JP6185724B2 - 露光装置および物品の製造方法 - Google Patents

露光装置および物品の製造方法 Download PDF

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JP6185724B2
JP6185724B2 JP2013031429A JP2013031429A JP6185724B2 JP 6185724 B2 JP6185724 B2 JP 6185724B2 JP 2013031429 A JP2013031429 A JP 2013031429A JP 2013031429 A JP2013031429 A JP 2013031429A JP 6185724 B2 JP6185724 B2 JP 6185724B2
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mark
substrate
exposure apparatus
alignment
axis
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Japanese (ja)
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JP2014160780A5 (enrdf_load_stackoverflow
JP2014160780A (ja
Inventor
浩平 長野
浩平 長野
規行 八木
規行 八木
啓介 大手
啓介 大手
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013031429A 2013-02-20 2013-02-20 露光装置および物品の製造方法 Active JP6185724B2 (ja)

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JP2013031429A JP6185724B2 (ja) 2013-02-20 2013-02-20 露光装置および物品の製造方法

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JP2013031429A JP6185724B2 (ja) 2013-02-20 2013-02-20 露光装置および物品の製造方法

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JP2014160780A JP2014160780A (ja) 2014-09-04
JP2014160780A5 JP2014160780A5 (enrdf_load_stackoverflow) 2016-04-07
JP6185724B2 true JP6185724B2 (ja) 2017-08-23

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6853700B2 (ja) * 2017-03-14 2021-03-31 キヤノン株式会社 露光装置、露光方法、プログラム、決定方法及び物品の製造方法
JP6788559B2 (ja) * 2017-09-04 2020-11-25 キヤノン株式会社 パターン形成方法、リソグラフィ装置、および物品製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3209189B2 (ja) * 1991-04-25 2001-09-17 株式会社ニコン 露光装置及び方法
JP3259314B2 (ja) * 1992-02-03 2002-02-25 株式会社ニコン アライメント方法、露光方法、デバイス製造方法、アライメント装置、露光装置、及び前記デバイス製造方法により製造されたデバイス
JPH09306811A (ja) * 1996-05-15 1997-11-28 Nikon Corp 露光方法
CN100476599C (zh) * 2002-09-20 2009-04-08 Asml荷兰有限公司 光刻标记结构、包含该光刻标记结构的光刻投射装置和利用该光刻标记结构进行基片对准的方法
JP2004303830A (ja) * 2003-03-28 2004-10-28 Canon Inc マーク計測装置及び方法及び露光装置
WO2007129688A1 (ja) * 2006-05-10 2007-11-15 Mejiro Precision, Inc. 投影露光装置及び投影露光方法
JP5041582B2 (ja) * 2006-12-05 2012-10-03 キヤノン株式会社 露光装置、計測条件を選定するための方法及びデバイス製造方法
JP2009031561A (ja) * 2007-07-27 2009-02-12 Adtec Engineeng Co Ltd 投影露光装置及び分割露光方法

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