JP6218735B2 - 空間変動電荷分布を用いた半導体ダイの間隔の決定 - Google Patents

空間変動電荷分布を用いた半導体ダイの間隔の決定 Download PDF

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JP6218735B2
JP6218735B2 JP2014534638A JP2014534638A JP6218735B2 JP 6218735 B2 JP6218735 B2 JP 6218735B2 JP 2014534638 A JP2014534638 A JP 2014534638A JP 2014534638 A JP2014534638 A JP 2014534638A JP 6218735 B2 JP6218735 B2 JP 6218735B2
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semiconductor die
spatial
time
driver
charge distribution
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Japanese (ja)
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JP2014530365A5 (enExample
JP2014530365A (ja
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サザーランド,イバン・イー
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オラクル・インターナショナル・コーポレイション
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    • H10W90/00
    • H10W72/00
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/023Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring distance between sensor and object
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/14Measuring arrangements characterised by the use of electric or magnetic techniques for measuring distance or clearance between spaced objects or spaced apertures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/30Measuring arrangements characterised by the use of electric or magnetic techniques for measuring angles or tapers; for testing the alignment of axes
    • H10W46/00
    • H10W72/07223
    • H10W72/20
    • H10W90/293

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  • Semiconductor Integrated Circuits (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2014534638A 2011-10-05 2012-10-02 空間変動電荷分布を用いた半導体ダイの間隔の決定 Active JP6218735B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/253,893 2011-10-05
US13/253,893 US9076663B2 (en) 2011-10-05 2011-10-05 Determining spacing using a spatially varying charge distribution
PCT/US2012/058487 WO2013052502A1 (en) 2011-10-05 2012-10-02 Determining spacing of semiconductor dies using a spatially varying charge distribution

Publications (3)

Publication Number Publication Date
JP2014530365A JP2014530365A (ja) 2014-11-17
JP2014530365A5 JP2014530365A5 (enExample) 2015-10-15
JP6218735B2 true JP6218735B2 (ja) 2017-10-25

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Application Number Title Priority Date Filing Date
JP2014534638A Active JP6218735B2 (ja) 2011-10-05 2012-10-02 空間変動電荷分布を用いた半導体ダイの間隔の決定

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Country Link
US (1) US9076663B2 (enExample)
EP (1) EP2764539B1 (enExample)
JP (1) JP6218735B2 (enExample)
CN (1) CN103918075B (enExample)
TW (1) TWI562300B (enExample)
WO (1) WO2013052502A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9076663B2 (en) * 2011-10-05 2015-07-07 Oracle International Corporation Determining spacing using a spatially varying charge distribution
US8918752B2 (en) * 2011-12-14 2014-12-23 Oracle International Corporation Determining alignment using a spatially varying charge distribution

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2777632B2 (ja) * 1989-12-29 1998-07-23 株式会社日立製作所 記録方法及び記録装置
DE4200076A1 (de) * 1992-01-03 1993-08-05 Siemens Ag Passiver oberflaechenwellen-sensor, der drahtlos abfragbar ist
JP3052594B2 (ja) * 1992-08-24 2000-06-12 株式会社村田製作所 静電センサの感度調整方法および静電センサ
US6728113B1 (en) * 1993-06-24 2004-04-27 Polychip, Inc. Method and apparatus for non-conductively interconnecting integrated circuits
US6812046B2 (en) * 2002-07-29 2004-11-02 Sun Microsystems Inc. Method and apparatus for electronically aligning capacitively coupled chip pads
US6710436B1 (en) * 2002-12-12 2004-03-23 Sun Microsystems, Inc. Method and apparatus for electrostatically aligning integrated circuits
US7425836B2 (en) * 2006-08-23 2008-09-16 Sun Microsystems, Inc. Measuring chip-to-chip capacitance differentials by demodulating signals over a capacitance bridge
US7649255B2 (en) * 2006-12-06 2010-01-19 Sun Microsystems, Inc. Determining chip separation by comparing coupling capacitances
US7786427B2 (en) * 2008-05-06 2010-08-31 Oracle America, Inc. Proximity optical memory module having an electrical-to-optical and optical-to-electrical converter
US9182782B2 (en) * 2011-09-22 2015-11-10 Oracle International Corporation Synchronizing timing of communication between integrated circuits
US9076663B2 (en) * 2011-10-05 2015-07-07 Oracle International Corporation Determining spacing using a spatially varying charge distribution
US8918752B2 (en) * 2011-12-14 2014-12-23 Oracle International Corporation Determining alignment using a spatially varying charge distribution

Also Published As

Publication number Publication date
CN103918075B (zh) 2017-02-15
TW201334134A (zh) 2013-08-16
US20130088212A1 (en) 2013-04-11
CN103918075A (zh) 2014-07-09
EP2764539A1 (en) 2014-08-13
EP2764539B1 (en) 2018-02-28
US9076663B2 (en) 2015-07-07
WO2013052502A1 (en) 2013-04-11
TWI562300B (en) 2016-12-11
JP2014530365A (ja) 2014-11-17

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