JP6231587B2 - 構成体及び構成体を備えたリソグラフィ装置 - Google Patents
構成体及び構成体を備えたリソグラフィ装置 Download PDFInfo
- Publication number
- JP6231587B2 JP6231587B2 JP2016011414A JP2016011414A JP6231587B2 JP 6231587 B2 JP6231587 B2 JP 6231587B2 JP 2016011414 A JP2016011414 A JP 2016011414A JP 2016011414 A JP2016011414 A JP 2016011414A JP 6231587 B2 JP6231587 B2 JP 6231587B2
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- magnetic
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- force
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- 230000005291 magnetic effect Effects 0.000 claims description 292
- 239000000463 material Substances 0.000 claims description 25
- 238000010276 construction Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000010586 diagram Methods 0.000 description 12
- 230000005347 demagnetization Effects 0.000 description 10
- 239000000696 magnetic material Substances 0.000 description 10
- 238000007493 shaping process Methods 0.000 description 8
- 238000005286 illumination Methods 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 229910001172 neodymium magnet Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000007779 soft material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QJVKUMXDEUEQLH-UHFFFAOYSA-N [B].[Fe].[Nd] Chemical compound [B].[Fe].[Nd] QJVKUMXDEUEQLH-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910000828 alnico Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000005293 ferrimagnetic effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004643 material aging Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
- F16C32/0406—Magnetic bearings
- F16C32/0408—Passive magnetic bearings
- F16C32/041—Passive magnetic bearings with permanent magnets on one part attracting the other part
- F16C32/0417—Passive magnetic bearings with permanent magnets on one part attracting the other part for axial load mainly
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
- F16C32/0406—Magnetic bearings
- F16C32/0408—Passive magnetic bearings
- F16C32/0423—Passive magnetic bearings with permanent magnets on both parts repelling each other
- F16C32/0427—Passive magnetic bearings with permanent magnets on both parts repelling each other for axial load mainly
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70816—Bearings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Description
(平面から観察者に向かう)及び
(観察者から平面へ向かう)を用いる。
102 ビーム整形系
104 照明系
106 投影系
108 EUV光源
110 コリメータ
112 モノクロメータ
114 EUV放射線
116 第1ミラー
118 第2ミラー
120 フォトマスク
122 ウェーハ
124 第3ミラー
126 第4ミラー
200 構成体
202 重量補償デバイス
204 第1磁気デバイス
206 第2磁気デバイス
208 第1要素
210 第1永久磁石
212 第2要素
214 第2永久磁石
216 第3要素
218 第3永久磁石
220 第4要素
222 第4永久磁石
224 距離
226 距離
228 第1支持デバイス
230 ミラーの第1面
232 ミラーの第2面
234 第2支持デバイス
236 光学有効面
900 磁化可能材料
902 アクチュエータ
