JP6034080B2 - Substrate holding device - Google Patents

Description

  The present invention relates to a technique for holding a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a plasma display, a glass substrate for a photomask, a substrate for an optical disk, etc. (hereinafter simply referred to as “substrate”).

  As a type of substrate processing apparatus that performs various types of processing on a substrate, while rotating the substrate, a processing liquid (specifically, a cleaning liquid such as pure water) is supplied to the substrate, and a physical force such as a brush There is known a rotary substrate processing apparatus that performs a cleaning process by the above.

  In a rotary substrate processing apparatus, a processing liquid is supplied onto a substrate by rotating the rotating table while holding the substrate on the rotating table. Then, the processing liquid uniformly spreads over the entire upper surface of the substrate due to the centrifugal force accompanying the rotation, and the processing on the substrate is executed. Thereafter, the turntable is further rotated in a state where the supply of the processing liquid is stopped. Then, the processing liquid on the substrate is shaken off by the centrifugal force, and thereby the substrate is dried (shake-off drying).

  By the way, as a technique for holding a substrate on a turntable, for example, in Patent Document 1, a plurality of chuck pins arranged along the outer peripheral edge of a substrate to be held, a back surface of the edge portion of the substrate, a side surface of the edge portion, and A configuration for holding the is disclosed.

  In the configuration in which the substrate is held by a plurality of chuck pins, there is a problem in that droplets remain at the contact portion between the chuck pins and the substrate during the swing-off drying. If droplets containing particles or the like remain attached to the substrate, the substrate is contaminated.

  Therefore, in Patent Document 1, for example, a drain hole is formed in the chuck pin in order to reduce the liquid remaining between the substrate and the chuck pin. Specifically, the through hole is formed so that the lower surface thereof is flush with the upper surface of the substrate, so that liquid droplets flowing along the upper surface of the substrate can escape to the outside of the chuck pins. It has become.

JP-A-7-115081

  When the technique disclosed in Patent Document 1 is applied, at least a part of the droplet on the upper surface side of the substrate can be discharged to the back side of the chuck pin through the through hole. However, in the configuration of Patent Document 1, there is a gap between the substrate and the chuck pin where both the lower side and the side of the substrate are closed. Therefore, the liquid droplets that have traveled around the chuck pins and the like and have come to the lower surface side of the substrate may be trapped in this gap between the chuck pins and the substrate and not discharged. As a result, liquid residue is generated, and there is a possibility that contamination of the substrate cannot be avoided sufficiently.

  This invention is made | formed in view of the said subject, and it aims at providing the technique which can reduce the liquid residue between a board | substrate and the member holding this in shake-off drying.

A 1st aspect is a board | substrate holding | maintenance apparatus, Comprising: The rotary base rotated in a horizontal surface centering on a rotating shaft, The holding part holding a board | substrate on the said rotary base, The said holding part is the said rotation. A base portion disposed on the upper surface of the base, a contact member group disposed on the base portion, and driving the base portion so that the contact member group is brought close to the periphery of the substrate on the turntable And a drive unit that moves in a separating direction, and the contact member group does not overlap the lower contact member when viewed from the rotation center of the substrate and a lower contact member that contacts the substrate from below. A side contact member that contacts the substrate from the side, a contact surface that contacts the substrate in the side contact member, and a surface opposite to the contact surface. and a communication portion for communicating the bets, the upper surface of the lower contact member, extends toward the rotational axis That top section around the a refracting surface whose sides are inclined downward.

A 2nd aspect is a board | substrate holding | maintenance apparatus, Comprising: The rotating stand rotated in a horizontal surface centering on a rotating shaft, The holding part holding a board | substrate on the said rotating table, The said holding part is the said rotation. A base portion disposed on the upper surface of the base, a contact member group disposed on the base portion, and driving the base portion so that the contact member group is brought close to the periphery of the substrate on the turntable And a drive unit that moves in a separating direction, and the contact member group does not overlap the lower contact member when viewed from the rotation center of the substrate and a lower contact member that contacts the substrate from below. A side contact member that contacts the substrate from the side, a contact surface that contacts the substrate in the side contact member, and a surface opposite to the contact surface. A communication portion that communicates with each other, and the cross-sectional area increases as the communication portion moves away from the rotating shaft. It is to become shape.

A 3rd aspect is a board | substrate holding | maintenance apparatus which concerns on a 2nd aspect, Comprising: The upper surface of the said lower contact member is an inclined surface which inclines below as it approaches the said rotating shaft.

A 4th aspect is a board | substrate holding | maintenance apparatus which concerns on a 2nd aspect, Comprising: The upper end part of the said lower contact member is a tapered shape.

  A fifth aspect is a substrate holding apparatus according to any one of the first to fourth aspects, wherein the communication portion opens on an upper surface of the side contact member.

A sixth aspect is a substrate holding apparatus according to any one of the first to fifth aspects, wherein a plurality of the communication portions are formed on the side contact member.

A seventh aspect is a substrate holding apparatus according to any one of the first to sixth aspects, wherein a bottom surface of the communication portion is a height position equal to or lower than a lower surface of the substrate held on the turntable. The

An eighth aspect is the substrate holding apparatus according to any one of the first to seventh aspects, wherein the contact member group includes one side contact member and the lower contact member. Two side contact members are arranged between the two lower contact members.

