JP5929097B2 - Liquid crystal device and electronic device - Google Patents

Description

  The present invention relates to a liquid crystal device and an electronic apparatus.

  As the liquid crystal device, for example, an active drive type liquid crystal device including a transistor for each pixel as an element for controlling switching of a pixel electrode is known. Such a liquid crystal device includes a transmissive liquid crystal device used as a transmissive type and a reflective liquid crystal device used as a reflective type.

  For example, in Patent Document 1, in a reflective liquid crystal device, a transparent insulating film is sandwiched and laminated between two transparent conductive films on the surface on the counter substrate side, thereby utilizing the refractive index of each film to prevent reflection. A technique for functioning as a film and improving the transmittance is disclosed.

JP 2007-18774 A

  However, in order to cope with the improvement in transmittance in a shorter wavelength region, it is necessary to further reduce the thickness of the transparent conductive film, which makes it difficult to follow the potential of the common electrode on the counter substrate side. In addition, when only some of the plurality of transparent conductive films are electrically connected, another film is charged up.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A liquid crystal device according to this application example includes an element substrate, a counter substrate disposed so as to face the element substrate, and a liquid crystal layer sandwiched between the element substrate and the counter substrate. The counter substrate is disposed on the liquid crystal layer side of the first transparent conductive film, the first transparent conductive film disposed on the liquid crystal layer side of the light transmissive substrate, and the transparent substrate. A transparent insulating film having a refractive index lower than that of the first transparent conductive film; a second transparent conductive film disposed on the liquid crystal layer side of the transparent insulating film and having a refractive index higher than that of the transparent insulating film; A convex portion disposed between the conductive substrate and the first transparent conductive film, wherein the first transparent conductive film and the second transparent conductive film are planar with at least a part of the convex portion. It is characterized in that they are electrically connected in the overlapping region.

  According to this application example, the first transparent conductive film and the second transparent conductive film are electrically connected to each other with the transparent insulating film portion in a region overlapping the convex portion as a connection portion. Compared with the method of connecting in a non-existing region, the thickness of the transparent insulating film on the convex portion can be reduced, and further, the connecting portion in the transparent insulating film can be gently formed. Therefore, even when the first transparent conductive film and the second transparent conductive film are as thin as possible as compared with other films, it is possible to prevent the transparent conductive film from being disconnected at the connection portion of the transparent insulating film. Therefore, the first transparent conductive film and the second transparent conductive film can be reliably electrically connected, and the potential of the common electrode on the counter substrate side due to the thin transparent conductive film is less likely to follow. Can be suppressed. In addition, contrast and transmittance can be improved, and charging of the transparent laminated film can be suppressed.

  Application Example 2 In the liquid crystal device according to the application example described above, it is preferable that the thickness of the convex portion is larger than the film thickness of the first transparent conductive film and the film thickness of the second transparent conductive film.

  According to this application example, since the thickness of the convex portion is thicker than that of the first transparent conductive film and the second transparent conductive film, the surface of the transparent insulating film is gently undulated and the transparent insulating film above the convex portion is A part can be made thin. Furthermore, the connecting portion in the transparent insulating film can be gently shaped. Therefore, even when the first transparent conductive film and the second transparent conductive film are as thin as possible as compared with other films, it is possible to prevent the transparent conductive film from being disconnected at the connection portion of the transparent insulating film.

  Application Example 3 In the liquid crystal device according to the application example described above, it is preferable that the thickness of the convex portion is larger than the thickness of the transparent insulating film.

  According to this application example, since the thickness of the convex portion is larger than that of the transparent insulating film, the surface of the transparent insulating film can be gently undulated and the transparent insulating film portion above the light shielding layer can be thinned. Furthermore, the connecting portion in the transparent insulating film can be gently shaped. Therefore, even when the first transparent conductive film and the second transparent conductive film are as thin as possible as compared with other films, it is possible to prevent the transparent conductive film from being disconnected at the connection portion of the transparent insulating film.

  Application Example 4 In the liquid crystal device according to the application example described above, it is preferable that the liquid crystal device includes a display area that is an image display area, and the convex portion is a light shielding film that surrounds the outer periphery of the display area.

  According to this application example, since the light shielding film surrounding the outer periphery of the display area is used as the convex portion, it is possible to suppress an increase in the number of manufacturing steps as compared with a case where a new convex portion is provided.

