JP2017083678A - Electro-optical device and electronic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electro-optical device that can prevent leakage of light from a peripheral area surrounding a display area, and an electronic apparatus including the electro-optical device.SOLUTION: A liquid crystal panel 110 comprises a light-blocking conductive film 8 that is arranged on a layer different from a pixel electrode 15 in a peripheral area E2 of an element substrate 10 as a first substrate, and is supplied with a potential that controls a liquid crystal layer 50 to display black between an opposing substrate 20 as a second substrate and a common electrode 23.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an electro-optical device and an electronic apparatus including the electro-optical device.

  Examples of the electro-optical device include an active drive type liquid crystal device having a switching element for each pixel. In a liquid crystal device, a pair of substrates are arranged to face each other at a predetermined interval, and a liquid crystal layer is configured by filling liquid crystal in the gap. A plurality of pixels are arranged in the display area of the liquid crystal device, and in order to make the display in the display area easy to see, one of the pair of substrates is provided with a light shielding portion surrounding the display area. When the light-shielding part is arranged with a slight gap between the outer edge of the display area, there is a possibility that display quality may be deteriorated due to light leaking from the gap.

  In order to improve such a problem, for example, in Patent Document 1, a light shielding electrode is formed on the first substrate so as to cover the periphery of a display area in which a plurality of pixel electrodes are arranged. A liquid crystal display device that supplies a potential for black display between an electrode and a counter electrode of a second substrate is disclosed.

  Further, for example, in Patent Document 2, in the first substrate, the first substrate is arranged in the outer peripheral region around the display region so as not to contact the pixel electrode and extends to the vicinity of the outer edge of the outer peripheral region. In the second substrate, the second substrate has a light-transmissive second dimming electrode disposed opposite to the first dimming electrode in the outer peripheral region, and the first substrate has a first electrode regardless of the display state of the display region. A liquid crystal display device that can control the voltage between the first dimming electrode and the second dimming electrode is disclosed. Further, it is shown that the liquid crystal between the dimming electrodes is in a light-shielding state when displaying an image.

  According to Patent Document 1 and Patent Document 2 described above, it is possible to prevent light leakage around the display area.

JP 2002-6328 A JP 2006-343529 A

  However, the light shielding electrode of Patent Document 1 and the first light control electrode of Patent Document 2 are formed in the same layer as the pixel electrode on one substrate, and when the pixel electrode is made of a transparent electrode, the light shielding electrode. It is presumed that the electrode and the first dimming electrode are also transparent electrodes. Therefore, even if a voltage is applied between the light-transmitting counter electrode and the second dimming electrode arranged with the liquid crystal layer sandwiched between these electrodes, black display or liquid crystal layer is blocked, the liquid crystal Depending on the alignment state of the liquid crystal molecules in the layer, there was a risk of slight light leakage.

  Specifically, since the light shielding electrode and the first dimming electrode are formed in the same layer as the pixel electrode, when a horizontal electric field is generated between these electrodes and the pixel electrode, the liquid crystal layer is generated by the horizontal electric field. In this case, the orientation state of the liquid crystal molecules is disturbed, the black display or the light shielding state becomes unstable, and light leakage may occur.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example An electro-optical device according to this application example includes a first substrate having pixel electrodes arranged in a display region, a second substrate having counter electrodes arranged at least over the display region, and the first substrate. A liquid crystal layer sandwiched between one substrate and the second substrate and controlled by an electric field between the pixel electrode and the counter electrode, and surrounding the display region in the peripheral region of the display region of the second substrate The light shielding film is arranged in a layer different from the pixel electrode in the peripheral region of the first substrate and is supplied with a potential for controlling the liquid crystal layer to display black between the counter electrode. And an electrically conductive film.

  According to this application example, light incident from the second substrate side around the display area is shielded by the light shielding film. In addition, since the conductive film in which the liquid crystal layer displays black with respect to the counter electrode is light-blocking, light incident on the conductive film is blocked even if there is a slight light leakage in black display. Further, since the conductive film is arranged in a layer different from that of the pixel electrode, a horizontal electric field hardly occurs between the pixel electrode. That is, it is possible to provide an electro-optical device that can prevent light leakage around the display area.

In the electro-optical device according to the application example, it is preferable that the conductive film is disposed below the pixel electrode on the first substrate via an insulating film.
According to this configuration, generation of a lateral electric field between the conductive film and the pixel electrode can be suppressed.

In the electro-optical device according to the application example described above, it is preferable that the conductive film is supplied with the same potential as the potential of the counter electrode.
According to this configuration, since no electric field is generated between the conductive film and the counter electrode, the alignment state of the liquid crystal molecules in the liquid crystal layer between the conductive film and the counter electrode is stable without being affected by the electric field. Become. That is, black display can be realized in a state where no electric field is generated in the liquid crystal layer.

In the electro-optical device according to the application example, the electro-optical device includes a seal that is disposed between an outer edge of the second substrate and an outer edge of the light-shielding film, and bonds the first substrate and the second substrate. It is characterized by comprising a photo-curing adhesive.
According to this configuration, since the light shielding film is not disposed in the region where the seal is provided, the seal can be reliably cured by irradiating light. On the other hand, since the liquid crystal layer between the seal and the light shielding film displays black, even if there is a gap between the seal and the light shielding film, light leakage from the gap can be prevented.

In the electro-optical device according to the application example described above, it is preferable that the electro-optical device further includes a transparent conductive film disposed in a seal region where the seal is disposed on the first substrate and the peripheral region.
According to this configuration, moisture or the like that has passed through the seal is less likely to be adsorbed on the substrate surface in the peripheral region as compared to the case where the transparent conductive film is not provided in the seal region and the peripheral region. That is, it is possible to suppress the deterioration of reliability quality due to moisture that has passed through the seal.

In the electro-optical device according to the application example, it is preferable that the transparent conductive film is divided at least in the seal region of the first substrate.
According to this configuration, unevenness is generated due to the separation of the transparent conductive film between the seal and the first substrate, so that the adhesion between the seal and the first substrate is improved, so that moisture and the like can enter. It is possible to provide an electro-optical device that is reduced and has high reliability quality.

In the electro-optical device according to the application example, it is preferable that the transparent conductive film is in an electrically floating state.
According to this configuration, since a horizontal electric field is hardly generated between the transparent conductive film and the pixel electrode, a stable black display state can be realized in the liquid crystal layer in the peripheral region.

[Application Example] An electronic apparatus according to this application example includes the electro-optical device according to the application example described above.
According to this application example, it is possible to provide an electronic device having excellent display quality by preventing light leakage in the peripheral region of the display region.

FIG. 2 is a schematic plan view showing a configuration of a liquid crystal device as an electro-optical device. FIG. 2 is a schematic cross-sectional view showing the structure of the liquid crystal device along the line H-H ′ in FIG. 1. FIG. 3 is an equivalent circuit diagram illustrating an electrical configuration of the liquid crystal device. FIG. 4 is a schematic cross-sectional view illustrating a structure of a pixel of a liquid crystal device. FIG. 2 is an essential part cross-sectional view showing a light shielding structure in a peripheral region of the liquid crystal device along the line A-A ′ of FIG. 1. The schematic plan view which shows arrangement | positioning of the transparent conductive film in the peripheral region of a liquid crystal device. Schematic which shows the structure of the projection type display apparatus as an electronic device.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. Note that the drawings to be used are appropriately enlarged or reduced so that the part to be described can be recognized.

  In the present embodiment, an active drive type liquid crystal device including a thin film transistor (TFT) as a switching element for each pixel will be described as an example of an electro-optical device. This liquid crystal device can be suitably used, for example, as light modulation means (liquid crystal light valve) of a projection display device (liquid crystal projector) described later.

(First embodiment)
<Electro-optical device>
First, a liquid crystal device as an electro-optical device according to the present embodiment will be described with reference to FIGS. FIG. 1 is a schematic plan view showing the configuration of a liquid crystal device as an electro-optical device, and FIG. 2 is a schematic cross-sectional view showing the structure of the liquid crystal device along the line HH ′ in FIG. FIG. 3 is an equivalent circuit diagram showing an electrical configuration of the liquid crystal device.

  As shown in FIGS. 1 and 2, a liquid crystal device 100 as an electro-optical device according to the present embodiment includes an element substrate 10 and a counter substrate 20 that are disposed to face each other, and a liquid crystal layer 50 that is sandwiched between the pair of substrates. The liquid crystal panel 110 is provided. As the base material 10s of the element substrate 10 and the base material 20s of the counter substrate 20, for example, transparent quartz substrates or glass substrates are used, respectively. The element substrate 10 corresponds to the first substrate of the present invention, and the counter substrate 20 corresponds to the second substrate of the present invention.

The element substrate 10 is larger than the counter substrate 20, and both the substrates are bonded to each other with a seal 40 disposed along the outer edge of the counter substrate 20. Liquid crystal is injected inside the seal 40 arranged in a frame shape to form a liquid crystal layer 50. The method of injecting the liquid crystal at the above-described interval is, for example, an ODF (One Drop Fill) in which the liquid crystal is dropped inside the seal 40 arranged in a frame shape, and the element substrate 10 and the counter substrate 20 are bonded under reduced pressure. ) Method.
For example, an adhesive such as a thermosetting or ultraviolet curable epoxy resin can be used for the seal 40. In the present embodiment, an ultraviolet curable epoxy resin is employed. The seal 40 is mixed with a spacer (not shown) for keeping the distance between the pair of substrates constant.

  Inside the seal 40, a display area E1 including a plurality of pixels P arranged in a matrix is provided. Further, a parting portion 21 as a light shielding film is provided between the seal 40 and the display area E1 so as to surround the display area E1. The parting portion 21 is made of, for example, a light shielding metal or metal oxide.

  The element substrate 10 is provided with a terminal portion in which a plurality of external connection terminals 104 are arranged. A data line driving circuit 101 is provided between the first side portion along the terminal portion and the seal 40. An inspection circuit 103 is provided between the seal 40 along the second side facing the first side and the display area E1. Further, a scanning line driving circuit 102 is provided between the seal 40 and the display area E1 along the third and fourth sides that are orthogonal to the first side and face each other. A plurality of wirings (not shown) that connect the two scanning line driving circuits 102 are provided between the seal 40 on the second side and the inspection circuit 103.

Wirings (not shown) connected to the data line driving circuit 101 and the scanning line driving circuit 102 are connected to a plurality of external connection terminals 104 arranged along the first side. The arrangement of the inspection circuit 103 is not limited to this, and may be provided at a position along the inside of the seal 40 between the data line driving circuit 101 and the display area E1.
In the following description, the direction along the first side is defined as the X direction, and the direction along the third side is defined as the Y direction. Further, viewing along the direction from the counter substrate 20 side toward the element substrate 10 side is referred to as “plan view” or “planar”.

  As shown in FIG. 2, on the surface of the element substrate 10 on the liquid crystal layer 50 side, a transparent pixel electrode 15 provided for each pixel P and a thin film transistor (hereinafter referred to as TFT) 30 as a switching element. In addition, a signal wiring and an alignment film 18 covering these are formed. Further, the peripheral area E2 between the outer edge of the display area E1 where the pixel electrode 15 is provided and the seal 40 and the seal area E3 where the seal 40 is provided are island-like and electrically independent of each other. A transparent conductive film 16 is provided. The element substrate 10 includes a base material 10s, a pixel electrode 15, a transparent conductive film 16, a TFT 30, a signal wiring, and an alignment film 18 formed on the base material 10s. A detailed configuration of the element substrate 10 will be described later.

  The counter substrate 20 disposed to face the element substrate 10 includes a base material 20s, a parting portion 21 formed on the base material 20s, a planarization layer 22 formed so as to cover the base material 20s, and a planarization layer 22. And a common electrode 23 as a counter electrode provided over substantially the entire surface of the base material 20s, and an alignment film 24 covering the common electrode 23. A region where the parting portion 21 as the light shielding film is provided in the counter substrate 20 is referred to as a parting region E4.

  As shown in FIG. 1, the parting part 21 surrounds the display area E1 and is provided at a position overlapping the scanning line driving circuit 102 and the inspection circuit 103 in plan view. This serves to shield the light incident on these circuits from the counter substrate 20 side and prevent these circuits from malfunctioning due to the light. Further, unnecessary stray light is shielded from entering the display area E1, and high contrast is ensured in the display of the display area E1. Note that there is a slight gap between the outer edge of the display area E1 and the inner edge of the parting area E4 in consideration of the positional accuracy in bonding the element substrate 10 and the counter substrate 20 (see FIG. 1). . Further, as described above, in this embodiment, the seal 40 is formed using an ultraviolet curable epoxy resin, and therefore the parting portion 21 is arranged so as not to overlap the seal 40 in a plan view. Therefore, the position between the inner edge of the seal region E3 and the outer edge of the parting region E4 is slightly in consideration of the positional accuracy in bonding the element substrate 10 and the counter substrate 20 and the ultraviolet curing property of the seal 40. There is a gap (see FIG. 1).

  The planarization layer 22 is made of an inorganic material such as silicon oxide, for example, and is provided so as to cover the parting portion 21 with light transmittance. As a method for forming such a planarizing layer 22, for example, a method of forming a film using a plasma CVD method or the like can be given.

  The common electrode 23 is made of a transparent conductive film such as ITO (Indium Tin Oxide), for example, covers the planarization layer 22 and is electrically connected to the vertical conduction portions 106 provided at the four corners of the counter substrate 20 as shown in FIG. It is connected to the. The vertical conduction part 106 is electrically connected to the wiring on the element substrate 10 side.

  The alignment film 18 that covers the pixel electrode 15 and the alignment film 24 that covers the common electrode 23 are selected based on the optical design of the liquid crystal device 100. The alignment films 18 and 24 are organic materials in which a substantially horizontal alignment process is performed on liquid crystal molecules having positive dielectric anisotropy, for example, by forming an organic material such as polyimide and rubbing the surface thereof. Examples thereof include an alignment film and an inorganic alignment film formed by depositing an inorganic material such as SiOx (silicon oxide) using a vapor phase growth method so that the liquid crystal molecules have a negative dielectric anisotropy and are substantially perpendicularly aligned. .

Such a liquid crystal device 100 is a transmissive type, and is normally white mode in which the transmittance of the pixel P is maximized when no voltage is applied, or normally black in which the transmittance of the pixel P is minimized when no voltage is applied. Modal optical design is adopted. Polarizing elements are arranged and used according to the optical design respectively on the light incident side and the light exit side of the liquid crystal panel 110 including the element substrate 10 and the counter substrate 20.
In the present embodiment, an example in which a normally black mode optical design is applied using the inorganic alignment film described above as the alignment films 18 and 24 and a liquid crystal having negative dielectric anisotropy will be described.

  Next, an electrical configuration of the liquid crystal device 100 will be described with reference to FIG. The liquid crystal device 100 includes a plurality of scanning lines 3 and a plurality of data lines 6 as signal wirings that are insulated and orthogonal to each other at least in the display region E1, and capacitance lines 7 arranged in parallel along the data lines 6. . The direction in which the scanning line 3 extends is the X direction, and the direction in which the data line 6 extends is the Y direction.

  A pixel electrode 15, a TFT 30, and a storage capacitor 31 are provided in a region divided by the scanning line 3, the data line 6, the capacitor line 7, and these signal lines, and these constitute a pixel circuit of the pixel P. doing.

  The scanning line 3 is electrically connected to the gate of the TFT 30, and the data line 6 is electrically connected to the source of the TFT 30. The pixel electrode 15 is electrically connected to the drain of the TFT 30.

  The data line 6 is connected to the data line driving circuit 101 (see FIG. 1), and supplies image signals D1, D2,..., Dn supplied from the data line driving circuit 101 to the pixels P. The scanning line 3 is connected to a scanning line driving circuit 102 (see FIG. 1), and supplies scanning signals SC1, SC2,..., SCm supplied from the scanning line driving circuit 102 to the pixels P.

  The image signals D1 to Dn supplied from the data line driving circuit 101 to the data lines 6 may be supplied line-sequentially in this order, or may be supplied to a plurality of adjacent data lines 6 for each group. Good. The scanning line driving circuit 102 supplies the scanning signals SC <b> 1 to SCm to the scanning line 3 in a pulse-sequential manner at a predetermined timing.

  In the liquid crystal device 100, the TFT 30 which is a switching element is turned on for a certain period by the input of the scanning signals SC1 to SCm, so that the image signals D1 to Dn supplied from the data line 6 are supplied to the pixel electrode 15 at a predetermined timing. It is the structure written in. The predetermined level of image signals D1 to Dn written to the liquid crystal layer 50 via the pixel electrode 15 is held for a certain period between the pixel electrode 15 and the common electrode 23 arranged to face each other via the liquid crystal layer 50. The The frequency of the image signals D1 to Dn is 60 Hz, for example.

  In order to prevent the held image signals D1 to Dn from leaking, a storage capacitor 31 is connected in parallel with a liquid crystal capacitor formed between the pixel electrode 15 and the common electrode 23. The storage capacitor 31 is provided between the drain of the TFT 30 and the capacitor line 7.

  The data line 6 is connected to the inspection circuit 103 shown in FIG. 1, and the operation defect of the liquid crystal device 100 can be confirmed by detecting the image signal in the manufacturing process of the liquid crystal device 100. Although not shown in the equivalent circuit of FIG.

  The peripheral circuit for driving and controlling the pixel circuit in this embodiment includes a data line driving circuit 101, a scanning line driving circuit 102, and an inspection circuit 103. The peripheral circuit includes a sampling circuit that samples the image signal and supplies it to the data line 6, and a precharge circuit that supplies a precharge signal of a predetermined voltage level to the data line 6 prior to the image signal. Also good.

<Pixel structure>
Next, the structure of the pixel P in the liquid crystal device 100 (liquid crystal panel 110) of this embodiment will be described. FIG. 4 is a schematic cross-sectional view illustrating a pixel structure of the liquid crystal device.

  As shown in FIG. 4, the scanning line 3 is first formed on the base material 10 s of the element substrate 10. The scanning line 3 is, for example, a simple metal or alloy containing at least one of metals such as Al (aluminum), Ti (titanium), Cr (chromium), W (tungsten), Ta (tantalum), and Mo (molybdenum). Further, metal silicide, polysilicide, nitride, or a laminate of these can be used and has light shielding properties.

A first insulating film (base insulating film) 11a made of, for example, silicon oxide is formed so as to cover the scanning lines 3, and a semiconductor layer 30a is formed in an island shape on the first insulating film 11a. The semiconductor layer 30a is made of, for example, a polycrystalline silicon film and is doped with impurity ions to have an LDD (Lightly Doped Drain) structure having a first source / drain region, a junction region, a channel region, a junction region, and a second source / drain region. Is formed.
Since the semiconductor layer 30a is provided above the light-shielding scanning line 3, light incident on the semiconductor layer 30a from the substrate 10s side is shielded. Thereby, the optical malfunction of the TFT 30 due to the incident light is prevented.

  A second insulating film (gate insulating film) 11b is formed so as to cover the semiconductor layer 30a. Further, a gate electrode 30g is formed at a position facing the channel region with the second insulating film 11b interposed therebetween.

  A third insulating film 11c is formed so as to cover the gate electrode 30g and the second insulating film 11b, and penetrates the second insulating film 11b and the third insulating film 11c at positions overlapping with respective end portions of the semiconductor layer 30a. Two contact holes CNT1 and CNT2 are formed.

  Then, a light-shielding conductive film such as Al (aluminum), an alloy thereof, or a metal compound is formed to fill the two contact holes CNT1 and CNT2 and cover the third insulating film 11c, and patterning the film. Thus, the data line 6 connected to the first source / drain region via the contact hole CNT1 is formed. At the same time, the first relay electrode 6b connected to the second source / drain region through the contact hole CNT2 is formed.

  Next, the first interlayer insulating film 12 is formed to cover the data line 6, the first relay electrode 6b, and the third insulating film 11c. The first interlayer insulating film 12 is made of, for example, silicon oxide or nitride. Then, a flattening process is performed to flatten the unevenness of the surface caused by covering the region where the TFT 30 is provided. Examples of the planarization method include chemical mechanical polishing (CMP) and spin coating.

  A contact hole CNT3 penetrating the first interlayer insulating film 12 is formed at a position overlapping the first relay electrode 6b. A light-shielding conductive film such as Al (aluminum), an alloy thereof, or a metal compound is formed so as to cover the contact hole CNT3 and the first interlayer insulating film 12, and is patterned to form a first A first capacitor electrode 31a and a second relay electrode 31d are formed.

  Of the first capacitor electrode 31a, the insulating film 13a is patterned and formed so as to cover the outer edge of the portion facing the second capacitor electrode 31b with the dielectric layer 31c formed later. Further, the insulating film 13a is patterned and formed so as to cover the outer edge of the second relay electrode 31d excluding the portion overlapping the contact hole CNT4.

A dielectric layer 31c is formed covering the insulating film 13a and the first capacitor electrode 31a. As the dielectric layer 31c, a silicon nitride film, a single-layer film such as haunium oxide (HfO ₂ ), alumina (Al ₂ O ₃ ), tantalum oxide (Ta ₂ O ₅ ), or at least one of these single-layer films is used. A multilayer film in which two types of single-layer films are stacked may be used. The portion of the dielectric layer 31c that overlaps the second relay electrode 31d in plan view is etched away. A conductive film such as, for example, TiN (titanium nitride) is formed so as to cover the dielectric layer 31c. By patterning the conductive film, the second capacitive electrode is disposed opposite to the first capacitive electrode 31a and connected to the second relay electrode 31d. 31b is formed. The storage capacitor 31 is configured by the dielectric layer 31c, and the first capacitor electrode 31a and the second capacitor electrode 31b that are arranged to face each other with the dielectric layer 31c interposed therebetween.

  Next, a second interlayer insulating film 13b that covers the second capacitor electrode 31b and the dielectric layer 31c is formed. The second interlayer insulating film 13b is also made of, for example, silicon oxide or nitride, and is subjected to planarization processing such as CMP processing. A contact hole CNT4 penetrating through the second interlayer insulating film 13b is formed so as to reach a portion of the second capacitor electrode 31b in contact with the second relay electrode 31d.

  A light-shielding conductive film such as Al (aluminum), an alloy thereof, or a metal compound is formed so as to cover the contact hole CNT4 and the second interlayer insulating film 13b. By patterning this, a wiring 8a is formed. And the third relay electrode 8b electrically connected to the second relay electrode 31d through the contact hole CNT4. The wiring 8a is formed so as to overlap the semiconductor layer 30a, the data line 6, and the storage capacitor 31 of the TFT 30 in a plan view, and functions as a shield layer when a fixed potential is applied.

  A third interlayer insulating film 14 is formed so as to cover the wiring 8a and the third relay electrode 8b. The third interlayer insulating film 14 can also be formed using, for example, silicon oxide, nitride, or oxynitride. A contact hole CNT5 that penetrates through the third interlayer insulating film 14 and reaches the third relay electrode 8b is formed.

  A transparent conductive film (electrode film) such as ITO is formed so as to cover the contact hole CNT5 and cover the third interlayer insulating film. The transparent conductive film (electrode film) is patterned to form a pixel electrode 15 that is electrically connected to the third relay electrode 8b through the contact hole CNT5.

  The third relay electrode 8b is electrically connected to the second source / drain region of the TFT 30 through the contact hole CNT4, the second capacitor electrode 31b, the second relay electrode 31d, the contact hole CNT3, and the first relay electrode 6b. The pixel electrode 15 is electrically connected through the contact hole CNT5.

  The first capacitor electrode 31a is formed so as to straddle a plurality of pixels P, and functions as the capacitor line 7 in the equivalent circuit (see FIG. 3). A fixed potential is applied to the first capacitor electrode 31a. Thereby, the potential applied to the pixel electrode 15 via the second source / drain region of the TFT 30 can be held between the first capacitor electrode 31a and the second capacitor electrode 31b.

  As described above, a plurality of wirings are formed on the base material 10 s of the element substrate 10, and the wiring layers are represented by using the reference numerals of insulating films and interlayer insulating films that insulate the wirings. That is, the first insulating film 11a, the second insulating film 11b, and the third insulating film 11c are collectively referred to as the wiring layer 11. A typical wiring of the wiring layer 11 is the scanning line 3. A typical wiring of the wiring layer 12 is the data line 6. The insulating film 13a and the second interlayer insulating film 13b are collectively referred to as a wiring layer 13, and a typical wiring is the first capacitor electrode 31a, that is, the capacitor line 7. Similarly, the representative wiring of the wiring layer 14 is the wiring 8a (shield layer).

  An alignment film 18 is formed so as to cover the pixel electrode 15, and an alignment film 24 is formed so as to cover the common electrode 23 of the counter substrate 20 disposed to face the element substrate 10 with the liquid crystal layer 50 interposed therebetween. As described above, the alignment films 18 and 24 are inorganic alignment films, and are made of an aggregate of columns 18a and 24a grown in a columnar shape by, for example, oblique deposition of an inorganic material such as silicon oxide from a predetermined direction. The liquid crystal molecules LC having negative dielectric anisotropy with respect to the alignment films 18 and 24 have a pretilt angle of 3 to 5 degrees in the inclination direction of the columns 18a and 24a with respect to the normal direction of the alignment film surface. Substantially vertical alignment (VA) with θp. By applying an alternating voltage (drive signal) between the pixel electrode 15 and the common electrode 23 to drive the liquid crystal layer 50, the liquid crystal molecules LC are inclined in the direction of the electric field generated between the pixel electrode 15 and the common electrode 23. Behaves (vibrates).

<Shading structure in the surrounding area>
Next, a light shielding structure in the peripheral region E2 of the liquid crystal device 100 (liquid crystal panel 110) of the present embodiment will be described with reference to FIGS. FIG. 5 is a principal cross-sectional view showing a light shielding structure in the peripheral region of the liquid crystal device along the line AA ′ in FIG. 1, and FIG. 6 is a schematic plan view showing the arrangement of the transparent conductive film in the peripheral region of the liquid crystal device. .

  The liquid crystal device 100 (liquid crystal panel 110) of the present embodiment has a configuration for preventing light incident from the counter substrate 20 side from leaking from the element substrate 10 side in the peripheral region E2 other than the display region E1. doing.

  Specifically, as shown in FIG. 5, in the wiring layer 14 of the element substrate 10, a light-shielding conductive film 8 is provided in the same layer as the third relay electrode 8b. The conductive film 8 can be formed using, for example, Al (aluminum), an alloy thereof, or a metal compound. In this embodiment, the light shielding layer is formed by laminating a light absorbing TiN film on a light reflecting Al film. Is used. A part of the conductive film 8 covers the seal region E3 and is disposed over the peripheral region E2. Further, when display is performed in the display region E1, the conductive film 8 is supplied with the same potential as the potential (LCCOM potential) applied to the common electrode 23 of the counter substrate 20. Thereby, since a potential difference, that is, an electric field does not occur between the conductive film 8 and the common electrode 23, the liquid crystal molecules LC in the peripheral region E2 are in a substantially vertical alignment state. That is, the liquid crystal layer 50 in the peripheral region E2 is normally black (black display).

  In the peripheral region E2 of the counter substrate 20, a parting portion 21 as a light shielding film is provided. The conductive film 8 and the parting portion 21 of the element substrate 10 are disposed to face each other with the liquid crystal layer 50 interposed therebetween in plan view. There are gaps between the outer edge of the display area E1 and the inner edge of the parting area E4 where the parting part 21 is provided, and between the inner edge of the sealing area E3 where the seal 40 is provided and the outer edge of the parting area E4.

  In such a liquid crystal panel 110, not only light directly incident on the parting portion 21 from the counter substrate 20 side but also light L1 incident on the display region E1 from an oblique direction and directed toward the parting portion 21 is also parted. The light is shielded by the unit 21. Further, the light L2 that enters the display region E1 from the opposite substrate 20 side in an oblique direction, passes through the liquid crystal layer 50, and travels toward the conductive film 8 is shielded by the conductive film 8. Further, the light L3 that is incident on the display area E1 from the opposite substrate 20 side and is transmitted through the liquid crystal layer 50 in the peripheral area E2 has the liquid crystal molecules LC in the liquid crystal layer 50 in a substantially vertical alignment state. It is difficult for the liquid crystal layer 50 to pass through. Furthermore, the light L4 that has entered the gap between the inner edge of the seal area E3 and the outer edge of the parting area E4 from the counter substrate 20 side is transmitted through the liquid crystal layer 50 because the liquid crystal molecules LC in the liquid crystal layer 50 are in a substantially vertical alignment state. It is hard to do. In addition, even if the light L4 passes through the liquid crystal layer 50, it is shielded by the conductive film 8.

  On the base material 10s, a scanning line driving circuit 102 is provided in the lower layer of the conductive film 8, that is, in the peripheral region E2. Accordingly, a power supply wiring (not shown in FIG. 5) for supplying a power supply voltage (DC potential) to the scanning line driving circuit 102 is also provided in the peripheral region E2. If there is no conductive film 8 to which the LCCOM potential is supplied, the potential difference between the power supply wiring and the common electrode 23 disturbs the substantially vertical alignment state of the liquid crystal molecules LC and causes the liquid crystal layer 50 to be electrolyzed. As a result, the liquid crystal layer 50 may be deteriorated. On the other hand, since no potential difference occurs between the conductive film 8 to which the LCCOM potential is supplied and the common electrode 23, the substantially vertical alignment state of the liquid crystal molecules LC is maintained and the liquid crystal layer 50 is not deteriorated. Note that FIG. 5 illustrates a portion of the peripheral region E2 in which the scanning line driving circuit 102 is provided. However, such an arrangement of the conductive film 8 is arranged in the peripheral region E2 in which the scanning line driving circuit 102 is provided. The same applies not only to the portion but also to the peripheral region E2 in the region where the inspection circuit 103 is provided, and in the region where the scanning line driving circuit 102 and the inspection circuit 103 are not provided.

  A transparent conductive film 16 is provided in the same layer as the pixel electrode 15 on the wiring layer 14 provided with the conductive film 8. The transparent conductive film 16 includes a first transparent conductive film 16a disposed in the peripheral region E2 and a second transparent conductive film 16b disposed in the seal region E3. For the transparent conductive film 16, for example, an ITO film is used in the same manner as the pixel electrode 15. By patterning and dividing the ITO film formed on the third interlayer insulating film 14, the pixel electrode 15, the first transparent conductive film 16a, and the second transparent conductive film 16b are formed.

  Specifically, as shown in FIG. 6, the pixel electrodes 15 are square in a plan view, and are arranged in a matrix in the X direction and the Y direction in the display area E1. The first transparent conductive film 16a has, for example, a square shape in plan view, and is arranged in a matrix in the X direction and the Y direction in the peripheral region E2. The size of the first transparent conductive film 16 a is smaller than the size of the pixel electrode 15. Further, the interval d2 between the first transparent conductive films 16a adjacent in the X direction and the Y direction is larger than the interval d1 between the pixel electrodes 15 adjacent in the X direction and the Y direction. Therefore, it is easy to pattern the electrically independent first transparent conductive film 16a in the peripheral region E2.

  The second transparent conductive film 16b has, for example, a square shape in plan view, and is arranged in a matrix in the X direction and the Y direction in the seal region E3. The size of the second transparent conductive film 16b is even smaller than the size of the first transparent conductive film 16a. Therefore, as shown in FIG. 5, in the element substrate 10, the surface of the alignment film 18 in the seal region E <b> 3 is in a state where fine irregularities are generated as compared with other portions, and therefore the seal 40 is disposed in the seal region E <b> 3. Thus, when the element substrate 10 and the counter substrate 20 are bonded together, the adhesion (adhesiveness) between the seal 40 and the element substrate 10 is improved. This makes it difficult for moisture and the like to enter the liquid crystal layer 50 from the interface between the seal 40 and the element substrate 10.

  In addition, the shape of the first transparent conductive film 16a and the second transparent conductive film 16b in plan view is not limited to a square, and both may be in an electrically floating state, and may be formed in, for example, a stripe shape. Further, the first transparent conductive film 16a disposed in the peripheral region E2 may have a solid shape, but the first transparent conductive film 16a may be formed by dividing and patterning the ITO film as shown in FIG. Unevenness occurs on the surface of the alignment film 18 to be covered. Thereby, by performing display in the display region E1, when ionic impurities or the like contained in the liquid crystal layer 50 are swept to the peripheral region E2, the swept impurities are easily retained in the peripheral region E2. In other words, the impurities swept to the peripheral region E2 are difficult to diffuse again into the display region E1, and the impurities are less likely to affect the display.

According to the liquid crystal device 100 (liquid crystal panel 110) of the first embodiment, the following effects can be obtained.
(1) Lights L2 and L3 that are incident on the display area E1 from the opposite substrate 20 side in an oblique direction and reach the peripheral area E2 have the liquid crystal molecules LC in the liquid crystal layer 50 in the peripheral area E2 in a substantially vertical alignment state. Therefore, even if the liquid crystal layer 50 is transmitted, it is shielded by the light-shielding conductive film 8 provided in the wiring layer 14. In addition, for the same reason, the light L4 incident from the gap between the inner edge of the seal area E3 and the outer edge of the parting area E4 is also difficult to transmit through the liquid crystal layer 50, and even if it passes through the liquid crystal layer 50, the light shielding provided in the wiring layer 14 Is shielded from light by the conductive film 8. That is, the light incident from the counter substrate 20 side does not leak from the element substrate 10 side in the peripheral region E2. Therefore, it is possible to provide the liquid crystal device 100 having excellent display quality that can prevent light leakage and display with high contrast in the display region E1.

  (2) Since the conductive film 8 is provided in the wiring layer 14 below the pixel electrode 15, a horizontal electric field is hardly generated between the conductive film 8 and the pixel electrode 15 even when an LCCOM potential is applied to the conductive film 8. That is, since the alignment state of the liquid crystal molecules LC in the peripheral region E2 is not easily disturbed by the lateral electric field with the pixel electrode 15, the light shielding property in the peripheral region E2 can be maintained.

  (3) In the seal region E3 of the element substrate 10, a plurality of second transparent conductive films 16b are provided. As a result, fine irregularities are formed on the surface of the alignment film 18 covering the plurality of second transparent conductive films 16b, so that the adhesion (adhesiveness) between the seal 40 and the element substrate 10 is improved. In addition, since the first transparent conductive film 16a is disposed in the peripheral region E2, exposure of the surface of the third interlayer insulating film 14 made of a silicon compound that easily adsorbs moisture or the like is suppressed. Therefore, it becomes difficult for moisture or the like to enter the liquid crystal layer 50 from the interface between the seal 40 and the element substrate 10, and the liquid crystal device 100 having improved durability in addition to the light shielding property of the peripheral region E 2 can be provided. Further, since the first transparent conductive film 16a is in an electrically floating state, the first transparent conductive film 16a does not hinder the substantially vertical alignment state of the liquid crystal molecules LC in the peripheral region E2, that is, normally black (black display).

  (4) In the counter substrate 20, the parting portion 21 as a light shielding film is arranged so as not to overlap the seal 40 (seal region E3) in plan view. In the element substrate 10, the conductive film 8 is disposed so as to partially overlap the seal 40 (seal region E <b> 3) in plan view. Therefore, even if the photocurable seal 40 is used, the seal 40 can be reliably cured by irradiating light from the element substrate 10 side, the counter substrate 20 side, or both. That is, the conductive film 8 and the parting portion 21 can prevent light leakage in the peripheral region E2 without hindering photocuring in the photocurable seal 40.

(Second Embodiment)
Next, a projection display device will be described as an example of the electronic apparatus of the present embodiment. FIG. 7 is a schematic diagram illustrating a configuration of a projection display device as an electronic apparatus.

  As shown in FIG. 7, a projection display apparatus 1000 as an electronic apparatus according to the present embodiment includes a polarization illumination apparatus 1100 arranged along the system optical axis L, and two dichroic mirrors 1104 and 1105 as light separation elements. Three reflection mirrors 1106, 1107, 1108, five relay lenses 1201, 1202, 1203, 1204, 1205, three transmissive liquid crystal light valves 1210, 1220, 1230 as light modulation means, and a light combining element As a cross dichroic prism 1206 and a projection lens 1207.

  The polarized light illumination device 1100 is generally configured by a lamp unit 1101 as a light source composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

  The dichroic mirror 1104 reflects red light (R) and transmits green light (G) and blue light (B) among the polarized light beams emitted from the polarization illumination device 1100. Another dichroic mirror 1105 reflects the green light (G) transmitted through the dichroic mirror 1104 and transmits the blue light (B).

The red light (R) reflected by the dichroic mirror 1104 is reflected by the reflection mirror 1106 and then enters the liquid crystal light valve 1210 via the relay lens 1205.
Green light (G) reflected by the dichroic mirror 1105 enters the liquid crystal light valve 1220 via the relay lens 1204.
The blue light (B) transmitted through the dichroic mirror 1105 enters the liquid crystal light valve 1230 via a light guide system including three relay lenses 1201, 1202, 1203 and two reflection mirrors 1107, 1108.

  The liquid crystal light valves 1210, 1220, and 1230 are disposed to face the incident surfaces of the cross dichroic prism 1206 for each color light. The color light incident on the liquid crystal light valves 1210, 1220, and 1230 is modulated based on video information (video signal) and emitted toward the cross dichroic prism 1206. In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. The three color lights are synthesized by these dielectric multilayer films, and the light representing the color image is synthesized. The synthesized light is projected on the screen 1300 by the projection lens 1207 which is a projection optical system, and the image is enlarged and displayed.

  The liquid crystal light valve 1210 is the one to which the liquid crystal device 100 of the first embodiment described above is applied. A pair of polarizing elements arranged in crossed Nicols are arranged with a gap between the color light incident side and the emission side of the liquid crystal panel 110. The same applies to the other liquid crystal light valves 1220 and 1230.

  According to such a projection type display device 1000, since the liquid crystal device 100 is used as the liquid crystal light valves 1210, 1220, and 1230, the light leakage in the peripheral region E2 surrounding the display region E1 is improved and excellent. A projection type display device 1000 having display quality can be provided.

  The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit or idea of the invention that can be read from the claims and the entire specification. Electronic equipment to which the electro-optical device is applied is also included in the technical scope of the present invention. Various modifications other than the above embodiment are conceivable. Hereinafter, a modification will be described.

  (Modification 1) The conductive film 8 for preventing light leakage in the peripheral region E2 is not limited to being provided in the wiring layer 14 below the pixel electrode 15, and is divided into, for example, the wiring layer 13 and the wiring layer 14. It may be arranged.

  (Modification 2) The display area E1 in which the plurality of pixels P (pixel electrodes 15) are arranged may include a plurality of dummy pixels arranged so as to surround the plurality of pixels P contributing to display. A potential is applied to the pixel electrode 15 of the dummy pixel so that the dummy pixel is in a normally black display state when display is performed in the plurality of pixels P. According to this, it is possible to further reduce light leakage in the gap between the outer edge of the display area E1 and the inner edge of the parting area E4.

  (Modification 3) The electronic apparatus to which the liquid crystal device 100 as an electro-optical device is applied is not limited to the projection display device 1000 of the second embodiment. For example, projection-type HUD (head-up display), direct-view type HMD (head-mounted display), electronic book, personal computer, digital still camera, LCD TV, viewfinder type or monitor direct-view type video recorder, car navigation system It can be suitably used as a display unit of an information terminal device such as an electronic notebook or POS.

  DESCRIPTION OF SYMBOLS 8 ... Conductive film, 10 ... Element board | substrate as 1st board | substrate, 15 ... Pixel electrode, 16 ... Transparent conductive film, 20 ... Counter substrate as 2nd board | substrate, 21 ... Parting part as light shielding film, 23 ... As counter electrode Common electrode, 40 ... seal, 50 ... liquid crystal layer, 100 ... liquid crystal device as electro-optical device, 1000 ... projection type display device as electronic equipment, E1 ... display region, E2 ... peripheral region, E3 ... seal region.

Claims (8)

A first substrate having a pixel electrode disposed in a display area;
A second substrate having a counter electrode disposed over at least the display region;
A liquid crystal layer sandwiched between the first substrate and the second substrate and controlled by an electric field between the pixel electrode and the counter electrode;
A light-shielding film disposed so as to surround the display region in a peripheral region of the display region of the second substrate;
A light-shielding conductive film disposed in a layer different from the pixel electrode in the peripheral region of the first substrate and supplied with a potential for controlling the liquid crystal layer to display black between the counter electrode. An electro-optical device.   2. The electro-optical device according to claim 1, wherein the conductive film is disposed below the pixel electrode in the first substrate via an insulating film.   The electro-optical device according to claim 1, wherein the conductive film is supplied with the same potential as the potential of the counter electrode. A seal disposed between an outer edge of the second substrate and an outer edge of the light-shielding film, and bonding the first substrate and the second substrate;
The electro-optical device according to claim 1, wherein the seal is made of a photo-curing adhesive.   The electro-optical device according to claim 4, further comprising a transparent conductive film disposed in a seal region where the seal of the first substrate is disposed and the peripheral region.   The electro-optical device according to claim 5, wherein the transparent conductive film is divided at least in the seal region of the first substrate.   The electro-optical device according to claim 5, wherein the transparent conductive film is in an electrically floating state.   An electronic apparatus comprising the electro-optical device according to claim 1.

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