JP6118030B2 - 測定装置、露光装置及びデバイスの製造方法 - Google Patents

測定装置、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP6118030B2
JP6118030B2 JP2012048613A JP2012048613A JP6118030B2 JP 6118030 B2 JP6118030 B2 JP 6118030B2 JP 2012048613 A JP2012048613 A JP 2012048613A JP 2012048613 A JP2012048613 A JP 2012048613A JP 6118030 B2 JP6118030 B2 JP 6118030B2
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Japan
Prior art keywords
head
diffraction grating
alignment
detected
measuring
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JP2012048613A
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English (en)
Japanese (ja)
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JP2012225907A5 (enExample
JP2012225907A (ja
Inventor
伸郎 今岡
伸郎 今岡
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012048613A priority Critical patent/JP6118030B2/ja
Priority to US13/428,001 priority patent/US8928882B2/en
Publication of JP2012225907A publication Critical patent/JP2012225907A/ja
Publication of JP2012225907A5 publication Critical patent/JP2012225907A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2012048613A 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法 Active JP6118030B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012048613A JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法
US13/428,001 US8928882B2 (en) 2011-04-05 2012-03-23 Measurement apparatus, exposure apparatus, and device fabrication method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011084076 2011-04-05
JP2011084076 2011-04-05
JP2012048613A JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2012225907A JP2012225907A (ja) 2012-11-15
JP2012225907A5 JP2012225907A5 (enExample) 2015-04-23
JP6118030B2 true JP6118030B2 (ja) 2017-04-19

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JP2012048613A Active JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法

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US (1) US8928882B2 (enExample)
JP (1) JP6118030B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201503261TA (en) * 2012-11-19 2015-05-28 Asml Netherlands Bv Position measurement system, grating for a position measurement system and method
KR102680059B1 (ko) * 2015-11-23 2024-06-28 어플라이드 머티어리얼스, 인코포레이티드 프로세스 툴에서의 온-보드 메트롤로지(obm) 설계 및 그 영향
US12261729B1 (en) * 2024-10-14 2025-03-25 Tp-Link Systems Inc. Signal processing in wireless communication

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3082516B2 (ja) 1993-05-31 2000-08-28 キヤノン株式会社 光学式変位センサおよび該光学式変位センサを用いた駆動システム
JPH07270122A (ja) 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
US6034378A (en) * 1995-02-01 2000-03-07 Nikon Corporation Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
JP4164414B2 (ja) * 2003-06-19 2008-10-15 キヤノン株式会社 ステージ装置
EP2963498B8 (en) * 2006-01-19 2017-07-26 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2003679B1 (en) * 2006-02-21 2016-11-16 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JP4789194B2 (ja) * 2006-05-01 2011-10-12 国立大学法人東京農工大学 露光装置および方法ならびにデバイス製造方法
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
KR101427071B1 (ko) * 2007-07-24 2014-08-07 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR20130023016A (ko) * 2011-08-24 2013-03-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 기판 테이블 및 디바이스 제조 방법

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Publication number Publication date
US8928882B2 (en) 2015-01-06
US20120258391A1 (en) 2012-10-11
JP2012225907A (ja) 2012-11-15

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