  Application Example 5 In the liquid crystal device according to the application example, it is preferable that the convex portion is a conduction pad for establishing conduction between the element substrate and the counter substrate.

  According to this application example, since the conductive pad is used as a convex portion, it is possible to suppress an increase in the number of manufacturing steps as compared with a case where a convex portion is newly provided.

  Application Example 6 In the liquid crystal device according to the application example described above, it is preferable that the convex portion and the first transparent conductive film are electrically connected.

  According to this application example, in addition to the first transparent conductive film and the second transparent conductive film being electrically connected, the two transparent conductive films are electrically connected to the light shielding layer. It is possible to further reduce the resistance of the film, and it is possible to suppress the potential of the common electrode from becoming difficult to follow due to the thin transparent conductive film.

  Application Example 7 An electronic apparatus according to this application example includes the liquid crystal device described above.

  According to this application example, since the liquid crystal device described above is provided, it is possible to provide an electronic apparatus that can reliably conduct the transparent laminated film and improve display quality.

FIG. 2 is a schematic plan view illustrating a configuration of a liquid crystal device. FIG. 2 is a schematic cross-sectional view taken along the line H-H ′ of the liquid crystal device illustrated in FIG. 1. FIG. 3 is an equivalent circuit diagram illustrating an electrical configuration of the liquid crystal device. It is a schematic diagram which shows the structure around the light shielding layer of a liquid crystal device, (a) is a schematic plan view which shows the structure of a liquid crystal device, (b) is a schematic cross section along the AA 'line of the liquid crystal device shown to (a). Figure. FIG. 5 is an enlarged cross-sectional view illustrating a B portion of the liquid crystal device illustrated in FIG. FIG. 6 is a schematic cross-sectional view showing a part of a method for manufacturing a liquid crystal device. FIG. 6 is a schematic cross-sectional view showing a part of a method for manufacturing a liquid crystal device. FIG. 3 is a schematic diagram illustrating a configuration of an electronic apparatus (liquid crystal projector) including a liquid crystal device. The schematic cross section which shows the structure of the modification of a counter substrate.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. Note that the drawings to be used are appropriately enlarged or reduced so that the part to be described can be recognized.

  In the following embodiments, for example, when “on the substrate” is described, the substrate is disposed so as to be in contact with the substrate, or is disposed on the substrate via another component, or the substrate. It is assumed that a part is arranged so as to be in contact with each other and a part is arranged via another component.

  In the present embodiment, an active matrix liquid crystal device including a thin film transistor (TFT) as a pixel switching element will be described as an example. This liquid crystal device can be suitably used as, for example, a light modulation element (liquid crystal light valve) of a projection display device (liquid crystal projector) described later.

<Configuration of liquid crystal device>
FIG. 1 is a schematic plan view showing the configuration of the liquid crystal device. 2 is a schematic cross-sectional view taken along the line HH ′ of the liquid crystal device shown in FIG. FIG. 3 is an equivalent circuit diagram showing an electrical configuration of the liquid crystal device. Hereinafter, the structure of the liquid crystal device will be described with reference to FIGS.

  As shown in FIGS. 1 and 2, the liquid crystal device 100 according to the present embodiment includes an element substrate 10 and a counter substrate 20 that are disposed to face each other, and a liquid crystal layer 15 that is sandwiched between the pair of substrates. For example, a glass substrate, a transparent substrate such as a quartz substrate, or a silicon substrate is used as the first substrate 11 constituting the element substrate 10 and the second substrate 12 as the light-transmitting substrate constituting the counter substrate 20. .

  The element substrate 10 is slightly larger than the counter substrate 20, and both substrates are bonded via a seal material 14 arranged in a frame shape, and liquid crystal having positive or negative dielectric anisotropy is sealed in the gap. A liquid crystal layer 15 is formed. For example, an adhesive such as a thermosetting or ultraviolet curable epoxy resin is employed as the sealing material 14. A gap material for keeping the distance between the pair of substrates constant is mixed in the seal material 14.

  A light shielding layer 18 (light shielding film) as a convex portion in the frame shape is provided inside the sealing material 14 arranged in a frame shape on the counter substrate 20 side. The light shielding layer 18 is made of, for example, a light shielding metal or metal oxide, and the inside of the light shielding layer 18 is a display region E having a plurality of pixels P. Although not shown in FIG. 1, the display area E is also provided with a light-shielding portion that divides a plurality of pixels P in a plane.

