JP6069941B2 - 投影露光装置及びデバイス製造方法 - Google Patents

投影露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP6069941B2
JP6069941B2 JP2012176501A JP2012176501A JP6069941B2 JP 6069941 B2 JP6069941 B2 JP 6069941B2 JP 2012176501 A JP2012176501 A JP 2012176501A JP 2012176501 A JP2012176501 A JP 2012176501A JP 6069941 B2 JP6069941 B2 JP 6069941B2
Authority
JP
Japan
Prior art keywords
optical system
mask
light
imaging optical
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012176501A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014035449A5 (enExample
JP2014035449A (ja
Inventor
武利 根岸
武利 根岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2012176501A priority Critical patent/JP6069941B2/ja
Publication of JP2014035449A publication Critical patent/JP2014035449A/ja
Publication of JP2014035449A5 publication Critical patent/JP2014035449A5/ja
Application granted granted Critical
Publication of JP6069941B2 publication Critical patent/JP6069941B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2012176501A 2012-08-08 2012-08-08 投影露光装置及びデバイス製造方法 Active JP6069941B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012176501A JP6069941B2 (ja) 2012-08-08 2012-08-08 投影露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012176501A JP6069941B2 (ja) 2012-08-08 2012-08-08 投影露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2014035449A JP2014035449A (ja) 2014-02-24
JP2014035449A5 JP2014035449A5 (enExample) 2015-08-13
JP6069941B2 true JP6069941B2 (ja) 2017-02-01

Family

ID=50284466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012176501A Active JP6069941B2 (ja) 2012-08-08 2012-08-08 投影露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP6069941B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6028350B2 (ja) * 2012-03-16 2016-11-16 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN108604063A (zh) * 2015-11-30 2018-09-28 株式会社尼康 曝光装置、曝光系统、基板处理方法、以及元件制造装置
CN117471867B (zh) * 2023-11-20 2026-05-29 季华实验室 一种曝光设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE10005189A1 (de) * 2000-02-05 2001-08-09 Zeiss Carl Projektionsbelichtungsanlage mit reflektivem Retikel
JP2003241099A (ja) * 2002-12-02 2003-08-27 Nikon Corp 反射屈折投影光学系、並びに投影露光方法及び装置
EP1730596B1 (en) * 2004-03-30 2011-02-16 Carl Zeiss SMT AG Projection objective and projection exposure apparatus
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TW200830057A (en) * 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
JP5282895B2 (ja) * 2009-03-06 2013-09-04 株式会社ニコン 露光装置、露光方法、およびデバイス製造方法
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP5708179B2 (ja) * 2010-04-13 2015-04-30 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
WO2011129369A1 (ja) * 2010-04-13 2011-10-20 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2014035449A (ja) 2014-02-24

Similar Documents

Publication Publication Date Title
JP6436216B2 (ja) 投影露光装置
JP6350687B2 (ja) 走査露光装置、並びにデバイス製造方法
JP6635167B2 (ja) 投影露光装置及びデバイス製造方法
JP6384579B2 (ja) パターン露光方法、及びパターン形成方法
WO2017094770A1 (ja) 露光装置、露光システム、基板処理方法、および、デバイス製造装置
JP2014035449A (ja) 投影露光装置及びデバイス製造方法
JP6493595B2 (ja) 走査露光装置、及びデバイス製造方法
WO2013150898A1 (ja) マスク移動装置、マスク保持装置、露光装置及び基板処理装置
HK1207162A1 (en) Substrate processing device and device manufacturing method
HK1207162B (en) Substrate processing device and device manufacturing method

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150624

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150624

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160530

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160705

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160905

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161206

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161219

R150 Certificate of patent or registration of utility model

Ref document number: 6069941

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250