JP6193305B2 - 高性能線形成光学システム及び方法 - Google Patents
高性能線形成光学システム及び方法 Download PDFInfo
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Description
I(x)=G(x)・rect(x/a) ((d1)/2=a)
で規定される。ここで、rect(x/a)は、0(|x|>aの場合)、1/2(x=aの場合)、及び、1(|x|<aの場合)であり、G(x)=exp(−x2)である。したがって、I’(x’)は、
<反射中継光学システム>
<レーザアニーリングシステム>
Claims (17)
- 対物面及び画像面を有し、前記画像面に線画像を形成する線形成光学システムであって、
初期レーザ光線を放射するレーザ光源と、光線調整光学システムと、第1の絞り装置と、中継光学システムとを備え、
前記光線調整光学システムは、前記初期レーザ光線を受光し、前記初期レーザ光線から、ガウス分布とともに第1の強度プロファイルを有する調整レーザ光線を少なくとも第1の方向に形成し、
前記第1の絞り装置は、前記対物面に動作可能に配置され、前記第1の方向の前記第1の強度プロファイルを切り捨てる第1のスリット開口部を規定し、前記調整レーザ光線の少なくとも50%を構成する第1の透過光を規定し、
前記中継光学システムは、前記第1の方向において、実質的に1倍倍率を有し、かつ、前記第1の方向にのみ光学出力を有する円筒状の光学システムであって、前記対物面及び前記画像面を規定するとともに、第2の絞り装置が動作可能に配置される中間像面を規定し、前記中間像面において、中央ピーク及び前記中央ピークに直に隣接する第1のサイドピークを有する第2の強度プロファイルを規定し、前記第2の絞り装置は、前記第1の方向において、各第1のサイドピーク内の第2の強度プロファイルを切り捨てて、第2の透過光を規定するように構成され、
前記中継光学システムは、前記画像面に、前記第2の透過光から前記線画像を形成し、
前記第1のサイドピークはそれぞれ、最大値MX、前記最大値MXと比べて前記中央ピークにより近い第1の最小値m1、及び、前記第1の最小値m1と比べて前記中央ピークからより離れた第2の最小値m2によって規定され、前記第2の絞り装置は、第2のスリット開口部を規定し、前記第2のスリット開口部は、各第1のサイドピークにおける、前記最大値MXと前記第2の最小値m2との間において前記第2の強度プロファイルを切り捨てるように構成され、
前記線画像は、5mm≦L≦100mmの範囲の長さLを有し、かつ、前記長さLに対して±5%以内の強度均一性を有する、線形成光学システム。 - 前記中継光学システムは、反射光学部品のみから構成される、請求項1に記載の線形成光学システム。
- 前記レーザ光源は、公称10.6μmの操作波長を有する、請求項2に記載の線形成光学システム。
- 前記第1の絞り装置は、前記対物面に動作可能に配置された一対のブレードを備える、請求項1から3の何れか1項に記載の線形成光学システム。
- 前記第2の絞り装置は、前記中間像面に動作可能に配置された一対のブレードを備える、請求項4に記載の線形成光学システム。
- 前記線画像は、5mm≦L≦100mmの範囲の長さLを有し、かつ、25μm≦w≦500μmの範囲の幅wを有する、請求項1から5の何れか1項に記載の線形成光学システム。
- 表面を有するウエハをアニーリングするためのレーザアニーリングシステムであって、
請求項1から6の何れか1項に記載の線形成光学システムと、ステージとを備え、
前記線形成光学システムにおいて、前記線画像は、長さLで規定された長手寸法を有し、
前記ステージは、前記画像面において前記ウエハを動作可能に支持し移動させるように構成され、これにより、ウエハ表面上で前記線画像を走査方向に走査し、前記ウエハ表面をアニールし、ここで、前記走査方向は、前記線画像の前記長手寸法に対して垂直である、
レーザアニーリングシステム。 - 前記ウエハ表面は、ドーパントを含むデバイス特徴部を含み、前記ウエハ表面のアニーリングは、前記ドーパントを活性化する、請求項7に記載のレーザアニーリングシステム。
- 線画像を形成する方法であって、
ガウス分布とともに第1の強度プロファイルを有するレーザ光線を少なくとも第1の方向に形成することと、