  A data line driving circuit 22 is provided between one side of the first substrate 11 and the sealing material 14 along the one side. Further, an inspection circuit 25 is provided inside the sealing material 14 along the other one side facing the one side. Further, a scanning line driving circuit 24 is provided inside the sealing material 14 along the other two sides orthogonal to the one side and facing each other. A plurality of wirings 29 that connect the two scanning line driving circuits 24 are provided inside the sealing material 14 on the other side facing the one side.

  Wirings connected to the data line driving circuit 22 and the scanning line driving circuit 24 are connected to a plurality of external connection terminals 61 arranged along the one side. Hereinafter, the direction along the one side will be referred to as the X direction, and the direction along the other two sides orthogonal to the one side and facing each other will be described as the Y direction. The arrangement of the inspection circuit 25 is not limited to this, and the inspection circuit 25 may be provided at a position along the inner side of the seal material 14 between the data line driving circuit 22 and the display area E.

  As shown in FIG. 2, on the surface of the first substrate 11 on the liquid crystal layer 15 side, a light-reflective pixel electrode 27 provided for each pixel P and a thin film transistor 30 (hereinafter referred to as “TFT 30”) as a switching element. ), Signal wirings, and an alignment film 28 covering them.

  The pixel electrode 27 can be formed using a light reflective compound such as Al (aluminum) or Ag (silver) or an alloy or oxide of these metals. In addition, a light shielding structure is employed that prevents light from entering the semiconductor layer in the TFT 30 to make the switching operation unstable.

  On the surface of the second substrate 12 on the liquid crystal layer 15 side, the light shielding layer 18, a first insulating layer 33 formed so as to cover it, and a common electrode 31 provided so as to cover the first insulating layer 33. And an alignment film 32 that covers the common electrode 31. A transparent laminated film in which a plurality of transparent films (not shown) are laminated is provided between the light shielding layer 18 and the common electrode 31. Details of the transparent laminated film will be described later.

  As shown in FIG. 1, the light shielding layer 18 is provided in a frame shape at a position overlapping the scanning line driving circuit 24 and the inspection circuit 25 in plan view. Thus, the light incident from the counter substrate 20 side is shielded, and the malfunction of the peripheral circuits including these drive circuits due to the light is prevented. Further, unnecessary stray light is shielded from entering the display area E, and high contrast in the display of the display area E is ensured.

  The first insulating layer 33 is made of, for example, an inorganic material such as silicon oxide, and is provided so as to cover the light shielding layer 18 with optical transparency. Examples of a method for forming the first insulating layer 33 include a method of forming a film using, for example, a plasma CVD (Chemical Vapor Deposition) method.

  The common electrode 31 is made of, for example, a transparent conductive film such as ITO (Indium Tin Oxide), covers the first insulating layer 33, and has an element formed by vertical conduction portions 26 provided at the four corners of the counter substrate 20 as shown in FIG. It is electrically connected to the wiring on the substrate 10 side.

  The alignment film 28 covering the pixel electrode 27 and the alignment film 32 covering the common electrode 31 are selected based on the optical design of the liquid crystal device 100. For example, a material in which an inorganic material such as SiOx (silicon oxide) is formed using a vapor phase growth method and aligned substantially perpendicularly to liquid crystal molecules can be used.

  Such a liquid crystal device 100 is of a reflective type, and adopts an optical design of a normally black mode in which the pixel P is darkly displayed when not driven or a normally white mode in which the pixel P is brightly displayed when not driven. Depending on the optical design, a polarizing element is arranged on the light incident side (emission side).

  As shown in FIG. 3, the liquid crystal device 100 includes a plurality of scanning lines 3 a and a plurality of data lines 6 a that are insulated from each other and orthogonal to each other at least in the display region E, and capacitance lines 3 b. The direction in which the scanning line 3a extends is the X direction, and the direction in which the data line 6a extends is the Y direction.

  A pixel electrode 27, a TFT 30, and a capacitive element 16 are provided in a region divided by the scanning line 3a, the data line 6a, the capacitive line 3b, and these signal lines, and these constitute a pixel circuit of the pixel P. doing.

