JP6135436B2 - 炭化珪素半導体装置 - Google Patents
炭化珪素半導体装置 Download PDFInfo
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- JP6135436B2 JP6135436B2 JP2013209434A JP2013209434A JP6135436B2 JP 6135436 B2 JP6135436 B2 JP 6135436B2 JP 2013209434 A JP2013209434 A JP 2013209434A JP 2013209434 A JP2013209434 A JP 2013209434A JP 6135436 B2 JP6135436 B2 JP 6135436B2
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- silicon carbide
- electrode
- insulating film
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 104
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 103
- 239000004065 semiconductor Substances 0.000 title claims description 80
- 239000010410 layer Substances 0.000 claims description 64
- 230000002093 peripheral effect Effects 0.000 claims description 54
- 239000012535 impurity Substances 0.000 claims description 40
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- 238000004519 manufacturing process Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 14
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000006073 displacement reaction Methods 0.000 description 10
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- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
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- 230000005669 field effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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- 229910052698 phosphorus Inorganic materials 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
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Description
最初に本発明の実施形態を列記して説明する。
この構成によれば、より一般的な製法に従って、ゲート絶縁膜を作成することができる。さらに、ゲートパッドの下のゲート絶縁膜に起因してリーク電流が生じる可能性を低減できる。ゲートパッドの下方にゲート絶縁膜が存在しない構造は、複雑になりやすい。また、より多くの製造工程が必要になる。上記の構成によれば、簡素な構成を実現することができる。
以下、図面に基づいて本発明の実施の形態を説明する。なお、以下の図面において同一または相当する部分には同一の参照番号を付し、その説明は繰返さない。
Claims (5)
- 炭化珪素半導体装置であって、
第1の主面と、前記第1の主面に対して反対側に位置する第2の主面とを有する炭化珪素層を備え、
前記炭化珪素層は、
導電型としてn型を有し、前記炭化珪素層の前記第1の主面を規定する第1の領域と、
前記第1の領域に配置され、導電型としてp型を有する第2の領域と、
前記第2の領域に配置され、導電型として前記p型を有し、前記第2の領域の不純物濃度よりも高い不純物濃度を有する第3の領域とを含み、
前記炭化珪素半導体装置は、
前記炭化珪素層の前記第2の領域上に配置されたゲート絶縁膜と、
前記ゲート絶縁膜上に配置されたゲート電極と、
前記ゲート絶縁膜および前記ゲート電極を覆うように配置され、前記ゲート電極を露出させる第1のコンタクトホールが設けられた層間絶縁膜と、
前記層間絶縁膜の上に配置されて、前記第1のコンタクトホールを通じて前記ゲート電極と電気的に接続されたゲートパッドとをさらに備え、
前記ゲート電極は、
平面視において、前記ゲートパッドの外部から前記ゲートパッドの周縁部に向けて延在するとともに、前記ゲートパッドの前記周縁部において前記ゲートパッドと重なる第1の櫛歯状電極部を含み、
前記第3の領域は、
前記平面視において前記ゲートパッドと重なる中央部と、
前記中央部から前記ゲートパッドの外側に向けて延在するとともに、前記ゲート電極の前記第1の櫛歯状電極部に対して間隔を隔てて対向するように配置された第1の周辺部とを含み、
前記第3の領域の前記第1の周辺部に直接接する前記ゲート絶縁膜上には、前記第1の櫛歯状電極部が配置されていない、炭化珪素半導体装置。 - 前記炭化珪素半導体装置は、
前記平面視において前記第2の領域と重なるように配置され、前記ゲート電極を囲むとともに前記ゲートパッドに電気的に接続されるゲートランナをさらに備え、
前記ゲート電極は、
前記平面視において、前記ゲートランナよりも内側から前記ゲートランナに向けて延在するとともに前記ゲートランナと重なる第2の櫛歯状電極部をさらに含み、
前記層間絶縁膜には、前記ゲート電極の前記第2の櫛歯状電極部を前記ゲートランナに電気的に接続するための第2のコンタクトホールが設けられ、
前記第3の領域は、
前記ゲートランナの内周側に向けて延在するとともに、前記ゲート電極の前記第2の櫛歯状電極部に対して間隔を隔てて対向するように配置された第2の周辺部をさらに含み、
前記第3の領域の前記第2の周辺部に直接接する前記ゲート絶縁膜上には、前記第2の櫛歯状電極部が配置されていない、請求項1に記載の炭化珪素半導体装置。 - 前記第3の領域の前記不純物濃度は、
5×1018cm-3以上、2×1020cm-3以下である、請求項1または請求項2に記載の炭化珪素半導体装置。 - 前記ゲート絶縁膜は、熱酸化膜である、請求項1から請求項3のいずれか1項に記載の炭化珪素半導体装置。
- 前記第2の領域に配置され、導電型としてn型を有する第4の領域と、
前記第2の領域に配置され、導電型としてp型を有する第5の領域と、
前記第3の領域とオーミック接合されるオーミック電極と、
前記オーミック電極、前記第4の領域および前記第5の領域に電気的に接続されるソースパッドとをさらに備える、請求項1から請求項4のいずれか1項に記載の炭化珪素半導体装置。
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