前記第1の方向において前記レーザ光線の少なくとも50%を通過させて第1の透過光を形成することと、
中間像面で前記第1の透過光の焦点合わせを行い、中央ピーク及び前記中央ピークに直に隣接する第1のサイドピークを有する第2の強度プロファイルを規定することと、
各第1のサイドピーク内の第2の強度プロファイルを切り捨てて第2の透過光を規定することと、
画像面において、前記第2の透過光から前記線画像を形成することと
を備え、
前記中間像面は、中継光学システムによって規定され、前記中継光学システムは、前記第1の方向において実質的に1倍倍率を有し、かつ、前記中継光学システムは、前記第1の方向にのみ光学出力を有する円筒鏡を備えており、
第1のサイドピークはそれぞれ、最大値MX、前記最大値MXと比べて前記中央ピークにより近い第1の最小値m1、及び、前記第1の最小値m1と比べて前記中央ピークからより離れた第2の最小値m2によって規定され、前記第2の強度プロファイルを切り捨てることは、各第1のサイドピークにおいて、前記最大値MXと前記第2の最小値m2との間で実行され、
前記線画像は、5mm≦L≦100mmの範囲の長さLを有し、前記長さLに対して±5%以内の強度均一性を有する、方法。 - 前記中継光学システムは、反射光学部品のみから構成される、請求項9に記載の方法。
- 前記第2の強度プロファイルを切り捨てることは、一対のブレードによって規定されたスリット開口部に、前記第1の透過光の中央部分を通過させることを含む、請求項9または10に記載の方法。
- 前記線画像は、5mm≦L≦100mmの範囲の長さLを有し、25μm≦w≦500μmの範囲の幅wを有する、請求項9から11の何れか1項に記載の方法。
- 前記線画像は、長さLで規定された長手寸法を有し、前記長手寸法に対して垂直な走査方向に、ウエハ表面上で前記線画像を走査することをさらに備える、請求項9から12の何れか1項に記載の方法。
- 前記ウエハ表面は、ドーパントを含むデバイス特徴部を含み、前記ウエハ表面上での前記線画像の走査は、前記ドーパントを活性化する、請求項13に記載の方法。
- 対物面及び画像面を有し、前記画像面に線画像を形成する線形成光学システムであって、
レーザ光源システムと、第1の絞り装置と、中継光学システムとを備え、
前記レーザ光源システムは、第1の方向に延びるとともに、前記第1の方向にガウス分布を有する第1の強度プロファイルを有するレーザ光線を放射し、
前記第1の絞り装置は、前記レーザ光線の中央部分の少なくとも50%を通過させて前記第1の方向において前記レーザ光線を切り捨てるように動作可能に配置され、
前記中継光学システムは、前記第1の方向において、実質的に1倍倍率を有し、かつ、前記第1の方向にのみ光学出力を有する円筒状の光学システムであって、前記中継光学システムは、中間像面を有し、前記中間像面には、第2の絞り装置が動作可能に配置され、前記中間像面において第2の強度プロファイルを規定する第1の光学部品を有し、前記第2の強度プロファイルは、前記第1の方向に延びるとともに、中央ピーク及び前記中央ピークに直に隣接する第1のサイドピークを有し、
前記第2の絞り装置は、各第1のサイドピーク内で前記第2の強度プロファイルを切り捨てて、第2の透過光を規定するように構成され、
前記中継光学システムは、前記画像面において前記第2の透過光から前記線画像を形成する第2の光学部品を有し、
前記第1のサイドピークはそれぞれ、最大値MX、前記最大値MXと比べて前記中央ピークにより近い第1の最小値m1、及び、前記第1の最小値m1と比べて前記中央ピークからより離れた第2の最小値m2によって規定され、前記第2の絞り装置は、第2のスリット開口部を規定し、前記第2のスリット開口部は、各第1のサイドピークにおける、前記最大値MXと前記第2の最小値m2との間において前記第2の強度プロファイルを切り捨てるように構成され、
前記線画像は、5mm≦L≦100mmの範囲の長さLを有し、かつ、前記長さLに対して±5%以内の強度均一性を有する、線形成光学システム。 - 前記第1及び第2の光学部品は反射性を有する、請求項15に記載の線形成光学システム。
- 前記第1及び第2の絞り装置はそれぞれ、一対のブレードを備える、請求項15または16に記載の線形成光学システム。
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