JP6090035B2 - 液処理装置 - Google Patents
液処理装置 Download PDFInfo
- Publication number
- JP6090035B2 JP6090035B2 JP2013154703A JP2013154703A JP6090035B2 JP 6090035 B2 JP6090035 B2 JP 6090035B2 JP 2013154703 A JP2013154703 A JP 2013154703A JP 2013154703 A JP2013154703 A JP 2013154703A JP 6090035 B2 JP6090035 B2 JP 6090035B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- wafer
- light
- unit
- light receiving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007788 liquid Substances 0.000 title claims description 88
- 238000012545 processing Methods 0.000 title claims description 51
- 239000000758 substrate Substances 0.000 claims description 95
- 230000003028 elevating effect Effects 0.000 claims description 53
- 238000001514 detection method Methods 0.000 claims description 31
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000004140 cleaning Methods 0.000 description 64
- 239000000835 fiber Substances 0.000 description 33
- 238000000034 method Methods 0.000 description 17
- 230000002093 peripheral effect Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 239000013307 optical fiber Substances 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000011895 specific detection Methods 0.000 description 1
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013154703A JP6090035B2 (ja) | 2013-07-25 | 2013-07-25 | 液処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013154703A JP6090035B2 (ja) | 2013-07-25 | 2013-07-25 | 液処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015026688A JP2015026688A (ja) | 2015-02-05 |
| JP2015026688A5 JP2015026688A5 (enExample) | 2015-12-24 |
| JP6090035B2 true JP6090035B2 (ja) | 2017-03-08 |
Family
ID=52491127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013154703A Active JP6090035B2 (ja) | 2013-07-25 | 2013-07-25 | 液処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6090035B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7021877B2 (ja) * | 2017-08-08 | 2022-02-17 | 株式会社Screenホールディングス | 基板処理装置、位置合わせ装置および位置合わせ方法 |
| JP6908474B2 (ja) * | 2017-09-06 | 2021-07-28 | 株式会社ディスコ | ウエーハ洗浄装置 |
| KR102685189B1 (ko) * | 2022-08-23 | 2024-07-16 | 엘에스이 주식회사 | 기판 세정 장치 |
| KR102798182B1 (ko) * | 2023-05-23 | 2025-04-22 | 엘에스이 주식회사 | 기판 세정 장치 |
| KR102821310B1 (ko) * | 2023-10-26 | 2025-06-17 | 엘에스이 주식회사 | 기판 세정 장치 |
| KR102819139B1 (ko) * | 2023-11-10 | 2025-06-11 | 엘에스이 주식회사 | 기판 세정 장치 |
| KR102836608B1 (ko) * | 2024-02-01 | 2025-07-22 | 엘에스이 주식회사 | 기판 세정 장치 |
| KR102836609B1 (ko) * | 2024-02-07 | 2025-07-22 | 엘에스이 주식회사 | 기판 세정 장치 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3544747B2 (ja) * | 1995-05-15 | 2004-07-21 | 大日本スクリーン製造株式会社 | 回転式基板処理装置 |
| US5853483A (en) * | 1995-05-02 | 1998-12-29 | Dainippon Screen Mfg. Co., Ltd. | Substrate spin treating method and apparatus |
| JP3640373B2 (ja) * | 1999-08-27 | 2005-04-20 | 大日本スクリーン製造株式会社 | 基板載置台 |
| JP2002319563A (ja) * | 2001-04-20 | 2002-10-31 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
| JP4439464B2 (ja) * | 2005-12-06 | 2010-03-24 | 東京エレクトロン株式会社 | 基板搬送方法及び基板搬送装置 |
| JP2009200063A (ja) * | 2006-05-22 | 2009-09-03 | Tokyo Electron Ltd | 基板の変形検出機構,処理システム,基板の変形検出方法及び記録媒体 |
| JP5009254B2 (ja) * | 2008-08-14 | 2012-08-22 | 株式会社ディスコ | 樹脂被覆装置 |
| US9082802B2 (en) * | 2011-11-28 | 2015-07-14 | Macronix International Co., Ltd. | Wafer centering hardware design and process |
-
2013
- 2013-07-25 JP JP2013154703A patent/JP6090035B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015026688A (ja) | 2015-02-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6090035B2 (ja) | 液処理装置 | |
| TWI362081B (enExample) | ||
| US11244849B2 (en) | Substrate transfer device and substrate transfer method | |
| JP6220312B2 (ja) | 基板処理装置、基板処理装置の基板検知方法および記憶媒体 | |
| JP6001896B2 (ja) | 基板洗浄装置およびそれを備えた基板処理装置 | |
| JP2015096830A (ja) | 基板処理装置および基板処理方法 | |
| JP2013152998A (ja) | ロボットシステム | |
| KR102702408B1 (ko) | 기판 세정 장치 | |
| KR102402297B1 (ko) | 기판 처리 장치 및 기판 처리 방법 | |
| JP2017224658A (ja) | 基板搬送装置および基板搬送方法 | |
| JP6965378B2 (ja) | 基板搬送装置および基板搬送装置の異常検出方法 | |
| JP2000294616A (ja) | 仮置台付位置合わせ機構及びポリッシング装置 | |
| KR20130086269A (ko) | 로봇 시스템 | |
| JP6650836B2 (ja) | 基板搬送装置および基板搬送方法 | |
| JP6408673B2 (ja) | 基板処理装置、基板処理装置の基板検知方法および記憶媒体 | |
| CN211103385U (zh) | 一种研磨装置 | |
| KR102819139B1 (ko) | 기판 세정 장치 | |
| JP3665717B2 (ja) | 光学式基板検出装置、ならびにそれを用いた基板処理装置および基板処理方法 | |
| KR102821310B1 (ko) | 기판 세정 장치 | |
| KR102836609B1 (ko) | 기판 세정 장치 | |
| KR102836608B1 (ko) | 기판 세정 장치 | |
| JP6183137B2 (ja) | 液処理装置 | |
| KR20220038001A (ko) | 기판 세정 장치 및 기판 세정 방법 | |
| JP3974293B2 (ja) | 基板処理装置および基板処理方法 | |
| KR102685189B1 (ko) | 기판 세정 장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151109 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20151109 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160923 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161025 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161208 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170110 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170123 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6090035 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |