JP5981086B2 - 光検出器 - Google Patents
光検出器 Download PDFInfo
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- JP5981086B2 JP5981086B2 JP2009502218A JP2009502218A JP5981086B2 JP 5981086 B2 JP5981086 B2 JP 5981086B2 JP 2009502218 A JP2009502218 A JP 2009502218A JP 2009502218 A JP2009502218 A JP 2009502218A JP 5981086 B2 JP5981086 B2 JP 5981086B2
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- 230000008878 coupling Effects 0.000 claims description 23
- 238000010168 coupling process Methods 0.000 claims description 23
- 238000005859 coupling reaction Methods 0.000 claims description 23
- 230000003287 optical effect Effects 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 16
- 230000032258 transport Effects 0.000 claims description 10
- 239000006096 absorbing agent Substances 0.000 claims description 8
- 239000002800 charge carrier Substances 0.000 claims description 8
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 7
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000010287 polarization Effects 0.000 claims description 4
- 239000013307 optical fiber Substances 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 description 32
- 230000003071 parasitic effect Effects 0.000 description 9
- 230000005855 radiation Effects 0.000 description 6
- 230000004043 responsiveness Effects 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910018885 Pt—Au Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Light Receiving Elements (AREA)
Description
Journal of Lightwave Technology, vol. 23, pp. 1818−1827, 2005
光信号を搬送する光子を、対応する電気信号を搬送する電荷キャリアに変換する吸収体を含む能動導波路と;
電気信号を搬送する電荷キャリアを輸送するキャリア収集層と;そして
キャリア収集層にじかに隣接し、かつ5つよりも少ないモードを持続(support)させる副導波路と、を備え、副導波路は光信号を搬送する光子を受信し、かつ能動導波路とエバネッセント結合する。
Claims (17)
- 光信号を搬送する光子を、対応する電気信号を搬送する電荷キャリアに変換する吸収体を含む、連続的に設けられた能動導波路と、
電気信号を搬送する電荷キャリアを輸送し、加速させるキャリア収集層と、
前記キャリア収集層にじかに隣接し、かつ5つよりも少ないモードを持続させる副導波路であって、前記副導波路は光信号を搬送する光子を受信し、かつ前記能動導波路とエバネッセント結合する、副導波路と、
電極としての機能を果たし、かつ伝送線路の一部を構成する複数の金属コンタクトと
を備える光検出器であって、
前記光検出器は、進行波構造を有し、前記進行波構造は、前記金属コンタクトの特性と、前記能動導波路、前記キャリア収集層、及び前記副導波路の材料の特性とに基づいて計算できる前記電極の間隔によって画定されるものであり、
前記光検出器は、前記光検出器に沿った電気信号の位相速度が前記能動導波路における光信号の位相速度とほぼ整合するように構成される、光検出器。 - 前記能動導波路から出て行く前記電荷キャリアの高速輸送が可能になる、請求項1記載の光検出器。
- 前記副導波路は、エピタキシャル構造の意図的にドープした層の内部に位置する、請求項1または2のいずれか一項に記載の光検出器。
- 前記能動導波路から電荷キャリアを輸送する単一走行キャリア構造を備える、請求項1ないし3のいずれか一項に記載の光検出器。
- 前記構造は積層状であり、そして前記能動導波路、前記副導波路、及びこれらの導波路に間に組み込まれる全ての中間層の合計膜厚は0.9μm〜1.3μmの範囲である、請求項1ないし4のいずれか一項に記載の光検出器。
- 前記副導波路の層の膜厚は0.5μm以下である、請求項5記載の光検出器。
- 前記能動導波路の層の膜厚は0.03μm〜0.3μmの範囲である、請求項5又は6記載の光検出器。
- 前記中間層の膜厚は0.15μm〜0.35μmの範囲である、請求項5、6、又は7記載の光検出器。
- 前記副導波路の層の幅は1〜8μmの範囲である、請求項1ないし8のいずれか一項に記載の光検出器。
- 前記能動導波路は亜鉛をドープした半導体である、請求項1ないし9のいずれか一項に記載の光検出器。
