JP6079086B2 - コネクタの製造方法 - Google Patents
コネクタの製造方法 Download PDFInfo
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- JP6079086B2 JP6079086B2 JP2012205996A JP2012205996A JP6079086B2 JP 6079086 B2 JP6079086 B2 JP 6079086B2 JP 2012205996 A JP2012205996 A JP 2012205996A JP 2012205996 A JP2012205996 A JP 2012205996A JP 6079086 B2 JP6079086 B2 JP 6079086B2
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- cured film
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- acrylate
- connector
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- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
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- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
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- 238000004364 calculation method Methods 0.000 description 1
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- 239000004643 cyanate ester Substances 0.000 description 1
- CWTMXRBURASPSI-UHFFFAOYSA-N cyclodecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCCCCCC1 CWTMXRBURASPSI-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- WRAABIJFUKKEJQ-UHFFFAOYSA-N cyclopentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC1 WRAABIJFUKKEJQ-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 150000003022 phthalic acids Chemical class 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Images
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Structure Of Printed Boards (AREA)
Description
これらは単独で、又は、2種以上を混合して用いることができる。
アクリル樹脂のTgは−50〜100℃であれば特に制限はなく、−45〜20℃が好ましく、−40℃〜5℃が特に好ましい。
ここで、ガラス転移温度(Tg)は、DSC(Differential scanning calorimetry)により測定できるが、n種のモノマーから構成されるアクリル樹脂のTgは、以下の計算式(FOX式)により算出することもできる。
Tg(℃)={1/(W1/Tg1+W2/Tg2+…+Wi/Tgi+…+Wn/Tgn)}−273
上記FOX式において、Tgi(K)は、各モノマーのホモポリマーのガラス転移温度を示し、Wiは、各モノマーの質量分率を示し、W1+W2+…+Wi+…Wn=1である。
Tg={1/(0.05/319+0.05/498+0.85/251+0.05/219)}−273=−14.7℃
無機フィラーは予め、表面処理剤を含む有機溶媒に分散してスラリー化しておくことが好ましい。スラリーの固形分濃度は特に限定されないが50〜90重量%が好ましく、60〜85重量%が好ましく、65〜80重量%が特に好ましい。
製造例
シクロヘキサノン129gにN−フェニル−3−アミノプロピルトリメトキシシランKBM573(信越シリコ−ン株式会社製商品名)3.0gを溶解したのち、球状シリカ粒子としてアドマファインSO−25R(アドマテック株式会社製商品名)300gを撹拌しながら加え、全量を加えた後さらに室温で1時間撹拌した。そこに、エポキシ樹脂としてNC−3000H(日本化薬株式会社製商品名)のシクロヘキサノン溶液(固形分50%)27.6g、フェノール樹脂としてLA−3018(大日本インキ株式会社製商品名)のプロピレングリコールモノメチルエーテル溶液(固形分60質量%)18.7g、2−エチル−4−メチルイミダゾール2E4MZ(四国化成株式会社製商品名)0.42gを加えて、さらに30分撹拌したのち、アクリル樹脂としてグリシジルメタクリレート(GMA)、アクリロニトリル(AN)、エチルメタクリレート(EA)、及びブチルアクリレート(BA)の共重合体(モノマーの配合割合:GMA/AN/EA/BA=5/5/85/5(質量比)、Tg:−14.7℃、重量平均分子量61万、エポキシ当量2869)のシクロヘキサノン溶液(固形分24.9質量%)301gを加えてボールミルで12時間撹拌、混合し樹脂組成物溶液を液状組成物として得た。