According to the first aspect, in the holding unit that holds the substrate on the turntable, the member that contacts the substrate from below and the member that contacts the substrate from the side do not overlap each other when viewed from the rotation center of the substrate. Provided at intervals. According to this configuration, in the shake-off drying, the liquid droplets adhering to the vicinity of the portion in contact with the lower contact member are shaken off from the substrate by the centrifugal force accompanying the rotation without being disturbed by the side contact member. In addition, the droplets adhering to the vicinity of the portion of the substrate that is in contact with the side contact member do not interfere with the lower contact member, and a part of the droplet falls down due to gravity, and the rest It is shaken off through the communicating part by centrifugal force. Therefore, the liquid residue between the substrate and the holding unit can be reduced in the shake-off drying. The lower abutting member contacts the substrate at the top side of the refractive surface. Accordingly, the contact area between the lower contact member and the substrate is a substantially linear area. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying. In particular, since the top side extends toward the rotating shaft of the turntable, the flow of liquid droplets flowing in the direction away from the rotating shaft due to the centrifugal force accompanying the rotation is the contact portion with the lower contact member. The droplets that are not easily disturbed and adhered to the substrate are discharged out of the substrate particularly quickly.

According to the second aspect, in the holding unit that holds the substrate on the turntable, the member that contacts the substrate from below and the member that contacts the substrate from the side do not overlap each other when viewed from the rotation center of the substrate. Provided at intervals. According to this configuration, in the shake-off drying, the liquid droplets adhering to the vicinity of the portion in contact with the lower contact member are shaken off from the substrate by the centrifugal force accompanying the rotation without being disturbed by the side contact member. In addition, the droplets adhering to the vicinity of the portion of the substrate that is in contact with the side contact member do not interfere with the lower contact member, and a part of the droplet falls down due to gravity, and the rest It is shaken off through the communicating part by centrifugal force. Therefore, the liquid residue between the substrate and the holding unit can be reduced in the shake-off drying. In addition, since the communication portion has a shape in which the cross-sectional area increases as the distance from the rotation axis increases, it is possible to discharge the droplets that have flowed into the communication portion particularly quickly during shake-off drying.

According to the third aspect, the upper surface of the lower contact member is an inclined surface that is inclined downward as it approaches the rotation axis. Accordingly, the contact area between the lower contact member and the substrate is a substantially linear area. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying.

  According to the 4th aspect, the contact area of a lower contact member and a board | substrate is restrained small by making the upper end part of a lower contact member into a tapered shape. According to this configuration, droplets between the substrate and the lower contact member are easily discharged out of the substrate in the swing-off drying. In addition, the flow of the liquid droplets flowing in the direction away from the rotation axis due to the centrifugal force accompanying the rotation is not easily hindered by the contact portion with the lower contact member, and the liquid droplets adhering to the substrate are particularly quick. Then, it is discharged out of the substrate.

  According to the fifth aspect, since the communicating portion is opened on the upper surface of the side support member, the droplets that have flowed into the communicating portion can be quickly discharged during the swing-off drying.

According to the sixth aspect, since a plurality of communicating portions are provided, in the shake-off drying, the liquid droplets flowing in the direction away from the rotating shaft by receiving the centrifugal force are effectively transferred through any of the communicating portions. Can be discharged outside.

According to the 7th aspect, the liquid residue between a side contact member and a board | substrate can further be reduced in shake-off drying.

According to the 8th aspect, the contact member group arrange | positioned at a base | substrate part is provided with two downward contact members and the side contact member arrange | positioned among these. According to this configuration, the substrate can be stably held.

It is sectional drawing of the board | substrate holding | maintenance apparatus of the state in which the cup is raised. It is sectional drawing of the board | substrate holding | maintenance apparatus in the state in which the cup is lowered | hung. It is a top view of a turntable. It is a side view of a movable holding member. It is a top view of a movable holding member. It is explanatory drawing which shows typically the mode of the state where the cup was raised. It is explanatory drawing which shows typically the mode of the state by which the cup was lowered | hung. It is a perspective view which shows the structure of a contact member group typically. It is explanatory drawing which shows the mode of the downward contact member vicinity in the case of shaking off drying. It is explanatory drawing which shows the mode of the side contact member in the case of shaking off drying. It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 2nd structural example, and the side contact member which concerns on a 1st structural example. It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 3rd structural example, and the side contact member which concerns on a 1st structural example. It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 1st structural example, and the side contact member which concerns on a 2nd structural example. It is a perspective view which shows the contact member group containing the downward contact member which concerns on a 1st structural example, and the side contact member which concerns on a 3rd structural example.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The following embodiment is an example embodying the present invention, and does not limit the technical scope of the present invention.

<1. Overall configuration>
The overall configuration of the substrate holding apparatus 100 will be described with reference to FIGS. 1 and 2 are cross-sectional views schematically showing a substrate holding device 100 used in a rotary substrate processing apparatus. FIG. 3 is a plan view of the turntable 1 of the substrate holding device 100. In FIGS. 1 and 2, some of the holding members 4 are not shown for easy understanding of the drawings.

  The substrate holding device 100 holds the substrate W above the turntable 1, and the substrate processing apparatus using the substrate holding device 100, for example, rotates the turntable 1 while rotating the substrate W to be processed. The apparatus performs brush cleaning on the upper surface of the substrate W while supplying a cleaning liquid such as pure water to the upper surface of the substrate. The substrate processing apparatus does not necessarily perform brush cleaning, and supplies a predetermined processing liquid (for example, a cleaning liquid, a rinsing liquid, a developer, etc.) to the substrate W to be processed. Alternatively, a predetermined process may be executed. Here, it is assumed that the substrate W to be processed has a substantially circular shape.