  The scanning line 3a is electrically connected to the gate of the TFT 30, and the data line 6a is electrically connected to the data line side source / drain region of the TFT 30. The pixel electrode 27 is electrically connected to the pixel electrode side source / drain region of the TFT 30.

  The data line 6a is connected to the data line driving circuit 22 (see FIG. 1), and supplies image signals D1, D2,..., Dn supplied from the data line driving circuit 22 to the pixels P. The scanning line 3a is connected to the scanning line driving circuit 24 (see FIG. 1), and supplies the scanning signals SC1, SC2,..., SCm supplied from the scanning line driving circuit 24 to each pixel P.

  The image signals D1 to Dn supplied from the data line driving circuit 22 to the data lines 6a may be supplied line-sequentially in this order, or may be supplied for each of a plurality of adjacent data lines 6a for each group. Good. The scanning line driving circuit 24 supplies the scanning signals SC1 to SCm to the scanning line 3a in a pulse-sequential manner at a predetermined timing.

  In the liquid crystal device 100, the TFT 30 as a switching element is turned on for a certain period by the input of the scanning signals SC1 to SCm, so that the image signals D1 to Dn supplied from the data line 6a are supplied to the pixel electrode 27 at a predetermined timing. It is the structure written in. The predetermined level of image signals D1 to Dn written to the liquid crystal layer 15 through the pixel electrode 27 is held for a certain period between the pixel electrode 27 and the common electrode 31 disposed to face each other through the liquid crystal layer 15. The

  In order to prevent the retained image signals D1 to Dn from leaking, the capacitive element 16 is connected in parallel with the liquid crystal capacitance formed between the pixel electrode 27 and the common electrode 31. The capacitive element 16 is provided between the pixel electrode side source / drain region of the TFT 30 and the capacitive line 3b. The capacitive element 16 has a dielectric layer between two capacitive electrodes.

  4A and 4B are schematic views showing a structure around the light shielding layer of the liquid crystal device, FIG. 4A is a schematic plan view showing the structure of the liquid crystal device, and FIG. 4B is a liquid crystal device shown in FIG. It is a schematic cross section along an AA 'line. FIG. 5 is an enlarged cross-sectional view showing a B portion of the liquid crystal device shown in FIG. Hereinafter, the structure of the liquid crystal device around the light shielding layer will be described with reference to FIGS.

  As shown in FIG. 4, the light shielding layer 18 is provided on the liquid crystal layer 15 side of the second substrate 12 constituting the counter substrate 20 so as to surround the display region E as described above. Moreover, as shown in FIG.4 (b), the cross-sectional shape of the light shielding layer 18 is convex shape. A transparent laminated film 40 is provided so as to cover the light shielding layer 18. Further, an insulating layer (not shown), a common electrode 31 and an alignment film 32 are provided so as to cover the transparent laminated film 40.

  Specifically, as shown in FIG. 5, a light shielding layer 18 is provided on the surface of the second substrate 12 on the liquid crystal layer 15 side. The material of the light shielding layer 18 is, for example, an aluminum alloy (AlSi, AlSiCu, etc.). The thickness of the light shielding layer 18 is thicker than the first transparent conductive film 41, the second transparent conductive film 43, and the transparent insulating film 42, and is, for example, 100 nm to 200 nm.

A first insulating layer 33 is provided on the light shielding layer 18 so as to cover the second substrate 12 and the light shielding layer 18. The first insulating layer 33 is, for example, a silicon oxide film (SiO ₂ ). The thickness of the first insulating layer 33 is, for example, 200 nm to 300 nm. For example, the first insulating layer 33 can be formed by a plasma CVD method using TEOS (tetraethoxysilane).

  A transparent laminated film 40 is provided on the first insulating layer 33. The transparent laminated film 40 is configured by laminating a first transparent conductive film 41, a transparent insulating film 42, and a second transparent conductive film 43 from the second substrate 12 side. The transparent insulating film 42 has a lower refractive index than the first transparent conductive film 41. The second transparent conductive film 43 has a higher refractive index than the transparent insulating film 42. The first transparent conductive film 41 and the second transparent conductive film 43 are electrically connected via a groove 45 in a region overlapping at least a part of the light shielding layer 18 in a plan view.

The first transparent conductive film 41 and the second transparent conductive film 43 are made of, for example, ITO. The transparent insulating film 42 is, for example, a silicon oxide film (SiO ₂ ). The thickness of the first transparent conductive film 41 is, for example, 20 nm. The thickness of the transparent insulating film 42 is 60 nm, for example. The thickness of the second transparent conductive film 43 is, for example, 20 nm.