904 コイル
1000 軸
1002 管
1004 接続要素
1006 ハウジング
1008 第1内側永久磁石リング
1010 第2内側永久磁石リング
1012 第1外側永久磁石リング
1014 第3内側永久磁石リング
1016 第2外側永久磁石リング
1018 結合デバイス
1020 第1アクチュエータ
1022 第2アクチュエータ
1024 第1コイル
1026 第2コイル
t1 第1時点
t2 第2時点
FG 重量
F1 第1磁力
F1a 第1時点における第1磁力
F1b 第2時点における第1磁力
F2 第2磁力
F2a 第1時点における第2磁力
F2b 第2時点における第2磁力
ΔF 磁力の差の絶対値
ΔF1 第1磁力の差の絶対値
ΔF2 第2磁力の差の絶対値
S S磁極
N N磁極
Z 鉛直方向
Claims (10)
- リソグラフィ装置(100)の構成体(200)であって、
コンポーネント(126)と、
該コンポーネント(126)の重量(FG)を補償する重量補償デバイス(202)とを有し、該重量補償デバイス(202)は、
前記コンポーネント(126)の前記重量(FG)を超え且つ前記コンポーネント(126)の前記重量(FG)に逆らって働く第1磁力(F1)を前記コンポーネント(126)に作用させるよう設計された、少なくとも1つの永久磁石(210、214)を含む第1磁気デバイス(204)と、
前記コンポーネント(126)の前記重量(FG)の方向に働く第2磁力(F2)を前記コンポーネント(126)に作用させるよう設計された、少なくとも1つの永久磁石(218、222)を含む第2磁気デバイス(206)とを備え、
前記第1磁気デバイス(204)の前記少なくとも1つの永久磁石(210、214)の単位時間当たりの前記第1磁力(F1)の第1低下率は、前記第2磁気デバイス(206)の前記少なくとも1つの永久磁石(218、222)の単位時間当たりの前記第2磁力(F2)の第2低下率より小さい構成体。 - 請求項1に記載の構成体において、前記第1磁気デバイス(204)の前記少なくとも1つの永久磁石(210、214)は、前記第2磁気デバイス(206)の前記少なくとも1つの永久磁石(218、222)とは異なる材料を含む構成体。
- 請求項1又は2に記載の構成体において、前記第1磁気デバイス(204)は、前記第1磁力(F1)で前記コンポーネント(126)を押さえるために該コンポーネント(126)の下に配置され、前記第2磁気デバイス(206)は、前記第2磁力(F2)で前記コンポーネント(126)を押さえるために該コンポーネント(126)の上に配置される構成体。
- 請求項1又は2に記載の構成体において、前記第1磁気デバイス(204)は、前記第1磁力(F1)で前記コンポーネント(126)を引き寄せるために該コンポーネント(126)の上に配置され、前記第2磁気デバイス(206)は、前記第2磁力(F2)で前記コンポーネント(126)を引き寄せるために該コンポーネント(126)の下に配置される構成体。
- 請求項1〜4のいずれか1項に記載の構成体において、前記第1磁気デバイス(204)及び前記第2磁気デバイス(206)が複数設けられる構成体。
- 請求項5に記載の構成体において、前記第2磁気デバイス(206)は、前記第1磁力(F1)の和と同時に同じ絶対値だけ前記第2磁力(F2)の和を低減するよう設計される構成体。
- 請求項1〜6のいずれか1項に記載の構成体において、該構成体は、前記コンポーネント(126)を位置決めするアクチュエータ(902)も有し、該アクチュエータ(902)は、前記コンポーネント(126)に接続された要素にコイル(904)によって磁力を作用させる構成体。
- 請求項1〜7のいずれか1項に記載の構成体において、前記コンポーネント(126)は、光学素子用の保持フレームを有し、且つ/又は光学素子を有する構成体。
- 請求項8に記載の構成体において、前記光学素子は、ミラー(126)又はレンズを含む構成体。
- 請求項1〜9のいずれか1項に記載の構成体(200)を備えたリソグラフィ装置(100)。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102015201255.7 | 2015-01-26 | ||
DE102015201255.7A DE102015201255A1 (de) | 2015-01-26 | 2015-01-26 | Anordnung und Lithographieanlage mit Anordnung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016157103A JP2016157103A (ja) | 2016-09-01 |
JP6231587B2 true JP6231587B2 (ja) | 2017-11-15 |
Family
ID=55358664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016011414A Active JP6231587B2 (ja) | 2015-01-26 | 2016-01-25 | 構成体及び構成体を備えたリソグラフィ装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9632421B2 (ja) |
JP (1) | JP6231587B2 (ja) |
DE (1) | DE102015201255A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017212773A1 (de) * | 2017-07-25 | 2019-01-31 | Carl Zeiss Smt Gmbh | Gewichtskraftkompensationseinrichtung |
DE102018207949A1 (de) * | 2018-05-22 | 2019-05-29 | Carl Zeiss Smt Gmbh | Baugruppe in einer mikrolithographischen Projektionsbelichtungsanalge |
