JP5974857B2 - トリクロロシラン製造装置 - Google Patents
トリクロロシラン製造装置 Download PDFInfo
- Publication number
- JP5974857B2 JP5974857B2 JP2012258361A JP2012258361A JP5974857B2 JP 5974857 B2 JP5974857 B2 JP 5974857B2 JP 2012258361 A JP2012258361 A JP 2012258361A JP 2012258361 A JP2012258361 A JP 2012258361A JP 5974857 B2 JP5974857 B2 JP 5974857B2
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- JP
- Japan
- Prior art keywords
- wall
- flow path
- folded
- gas
- trichlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/005—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out at high temperatures, e.g. by pyrolysis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2415—Tubular reactors
- B01J19/244—Concentric tubes
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00132—Controlling the temperature using electric heating or cooling elements
- B01J2219/00135—Electric resistance heaters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/0015—Controlling the temperature by thermal insulation means
- B01J2219/00155—Controlling the temperature by thermal insulation means using insulating materials or refractories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/18—Details relating to the spatial orientation of the reactor
- B01J2219/185—Details relating to the spatial orientation of the reactor vertical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/19—Details relating to the geometry of the reactor
- B01J2219/194—Details relating to the geometry of the reactor round
- B01J2219/1941—Details relating to the geometry of the reactor round circular or disk-shaped
- B01J2219/1943—Details relating to the geometry of the reactor round circular or disk-shaped cylindrical
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Description
4SiHCl3→Si+3SiCl4+2H2 …(2)
SiCl4+H2→SiHCl3+HCl …(3)
10,310,410,510 反応容器
12,412 外壁(被加熱壁)
13,413 内壁
13a,313a,413a,513a 流通孔
14,314,414,514 底板
14a,314a,415a,515a ガス導出口
14b,314b,415b,515b ガス供給口
15,315,415,515 天板
16,316,416,516 第1筒体
16a,316a,416a,516a 流通孔
17,317,417,517 第2筒体
17a,317a,417a,517a 流通孔
18,318 環状天板
20,320,520 ヒータ
21 電極
30,330,430 ガス供給管
31,331,333,431 配管
32,332,432 ガス導出管
34 断熱材
36 収納容器
36A 筒状壁
36B 底板部
36C,436C 天板部
38 アルゴン供給機構
40,340,440,540 流路
41,341,441,541 第1流路部
42,342,442,542 第2流路部
43,343,443,543 折り返し流路部
44,344,444,544 ガス流入部
45A,345A,445A,545A 第1折り返し部(反転部)
45B,345B,445B,545B 第2折り返し部(反転部)
312,512 外壁
313,513 内壁
319,519 ヒータ収容壁(被加熱壁)
417b,517b 支柱
418,518 環状底板
C 軸線
L1 流路の最大軸線方向長さ
L2 軸線方向長さ
Claims (2)
- 略筒状に設けられてその軸線方向に延びる流路を形成する被加熱壁を有する反応容器と、前記被加熱壁を加熱するヒータとを備え、前記反応容器内でテトラクロロシランと水素とを含む供給ガスを加熱することにより、トリクロロシランと塩化水素とを含む反応生成ガスを生成するトリクロロシラン製造装置であって、
前記反応容器の外部から前記供給ガスを導入されてこの供給ガスを前記軸線方向に沿って流通させるガス流入部と、このガス流入部の下流側に接続され前記供給ガスの流通方向を1回以上反対方向に反転させて流通させる反転部とを備える折り返し流路部が、前記流路の最上流部に設けられており、
前記折り返し流路部において、前記ガス流入部と前記被加熱壁との間に前記反転部が形成されているとともに、前記流路における前記軸線方向に沿う最大軸線方向長さよりも前記折り返し流路部における前記軸線方向長さが小さい
ことを特徴とするトリクロロシラン製造装置。 - 前記折り返し流路部の前記軸線方向長さは、前記流路の前記軸線方向に沿う前記最大軸線方向長さの10%以上50%以下であることを特徴とする請求項1に記載のトリクロロシラン製造装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012258361A JP5974857B2 (ja) | 2011-11-28 | 2012-11-27 | トリクロロシラン製造装置 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011259483 | 2011-11-28 | ||
JP2011259483 | 2011-11-28 | ||
JP2012258361A JP5974857B2 (ja) | 2011-11-28 | 2012-11-27 | トリクロロシラン製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013136505A JP2013136505A (ja) | 2013-07-11 |
JP5974857B2 true JP5974857B2 (ja) | 2016-08-23 |
Family
ID=48467068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012258361A Active JP5974857B2 (ja) | 2011-11-28 | 2012-11-27 | トリクロロシラン製造装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9168502B2 (ja) |
JP (1) | JP5974857B2 (ja) |
CN (1) | CN103130226B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113289630B (zh) * | 2021-05-19 | 2022-11-22 | 哈尔滨工业大学(深圳) | 柴油重整反应用催化剂及其制备方法、制氢重整器及系统 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5906799A (en) | 1992-06-01 | 1999-05-25 | Hemlock Semiconductor Corporation | Chlorosilane and hydrogen reactor |
JP5428146B2 (ja) * | 2006-10-31 | 2014-02-26 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
JP5205906B2 (ja) * | 2006-10-31 | 2013-06-05 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
JP5205910B2 (ja) * | 2006-10-31 | 2013-06-05 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
JP5601438B2 (ja) * | 2006-11-07 | 2014-10-08 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシラン製造装置 |
JP5012449B2 (ja) * | 2006-11-28 | 2012-08-29 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
WO2010107262A2 (ko) * | 2009-03-20 | 2010-09-23 | 주식회사수성기술 | 열변환반응 밀폐용기 |
-
2012
- 2012-11-27 JP JP2012258361A patent/JP5974857B2/ja active Active
- 2012-11-27 US US13/686,007 patent/US9168502B2/en active Active
- 2012-11-28 CN CN201210495009.5A patent/CN103130226B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN103130226A (zh) | 2013-06-05 |
US20130136667A1 (en) | 2013-05-30 |
JP2013136505A (ja) | 2013-07-11 |
CN103130226B (zh) | 2016-08-03 |
US9168502B2 (en) | 2015-10-27 |
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