  The substrate holding device 100 includes a turntable 1 and a cup 2 that covers a side periphery of the turntable 1. The turntable 1 is driven in the horizontal plane about an axis (rotation axis) A1 extending vertically through the center A10 of the turntable 1 under the drive of the motor 11. Further, the substrate holding device 100 includes a holding unit 3 that holds the substrate W on the turntable 1.

  The holding unit 3 is a functional unit that holds the substantially circular substrate W in a substantially horizontal posture while restricting the substantially circular substrate W to a position substantially concentric with the turntable 1. There are six or more holding members 4 in the illustrated example. The plurality of holding members 4 are arranged on the circumference of a virtual circle having substantially the same size as the substrate W to be held. That is, the plurality of holding members 4 are arranged on the same circumference so as to substantially follow the periphery of the substrate W on the turntable 1.

  Each of the plurality of holding members 4 provided on the turntable 1 has a contact member group 400 (specifically, two lower contact members 41 on the upper surface of the base portion 40 disposed on the turntable 1. , 41 and one side contact member 42).

  The at least one holding member 4 among the plurality of holding members 4 provided on the turntable 1 has a base portion 40 formed in, for example, a long flat plate shape. And can be pivoted. Further, the base member 40 of the remaining holding member 4 is formed in a columnar shape, for example, and the base member 40 is fixedly arranged with respect to the turntable 1. In the following, when the two are distinguished, the former is also referred to as “movable holding member 4a”, and the latter is also referred to as “fixed holding member 4b”. As shown in the drawing, the movable holding member 4a is disposed at a position substantially opposite to the fixed holding member 4b. In the illustrated example, six holding members 4 are provided on the turntable 1, two of the six holding members 4 are movable holding members 4a, and the remaining four are fixedly held. Although the member 4b is provided, the total number of the holding members 4 and the number of the movable holding members 4a and the fixed holding members 4b are not necessarily illustrated. Further, the position of the holding member 4 is not necessarily limited to that illustrated.

  The base portion 40 of the movable holding member 4a is rotatable about a rotation axis A2 that is an axis parallel to the rotation axis A1 of the turntable 1 under the driving of the drive unit 8 described later. However, in the base portion 40 of the movable holding member 4a, the contact member group 400 is provided at a position eccentric from the rotation axis A2. Therefore, when the base portion 40 is rotated about the rotation axis A2, the contact member group 400 moves away from or approaches the rotation axis A1 of the turntable 1. That is, the contact member group 400 is moved in the direction of approaching and separating from the peripheral edge of the substrate W on the turntable 1.

  When the contact member group 400 of the movable holding member 4a is moved in a direction approaching the periphery of the substrate W on the turntable 1 (a state indicated by a solid line in FIGS. 1 and 3), the contact member group 400 is moved to the periphery of the substrate W. A plurality (twelve in the illustrated example) of the lower contact members 41 are in contact with the substrate W from below and are also disposed along the periphery of the substrate W. In the illustrated example, six side contact members 42 are in contact with the substrate W from the side. However, as described above, since the fixed holding member 4b is fixed at a position substantially opposite to the movable holding member 4a, the side contact member 42 of each movable holding member 4a contacts the substrate W from the side. In the contacted state, the substrate W is sandwiched between the side contact member 42 and the side contact member 42 of the fixing holding member 4b disposed to face the substrate W. That is, when the contact member group 400 of the movable holding member 4 a is in contact with the peripheral edge of the substrate W, the substrate W is substantially horizontal on the turntable 1 by the plurality of lower contact members 41. In addition to being supported in a posture, it is in a state (held state) that is sandwiched between the plurality of side contact members 42 and restricted in the horizontal direction. On the other hand, when the contact member group 400 of the movable holding member 4a is moved in a direction away from the peripheral edge of the substrate W (the state indicated by the phantom lines in FIGS. 2 and 3), the holding state of the substrate W is released. Then, the substrate W is released. As described above, in the substrate holding apparatus 100, the contact member group 400 of the movable holding member 4 a is moved in the direction of approaching and separating from the peripheral edge of the substrate W on the turntable 1. The holding and releasing of the substrate W by 4 are performed.

<2. Drive unit 8>
Next, the drive unit 8 that is a mechanism for rotating the base unit 40 of the movable holding member 4a will be described with reference to FIGS. 4 and 5 in addition to FIGS. FIG. 4 is a side view schematically showing the configuration of the movable holding member 4a. FIG. 5 is a plan view schematically showing the configuration of the movable holding member 4a.

  The upper end of the rotating shaft 81 extending vertically is connected to the lower portion of the base portion 40 of the movable holding member 4a. In addition, a magnet holding member 82 disposed coaxially with the rotation shaft 81 is connected to the lower end of the rotation shaft 81. A rotating magnet 821 is fixed to the magnet holding member 82.

  The rotating shaft 81 penetrates the turntable 1 up and down and is arranged to be rotatable with respect to the turntable 1. That is, the base portion 40 and the magnet holding member 82 can be rotated synchronously around the rotation axis A2 that coincides with the axis of the rotation shaft 81 on each of the upper side and the lower side of the turntable 1. It is arranged. However, the rotation axis A2 is an axis parallel to the rotation axis A1 of the turntable 1. Further, as described above, the contact member group 400 provided on the base portion 40 of the movable holding member 4a is provided at a position eccentric from the rotation axis A2. Specifically, the contact member group 400 is disposed, for example, on the opposite side of the rotation axis A2 across the geometric center of the upper surface of the base body 40.