CN110153971B (zh) * | 2019-04-30 | 2024-01-30 | 上海隐冠半导体技术有限公司 | 工作台及其磁浮重力补偿装置 |
JP7400249B2 (ja) | 2019-07-31 | 2023-12-19 | ニデック株式会社 | 気体動圧軸受、モータ、ファンモータおよび直列式ファンモータ |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5560719A (en) * | 1978-10-27 | 1980-05-08 | Toshiba Corp | Magnetic bearing |
DE2938809A1 (de) | 1979-09-25 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Magnetisches schwebelager |
JPS56125984A (en) | 1980-03-10 | 1981-10-02 | Nippon Telegr & Teleph Corp <Ntt> | Magnetically floating movable base |
JPS61258345A (ja) | 1985-05-13 | 1986-11-15 | Toshiba Corp | 光ピツクアツプの対物レンズ支持駆動装置 |
JPH0294418A (ja) | 1988-09-30 | 1990-04-05 | Toshiba Corp | 投影露光装置 |
US5780943A (en) | 1996-04-04 | 1998-07-14 | Nikon Corporation | Exposure apparatus and method |
EP1262832A1 (en) * | 2001-05-31 | 2002-12-04 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2004048919A (ja) | 2002-07-12 | 2004-02-12 | Nikon Corp | リニアモータ及びステージ装置並びに露光装置 |
TWI254356B (en) | 2002-11-29 | 2006-05-01 | Asml Netherlands Bv | Magnetic actuator under piezoelectric control |
JP2004214555A (ja) | 2003-01-08 | 2004-07-29 | Nikon Corp | 磁気浮上テーブル装置及び露光装置 |
EP1646074A4 (en) | 2003-07-09 | 2007-10-03 | Nikon Corp | EXPOSURE DEVICE AND METHOD OF MANUFACTURE |
CN1879046B (zh) | 2003-09-12 | 2010-07-14 | 卡尔蔡司Smt股份公司 | 光学元件操纵仪 |
JP2005181760A (ja) | 2003-11-27 | 2005-07-07 | Kyocera Corp | 光学素子の保持構造及びこれを用いた光アイソレータ |
JP2005209670A (ja) | 2004-01-20 | 2005-08-04 | Canon Inc | 磁気浮上装置 |
JP2006323295A (ja) | 2005-05-20 | 2006-11-30 | Nidec Sankyo Corp | レンズ駆動装置 |
NL2001216C2 (nl) | 2008-01-25 | 2009-07-30 | Dams Beheer B V J | Magnetische actuator. |
JP5206132B2 (ja) | 2008-06-05 | 2013-06-12 | 株式会社ニコン | 光学素子保持装置、光学系、露光装置、デバイスの製造方法 |
WO2010066873A1 (de) | 2008-12-11 | 2010-06-17 | Carl Zeiss Smt Ag | Gravitationskompensation für optische elemente in projektionsbelichtungsanlagen |
WO2012084675A1 (en) | 2010-12-20 | 2012-06-28 | Carl Zeiss Smt Gmbh | Arrangement for mounting an optical element |
DE102011004607A1 (de) | 2011-02-23 | 2012-01-12 | Carl Zeiss Smt Gmbh | Vorrichtung zur Gewichtskraftkompensation eines optischen Bauteils, Aktuator und Lithographievorrichtung |
DE102013204317B4 (de) * | 2013-03-13 | 2015-07-23 | Carl Zeiss Smt Gmbh | Baugruppe einer mikrolithographischen Projektionsbelichtungsanlage |
-
2015
- 2015-01-26 DE DE102015201255.7A patent/DE102015201255A1/de not_active Withdrawn
-
2016
- 2016-01-22 US US15/003,970 patent/US9632421B2/en active Active
- 2016-01-25 JP JP2016011414A patent/JP6231587B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US9632421B2 (en) | 2017-04-25 |
JP2016157103A (ja) | 2016-09-01 |
DE102015201255A1 (de) | 2016-03-10 |
US20160216611A1 (en) | 2016-07-28 |
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