  As described above, when the transparent laminated film 40 is laminated on the light shielding layer 18 provided in a convex shape in cross section, and the groove 45 is provided in the transparent insulating film 42 constituting the transparent laminated film 40, the opening of the groove 45. When the second transparent conductive film 43 is provided on the transparent insulating film 42 after that, it is possible to prevent the second transparent conductive film 43 from being disconnected in the groove 45. Can do.

  Specifically, when the transparent insulating film 42 is provided on the light shielding layer 18, the thickness of the transparent insulating film 42 above the light shielding layer 18 can be reduced, and the groove 45 ( The opening shape of the connection portion can be made gentle. Therefore, even if the second transparent conductive film 43 having a relatively thin film thickness (for example, 20 nm) is formed on the entire substrate including the groove 45, the second transparent conductive film 43 in the groove 45 is disconnected. Can be suppressed. Therefore, the first transparent conductive film 41 and the second transparent conductive film 43 can be electrically connected reliably. As a result, contrast and transmittance can be improved.

  As shown in FIG. 4A, a light shielding layer 18 is provided around the display area E. Above the light shielding layer 18, the first transparent conductive film 41 and the second transparent conductive film 43 are provided. Are electrically connected, the resistance of the two transparent conductive films 41 and 43 can be lowered, and the potential of the common electrode 31 due to the thin film of the transparent conductive film is less likely to follow. Can do.

  On the transparent laminated film 40, the 2nd insulating layer 44, the common electrode 31, and the alignment film 32 which is not shown in order are provided, and the counter substrate 20 is comprised. The element substrate 10 and the counter substrate 20 are bonded to each other with a sealing material 14 interposed therebetween.

  6 and 7 are schematic cross-sectional views illustrating a part of the manufacturing method of the liquid crystal device. Hereinafter, a part of the manufacturing method of the liquid crystal device (particularly, the manufacturing method of the transparent laminated film) will be described with reference to FIGS.

  First, the element substrate 10 side is manufactured using a known technique. Subsequently, the counter substrate 20 is manufactured. As a manufacturing method of the counter substrate 20, first, the light shielding layer 18 is formed on the second substrate 12. Specifically, as shown in FIG. 6A, a light shielding layer 18 made of, for example, an aluminum alloy (AlSi) is formed on the second substrate 12 made of a light-transmitting material such as a quartz substrate. Film formation and patterning are performed so as to surround the periphery. The thickness of the light shielding layer 18 is, for example, 100 nm to 200 nm.

Next, as shown in FIG. 6B, the first insulating layer 33 is formed on the light shielding layer 18 and the second substrate 12. The first insulating layer 33 is, for example, a silicon oxide film (SiO ₂ ). The thickness of the first insulating layer 33 is, for example, 200 nm to 300 nm.

Next, the 1st transparent conductive film 41 which comprises the transparent laminated film 40 is formed into a film. Thereafter, a transparent insulating film 42 is formed. The first transparent conductive film 41 is, for example, ITO. The transparent insulating film 42 is, for example, a silicon oxide film (SiO ₂ ). As a manufacturing method of the 1st transparent conductive film 41, it can manufacture by a sputtering method, for example. As a manufacturing method of the transparent insulating film 42, it can manufacture using CVD method, for example.

  Next, as shown in FIG. 6C, the portion 42a of the transparent insulating film 42 formed above the light shielding layer 18 is removed. Specifically, for example, the groove 45 is formed above the light shielding layer 18 by photolithography and etching. Thereby, a part of the surface 41a of the first transparent conductive film 41 is exposed so as to surround the display region E. In other words, the connected groove part 45 is formed so as to surround the display area E.

  Next, as shown in FIG. 7D, a second transparent conductive film 43 constituting the transparent laminated film 40 is formed so as to cover the entire second substrate 12 including the transparent insulating film 42. The second transparent conductive film 43 is, for example, ITO. Thereby, the second transparent conductive film 43 is formed on the transparent insulating film 42 and in the groove 45. In other words, the first transparent conductive film 41 and a part of the second transparent conductive film 43 are electrically connected via the groove 45 above the light shielding layer 18.