  On the other hand, as shown in FIGS. 1 and 2, a disk 83 is attached below the turntable 1. Inside the circular plate 83, a ring-shaped magnet 831 is provided. As shown in FIG. 1, the ring-shaped magnet 831 is arranged in substantially the same horizontal plane as the rotating magnet 821 connected to the movable holding member 4 a when the cup 2 is raised. Yes.

  A magnet holding portion 84 is attached to the upper portion of the cup 2 that covers the side periphery of the turntable 1. Inside the magnet holding part 84, the same number of auxiliary magnets 841 as the movable holding member 4a are provided. Each auxiliary magnet 841 is provided in association with each movable holding member 4a as schematically shown in FIG. Further, the turntable 1 is stopped at a rotation position such that the turning magnet 821 connected to each movable holding member 4a is located to the side of the corresponding auxiliary magnet 841. Further, as shown in FIG. 2, each auxiliary magnet 841 is disposed in substantially the same horizontal plane as the rotating magnet 821 connected to the corresponding movable holding member 4a when the cup 2 is lowered. It is like that.

  The drive unit 8 having the above configuration rotates the magnet holding member 82 by applying a magnetic force to the rotating magnet 821 from the outside, and is thereby connected to the magnet holding member 82 via the rotating shaft 81. The base portion 40 thus made is rotated. This aspect will be described with reference to FIGS. 6 and 7 in addition to FIGS. FIG. 6 is an explanatory view schematically showing the state of the vicinity of the movable holding member 4a when the cup 2 is raised. FIG. 7 is an explanatory view schematically showing a state in the vicinity of the movable holding member 4a when the cup 2 is lowered.

  That is, when the cup 2 is lifted by the drive of the air cylinder 21, the ring-shaped magnet 831 is positioned on the side of the rotating magnet 821 (the state shown in FIGS. 1 and 6). In this state, the rotating magnet 821 receives a large magnetic force from the ring magnet 831. Now, in the movable holding member 4 a, for example, when the contact member group 400 is in contact with the peripheral edge of the substrate W on the turntable 1, the S pole of the turning magnet 821 is the most on the rotation axis A1 of the turntable 1. It is assumed that the rotating magnet 821 is attached to the magnet holding member 82 at such an angle as to approach. Further, it is assumed that the ring-shaped magnet 831 has an N pole on the outer peripheral side and an S pole on the inner peripheral side. In this example, when the cup 2 is raised, a magnetic field represented by a magnetic field line moving away from the rotation axis A1 of the turntable 1 is formed in the vicinity of the turning magnet 821 (arrow AR1 in FIG. 6). Accordingly, the south pole of the rotating magnet 821 is drawn toward the rotating shaft A1 side of the turntable 1, whereby the movable holding member 4a rotates around the rotating shaft A2. As described above, in the movable holding member 4a, the contact member group 400 is arranged eccentrically with respect to the rotation axis A2, and the movable holding member 4a rotates around the rotation axis A2, thereby contacting the movable holding member 4a. The member group 400 is moved so as to approach the rotation axis A1 of the turntable 1 (state shown by the solid line in FIG. 3).

  On the other hand, when the cup 2 is lowered by the driving of the air cylinder 21, the ring-shaped magnet 831 is positioned below the rotating magnet 821, and the auxiliary magnet 841 is positioned on the side of the rotating magnet 821 ( (The state shown in FIGS. 2 and 7). Then, the direction of the magnetic field arranged in the vicinity of the rotating magnet 821 is reversed. That is, in this state, the magnetic field lines from the ring-shaped magnet 831 travel from the N pole toward the cup 2 and then change the direction so that the rotation of the turntable 1 from the cup 2 is substantially performed at the position of the rotating magnet 821. It will proceed toward the axis A1 (arrow AR2 in FIG. 7). In response to this, the rotating magnet 821 tends to move its south pole away from the rotation axis A1 of the turntable 1, so that the movable holding member 4a is centered on the rotation axis A2 when the cup is raised. It rotates in the opposite direction. When the movable holding member 4a rotates in this direction, the contact member group 400 of the movable holding member 4a is moved away from the rotation axis A1 of the turntable 1 (a state indicated by a one-dot chain line in FIG. 3). ).

  In this example, it is assumed that the auxiliary magnet 841 is arranged with the N pole facing the center side of the turntable 1. Therefore, in the state where the cup 2 is lowered, the magnetic lines of force from the auxiliary magnet 841 travel from the cup 2 toward the rotation axis A1 of the turntable 1 in the vicinity of the turning magnet 821 (arrow AR3 in FIG. 7). . In other words, the rotating magnet 821 receives a force from the magnetic field formed by the auxiliary magnet 841 to direct the S pole in a direction away from the rotation axis A1 of the turntable 1. Thereby, the movable holding member 4a is reliably moved in the direction away from the rotation axis A1 of the turntable 1.

<3. Contact member group 400>
Next, the contact member group 400 included in each holding member 4 will be specifically described with reference to FIG. 8 in addition to FIGS. FIG. 8 is a perspective view schematically showing the configuration of the contact member group 400. As described above, a part of the plurality of holding members 4 provided in the holding unit 3 is the movable holding member 4a, and the rest is the fixed holding member 4b, but the abutting members provided in the holding members 4a and 4b are provided. The configuration of the group 400 is the same.

