JP5959648B2 - プロセス認識メトロロジー - Google Patents

プロセス認識メトロロジー Download PDF

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Publication number
JP5959648B2
JP5959648B2 JP2014531950A JP2014531950A JP5959648B2 JP 5959648 B2 JP5959648 B2 JP 5959648B2 JP 2014531950 A JP2014531950 A JP 2014531950A JP 2014531950 A JP2014531950 A JP 2014531950A JP 5959648 B2 JP5959648 B2 JP 5959648B2
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JP
Japan
Prior art keywords
wafer
optical
determining
simulating
model
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JP2014531950A
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English (en)
Japanese (ja)
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JP2014526805A5 (https=
JP2014526805A (ja
Inventor
シュエフェン リウ
シュエフェン リウ
ユン−ホ アレックス チュアン
ユン−ホ アレックス チュアン
ジョン フィールデン
ジョン フィールデン
ビン−ミン ベンジャミン ツァイ
ビン−ミン ベンジャミン ツァイ
ジンジン ジャン
ジンジン ジャン
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KLA Corp
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KLA Corp
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Publication date
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Publication of JP2014526805A publication Critical patent/JP2014526805A/ja
Publication of JP2014526805A5 publication Critical patent/JP2014526805A5/ja
Application granted granted Critical
Publication of JP5959648B2 publication Critical patent/JP5959648B2/ja
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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation
    • G06F30/23—Design optimisation, verification or simulation using finite element methods [FEM] or finite difference methods [FDM]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
    • G06F17/10—Complex mathematical operations
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2111/00—Details relating to CAD techniques
    • G06F2111/10—Numerical modelling
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00—Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/18—Manufacturability analysis or optimisation for manufacturability
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/32—Circuit design at the digital level
    • G06F30/333—Design for testability [DFT], e.g. scan chain or built-in self-test [BIST]
    • G—PHYSICS
    • G16—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16Z—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS, NOT OTHERWISE PROVIDED FOR
    • G16Z99/00—Subject matter not provided for in other main groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2014531950A 2011-09-23 2012-09-20 プロセス認識メトロロジー Active JP5959648B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161538699P 2011-09-23 2011-09-23
US61/538,699 2011-09-23
US13/411,433 US8468471B2 (en) 2011-09-23 2012-03-02 Process aware metrology
US13/411,433 2012-03-02
PCT/US2012/056272 WO2013043831A2 (en) 2011-09-23 2012-09-20 Process aware metrology

Publications (3)

Publication Number Publication Date
JP2014526805A JP2014526805A (ja) 2014-10-06
JP2014526805A5 JP2014526805A5 (https=) 2015-11-12
JP5959648B2 true JP5959648B2 (ja) 2016-08-02

Family

ID=47912686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014531950A Active JP5959648B2 (ja) 2011-09-23 2012-09-20 プロセス認識メトロロジー

Country Status (6)

Country Link
US (2) US8468471B2 (https=)
EP (1) EP2758990B1 (https=)
JP (1) JP5959648B2 (https=)
KR (1) KR102060209B1 (https=)
IL (1) IL231667B (https=)
WO (1) WO2013043831A2 (https=)

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Also Published As

Publication number Publication date
US8832611B2 (en) 2014-09-09
IL231667B (en) 2018-02-28
US20130080984A1 (en) 2013-03-28
EP2758990A4 (en) 2015-10-14
WO2013043831A2 (en) 2013-03-28
EP2758990A2 (en) 2014-07-30
JP2014526805A (ja) 2014-10-06
US8468471B2 (en) 2013-06-18
KR102060209B1 (ko) 2019-12-27
WO2013043831A3 (en) 2013-05-23
KR20140069255A (ko) 2014-06-09
EP2758990B1 (en) 2019-03-06
US20130282340A1 (en) 2013-10-24
IL231667A0 (en) 2014-05-28

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