  In this way, the first transparent conductive film 41 and the second transparent conductive film 43 are electrically connected above the light shielding layer 18 provided in a convex shape in cross section, so that the transparent insulating film 42 Further, the opening shape of the groove 45 (connection portion) in the transparent insulating film 42 can be made gentle. Therefore, even if the second transparent conductive film 43 having a relatively thin film thickness (for example, 20 nm) is formed on the entire substrate including the groove 45, the second transparent conductive film 43 in the groove 45 is disconnected. Can be suppressed. Therefore, the first transparent conductive film 41 and the second transparent conductive film 43 can be electrically connected reliably. As a result, the resistance of the two transparent conductive films 41 and 43 can be lowered.

  Next, as shown in FIG. 7E, the second insulating layer 44, the common electrode 31, and the alignment film 32 (not shown) are formed on the transparent laminated film 40 by a known method, so that the counter substrate 20 side is Complete. Thereafter, the element substrate 10 and the counter substrate 20 are bonded to each other through the sealing material 14, for example, liquid crystal is injected from a liquid crystal injection port, and then the liquid crystal injection port is sealed to complete the liquid crystal device 100.

<Configuration of electronic equipment>
FIG. 8 is a schematic diagram showing a configuration of an electronic apparatus (reflection type projection display device: liquid crystal projector) provided with the liquid crystal device described above. Hereinafter, the configuration of the electronic device will be described with reference to FIG.

  As shown in FIG. 8, a liquid crystal projector 1500 as an electronic apparatus according to the present embodiment includes a polarization illumination device 1100 arranged along the system optical axis L, three dichroic mirrors 1111, 1112 and 1115, and two reflections. Mirrors 1113, 1114, reflection type liquid crystal light valves 1250, 1260, 1270 as three light modulation elements, a cross dichroic prism 1206, and a projection lens 1207 are provided.

  The polarized light illumination device 1100 is generally configured by a lamp unit 1101 as a light source composed of a white light source such as a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

  The polarized light beam emitted from the polarization illumination device 1100 is incident on the dichroic mirror 1111 and the dichroic mirror 1112 which are arranged orthogonal to each other. A dichroic mirror 1111 serving as a light separation element reflects red light (R) in the incident polarized light flux. The dichroic mirror 1112 as the other light separation element reflects green light (G) and blue light (B) in the incident polarized light flux.

  The reflected red light (R) is reflected again by the reflection mirror 1113 and enters the liquid crystal light valve 1250. On the other hand, the reflected green light (G) and blue light (B) are reflected again by the reflection mirror 1114 and enter the dichroic mirror 1115 as a light separation element. The dichroic mirror 1115 reflects green light (G) and transmits blue light (B). The reflected green light (G) enters the liquid crystal light valve 1260. The transmitted blue light (B) enters the liquid crystal light valve 1270.

  The liquid crystal light valve 1250 includes a reflective liquid crystal panel 1251 and a wire grid polarizer 1253 as a reflective polarizing element.

  The liquid crystal light valve 1250 is arranged so that the red light (R) reflected by the wire grid polarizer 1253 is perpendicularly incident on the incident surface of the cross dichroic prism 1206. Further, an auxiliary polarizing plate 1254 that compensates for the degree of polarization of the wire grid polarizing plate 1253 is disposed on the red light (R) incident side of the liquid crystal light valve 1250, and another auxiliary polarizing plate 1255 is disposed on the red light (R) emission side. Are arranged along the incident surface of the cross dichroic prism 1206. In the case where a polarizing beam splitter is used as the reflective polarizing element, the pair of auxiliary polarizing plates 1254 and 1255 can be omitted.

  The configuration of the reflective liquid crystal light valve 1250 and the arrangement of the components are the same in the other reflective liquid crystal light valves 1260 and 1270.

  Each color light incident on the liquid crystal light valves 1250, 1260, 1270 is modulated based on the image information, and again enters the cross dichroic prism 1206 via the wire grid polarizers 1253, 1263, 1273. In the cross dichroic prism 1206, the color lights are combined, and the combined light is projected onto the screen 1300 by the projection lens 1207, and the image is enlarged and displayed.

  In the present embodiment, the liquid crystal device 100 in the above embodiment is applied as the reflective liquid crystal panels 1251, 1261, 1271 in the liquid crystal light valves 1250, 1260, 1270.