  The contact member group 400 includes two lower contact members 41 and 41 and one side contact member 42. As shown in FIGS. 3 and 8, the members 41, 41, and 42 are arranged in the order of a lower contact member 41, a side contact member 42, and a lower contact member 41 (that is, two lower members). The side abutting members 42 are arranged between the abutting members 41, 41) and are arranged so as to be substantially along the periphery of the substrate W on the turntable 1. According to this arrangement mode, the substrate W can be stably held.

  The side abutting members 42 and the respective lower abutting members 41 arranged on both sides of the side abutting members 42 are provided at intervals in the peripheral direction of the substrate W on the turntable 1 (here, “ The “peripheral direction” is the extending direction of the peripheral portion of the peripheral edge of the substrate W on the turntable 1 where the contact member group 400 of interest is in contact with. That is, the side contact member 42 and each lower contact member 41 do not overlap each other when viewed from the rotation center A10 of the substrate W (the rotation center of the substrate W that is held and rotated on the turntable 1). , Provided at intervals. Therefore, when viewed from the rotation center A10 of the substrate W, a gap g is formed between the side contact member 42 and each lower contact member 41.

  The lower contact member 41 is a member that contacts the substrate W from below. However, the lower abutting member 41 abuts on the substrate W only from below, and does not abut from the side and above the substrate W. Specifically, for example, the lower contact member 41 contacts only the lower part of the edge of the substrate W and does not contact the side surface part and the upper part of the edge (see FIG. 9). That is, the lower contact member 41 does not block the side and upper side of the substrate W.

  Specifically, the lower abutting member 41 is, for example, a columnar member having a rectangular shape in a plan view that is erected substantially perpendicularly to the upper surface of the base portion 40, and the upper surface thereof is the rotation axis A <b> 1 of the turntable 1. (Ie, as it approaches the center of the substrate W on the turntable 1), the inclined surface 411 is inclined downward. Specifically, the inclined surface 411 is disposed such that, for example, a pair of sides thereof is substantially parallel to the peripheral direction of the substrate W on the turntable 1, and the rotation axis A1 is included in the pair of sides. The side closer to is placed at a lower height than the other side.

  The lower contact member 41 is in contact with the substrate W in a partial region within the inclined surface 411, and the contact region between the lower contact member 41 and the substrate W is a substantially linear region. According to this configuration, for example, droplets between the substrate W and the lower abutting member 41 are discharged out of the substrate W in the swing-off drying described later, as compared with the case where the substrate W is in contact with the planar region. Cheap. In addition, it is less likely to wear compared to the case where the substrate W is contacted in a dotted area. Furthermore, since the lower contact member 41 can contact the substrate W at different height positions in each portion of the inclined surface 411, the height positions of the lower contact members 41 provided on the turntable 1 are in contact with each other. In the adjustment operation for adjusting the above, the allowable error range becomes relatively large. Therefore, the adjustment work is simplified.

  In the illustrated lower abutting member 41, the upper end surface of the columnar member in a plan view that is erected substantially perpendicularly to the upper surface of the base portion 40 is an inclined surface 411 (that is, a rectangular parallelepiped). A rectangular triangular prism (a triangular prism whose bottom surface is a right triangular triangle) is horizontally placed on the shape portion), but the rectangular shape shape portion is not necessarily provided. In other words, the lower abutting member 41 may be a member in which a member having a right triangular prism arranged sideways is arranged directly on the base portion 40.

  The side contact member 42 is a member that contacts the substrate W from the side. However, the side contact member 42 contacts the substrate W only from the side, and does not contact from below or above the substrate W. Specifically, for example, the side contact member 42 contacts only the side surface portion of the edge of the substrate W, and does not contact the lower portion and the upper portion of the edge (see FIG. 10). That is, the side contact member 42 does not block the lower and upper sides of the substrate W.

  Specifically, the side abutting member 42 is, for example, a columnar member having a semicircular shape in a plan view and standing substantially vertically on the upper surface of the base portion 40, and extends substantially perpendicular to the base portion 40. An existing flat side wall surface 421 is directed to the rotation axis A1 side of the turntable 1, and the side wall surface 421 is disposed so as to extend substantially parallel to the peripheral direction of the substrate W on the turntable 1. . The side contact member 42 contacts the substrate W from the side in a partial region in the side wall surface 421. Hereinafter, the side wall surface 421 is also referred to as a “contact surface 421”.

  The side abutting member 42 further communicates with the abutting surface 421 and a surface opposite to the abutting surface 421 (which is a surface curved in an arc shape, hereinafter also referred to as “curved surface”) 422, A groove-shaped communication portion 43 that is also opened on the upper surface of the contact member 42 is formed. For example, the communication portion 43 has a straight shape in which a pair of opposing inner walls extend in parallel. The communication portion 43 is preferably formed in the vicinity of the center in the width direction of the side contact member 42 with the direction along the peripheral direction of the substrate W on the turntable 1 being the width direction.

  By forming the communication part 43, droplets adhering to the substrate W can be discharged to the outside of the substrate W through the communication part 43 in shake-off drying described later. In particular, when the shape of the communication portion 43 is a groove shape that is also opened on the upper surface of the side contact member 42, the liquid droplets that have flowed into the communication portion 43 can be quickly discharged. As a result, the droplets adhering to the substrate W can be quickly discharged out of the substrate W.