- 前記能動導波路はInGaAsを含む、請求項1ないし10のいずれか一項に記載の光検出器。
- 前記能動導波路の層の膜厚は0.1μm未満である、請求項1ないし11のいずれか一項に記載の光検出器。
- 前記副導波路はn型InGaAsPを含む、請求項1ないし12のいずれか一項に記載の光検出器。
- 前記キャリア収集層は、InP空乏層を前記能動導波路と前記副導波路との間に含む、請求項1ないし13のいずれか一項に記載の光検出器。
- 前記能動導波路及び前記副導波路は少なくとも15μmの長さである、請求項1ないし14のいずれか一項に記載の光検出器。
- 更に、検出される光子を光ファイバから前記副導波路に結合させるモード変換器を備える、請求項1ないし15のいずれか一項に記載の光検出器。
- 前記モード変換器によって、結合が3dB未満の偏波感度で可能になる、請求項16記載の光検出器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0606540.3A GB0606540D0 (en) | 2006-03-31 | 2006-03-31 | Photodetector |
GB0606540.3 | 2006-03-31 | ||
PCT/GB2007/001160 WO2007113502A1 (en) | 2006-03-31 | 2007-03-30 | Photodetector |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009531847A JP2009531847A (ja) | 2009-09-03 |
JP2009531847A5 JP2009531847A5 (ja) | 2016-07-14 |
JP5981086B2 true JP5981086B2 (ja) | 2016-08-31 |
Family
ID=36425025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009502218A Expired - Fee Related JP5981086B2 (ja) | 2006-03-31 | 2007-03-30 | 光検出器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7851782B2 (ja) |
EP (1) | EP2005229B1 (ja) |
JP (1) | JP5981086B2 (ja) |
GB (1) | GB0606540D0 (ja) |
WO (1) | WO2007113502A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106405735A (zh) * | 2016-12-15 | 2017-02-15 | 中国计量大学 | 硅阵列结构的太赫兹波偏振分束器 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8410420B1 (en) * | 2009-01-16 | 2013-04-02 | University Of Washington Through Its Center For Commercialization | Semiconductor travelling-wave evanescent waveguide photodetector |
US9040919B2 (en) * | 2010-10-25 | 2015-05-26 | Thomas E. Darcie | Photomixer-waveguide coupling tapers |
JP5742345B2 (ja) * | 2011-03-20 | 2015-07-01 | 富士通株式会社 | 受光素子および光受信モジュール |
KR101897257B1 (ko) | 2012-05-14 | 2018-09-11 | 한국전자통신연구원 | 광 검출기 및 그를 구비한 광학 소자 |
SG2013075379A (en) | 2012-10-08 | 2014-05-29 | Agency Science Tech & Res | P-i-n photodiode |
ITMI20122216A1 (it) | 2012-12-21 | 2014-06-22 | Milano Politecnico | Sistema di rivelazione di radiazione ottica includente un circuito di misura di parametri elettrici |
JP6295693B2 (ja) | 2014-02-07 | 2018-03-20 | ソニー株式会社 | 撮像装置 |
KR102351574B1 (ko) * | 2015-04-30 | 2022-01-14 | 한국전자통신연구원 | 포토 다이오드 |
JPWO2017164042A1 (ja) * | 2016-03-23 | 2019-01-31 | Agc株式会社 | 複合光導波路 |
US9818896B1 (en) * | 2016-12-08 | 2017-11-14 | The Boeing Company | Graded infrared photodetector and method |
US11588062B2 (en) * | 2020-10-08 | 2023-02-21 | Globalfoundries U.S. Inc. | Photodetectors including a coupling region with multiple tapers |
CN112310237A (zh) * | 2020-10-30 | 2021-02-02 | 中国科学院半导体研究所 | 波导耦合型单载流子探测器 |
US20240154047A1 (en) * | 2021-04-13 | 2024-05-09 | Nippon Telegraph And Telephone Corporation | Light Receiving Element and Manufacturing Method Therefor |
