JP6078970B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP6078970B2
JP6078970B2 JP2012079318A JP2012079318A JP6078970B2 JP 6078970 B2 JP6078970 B2 JP 6078970B2 JP 2012079318 A JP2012079318 A JP 2012079318A JP 2012079318 A JP2012079318 A JP 2012079318A JP 6078970 B2 JP6078970 B2 JP 6078970B2
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JP
Japan
Prior art keywords
meth
pigment
group
resin
acrylate
Prior art date
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Active
Application number
JP2012079318A
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English (en)
Japanese (ja)
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JP2013210444A (ja
Inventor
雅子 吉田
雅子 吉田
龍一 松浦
龍一 松浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2012079318A priority Critical patent/JP6078970B2/ja
Priority to CN201310101339.6A priority patent/CN103365080B/zh
Priority to KR1020130032559A priority patent/KR102021617B1/ko
Priority to TW102111109A priority patent/TWI617885B/zh
Publication of JP2013210444A publication Critical patent/JP2013210444A/ja
Application granted granted Critical
Publication of JP6078970B2 publication Critical patent/JP6078970B2/ja
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2012079318A 2012-03-30 2012-03-30 着色感光性樹脂組成物 Active JP6078970B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012079318A JP6078970B2 (ja) 2012-03-30 2012-03-30 着色感光性樹脂組成物
CN201310101339.6A CN103365080B (zh) 2012-03-30 2013-03-27 着色感光性树脂组合物
KR1020130032559A KR102021617B1 (ko) 2012-03-30 2013-03-27 착색 감광성 수지 조성물
TW102111109A TWI617885B (zh) 2012-03-30 2013-03-28 著色光敏性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012079318A JP6078970B2 (ja) 2012-03-30 2012-03-30 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2013210444A JP2013210444A (ja) 2013-10-10
JP6078970B2 true JP6078970B2 (ja) 2017-02-15

Family

ID=49366738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012079318A Active JP6078970B2 (ja) 2012-03-30 2012-03-30 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP6078970B2 (zh)
KR (1) KR102021617B1 (zh)
CN (1) CN103365080B (zh)
TW (1) TWI617885B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202127141A (zh) * 2015-01-30 2021-07-16 日商住友化學股份有限公司 著色感光性樹脂組合物
TWI735423B (zh) * 2015-01-30 2021-08-11 日商住友化學股份有限公司 著色感光性樹脂組合物
CN106019838A (zh) * 2015-03-30 2016-10-12 住友化学株式会社 着色感光性树脂组合物
KR101981373B1 (ko) * 2015-09-24 2019-05-22 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
JP6704337B2 (ja) * 2015-12-28 2020-06-03 住友化学株式会社 着色感光性樹脂組成物、カラーフィルタ及びそれを含む表示装置
TWI721087B (zh) * 2016-01-27 2021-03-11 日商住友化學股份有限公司 著色硬化性樹脂組成物、彩色濾光片及含有該濾光片之顯示裝置
US10889755B2 (en) 2016-11-22 2021-01-12 Samsung Electronics Co., Ltd. Photosensitive resin composition, complex, laminated structure and display device, and electronic device including the same
KR101869205B1 (ko) * 2017-10-13 2018-07-19 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 형성되는 패턴층, 이를 포함하는 컬러필터 및 이를 포함하는 액정 디스플레이 장치
KR20230093354A (ko) * 2018-02-16 2023-06-27 후지필름 가부시키가이샤 감광성 조성물

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4573256B2 (ja) * 2003-06-13 2010-11-04 ダイセル・サイテック株式会社 多官能(メタ)アクリル酸エステル、その製造方法および活性エネルギー線硬化型(メタ)アクリル酸エステル樹脂組成物並びにその硬化物
TWI396042B (zh) * 2004-09-29 2013-05-11 Sumitomo Chemical Co 著色感光性樹脂組成物
JP4946748B2 (ja) * 2007-09-14 2012-06-06 Jsr株式会社 着色層形成用感放射線性樹脂組成物およびカラーフィルタ
JP5187159B2 (ja) * 2008-11-26 2013-04-24 凸版印刷株式会社 カラーフィルタ
JP5593637B2 (ja) * 2009-06-05 2014-09-24 凸版印刷株式会社 カラーフィルタ
KR20110045528A (ko) * 2009-10-27 2011-05-04 동우 화인켐 주식회사 청색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP5683095B2 (ja) * 2009-12-01 2015-03-11 株式会社Dnpファインケミカル カラーフィルター用緑色組成物及び感光性緑色組成物
JP5110223B2 (ja) * 2010-03-03 2012-12-26 大日本印刷株式会社 顔料分散液、カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ、並びに、液晶表示装置及び有機発光表示装置
JP5604968B2 (ja) * 2010-05-14 2014-10-15 東レ株式会社 カラーフィルター用緑色着色剤組成物、カラーフィルター基板および液晶表示装置
JP5853673B2 (ja) * 2010-12-27 2016-02-09 東レ株式会社 カラーフィルター基板および液晶表示装置
JP2012247539A (ja) * 2011-05-26 2012-12-13 Toppan Printing Co Ltd 緑色感光性樹脂組成物およびカラーフィルタ

Also Published As

Publication number Publication date
KR20130111372A (ko) 2013-10-10
CN103365080B (zh) 2019-04-26
JP2013210444A (ja) 2013-10-10
TW201344361A (zh) 2013-11-01
CN103365080A (zh) 2013-10-23
KR102021617B1 (ko) 2019-09-16
TWI617885B (zh) 2018-03-11

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