JP5942360B2 - 保磁力に優れた鉄−白金系磁性合金の製造方法 - Google Patents
保磁力に優れた鉄−白金系磁性合金の製造方法 Download PDFInfo
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- JP5942360B2 JP5942360B2 JP2011184294A JP2011184294A JP5942360B2 JP 5942360 B2 JP5942360 B2 JP 5942360B2 JP 2011184294 A JP2011184294 A JP 2011184294A JP 2011184294 A JP2011184294 A JP 2011184294A JP 5942360 B2 JP5942360 B2 JP 5942360B2
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- alloy
- platinum
- iron
- coercive force
- heat treatment
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- OBACEDMBGYVZMP-UHFFFAOYSA-N iron platinum Chemical compound [Fe].[Fe].[Pt] OBACEDMBGYVZMP-UHFFFAOYSA-N 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 45
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 39
- 229910045601 alloy Inorganic materials 0.000 claims description 28
- 239000000956 alloy Substances 0.000 claims description 28
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 28
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 27
- 229910052757 nitrogen Inorganic materials 0.000 claims description 21
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 13
- 238000010884 ion-beam technique Methods 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 22
- 229910005335 FePt Inorganic materials 0.000 description 21
- 230000001965 increasing effect Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 125000004429 atom Chemical group 0.000 description 9
- 238000002513 implantation Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 229910002070 thin film alloy Inorganic materials 0.000 description 8
- 238000012795 verification Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 229910052761 rare earth metal Inorganic materials 0.000 description 5
- 150000002910 rare earth metals Chemical class 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- GUBSQCSIIDQXLB-UHFFFAOYSA-N cobalt platinum Chemical compound [Co].[Pt].[Pt].[Pt] GUBSQCSIIDQXLB-UHFFFAOYSA-N 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- -1 nitrogen ions Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- Hard Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Description
本発明の実施例1について、以下に説明する。まずこの実施例1では、電子ビーム加熱蒸着装置を用いてFe/Pt多層膜の成膜を行った。なお、成膜基板には、表面が酸化被膜(厚さ:120nm)で覆われたシリコンウェハ(厚さ:0.5mm)を使用し、成膜時の装置内の真空度は1×10-4Paに設定した。
次に、本発明の実施例2について、以下に説明する。この実施例2では、上記実施例1と同じ方法・条件でFe/Pt多層膜の成膜、及び窒素原子の注入を行う一方、Fe/Pt多層膜の熱処理については、高真空中での熱処理だけでなく水素雰囲気下での熱処理も組み合わせて行った。
次に、本発明の保磁力増大効果を実証するために行った実証試験について説明する。この実証試験では、実施例1の方法で作製したFePt薄膜合金(試料A〜G,比較試料S)と、実施例2の方法で作製したFePt薄膜合金(試料A’〜G’,比較試料S’)についてそれぞれ保磁力を測定した。
次に、本発明の作用・効果を裏付けるために行った検証試験(I)について説明する。この検証試験(I)では、窒素の注入量が1.6×1017atoms/cm2及び3.2×1017atoms/cm2の2種類のFePt薄膜について、窒素注入前、熱処理前、熱処理後の各段階で6.0MeVの4He2+イオンビームを照射して後方散乱スペクトルの測定を行った。
次に、本発明の作用・効果を裏付けるために行った検証試験(II)について説明する。この検証試験(II)では、窒素元素の注入量および熱処理の条件の異なる5つの試料についてX線回折装置(Rigaku,RINT2500)を用いて、X線回折パターンの測定を行った。なお、測定は入射X線をCu Kα(l=1.54 A)とし、q-2q法により行った。
Claims (4)
- 鉄-白金系合金にNイオンビームを直接照射して、窒素原子の添加量が11at.%以上となるように合金中に窒素原子を注入した後、合金の熱処理を行って前記注入された窒素を外部に放出することを特徴とする保磁力に優れた鉄-白金系磁性合金の製造方法。
- 鉄-白金系合金の熱処理を水素雰囲気中で行うことを特徴とする請求項1記載の保磁力に優れた鉄-白金系磁性合金の製造方法。
- 鉄-白金系合金の熱処理を1.0×10-3Pa以下の高真空中でも行うことを特徴とする請求項1または2に記載の保磁力に優れた鉄-白金系磁性合金の製造方法。
- Nイオンビームを照射する鉄-白金系合金が、Fe層とPt層を交互に積層したFe/Pt多層薄膜であることを特徴とする請求項1〜3の何れか一つに記載の保磁力に優れた鉄-白金系磁性合金の製造方法。
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JP6884322B2 (ja) * | 2016-10-31 | 2021-06-09 | 国立大学法人福井大学 | 2次元光走査ミラー装置の製造方法 |
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CN115732155A (zh) * | 2022-12-05 | 2023-03-03 | 宁波合力磁材技术有限公司 | 一种高矫顽力钕铁硼磁性材料及其制备方法 |
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