JP6242601B2 - 2次元ガード構造およびそれを用いた放射線検出器 - Google Patents
2次元ガード構造およびそれを用いた放射線検出器 Download PDFInfo
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Description
−その端部が前記変向点に位置する導電性パッチに隣り合って配置されている電極が、最も大きい電位の絶対値を呈するように構成されている(角に、1個の電極701、1個の導電性パッチ702;図7を参照のこと)
−それら端部が前記変向点に位置する導電性パッチに隣り合って配置されている、少なくとも1つの電極が、最も大きい電位の絶対値を呈するように構成されている(角に、数個の電極、1個の導電性パッチ;図5および6を参照のこと)
−その端部が前記変向点に位置する複数の導電性パッチに隣り合って配置されている電極が、最も大きい電位の絶対値を呈するように構成されている(角に、1個の電極801、数個の導電性パッチ802、803;図8を参照のこと)
−それら端部が前記変向点に位置する複数の導電性パッチに隣り合って配置されている少なくとも1つの電極が、最も大きい電位の絶対値を呈するように構成されている(角に、数個の電極、数個の導電性パッチ)。
−第1側:三日月体のドリフト電極(またはそれより長い電極)の端部と隣り合っている側
−第2側:半導体部材の縁部1005と隣り合っている側(前記縁部は実際には、図10に示されているより導電性パッチからはるかに離れている可能性がある)
−第3側:ドリフト検出器の幅広の端部を囲むガードリング(および最外側のドリフト電極)の連続部分の端点と隣り合っている側、ならびに
−第4側:ドリフト検出器の尖状の端部のまわりに沿って曲げられているガードリング(および最外側のドリフト電極)のより短い連続部分の端点と隣り合っている側。
502 2次元アレイの第2側
503 2次元アレイの第3側
504 2次元アレイの第4側
505、506、507、508、701、801、1014 電極
702、802、803、1401 導電性パッチ
1001 ドリフト検出器の幅広の端部
1002 ドリフト検出器の尖状の端部
1004 アノード領域
1005 半導体部材の縁部
1012 導電性パッチの配列
1013 三日月体のドリフト電極
1015 導電性ブリッジ
1101、1102、1103 導電性トラック
1201 半導体部材
1202、1203、1204、1205、1206 ドリフト電極
1208、1404 フィールドプレート
1209、1403 電気絶縁層
Claims (12)
- 半導体装置の表面上の電位の絶対値を制御可能に低下させるためのガード構造であって、
導電性パッチの2次元アレイであって、そのうちの少なくともいくつかが前記2次元アレイの領域の外側に存在する電位の影響下、電位を呈していて、2つの異なる方向で前記半導体装置の表面上の前記電位の絶対値を制御可能に低下させる、導電性パッチの2次元アレイと、
前記表面上のガードリングであって、前記2次元アレイを構成する前記導電性パッチの配列によってそのうちの少なくとも1つが中断されているガードリングと
を備えるガード構造。 - 前記2次元アレイが、単純に連結された、前記半導体装置の表面の2次元領域を覆っている請求項1記載のガード構造。
- 半導体部材と、
前記半導体部材の表面上に、種々の電位を呈するように構成される多数の電極ストリップと、
導電性パッチの2次元アレイであって、そのうちの少なくともいくつかが前記電極に存在する電位の影響下、電位を呈していて、2つの異なる方向で前記半導体部材の前記表面上の前記電位の絶対値を制御可能に低下させる、導電性パッチの2次元アレイ、および、前記表面上のガードリングであって、前記2次元アレイを構成する前記導電性パッチの配列によってそのうちの少なくとも1つが中断されているガードリングを備えたガード構造
とを備える半導体装置。 - 前記2次元アレイが第1側、前記第1側に対向する第2側、第3側および前記第3側に対向する第4側を備え、
前記第2側が、半導体部材の縁部に隣接し、
前記電極の第1のサブセットが、ストリップの形状をしており、そして、それらの端点が、前記第1側に沿った導電性パッチの対応するそれぞれと隣り合うように位置し、
前記電極の第2のサブセットが、ストリップの形状をしており、そして、それらの端点が、前記第3側に沿った導電性パッチの対応するそれぞれに隣り合うように位置する
請求項3記載の半導体装置。 - 前記電極の第1および第2のサブセットのうち、そのまたはそれらの端部が前記第1側および第3側のあいだの変向点に位置する導電性パッチに隣り合って配置されている1つまたは少なくとも1つの電極が、最も大きい絶対値の電位を呈するように構成されている
請求項4記載の半導体装置。 - 半導体装置が、前記電極の電位によって形成される電場の影響下、前記半導体部材内に放射線によって誘起される電荷キャリアを収集するように構成されているドリフト検出器であり、
半導体装置が、前記半導体部材の前記表面上に、前記表面の中心部分を囲む1またはそれ以上のガードリングを備え、