  In the illustrated example, the bottom surface of the communication portion 43 reaches the top surface of the base portion 40, but the bottom surface of the communication portion 43 does not necessarily reach the top surface of the base portion 40, and the turntable 1 It can be set to a height position below the lower surface H (see FIG. 4) of the upper substrate W (that is, an arbitrary height position that is the same as or lower than the lower surface H). If the bottom surface is set to a height position equal to or lower than the lower surface H of the substrate W, the remaining liquid between the substrate W and the side contact member 42 can be further reduced in swing-off drying described later. Further, the bottom surface of the communication portion 43 may be an inclined surface that is inclined downward as it goes from the contact surface 421 toward the curved surface 422 (that is, away from the rotation axis A1 of the turntable 1). According to this configuration, the flow velocity of the liquid that flows into the communication portion 43 and flows from the contact surface 421 side toward the curved surface 422 is increased, and the liquid droplets can be discharged quickly. Moreover, it is also preferable that various treatments (for example, surface treatment for improving smoothness) for quickly discharging the droplets are performed on the inner surface of the communication portion 43.

<4. Operation>
Next, the operation of the substrate processing apparatus using the substrate holding apparatus 100 will be described with reference to FIGS.

  In a state where the cup 2 is disposed below and the contact member group 400 of each movable holding member 4a is disposed at a position away from the rotation axis A1 of the turntable 1, the substrate W is placed on the substrate processing apparatus by a transport device (not shown). When the substrate W is loaded, the loaded substrate W is supported on the turntable 1 by the lower contact members 41 of the plurality of fixed holding members 4b (the state shown in FIG. 2).

  Subsequently, the cup 2 is raised by the driving of the air cylinder 21. Then, each movable holding member 4a is rotated, and the contact member group 400 of the movable holding member 4a is moved so as to approach the rotation axis A1 of the turntable 1, so that the contact member group 400 of each movable holding member 4a is moved. Then, it comes into contact with the substrate W. As a result, all of the plurality of lower contact members 41 are in contact with the substrate W from below, and all of the plurality of side contact members 42 are in contact with the substrate W from the side. The substrate W is supported in a substantially horizontal posture on the turntable 1 and is in a holding state regulated in the horizontal direction (the state shown in FIG. 1).

  When the substrate W is held, the turntable 1 is rotated about the rotation axis A1 by the drive of the motor 11, and a brush (not shown) is brought into contact with the substrate W while rotating. As a result, a cleaning process is performed on the upper surface of the substrate W. At this time, a processing liquid (specifically, for example, pure water) is supplied to a portion of the substrate W in contact with the brush, and particles removed by the brush are transferred to the substrate W by the processing liquid. It is pushed away in the outer circumferential direction. When the predetermined time elapses, the turntable 1 is further rotated for a predetermined time after the brush is separated from the substrate W. Then, the processing liquid on the substrate W is shaken off by the centrifugal force accompanying the rotation, and thereby the substrate W is dried (shake-off drying).

  As described above, in the substrate holding apparatus 100, the plurality of holding members 4 hold the substrate W on the turntable 1. In each holding member 4, the member that contacts the substrate W from below (the lower contact member 41). And the member that abuts the substrate W from the side (side abutting member 42) are configured as separate members. The side abutting member 42 and the lower abutting member 41 are provided at an interval so as not to overlap each other when viewed from the rotation center A10 of the substrate W. According to this configuration, the remaining liquid between the substrate W and each holding member 4 can be reduced in the swing-off drying. That is, as shown schematically in FIG. 9 (a cross-sectional view seen from the direction of arrow K1 in FIG. 5), the droplets adhering to the vicinity of the portion of the rotating substrate W that is in contact with the lower contact member 41 are schematically shown. Without being obstructed by the side contact member 42, it is shaken off from the substrate W by being swung off in the radial direction by the centrifugal force accompanying the rotation. Further, the droplets adhering to the vicinity of the portion of the rotating substrate W that is in contact with the side contact member 42, as shown in FIG. 10 (sectional view viewed from the direction of the arrow K2 in FIG. 5), Without being disturbed by the contact member 41, a part of the liquid droplet falls downward due to gravity, and the rest is shaken off through the communication part 43 by centrifugal force. That is, it is difficult for droplets to remain between the lower contact member 41 and the substrate W, and it is difficult for droplets to remain between the side contact member 42 and the substrate W. For example, when there is a gap between the substrate W and a member that holds the substrate, both the lower side and the side of the substrate W are closed, the droplets that flow into the gap are accompanied by rotation. Even if it receives any force of centrifugal force and gravity, it is difficult to be discharged out of the substrate W, so that it is likely that liquid remains. However, there is no such gap in the substrate holding device 100 according to this embodiment. In addition, liquid residue is unlikely to occur.

  However, in the substrate holding device 100, the lower contact member 41 and the side contact member 42 are disposed apart from each other while being disposed on the common base portion 40. For example, when these two members are disposed completely apart from each other without being provided on a common base portion, it is necessary to individually provide a mechanism for moving each member in the direction of approaching and separating from the periphery of the substrate W. In the substrate holding device 100 according to the present embodiment, the lower contact member 41 and the side contact member 42 are disposed on the common base portion 40, so that both the members 41 and 42 are mounted on the substrate W. It is possible to simplify the mechanism for moving in the direction of approaching and separating from the peripheral edge.

  When the swing-off drying is completed, the cup 2 is lowered under the drive of the air cylinder 21. Then, each movable holding member 4a is rotated in the opposite direction to the previous rotation, and the contact member group 400 of each movable holding member 4a is moved away from the rotation axis A1 of the turntable 1. Then, the contact member group 400 of each movable holding member 4 a is separated from the outer edge portion of the substrate W. As a result, the substrate W is opened. When the substrate W is opened, a transfer device (not shown) carries the substrate W out of the substrate processing apparatus.

