CN107012421B - 金属掩模材料及金属掩模 - Google Patents

金属掩模材料及金属掩模 Download PDF

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Publication number
CN107012421B
CN107012421B CN201610960658.6A CN201610960658A CN107012421B CN 107012421 B CN107012421 B CN 107012421B CN 201610960658 A CN201610960658 A CN 201610960658A CN 107012421 B CN107012421 B CN 107012421B
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CN
China
Prior art keywords
metal mask
rolling
mask material
degree
metal
Prior art date
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Active
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CN201610960658.6A
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English (en)
Chinese (zh)
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CN107012421A (zh
Inventor
近藤祐幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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Publication of CN107012421A publication Critical patent/CN107012421A/zh
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal Rolling (AREA)
  • Heat Treatment Of Sheet Steel (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
CN201610960658.6A 2015-11-04 2016-11-04 金属掩模材料及金属掩模 Active CN107012421B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015216848A JP6177298B2 (ja) 2015-11-04 2015-11-04 メタルマスク材料及びメタルマスク
JP2015-216848 2015-11-04

Publications (2)

Publication Number Publication Date
CN107012421A CN107012421A (zh) 2017-08-04
CN107012421B true CN107012421B (zh) 2019-08-02

Family

ID=58740589

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610960658.6A Active CN107012421B (zh) 2015-11-04 2016-11-04 金属掩模材料及金属掩模

Country Status (4)

Country Link
JP (1) JP6177298B2 (ko)
KR (1) KR101830004B1 (ko)
CN (1) CN107012421B (ko)
TW (1) TWI612160B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116083843A (zh) * 2017-09-07 2023-05-09 Lg伊诺特有限公司 金属材料oled沉积掩模及沉积掩模的残余应力的测量方法
CN109778114B (zh) * 2017-11-14 2021-10-15 大日本印刷株式会社 用于制造蒸镀掩模的金属板和金属板的制造方法以及蒸镀掩模和蒸镀掩模的制造方法
EP3859029A4 (en) * 2018-09-27 2022-11-02 NIPPON STEEL Chemical & Material Co., Ltd. METAL MASK MATERIAL, ITS PRODUCTION METHOD AND METAL MASK
DE102019007831A1 (de) * 2018-11-13 2020-05-14 Dai Nippon Printing Co., Ltd. Metallplatte zur herstellung von dampfphasenabscheidungsmasken, verfahren zur herstellung von metallplatten, dampfphasenabscheidungsmaske, verfahren zur herstellung einer dampfphasenabscheidungsmaske, und dampfphasenabscheidungsmaskenvorrichtung aufweisend eine dampfphasenabscheidungsmaske
JP2020138115A (ja) * 2019-02-27 2020-09-03 信越ポリマー株式会社 部品保持治具の粘着面再生方法
CN112322993A (zh) * 2020-11-19 2021-02-05 苏州钿汇金属材料有限公司 一种超薄铁镍合金材料及其制造方法
TWI772066B (zh) * 2021-06-16 2022-07-21 達運精密工業股份有限公司 金屬遮罩基材的製備方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04218644A (ja) * 1990-03-22 1992-08-10 Nkk Corp 清浄性およびエッチング穿孔性に優れたＦｅ−Ｎｉ系合金冷延板およびその製造方法　
JP2001254147A (ja) * 2000-03-10 2001-09-18 Nisshin Steel Co Ltd すじむらを抑制したシャドウマスク用Ｆｅ−Ｎｉ系合金板及びその製造方法
CN103205700A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 一种有效提高蒸镀质量的掩模板及其制备工艺
CN103205698A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 一种蒸镀用掩模板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60040004D1 (de) * 1999-06-10 2008-10-02 Nippon Yakin Kogyo Co Ltd Material auf fe-ni-basis für lochmaske
JP5294072B2 (ja) * 2009-03-18 2013-09-18 日立金属株式会社 エッチング加工用素材の製造方法及びエッチング加工用素材
JP4883432B2 (ja) * 2010-05-31 2012-02-22 東洋紡績株式会社 フレキシブル金属張積層体
JP5721691B2 (ja) * 2012-11-20 2015-05-20 Jx日鉱日石金属株式会社 メタルマスク材料及びメタルマスク

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04218644A (ja) * 1990-03-22 1992-08-10 Nkk Corp 清浄性およびエッチング穿孔性に優れたＦｅ−Ｎｉ系合金冷延板およびその製造方法　
JP2001254147A (ja) * 2000-03-10 2001-09-18 Nisshin Steel Co Ltd すじむらを抑制したシャドウマスク用Ｆｅ−Ｎｉ系合金板及びその製造方法
CN103205700A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 一种有效提高蒸镀质量的掩模板及其制备工艺
CN103205698A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 一种蒸镀用掩模板

Also Published As

Publication number Publication date
CN107012421A (zh) 2017-08-04
TWI612160B (zh) 2018-01-21
KR20170052468A (ko) 2017-05-12
TW201723204A (zh) 2017-07-01
JP6177298B2 (ja) 2017-08-09
KR101830004B1 (ko) 2018-02-19
JP2017088914A (ja) 2017-05-25

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Address after: No. 10-4, erdingmu, tiger gate, Tokyo port, Japan

Patentee after: JX Metal Co.,Ltd.

Address before: Tokyo, Japan

Patentee before: JX Metal Co.,Ltd.

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