少なくとも1つの前記ガードリングが、前記導電性パッチの配列を備える
請求項3記載の半導体装置。 - 半導体部材が、幅広の端部および尖状の端部を有する液滴の形状であり、
前記少なくとも1つの前記ガードリングの一部が、前記幅広の端部に位置する電極の周りを円で囲み、
前記導電性パッチの配列が、前記幅広の端部および前記尖状の端部の間の半導体部材の端部に平行に延びる
請求項6記載の半導体装置。 - 前記液滴の形状の両側に沿って、導電性パッチの2次元アレイと、
前記幅広の端部内の前記表面上の、多数の三日月体のドリフト電極であって、それぞれの三日月体のドリフト電極が、1つの2次元アレイの最内部側で導電性パッチと隣り合う1つの端部、および、別の2次元アレイの最内部側で導電性パッチと隣り合うもう1つの端部を有するドリフト電極
とを有する請求項7記載の半導体装置。 - 前記三日月体のドリフト電極であって、その端部が2次元アレイの最内部側で導電性パッチと隣り合っており、ドリフト電極の広がっていく配列中の1つおきのドリフト電極を構成し、
半導体装置が、前記三日月体のドリフト電極の連続的な対のそれぞれの間に、より短い三日月体のドリフト電極を備え、その端部が、前記1つおきのドリフト電極の端部と比べ、2次元アレイの前記最内部側から離れた距離にある
請求項8記載の半導体装置。 - 半導体装置が、前記表面上の電極から導電性トラックを電気的に絶縁させる少なくとも1つの絶縁層上に、少なくとも1つの導電性トラックを備え、および
前記導電性トラックが、前記導電性パッチの2次元アレイが前記幅広の端部を囲っている電極部分から離れている電極部分を横切り、前記尖状の端部内に位置しているアノード領域へと延びる、
請求項7記載の半導体装置。 - 表面で形成される電荷キャリアの収集のための配置であって、前記電荷キャリアをドリフト電極の端部の間のギャップから前記導電性パッチの2次元アレイによって覆われた領域へと導くように構成されている配置を備える請求項6記載の半導体装置。
- 前記配置が、連続的なドリフト電極の間のそれぞれの分離に隣り合って位置され、かつ、電気絶縁層によって前記分離から電気的に絶縁されている、多数の連続的なフィールドプレートを備える請求項11記載の半導体装置。
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US13/528,065 US9530902B2 (en) | 2012-06-20 | 2012-06-20 | Two-dimensional guard structure and a radiation detector with the same |
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US8314468B2 (en) * | 2009-06-10 | 2012-11-20 | Moxtek, Inc. | Variable ring width SDD |
EP2275837A3 (en) * | 2009-07-16 | 2014-02-26 | Canberra Industries, Inc. | Simplified silicon drift detector and wraparound neutron detector |
JP5543758B2 (ja) * | 2009-11-19 | 2014-07-09 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
DE102010004890A1 (de) * | 2010-01-18 | 2011-07-21 | Siemens Aktiengesellschaft, 80333 | Photodiodenarray, Strahlendetektor und Verfahren zur Herstellung eines solchen Photodiodenarrays und eines solchen Strahlendetektors |
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2012
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EP2677555A3 (en) | 2018-01-24 |
CN103515175A (zh) | 2014-01-15 |
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JP2014013894A (ja) | 2014-01-23 |
US9530902B2 (en) | 2016-12-27 |
CN103515175B (zh) | 2017-03-01 |
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US20130341752A1 (en) | 2013-12-26 |
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