JP6037340B2 - 表面の化学的性質の非接触測定装置および方法 - Google Patents
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Description
また、本願は以下に記載する態様を含む。
(態様1)
プロセッサと、
前記プロセッサと接続しており、かつ、ある範囲の赤外波長を用いた測定対象面にわたる表面の化学的性質の同時測定のために構成されている波長可変赤外線レーザー分光計のアレイと、
前記プロセッサと接続しており、かつ、前記測定対象面から反射する赤外波長の赤外線スペクトルを表示するよう適合されている表示部と、
を含む表面の化学的性質の測定装置。
(態様2)
前記プロセッサと接続している可視レーザーポインターをさらに含む態様1に記載の装置。
(態様3)
装置筐体をさらに含み、かつ、前記波長可変赤外線レーザー分光計のアレイが前記装置筐体に収容されている態様1に記載の装置。
(態様4)
前記筐体に入射赤外線ビーム開口をさらに含み、かつ、前記波長可変赤外線レーザー分光計のアレイが前記入射赤外線ビーム開口と接続している態様3に記載の装置。
(態様5)
前記装置筐体に可視レーザービーム開口と、前記プロセッサと接続しており、かつ、前記可視レーザービーム開口と接続している可視レーザーポインターとをさらに含む態様4に記載の装置。
(態様6)
前記筐体に反射赤外線ビーム開口をさらに含み、かつ、前記波長可変赤外線レーザー分光計のアレイが前記反射赤外線ビーム開口と接続している態様4に記載の装置。
(態様7)
前記波長可変赤外線レーザー分光計のアレイが、波数約400(cm −1 )から波数約4000までの赤外波長を用いた測定対象面にわたる表面の化学的性質の同時測定のために構成されている態様1に記載の装置。
(態様8)
前記プロセッサと接続している少なくとも1つのポートをさらに含む態様1に記載の装置。
(態様9)
入射赤外線ビーム開口、可視レーザービーム開口および反射赤外線ビーム開口を有する装置筐体と、
前記装置筐体内のプロセッサと、
前記装置筐体内に存在し、かつ、前記プロセッサならびに前記入射赤外線ビーム開口および前記可視レーザービーム開口と接続している波長可変赤外線レーザー分光計のアレイであって、
ある範囲の赤外波長を用いた測定対象面にわたる表面の化学的性質の同時測定のために構成されている前記波長可変赤外線レーザー分光計のアレイと、
前記装置筐体内に存在し、かつ、前記可視レーザービーム開口と接続している可視レーザーと、
前記プロセッサと接続しており、かつ、前記測定対象面から反射する赤外波長の赤外線スペクトルを表示するよう適合されている表示部と、
を含む表面の化学的性質の測定装置。
(態様10)
前記波長可変赤外線レーザー分光計のアレイが、波数約400(cm −1 )から波数約4000までの赤外波長を用いた測定対象面にわたる表面の化学的性質の同時測定のために構成されている態様9に記載の装置。
(態様11)
前記プロセッサと接続している少なくとも1つのポートをさらに含む態様9に記載の装置。
(態様12)
前記可視レーザービーム開口が、概して、前記入射赤外線ビーム開口と前記反射赤外線ビーム開口との間に存在する態様9に記載の装置。
(態様13)
表面の化学的性質の汚染の広がり(range)を有する複数の標準物を設けること、
波長可変赤外線レーザー分光計のアレイを設けること、
前記標準物上の前記表面の化学的性質の汚染の広がりの赤外線スペクトルを得ること、
前記表面の化学的性質の汚染の広がりに合わせて前記赤外線スペクトルを較正すること、
前記波長可変赤外線レーザー分光計のアレイを用いて汚染の可能性のある表面の赤外線スペクトルを得ること、および、
前記汚染の可能性のある表面の前記赤外線スペクトルを前記表面の化学的性質の汚染の広がりの前記赤外線スペクトルと比較すること
を含む表面の化学的性質の非接触測定方法。
(態様14)
前記波長可変赤外線レーザー分光計のアレイを用いて汚染の可能性のある表面の赤外線スペクトルを得ることが、前記波長可変赤外線レーザー分光計のアレイを用いてシリコーン汚染の可能性のある表面の赤外線スペクトルを得ることを含む態様13に記載の方法。
Claims (2)
- 表面に化学的に汚染された領域を有する複数の標準物を設けること、
波長可変赤外線レーザー分光計(4)を設けること、
前記標準物上の前記表面の化学的に汚染された領域の赤外線スペクトルを得ること、
前記表面の化学的に汚染された領域に合わせて前記赤外線スペクトルを較正すること、
前記波長可変赤外線レーザー分光計(4)を用いて汚染の可能性のある表面の赤外線スペクトルを得ること、および、
前記汚染の可能性のある表面の前記赤外線スペクトルを前記表面の化学的に汚染された領域の前記較正された赤外線スペクトルと比較することを含む表面の化学的性質の非接触測定方法。 - 前記波長可変赤外線レーザー分光計(4)を用いて汚染の可能性のある表面の赤外線スペクトルを得ることが、前記波長可変赤外線レーザー分光計(4)を用いてシリコーン汚染の可能性のある表面の赤外線スペクトルを得ることを含む請求項1に記載の方法。
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US12/903,548 US8536529B2 (en) | 2010-10-13 | 2010-10-13 | Non-contact surface chemistry measurement apparatus and method |
US12/903,548 | 2010-10-13 | ||
PCT/US2011/049331 WO2012050669A1 (en) | 2010-10-13 | 2011-08-26 | Non-contact surface chemistry measurement apparatus and method |
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JP2013539865A JP2013539865A (ja) | 2013-10-28 |
JP2013539865A5 JP2013539865A5 (ja) | 2014-07-17 |
JP6037340B2 true JP6037340B2 (ja) | 2016-12-07 |
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JP2016160335A Active JP6309583B2 (ja) | 2010-10-13 | 2016-08-18 | 表面の化学的性質の非接触測定装置および方法 |
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US (1) | US8536529B2 (ja) |
EP (1) | EP2627989B1 (ja) |
JP (2) | JP6037340B2 (ja) |
CN (1) | CN103180715A (ja) |
WO (1) | WO2012050669A1 (ja) |
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EA201000526A1 (ru) * | 2007-10-11 | 2010-12-30 | Басф Се | Спектрометр со светодиодной матрицей |
JP2009282007A (ja) * | 2008-05-26 | 2009-12-03 | Ritsuo Hasumi | 携帯型スペクトル分析機のデータ処理方法 |
JP2010117272A (ja) * | 2008-11-13 | 2010-05-27 | Mitsubishi Rayon Co Ltd | シリコーン異物の判別方法 |
CN201331382Y (zh) * | 2009-01-19 | 2009-10-21 | 杭州电子科技大学 | 一种阵列式微型光谱仪 |
CN101819063B (zh) * | 2009-12-29 | 2011-10-05 | 南京邮电大学 | 相位调制凹槽阵列微型光谱仪 |
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