<5. Another configuration example of the lower contact member>
The configuration of the lower contact member 41 is not necessarily limited to that described above. Hereinafter, another configuration example of the lower contact member 41 will be described.

<I. Lower contact member 41a>
FIG. 11 illustrates a contact member group including a lower contact member 41a according to the second configuration example. The lower abutting member 41a according to the second configuration example is a columnar member having a rectangular shape in a plan view and standing substantially vertically on the upper surface of the base portion 40, and the upper surface thereof is the rotation axis A1 of the turntable 1. A refracting surface 413 having a shape in which both sides thereof are inclined downward with respect to the top side 412 extending in the direction (that is, extending in a direction substantially orthogonal to the peripheral direction of the substrate W on the turntable 1). The

  The lower contact member 41 a contacts the substrate W from below at the top side 412 of the refractive surface 413. Therefore, the contact area between the lower contact member 41a and the substrate W is a substantially linear area. According to this configuration, compared to the case where the substrate W is brought into contact with the planar area, droplets between the substrate W and the lower contact member 41a are easily discharged out of the substrate in the swing-off drying. In particular, since the apex 412 extends toward the rotation axis A1 of the turntable 1, the flow of liquid droplets flowing in the direction away from the rotation axis A1 due to the centrifugal force associated with the rotation is the lower abutting member. The liquid droplets that are not easily disturbed by the contact portion with 41a and adhere to the substrate W are discharged out of the substrate particularly quickly. In addition, there is an advantage that the substrate W is less likely to be worn as compared with the case where the substrate W is in contact with the dotted region.

  In the illustrated lower abutting member 41a, the upper end surface of a columnar member having a rectangular shape in plan view standing upright substantially on the upper surface of the base portion 40 is a refracting surface 413 (that is, a rectangular parallelepiped). The shape portion is formed by superimposing the shape portion of the triangular prism on the shape portion), but the shape portion of the rectangular parallelepiped is not necessarily provided. That is, the lower abutting member 41a may be a member in which a member having a triangular prism formed sideways is arranged directly on the base body portion 40.

<Ii. Lower contact member 41b>
FIG. 12 illustrates a contact member group including a lower contact member 41b according to the third configuration example. The lower contact member 41b according to the third configuration example includes an upper end portion 414 having a tapered shape (tapered shape). Specifically, for example, the lower contact member 41 b is configured by a conical member that is erected substantially perpendicular to the upper surface of the base body portion 40.

  The lower contact member 41b comes into contact with the substrate W from below at the top of the upper end portion 414 having a tapered shape. Therefore, the contact area between the lower contact member 41b and the substrate W can be kept small. In particular, when the upper end portion 414 of the lower contact member 41b is a cone, the contact area is a substantially dot-shaped area. According to this configuration, compared with the case where the substrate W is in contact with the planar or substantially linear region, the droplets between the substrate W and the lower contact member 41b are discharged to the outside of the substrate in the swing-off drying. Easy to be. Further, the flow of the liquid droplets flowing in the direction away from the rotation axis A1 due to the centrifugal force accompanying the rotation is not easily disturbed by the contact portion with the lower contact member 41b, and the liquid droplets adhering to the substrate W In particular, it is discharged quickly from the substrate.

  Note that the lower abutting member 41b does not necessarily have a conical shape, and may be formed of various types of cones (such as a quadrangular pyramid, a triangular pyramid, and an elliptical cone). Further, the lower contact member 41b does not necessarily have a cone shape as a whole, and at least the upper end portion only needs to be a tapered shape. For example, the lower abutting member 41 b may be a member in which a cone-shaped protrusion is formed on the upper end surface of a columnar member that is erected substantially perpendicularly to the upper surface of the base portion 40.

<6. Another configuration example of the side contact member>
The configuration of the side contact member 42 is not necessarily limited to that described above. In the following, another configuration example of the side contact member 42 will be described.

<I. Side contact member 42a>
FIG. 13 illustrates a contact member group including a side contact member 42a according to the second configuration example. Similarly to the side contact member 42 according to the above-described embodiment, the side contact member 42a according to the second configuration example communicates with the contact surface 421a and the curved surface 422a, and also the side contact member 42a. A groove-shaped communication portion 43a that is also opened on the upper surface of the member 42a is formed. However, assuming that the direction along the peripheral direction of the substrate W on the turntable 1 is the width direction, the communication portion 43a has a shape in which the dimension in the width direction increases as it goes from the contact surface 421a to the curved surface 422a. . That is, the communication portion 43a has a shape in which the cross-sectional area increases (so-called an expanded shape) as it goes from the contact surface 421a toward the curved surface 422a (that is, as the distance from the rotation axis A1 of the turntable 1).

  According to the side abutting member 42a, in the swing-off drying, the droplets that flow into the communication portion 43a and flow from the abutting surface 421a side toward the curved surface 422a side can be discharged particularly quickly. As a result, the droplets adhering to the substrate W can be discharged to the outside of the substrate W particularly quickly.

  As shown in FIG. 13, the side contact member 42a may be combined with the lower contact member 41 according to the first configuration example to form a contact member group. Further, the side contact member 42a may be combined with the lower contact member 41a according to the second configuration example to form a contact member group. Further, the side contact member 42a may be combined with the lower contact member 41b according to the third configuration example to form a contact member group.

<Ii. Side contact member 42b>
FIG. 14 illustrates a contact member group including the side contact member 42b according to the third configuration example. In the side contact member 42b according to the third configuration example, a plurality of (two in the illustrated example) communication portions 43b and 43b are formed at intervals in the width direction of the side contact member 42b. Is done. Each communication portion 43b has, for example, a groove shape that communicates between the contact surface 421 and the curved surface 422 and also opens on the upper surface of the side contact member 42b, similarly to the communication portion 43 according to the above-described embodiment. Is done. In addition, at least one of the plurality of communication portions 43b and 43b has a shape that expands toward the curved surface 422 as the communication portion 43a included in the side contact member 42a according to the second configuration example. Also good.

  According to the side abutting member 42b, in the swing-off drying, the liquid droplets flowing in the direction away from the rotation axis A1 of the turntable 1 due to centrifugal force are effective through any one of the communication portions 43b and 43b. Thus, it can be discharged out of the substrate W.

  As shown in FIG. 14, the side contact member 42 b may be combined with the lower contact member 41 according to the first configuration example to form a contact member group. Further, the side contact member 42b may be combined with the lower contact member 41a according to the second configuration example to form a contact member group. Further, the side contact member 42b may be combined with the lower contact member 41b according to the third configuration example to form a contact member group.

<7. Modification>
The configuration of the lower contact member 41 is not necessarily limited to that described above. For example, the lower contact member may be formed of a rectangular parallelepiped member having a flat upper surface.

  Further, the configurations of the side contact member 42 and the communication portion 43 formed there are not necessarily limited to those described above. For example, the abutting surface of the side abutting member may be an arcuate curved surface that swells toward the rotation axis A <b> 1 of the turntable 1. Further, for example, the side contact member may be a columnar member having a rectangular shape in plan view, or may be a columnar member having a circular shape in plan view. Further, for example, the communication portion formed in the side contact member may have a tubular shape that connects the contact surface 421 and the curved surface 422 and does not open on the upper surface of the side contact member.

  Further, in the above-described embodiment, the fixing holding member 4b may have a configuration in which the base portion 40 is not provided. That is, the contact member group 400 included in the fixed holding member 4b may be directly disposed on the turntable 1 without the base portion 40 interposed therebetween.

  Moreover, in said embodiment, the aspect of the drive part 8 which rotates the base | substrate part 40 of the movable holding member 4a is not restricted to what uses a magnet. For example, the base portion 40 may be rotated using a rotary motor or the like.

DESCRIPTION OF SYMBOLS 1 Turntable 2 Cup 3 Holding part 4 Holding member 4a Movable holding member 4b Fixed holding member 41, 41a, 41b Lower contact member 42, 42a, 42b Side contact member 43, 43a, 43b Communication part 8 Drive part A1 Rotation Axis A10 Center of rotation A2 Rotation axis W Substrate

Claims (8)

A substrate holding device,
A turntable that rotates in a horizontal plane around a rotation axis;
A holding unit for holding the substrate on the turntable;
With
The holding part is
A base portion disposed on an upper surface of the turntable;
A contact member group disposed on the base portion;
A driving unit that drives the base unit to move the contact member group in a direction of approaching and separating from a peripheral edge of the substrate on the turntable;
With
The contact member group includes:
A lower contact member that contacts the substrate from below;
A side contact member that is provided at an interval so as not to overlap the lower contact member when viewed from the center of rotation of the substrate;
A contact portion that contacts the substrate in the side contact member, and a communication portion that connects the surface opposite to the contact surface;
Equipped with a,
The substrate holding apparatus , wherein the upper surface of the lower abutting member is a refracting surface whose both sides are inclined downward with the apex extending toward the rotation axis as a center . A substrate holding device,
A turntable that rotates in a horizontal plane around a rotation axis;
A holding unit for holding the substrate on the turntable;
With
The holding part is
A base portion disposed on an upper surface of the turntable;
A contact member group disposed on the base portion;
A driving unit that drives the base unit to move the contact member group in a direction of approaching and separating from a peripheral edge of the substrate on the turntable;
With
The contact member group includes:
A lower contact member that contacts the substrate from below;
A side contact member that is provided at an interval so as not to overlap the lower contact member when viewed from the center of rotation of the substrate;
A contact portion that contacts the substrate in the side contact member, and a communication portion that connects the surface opposite to the contact surface;
With
The communication portion has a shape in which a cross-sectional area increases as the distance from the rotation shaft increases.
Substrate holding device. The substrate holding apparatus according to claim 2 ,
The upper surface of the lower contact member is an inclined surface that is inclined downward as it approaches the rotation axis.
Substrate holding device. The substrate holding apparatus according to claim 2 ,
The upper end portion of the lower contact member has a tapered shape.
Substrate holding device. The substrate holding apparatus according to any one of claims 1 to 4,
The communication portion is open on the upper surface of the side contact member.
Substrate holding device. A substrate holding apparatus according to any one of claims 1 to 5,
A plurality of the communication portions are formed on the side contact member.
Substrate holding device. The substrate holding apparatus according to any one of claims 1 to 6,
The bottom surface of the communication portion is a height position below the lower surface of the substrate held on the turntable,
Substrate holding device. A substrate holding apparatus according to any one of claims 1 to 7,
The contact member group includes:
With one side abutting member and two lower abutting members,
The side contact member is disposed between the two lower contact members.
Substrate holding device.

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