JP6023669B2 - 表面増強ラマン散乱素子 - Google Patents
表面増強ラマン散乱素子 Download PDFInfo
- Publication number
- JP6023669B2 JP6023669B2 JP2013142164A JP2013142164A JP6023669B2 JP 6023669 B2 JP6023669 B2 JP 6023669B2 JP 2013142164 A JP2013142164 A JP 2013142164A JP 2013142164 A JP2013142164 A JP 2013142164A JP 6023669 B2 JP6023669 B2 JP 6023669B2
- Authority
- JP
- Japan
- Prior art keywords
- raman scattering
- enhanced raman
- groove
- pillar
- base portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 title claims description 92
- 239000000758 substrate Substances 0.000 claims description 72
- 239000004020 conductor Substances 0.000 claims description 53
- 230000003287 optical effect Effects 0.000 claims description 29
- 239000002245 particle Substances 0.000 claims description 9
- 239000010410 layer Substances 0.000 description 67
- 238000001069 Raman spectroscopy Methods 0.000 description 31
- 238000005259 measurement Methods 0.000 description 29
- 238000000034 method Methods 0.000 description 24
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000000465 moulding Methods 0.000 description 10
- 239000002184 metal Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000005284 excitation Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- -1 polypropylene Polymers 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- 229910001111 Fine metal Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical group C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000000479 surface-enhanced Raman spectrum Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- UOHVEPZCVBELIM-UHFFFAOYSA-N ethanol 2-sulfanylbenzoic acid Chemical compound C(C)O.SC1=C(C(=O)O)C=CC=C1 UOHVEPZCVBELIM-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013142164A JP6023669B2 (ja) | 2013-07-05 | 2013-07-05 | 表面増強ラマン散乱素子 |
| TW102128717A TWI604186B (zh) | 2012-08-10 | 2013-08-09 | Surface Enhanced Raman Scattering Element |
| CN201380040860.1A CN104508466B (zh) | 2012-08-10 | 2013-08-09 | 表面增强拉曼散射元件 |
| EP13828081.3A EP2884265A4 (en) | 2012-08-10 | 2013-08-09 | SURFACE-REINFORCED RAM SPREADING ELEMENT |
| US14/420,502 US9863883B2 (en) | 2012-08-10 | 2013-08-09 | Surface-enhanced raman scattering element |
| PCT/JP2013/071704 WO2014025035A1 (ja) | 2012-08-10 | 2013-08-09 | 表面増強ラマン散乱素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013142164A JP6023669B2 (ja) | 2013-07-05 | 2013-07-05 | 表面増強ラマン散乱素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015014546A JP2015014546A (ja) | 2015-01-22 |
| JP2015014546A5 JP2015014546A5 (enrdf_load_stackoverflow) | 2015-05-21 |
| JP6023669B2 true JP6023669B2 (ja) | 2016-11-09 |
Family
ID=52436352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013142164A Active JP6023669B2 (ja) | 2012-08-10 | 2013-07-05 | 表面増強ラマン散乱素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6023669B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6564203B2 (ja) * | 2015-02-26 | 2019-08-21 | 浜松ホトニクス株式会社 | 表面増強ラマン散乱素子及びその製造方法 |
| KR101886619B1 (ko) * | 2016-05-17 | 2018-08-10 | 충남대학교산학협력단 | 표면증강 라만산란 기판, 이를 포함하는 분자 검출용 소자 및 이의 제조방법 |
| EP3635384A4 (en) * | 2017-09-14 | 2021-01-20 | Hewlett-Packard Development Company, L.P. | CHROMATOGRAPHIC MEASUREMENT OF SURFACE ENHANCED LUMINESCENCE (SEL) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7460224B2 (en) * | 2005-12-19 | 2008-12-02 | Opto Trace Technologies, Inc. | Arrays of nano structures for surface-enhanced Raman scattering |
| US7388661B2 (en) * | 2006-10-20 | 2008-06-17 | Hewlett-Packard Development Company, L.P. | Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS) |
| WO2011047690A1 (en) * | 2009-10-23 | 2011-04-28 | Danmarks Tekniske Universitet | Surface enhanced raman scattering substrates consumables for raman spectroscopy |
| US20110166045A1 (en) * | 2009-12-01 | 2011-07-07 | Anuj Dhawan | Wafer scale plasmonics-active metallic nanostructures and methods of fabricating same |
| CN105911814A (zh) * | 2010-05-21 | 2016-08-31 | 普林斯顿大学 | 用于增强局部电场、光吸收、光辐射、材料检测的结构以及用于制作和使用此结构的方法 |
-
2013
- 2013-07-05 JP JP2013142164A patent/JP6023669B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015014546A (ja) | 2015-01-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2014025035A1 (ja) | 表面増強ラマン散乱素子 | |
| WO2014025038A1 (ja) | 表面増強ラマン散乱素子、及び、表面増強ラマン散乱素子を製造する方法 | |
| WO2014025037A1 (ja) | 表面増強ラマン散乱素子及びその製造方法 | |
| JP6023509B2 (ja) | 表面増強ラマン散乱ユニット | |
| JP5908370B2 (ja) | 表面増強ラマン散乱ユニット | |
| CN109001174B (zh) | 表面增强拉曼散射元件 | |
| US10393663B2 (en) | Surface-enhanced raman scattering element and method for manufacturing same | |
| JP6312376B2 (ja) | 表面増強ラマン散乱素子、及び、表面増強ラマン散乱素子を製造する方法 | |
| JP6230250B2 (ja) | 表面増強ラマン散乱ユニット、及びラマン分光分析方法 | |
| JP6023669B2 (ja) | 表面増強ラマン散乱素子 | |
| JP6203558B2 (ja) | 表面増強ラマン散乱素子及びその製造方法 | |
| JP6335410B1 (ja) | 表面増強ラマン散乱素子 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150406 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150406 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160223 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160425 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160913 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161007 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6023669 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |