JP6037649B2 - 微細気泡発生装置、微細気泡発生方法、基板処理装置、および基板処理方法 - Google Patents

微細気泡発生装置、微細気泡発生方法、基板処理装置、および基板処理方法 Download PDF

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JP6037649B2
JP6037649B2 JP2012101754A JP2012101754A JP6037649B2 JP 6037649 B2 JP6037649 B2 JP 6037649B2 JP 2012101754 A JP2012101754 A JP 2012101754A JP 2012101754 A JP2012101754 A JP 2012101754A JP 6037649 B2 JP6037649 B2 JP 6037649B2
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秀晃 寺門
秀晃 寺門
林　航之介
航之介 林
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Shibaura Mechatronics Corp
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JP2012101754A 2012-04-26 2012-04-26 微細気泡発生装置、微細気泡発生方法、基板処理装置、および基板処理方法 Active JP6037649B2 (ja)

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JP2012101754A JP6037649B2 (ja) 2012-04-26 2012-04-26 微細気泡発生装置、微細気泡発生方法、基板処理装置、および基板処理方法

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JP2012101754A JP6037649B2 (ja) 2012-04-26 2012-04-26 微細気泡発生装置、微細気泡発生方法、基板処理装置、および基板処理方法

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KR102382789B1 (ko) * 2020-02-26 2022-04-06 주식회사 이앤에이치 기판 세정 장치 및 기판 세정 방법
JP7514687B2 (ja) * 2020-07-31 2024-07-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置及び基板処理方法
JP7476024B2 (ja) * 2020-08-03 2024-04-30 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法及び基板処理装置

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JP4869957B2 (ja) * 2006-03-22 2012-02-08 大日本スクリーン製造株式会社 基板処理装置
JP2009285571A (ja) * 2008-05-29 2009-12-10 Mitsubishi Electric Corp 洗浄装置

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