CN114823940A (zh) * | 2022-04-29 | 2022-07-29 | 电子科技大学 | 斜入射光纤直接耦合的大横截面光波导探测器 |
JP2023178006A (ja) * | 2022-06-03 | 2023-12-14 | 浜松ホトニクス株式会社 | 半導体受光素子 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2253480A (en) | 1991-03-07 | 1992-09-09 | Marconi Gec Ltd | Optical waveguide photodetector |
US5818096A (en) * | 1996-04-05 | 1998-10-06 | Nippon Telegraph And Telephone Corp. | Pin photodiode with improved frequency response and saturation output |
JPH11112013A (ja) * | 1997-09-30 | 1999-04-23 | Nippon Telegr & Teleph Corp <Ntt> | 半導体受光素子 |
US6239422B1 (en) * | 1999-03-10 | 2001-05-29 | Trw Inc. | Variable electrode traveling wave metal-semiconductor-metal waveguide photodetector |
US6278820B1 (en) | 1999-04-28 | 2001-08-21 | The Boeing Company | High power and large bandwidth traveling-wave photodetector |
JP2001068717A (ja) * | 1999-08-25 | 2001-03-16 | Nippon Telegr & Teleph Corp <Ntt> | 進行波型半導体光検出器 |
US6418248B1 (en) * | 1999-12-07 | 2002-07-09 | Hrl Laboratories, Llc | Traveling-wave photodetector |
JP2001318352A (ja) * | 2000-05-08 | 2001-11-16 | Nippon Telegr & Teleph Corp <Ntt> | 光スイッチング装置 |
JP4585168B2 (ja) * | 2000-07-05 | 2010-11-24 | 三菱電機株式会社 | 半導体レーザ装置 |
JP2003163363A (ja) * | 2001-11-29 | 2003-06-06 | Fujitsu Ltd | 半導体受光装置 |
US20030174956A1 (en) * | 2002-03-13 | 2003-09-18 | Jean-Francois Viens | Polarization insensitive modal field transformer for high index contrast waveguide devices |
US6831309B2 (en) * | 2002-12-18 | 2004-12-14 | Agilent Technologies, Inc. | Unipolar photodiode having a schottky junction contact |
JP2004247620A (ja) * | 2003-02-17 | 2004-09-02 | Yokogawa Electric Corp | 半導体受光素子 |
US6740908B1 (en) * | 2003-03-18 | 2004-05-25 | Agilent Technologies, Inc. | Extended drift heterostructure photodiode having enhanced electron response |
-
2006
- 2006-03-31 GB GBGB0606540.3A patent/GB0606540D0/en not_active Ceased
-
2007
- 2007-03-30 WO PCT/GB2007/001160 patent/WO2007113502A1/en active Application Filing
- 2007-03-30 JP JP2009502218A patent/JP5981086B2/ja not_active Expired - Fee Related
- 2007-03-30 EP EP07732214.7A patent/EP2005229B1/en active Active
- 2007-03-30 US US12/295,429 patent/US7851782B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106405735A (zh) * | 2016-12-15 | 2017-02-15 | 中国计量大学 | 硅阵列结构的太赫兹波偏振分束器 |
Also Published As
Publication number | Publication date |
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US7851782B2 (en) | 2010-12-14 |
JP2009531847A (ja) | 2009-09-03 |
WO2007113502A1 (en) | 2007-10-11 |
GB0606540D0 (en) | 2006-05-10 |
US20090184383A1 (en) | 2009-07-23 |
EP2005229B1 (en) | 2019-06-26 |
EP2005229A1 (en) | 2008-12-24 |
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