  According to such a liquid crystal projector 1500, since the reflective liquid crystal device 100 is used for the liquid crystal light valves 1250, 1260, and 1270, the reflective liquid crystal projector 1500 capable of improving contrast and transmittance is provided. it can.

  As described above in detail, according to the liquid crystal device 100 and the electronic apparatus of the present embodiment, the following effects can be obtained.

  (1) According to the liquid crystal device 100 of the present embodiment, when the transparent insulating film 42 is provided on the light shielding layer 18, the thickness of the transparent insulating film 42 above the light shielding layer 18 can be reduced. The opening shape of the groove 45 (connection portion) in the transparent insulating film 42 can be made gentle. Therefore, even if the second transparent conductive film 43 having a relatively thin film thickness (for example, 20 nm) is formed on the entire substrate including the groove 45, the second transparent conductive film 43 is disconnected in the groove 45. Can be suppressed. Accordingly, the first transparent conductive film 41 and the second transparent conductive film 43 can be reliably connected to each other, and the resistance of the two transparent conductive films 41 and 43 can be lowered. Therefore, it is possible to prevent the potential of the common electrode 31 from becoming difficult to follow. In addition, contrast and transmittance can be improved, and charging of the transparent laminated film 40 can be suppressed.

  (2) According to the liquid crystal device 100 of the present embodiment, the light shielding layer 18 that surrounds the outer periphery of the display area E is used as a convex portion, so that the number of manufacturing steps is increased as compared with the case where a new convex portion is provided. Can be suppressed.

  (3) According to the electronic apparatus of the present embodiment, since the liquid crystal device 100 described above is provided, the transparent laminated film 40 can be reliably conducted and the display quality can be improved. Equipment can be provided.

  Note that the present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the spirit or concept of the invention that can be read from the claims and the entire specification, and is included in the technical scope of the present invention. Is. Moreover, it can also implement with the following forms.

(Modification 1)
As described above, the first transparent conductive film 41 and the second transparent conductive film 43 are not limited to being electrically connected, and may be configured as shown in FIG. 9, for example. FIG. 9 is a schematic cross-sectional view showing a structure of a modified example of the counter substrate. As shown in FIG. 9, the counter substrate 120 of the modified example is provided with a light shielding layer 18 on the second substrate 12, and a first insulating layer 133 is provided so as to cover the light shielding layer 18.

  The first insulating layer 133 above the light shielding layer 18 is provided with a groove portion penetrating to the light shielding layer 18, and the first transparent conductive film 141 is provided so as to cover the groove portion and the first insulating layer 133. Yes. Thereby, the light shielding layer 18 and the 1st transparent conductive film 141 are electrically connected. Further, as in the above embodiment, the second transparent conductive film 143 is provided via the transparent insulating film 142, and the first transparent conductive film 141 and the first transparent conductive film 141 are connected via the groove provided above the light shielding layer 18. Two transparent conductive films 143 are electrically connected.

  According to this configuration, in addition to the first transparent conductive film 141 and the second transparent conductive film 143 being electrically connected, they are also electrically connected to the light shielding layer 18. The resistances of the films 141 and 143 can be further reduced, and it is possible to suppress the potential of the common electrode 31 from being difficult to follow due to the thin transparent conductive film.

  As described above, the light shielding layer 18 is not limited to being composed of only an aluminum alloy, and for example, titanium nitride (TiN) may be laminated on an aluminum alloy (for example, AlSi). . According to this, it can suppress that the light shielding layer 18 corrodes. Further, it can function as an etching stopper when a through groove is formed in the first insulating layer 133 above the light shielding layer 18. The thickness of the aluminum alloy (AlSi) is, for example, 100 nm to 200 nm. The thickness of titanium nitride (TiN) is, for example, 50 nm.

(Modification 2)
As described above, the present invention is not limited to being applied to the reflective liquid crystal device 100, and may be applied to a transmissive liquid crystal device. According to this, a transmissive liquid crystal projector can be used.

(Modification 3)
As described above, the light shielding layer 18 is not limited to being used as a convex portion, and, for example, a black matrix (BM) or a conductive pad of a vertical conductive terminal may be used as the convex portion. Moreover, it is not limited to the convex part provided in the counter substrate side, You may make it use the convex part provided in the element substrate side.

(Modification 4)
As described above, the convex portion is not limited to using a light shielding film connected to the periphery so as to surround the display region, and for example, a convex portion divided for each region may be used. According to this, even if the transparent conductive film is disconnected above the region without the convex part, the first transparent conductive film 41 and the second transparent conductive film 43 are surely provided above the other convex part. Can be electrically connected.

(Modification 5)
As described above, the present invention is not limited to providing the groove 45 connected so as to surround the display area in a planar manner in the transparent conductive film. For example, the groove may not be connected over the periphery. According to this, although the connection area of the 1st transparent conductive film 41 and the 2nd transparent conductive film 43 becomes small, resistance can be lowered compared with the past.

(Modification 6)
As described above, the projection display device (projector) 1500 has been described as an example of the electronic apparatus. However, the present invention is not limited to this, and may be applied to, for example, a viewer, a viewfinder, a head mounted display, and the like. Various electronic devices such as LCD TVs, mobile phones, electronic notebooks, word processors, viewfinder type or monitor direct-view type video tape recorders, workstations, mobile personal computers, video phones, POS terminals, pagers, calculators, touch panels, etc. Further, the present invention may be applied to an electrophoretic device such as electronic paper, a car navigation device, and the like.

  3a ... scanning line, 3b ... capacitance line, 6a ... data line, 10 ... element substrate, 11 ... first substrate, 12 ... second substrate as translucent substrate, 14 ... sealing material, 15 ... liquid crystal layer, 16 ... Capacitance element, 18 ... light shielding layer (light shielding film) as a convex part, 20, 120 ... counter substrate, 22 ... data line driving circuit, 24 ... scanning line driving circuit, 25 ... inspection circuit, 26 ... vertical conduction part, 27 ... Pixel electrode, 28, 32 ... alignment film, 29 ... wiring, 30 ... TFT, 31 ... common electrode, 33, 133 ... first insulating layer, 40 ... transparent laminated film, 41, 141 ... first transparent conductive film, 41a ... Surface, 42, 142 ... Transparent insulating film, 42a ... portion, 43, 143 ... Second transparent conductive film, 44 ... Second insulating layer, 45 ... Groove, 61 ... External connection terminal, 100 ... Liquid crystal device, 1100 ... Polarized illumination Device 1101 ... Lamp unit 1102 ... Intel 1101, 1112, 1115 ... Dichroic mirror, 1113, 1114 ... Reflection mirror, 1206 ... Cross dichroic prism, 1207 ... Projection lens, 1250, 1260, 1270 ... Liquid crystal light valve, 1251, 1261 1271 ... reflective liquid crystal panel, 1253, 1263, 1273 ... wire grid polarizer, 1254, 1255 ... auxiliary polarizer, 1300 ... screen, 1500 ... liquid crystal projector.

Claims (6)

An element substrate;
A counter substrate arranged to face the element substrate;
A liquid crystal layer sandwiched between the element substrate and the counter substrate,
The counter substrate includes a translucent substrate,
A first transparent conductive film disposed on the liquid crystal layer side of the translucent substrate;
A transparent insulating film disposed on the liquid crystal layer side of the first transparent conductive film and having a lower refractive index than the first transparent conductive film;
A second transparent conductive film disposed on the liquid crystal layer side of the transparent insulating film and having a higher refractive index than the transparent insulating film;
A convex portion disposed between the translucent substrate and the first transparent conductive film,
The first transparent conductive film protrudes toward the second transparent conductive film by the convex portion,
The liquid crystal device, wherein the first transparent conductive film and the second transparent conductive film are electrically connected at least in a region overlapping with a part of the projection. The liquid crystal device according to claim 1,
The thickness of the convex part is thicker than the film thickness of the first transparent conductive film and the film thickness of the second transparent conductive film, or thicker than the thickness of the transparent insulating film. The liquid crystal device according to claim 1 or 2 ,
It has a display area that is an area for displaying images,
The liquid crystal device, wherein the convex portion is a light shielding film surrounding an outer periphery of the display area. The liquid crystal device according to claim 1 or 2 ,
The liquid crystal device according to claim 1, wherein the convex portion is a conductive pad for establishing electrical connection between the element substrate and the counter substrate. The liquid crystal device according to any one of claims 1 to 4,
The liquid crystal device, wherein the convex portion and the first transparent conductive film are electrically connected. An electronic apparatus comprising the liquid crystal device according to any one of claims 1 to 5 .

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