装置:(ポンプ:L−2130型[(株)日立ハイテクノロジーズ製])、
(検出器:L−2490型RI[(株)日立ハイテクノロジーズ製])、
(カラムオーブン:L−2350[(株)日立ハイテクノロジーズ製])
カラム:Gelpack GL−A100M(日立化成工業(株)製、商品名)
カラムサイズ:10.7mmI.D×300mm
溶離液:テトラヒドロフラン
試料濃度:10mg/mL
注入量:100μL
流量:1.0mL/分
測定温度:25℃
ポリイミド厚み25μm/銅厚み18μmのエスパネックス(新日鐵化学株式会社製商品名)及びポリイミド厚み50μm/銅厚み18μmのエスパネックスの銅をフォトリソ加工して配線端子のパターンを形成した(導体層+基材の厚み=43μm)。ポリイミド基板上の端子パターンとは反対面に、メタルマスクを用い、製造例1の液状組成物を、印刷後の厚みが90μmとなるように印刷し、印刷した液状組成物を130℃で10分の加熱により乾燥した。その後、再度、同じ液状組成物を、印刷後の厚みが90μmとなるように印刷し、印刷された液状組成物を130℃で10分の加熱により乾燥した。次いで、さらに185℃で60分の加熱により液状組成物を硬化して、180μmの硬化膜を形成させ、硬化膜を有する試験片を得た(全厚み223μm)。
実施例1で作製した研磨前の試験片(全厚み223μm)をアランダムA#1000(アルミナ研磨液、株式会社マルトー製商品名)を用いて研磨し、全厚みが200μmのコネクタ試験片を得た。
(硬化膜とポリイミドフィルムとの接着性)
ポリイミドフィルム(ユーピレックス50S)に、バーコータを用い、乾燥後の厚みが125μmになるように液状組成物を塗布し、塗布した液状組成物を130℃で10分間の加熱により乾燥した。その後、185℃で30分間の加熱により膜を硬化させて、硬化膜を有する試料を得た。カッターナイフにより2mm幅に10本、これと直角に交差するように2mm幅で10本の碁盤目の切り込みを硬化膜に入れた。そこにセロテープ(登録商標)を張った後これを引き剥がし、そのときの硬化膜の剥がれの有無を確認した。
離型処理PET(ポリエチレンテレフタレート)フィルムに、バーコータを用い、乾燥後の厚みが125μmになるように液状組成物を塗布し、塗布された液状組成物を130℃で10分間の加熱により、乾燥した後、185℃で30分間、硬化し、硬化物(硬化膜)を離型処理PETフィルムからはがし、試料とした。試料を幅10mm、長さ100mmに打ち抜き、EZテスター(株式会社島津製作所製オートグラフEZ-S)を用いて引張り速度50mm/分で長さ方向に引っ張り、応力−変位曲線を測定した。立ち上がり初期の傾きから引張り弾性率を求めた。
幅10mmの試験片を天秤に押し付け、50gfの荷重を掛けたときに試験片が屈曲しなかったものを○、試験片が屈曲したり、樹脂層が破断したものを×とした。
ポリイミドフィルム及びこれに積層された硬化膜を有する試料を2枚の金網の間に挟み、コンベア型リフロー試験として、1.2m/分の速度で移動させながら、基板表面温度の最高温度が260℃であり、この温度で10秒加熱する加熱プロファイルで3回、処理した。処理後、外観の目視によりポリイミド/硬化膜間のふくれやはがれの有無を確認した。
デジタルマイクロメータ20(ミツトヨ製MDC−25SB)の測定部分21,22に厚さ1mmの鏡面仕上げアルミニウム板31,32を接着剤で固定し抜き差し耐久性評価用の治具とした(図2)。2枚のアルミニウム板31,32の間にデジタルマイクロメータ20により所定の隙間を設定した。隙間の間隔は試験片の厚みと同等、−15ミクロン、+15ミクロンの3点とした。アルミニウム板に対して平行な向きAに沿って試験片を約10mm挿入した後、引き抜きこれを最大30回繰り返した。試験片の異常を目視により観察し、剥がれ、割れ、折れなどの異常が発生するまでの回数を評価した。
各実施例の硬化膜とポリイミドフィルムとの接着性は良好であり、耐リフロー性も問題なかった。実施例1、2の硬化膜の引張り弾性率は1.7GPaであった。折り曲げ性の評価では、50gfの荷重に対して試験片が屈曲することはなかった。コネクタの抜き差しに対する耐久性の評価において、30回抜き差しを繰り返した後も異常は見られなかった。
Claims (3)
- 相手側のコネクタに差し込まれて配線を接続するために用いられる差し込み側のコネクタの製造方法であって、
一方の面側に配線端子が設けられている、又は配線端子が設けられる前の可撓性基材の他方の面上に液状組成物の層を形成させる工程と、
前記液状組成物の層から硬化膜又は半硬化膜を形成させる工程と、
前記硬化膜又は前記半硬化膜の一部を前記可撓性基材とは反対側の面側から除去して、前記硬化膜又は前記半硬化膜の厚みを所定の厚みまで減少させる工程と、
を備え、
前記液状組成物が球状シリカ粒子を含み、
前記硬化膜又前記半硬化膜が前記球状シリカ粒子を全体積のうち50〜70体積%含む、
製造方法。 - 前記液状組成物の層を印刷により形成させる、請求項1に記載の製造方法。
- 前記液状組成物がアクリル樹脂を含む、請求項1又は2に記載の製造方法。
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