Asahi Glass Company, Limited | Methods for producing and for heat-treating a tio2-sio2 glass body |
| JP5572016B2 (ja) | 2009-08-04 | 2014-08-13 | シスメックス株式会社 | 組織液抽出用デバイス、その製造方法、及び該デバイスを用いた組織液の分析方法 |
| US8713969B2 (en) | 2009-08-31 | 2014-05-06 | Corning Incorporated | Tuning Tzc by the annealing of ultra low expansion glass |
| JP5510308B2 (ja) | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
| US20110207593A1 (en) | 2010-02-25 | 2011-08-25 | Carlos Duran | Expansivity in Low Expansion Silica-Titania Glasses |
| US8541325B2 (en) | 2010-02-25 | 2013-09-24 | Corning Incorporated | Low expansivity, high transmission titania doped silica glass |
| US9034450B2 (en) | 2011-08-31 | 2015-05-19 | Corning Incorporated | Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
| US20130047669A1 (en) | 2011-08-31 | 2013-02-28 | Sezhian Annamalai | Method of making a silica-titania glass having a ternary doped critical zone |
-
2013
- 2013-03-15 US US13/835,039 patent/US8901019B2/en not_active Expired - Fee Related
- 2013-11-27 WO PCT/US2013/072146 patent/WO2014085529A1/en not_active Ceased
- 2013-11-27 EP EP13803404.6A patent/EP2925686A1/en not_active Withdrawn
- 2013-11-27 JP JP2015545421A patent/JP6291505B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20140155246A1 (en) | 2014-06-05 |
| JP2016502495A (ja) | 2016-01-28 |
| EP2925686A1 (en) | 2015-10-07 |
| WO2014085529A1 (en) | 2014-06-05 |
| US8901019B2 (en) | 2014-12-02 |
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