JP6285636B2 - 露光装置、露光方法及びデバイスの製造方法 - Google Patents

露光装置、露光方法及びデバイスの製造方法 Download PDF

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Publication number
JP6285636B2
JP6285636B2 JP2013057303A JP2013057303A JP6285636B2 JP 6285636 B2 JP6285636 B2 JP 6285636B2 JP 2013057303 A JP2013057303 A JP 2013057303A JP 2013057303 A JP2013057303 A JP 2013057303A JP 6285636 B2 JP6285636 B2 JP 6285636B2
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JP
Japan
Prior art keywords
reticle
stage
holding
held
exposure apparatus
Prior art date
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Expired - Fee Related
Application number
JP2013057303A
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English (en)
Japanese (ja)
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JP2014183227A (ja
JP2014183227A5 (enExample
Inventor
崇志 早川
崇志 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013057303A priority Critical patent/JP6285636B2/ja
Priority to US14/219,101 priority patent/US9632432B2/en
Publication of JP2014183227A publication Critical patent/JP2014183227A/ja
Publication of JP2014183227A5 publication Critical patent/JP2014183227A5/ja
Application granted granted Critical
Publication of JP6285636B2 publication Critical patent/JP6285636B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013057303A 2013-03-19 2013-03-19 露光装置、露光方法及びデバイスの製造方法 Expired - Fee Related JP6285636B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013057303A JP6285636B2 (ja) 2013-03-19 2013-03-19 露光装置、露光方法及びデバイスの製造方法
US14/219,101 US9632432B2 (en) 2013-03-19 2014-03-19 Exposure apparatus, stage apparatus, and device fabrication method for transferring a pattern of a reticle onto a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013057303A JP6285636B2 (ja) 2013-03-19 2013-03-19 露光装置、露光方法及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2014183227A JP2014183227A (ja) 2014-09-29
JP2014183227A5 JP2014183227A5 (enExample) 2016-04-14
JP6285636B2 true JP6285636B2 (ja) 2018-02-28

Family

ID=51568920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013057303A Expired - Fee Related JP6285636B2 (ja) 2013-03-19 2013-03-19 露光装置、露光方法及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US9632432B2 (enExample)
JP (1) JP6285636B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5689491B2 (ja) * 2013-03-05 2015-03-25 ファナック株式会社 サーボモータの制御装置
US20200218165A1 (en) * 2018-12-21 2020-07-09 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Exposure apparatus and method of detecting alignment error of reticle

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3985003B2 (ja) * 1996-03-12 2007-10-03 キヤノン株式会社 Ｘ線投影露光装置及びデバイス製造方法
JPH1055944A (ja) * 1996-08-08 1998-02-24 Toshiba Corp パターン転写装置
JPH11162809A (ja) * 1997-11-25 1999-06-18 Nikon Corp 試料保持装置および露光装置
US6573976B2 (en) * 2000-10-04 2003-06-03 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and semiconductor device manufacturing method
US6710850B2 (en) 2000-12-22 2004-03-23 Nikon Corporation Exposure apparatus and exposure method
JP4635364B2 (ja) * 2001-04-03 2011-02-23 株式会社ニコン 露光装置及び露光方法
JP3568511B2 (ja) * 2002-02-28 2004-09-22 株式会社半導体先端テクノロジーズ パターン露光方法および露光装置
JP2004140271A (ja) * 2002-10-21 2004-05-13 Nikon Corp 露光装置及びデバイス製造方法
JP2007115992A (ja) * 2005-10-21 2007-05-10 Nikon Corp 露光装置、基板及びデバイスの製造方法
JP2010198315A (ja) 2009-02-25 2010-09-09 Yokogawa Electric Corp Ｘｙステージ

Also Published As

Publication number Publication date
JP2014183227A (ja) 2014-09-29
US9632432B2 (en) 2017-04-25
US20140285791A1 (en) 2014-09-25

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