JP6177298B2 - メタルマスク材料及びメタルマスク - Google Patents
メタルマスク材料及びメタルマスク Download PDFInfo
- Publication number
- JP6177298B2 JP6177298B2 JP2015216848A JP2015216848A JP6177298B2 JP 6177298 B2 JP6177298 B2 JP 6177298B2 JP 2015216848 A JP2015216848 A JP 2015216848A JP 2015216848 A JP2015216848 A JP 2015216848A JP 6177298 B2 JP6177298 B2 JP 6177298B2
- Authority
- JP
- Japan
- Prior art keywords
- metal mask
- rolling
- mask material
- metal
- cold rolling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002184 metal Substances 0.000 title claims description 94
- 229910052751 metal Inorganic materials 0.000 title claims description 94
- 239000000463 material Substances 0.000 title claims description 57
- 238000005096 rolling process Methods 0.000 claims description 42
- 239000011888 foil Substances 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 2
- 238000000137 annealing Methods 0.000 description 31
- 239000013078 crystal Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 30
- 230000007547 defect Effects 0.000 description 28
- 238000005097 cold rolling Methods 0.000 description 26
- 238000001953 recrystallisation Methods 0.000 description 22
- 238000005530 etching Methods 0.000 description 18
- 239000000758 substrate Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000003921 oil Substances 0.000 description 12
- 239000011368 organic material Substances 0.000 description 11
- HYHSBSXUHZOYLX-WDSKDSINSA-N S-nitrosoglutathione Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@@H](CSN=O)C(=O)NCC(O)=O HYHSBSXUHZOYLX-WDSKDSINSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000003086 colorant Substances 0.000 description 5
- 239000010731 rolling oil Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000002845 discoloration Methods 0.000 description 3
- 238000000879 optical micrograph Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Metal Rolling (AREA)
- Heat Treatment Of Sheet Steel (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015216848A JP6177298B2 (ja) | 2015-11-04 | 2015-11-04 | メタルマスク材料及びメタルマスク |
| TW105129913A TWI612160B (zh) | 2015-11-04 | 2016-09-14 | 金屬遮罩材料及金屬遮罩 |
| KR1020160138223A KR101830004B1 (ko) | 2015-11-04 | 2016-10-24 | 메탈 마스크 재료 및 메탈 마스크 |
| CN201610960658.6A CN107012421B (zh) | 2015-11-04 | 2016-11-04 | 金属掩模材料及金属掩模 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015216848A JP6177298B2 (ja) | 2015-11-04 | 2015-11-04 | メタルマスク材料及びメタルマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017088914A JP2017088914A (ja) | 2017-05-25 |
| JP6177298B2 true JP6177298B2 (ja) | 2017-08-09 |
Family
ID=58740589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015216848A Active JP6177298B2 (ja) | 2015-11-04 | 2015-11-04 | メタルマスク材料及びメタルマスク |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6177298B2 (ko) |
| KR (1) | KR101830004B1 (ko) |
| CN (1) | CN107012421B (ko) |
| TW (1) | TWI612160B (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116083843A (zh) * | 2017-09-07 | 2023-05-09 | Lg伊诺特有限公司 | 金属材料oled沉积掩模及沉积掩模的残余应力的测量方法 |
| CN109778114B (zh) * | 2017-11-14 | 2021-10-15 | 大日本印刷株式会社 | 用于制造蒸镀掩模的金属板和金属板的制造方法以及蒸镀掩模和蒸镀掩模的制造方法 |
| EP3859029A4 (en) * | 2018-09-27 | 2022-11-02 | NIPPON STEEL Chemical & Material Co., Ltd. | METAL MASK MATERIAL, ITS PRODUCTION METHOD AND METAL MASK |
| DE102019007831A1 (de) * | 2018-11-13 | 2020-05-14 | Dai Nippon Printing Co., Ltd. | Metallplatte zur herstellung von dampfphasenabscheidungsmasken, verfahren zur herstellung von metallplatten, dampfphasenabscheidungsmaske, verfahren zur herstellung einer dampfphasenabscheidungsmaske, und dampfphasenabscheidungsmaskenvorrichtung aufweisend eine dampfphasenabscheidungsmaske |
| JP2020138115A (ja) * | 2019-02-27 | 2020-09-03 | 信越ポリマー株式会社 | 部品保持治具の粘着面再生方法 |
| CN112322993A (zh) * | 2020-11-19 | 2021-02-05 | 苏州钿汇金属材料有限公司 | 一种超薄铁镍合金材料及其制造方法 |
| TWI772066B (zh) * | 2021-06-16 | 2022-07-21 | 達運精密工業股份有限公司 | 金屬遮罩基材的製備方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2590626B2 (ja) * | 1990-03-22 | 1997-03-12 | 日本鋼管株式会社 | 清浄性およびエッチング穿孔性に優れたＦｅ−Ｎｉ系合金冷延板およびその製造方法 |
| DE60040004D1 (de) * | 1999-06-10 | 2008-10-02 | Nippon Yakin Kogyo Co Ltd | Material auf fe-ni-basis für lochmaske |
| JP2001254147A (ja) * | 2000-03-10 | 2001-09-18 | Nisshin Steel Co Ltd | すじむらを抑制したシャドウマスク用Ｆｅ−Ｎｉ系合金板及びその製造方法 |
| JP5294072B2 (ja) * | 2009-03-18 | 2013-09-18 | 日立金属株式会社 | エッチング加工用素材の製造方法及びエッチング加工用素材 |
| JP4883432B2 (ja) * | 2010-05-31 | 2012-02-22 | 東洋紡績株式会社 | フレキシブル金属張積層体 |
| CN103205698B (zh) * | 2012-01-16 | 2015-06-10 | 昆山允升吉光电科技有限公司 | 一种蒸镀用掩模板 |
| CN103205700A (zh) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | 一种有效提高蒸镀质量的掩模板及其制备工艺 |
| JP5721691B2 (ja) * | 2012-11-20 | 2015-05-20 | Jx日鉱日石金属株式会社 | メタルマスク材料及びメタルマスク |
-
2015
- 2015-11-04 JP JP2015216848A patent/JP6177298B2/ja active Active
-
2016
- 2016-09-14 TW TW105129913A patent/TWI612160B/zh active
- 2016-10-24 KR KR1020160138223A patent/KR101830004B1/ko active IP Right Grant
- 2016-11-04 CN CN201610960658.6A patent/CN107012421B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN107012421A (zh) | 2017-08-04 |
| TWI612160B (zh) | 2018-01-21 |
| CN107012421B (zh) | 2019-08-02 |
| KR20170052468A (ko) | 2017-05-12 |
| TW201723204A (zh) | 2017-07-01 |
| KR101830004B1 (ko) | 2018-02-19 |
| JP2017088914A (ja) | 2017-05-25 |
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