JP5923442B2 - 再生リング共振器 - Google Patents

再生リング共振器 Download PDF

Info

Publication number
JP5923442B2
JP5923442B2 JP2012502124A JP2012502124A JP5923442B2 JP 5923442 B2 JP5923442 B2 JP 5923442B2 JP 2012502124 A JP2012502124 A JP 2012502124A JP 2012502124 A JP2012502124 A JP 2012502124A JP 5923442 B2 JP5923442 B2 JP 5923442B2
Authority
JP
Japan
Prior art keywords
laser beam
discharge chamber
laser
profile
optical coupler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012502124A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012522376A5 (enExample
JP2012522376A (ja
Inventor
ホン イー
ホン イー
サンドストロム　リチャード　エル
リチャード エル サンドストロム
スラヴァ ロキツキ
スラヴァ ロキツキ
ダニエル ジェイ ダブリュー ブラウン
ダニエル ジェイ ダブリュー ブラウン
ロバート ジェイ ラファック
ロバート ジェイ ラファック
Original Assignee
サイマー リミテッド ライアビリティ カンパニー
サイマー リミテッド ライアビリティ カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by サイマー リミテッド ライアビリティ カンパニー, サイマー リミテッド ライアビリティ カンパニー filed Critical サイマー リミテッド ライアビリティ カンパニー
Publication of JP2012522376A publication Critical patent/JP2012522376A/ja
Publication of JP2012522376A5 publication Critical patent/JP2012522376A5/ja
Application granted granted Critical
Publication of JP5923442B2 publication Critical patent/JP5923442B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/0804—Transverse or lateral modes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08072—Thermal lensing or thermally induced birefringence; Compensation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/083—Ring lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10084—Frequency control by seeding
    • H01S3/10092—Coherent seed, e.g. injection locking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/0804—Transverse or lateral modes
    • H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08081—Unstable resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/083—Ring lasers
    • H01S3/0835—Gas ring lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1053—Control by pressure or deformation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/235—Regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP2012502124A 2009-03-27 2010-03-18 再生リング共振器 Active JP5923442B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US41334109A 2009-03-27 2009-03-27
US16429709P 2009-03-27 2009-03-27
US12/413,341 2009-03-27
US61/164,297 2009-03-27
US12/724,681 US8014432B2 (en) 2009-03-27 2010-03-16 Regenerative ring resonator
US12/724,681 2010-03-16
PCT/US2010/027842 WO2010111119A1 (en) 2009-03-27 2010-03-18 Regenerative ring resonator

Publications (3)

Publication Number Publication Date
JP2012522376A JP2012522376A (ja) 2012-09-20
JP2012522376A5 JP2012522376A5 (enExample) 2013-05-09
JP5923442B2 true JP5923442B2 (ja) 2016-05-24

Family

ID=42781411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012502124A Active JP5923442B2 (ja) 2009-03-27 2010-03-18 再生リング共振器

Country Status (6)

Country Link
US (1) US8014432B2 (enExample)
EP (1) EP2412067A4 (enExample)
JP (1) JP5923442B2 (enExample)
KR (1) KR101548286B1 (enExample)
TW (1) TWI553978B (enExample)
WO (1) WO2010111119A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
CN102810810A (zh) 2012-03-02 2012-12-05 中国科学院光电研究院 单腔双电极放电腔及准分子激光器
US8563956B1 (en) * 2012-07-28 2013-10-22 Cymer, Llc Intracavity loss element for power amplifier
US8853657B2 (en) 2012-07-28 2014-10-07 Cymer, Llc Intracavity loss element for power amplifier
JP2014126567A (ja) * 2012-12-25 2014-07-07 Okamoto Kogaku Kakosho:Kk 赤外固体レーザー発振装置
WO2014121844A1 (en) * 2013-02-08 2014-08-14 Carl Zeiss Laser Optics Gmbh Beam reverser module and optical power amplifier having such a beam reverser module
US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
WO2015111219A1 (ja) * 2014-01-27 2015-07-30 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
KR102116021B1 (ko) * 2015-02-25 2020-05-29 콴타 시스템 에스.피.에이. 서브-나노초 지속기간의 레이저 펄스들을 생성하기 위한 레이저 시스템
KR102070141B1 (ko) * 2015-07-22 2020-01-28 아카데미 오브 옵토-일렉트로닉스, 차이니즈 아카데미 오브 사이언시스 환형 챔버 구조를 가지는 엑시머 레이저 시스템
US9945730B2 (en) 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
US10451890B2 (en) 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
KR102366148B1 (ko) 2017-09-25 2022-02-23 사이머 엘엘씨 가스 방전 광원에서의 불소 검출 방법
CN108535735A (zh) * 2018-04-13 2018-09-14 长春理工大学 用于室内可连续调节的距离模拟装置
US20240283210A1 (en) * 2021-07-15 2024-08-22 Cymer, Llc Pulsed power systems with controlled reactor reset
DE102023135987B4 (de) * 2023-12-20 2025-10-30 Carl Zeiss Smt Gmbh Laserlichtquelle, insbesondere zur Verwendung in einer mikrolithographischen Projektionsbelichtungsanlage

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5557630A (en) * 1995-01-13 1996-09-17 Scaggs; Michael J. Unstable laser resonator
JPH10303480A (ja) * 1997-04-24 1998-11-13 Amada Eng Center:Kk 固体レーザー発振器
US5856991A (en) 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6496528B2 (en) 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6356576B1 (en) 1999-11-29 2002-03-12 Cymer, Inc. Deep ultraviolet catadioptric anamorphic telescope
US6904073B2 (en) 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6912052B2 (en) 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US7230964B2 (en) 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US7154928B2 (en) 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
JP2004039767A (ja) * 2002-07-02 2004-02-05 Gigaphoton Inc Ｍｏｐａ式又は注入同期式レーザ装置
JP4162936B2 (ja) 2002-07-15 2008-10-08 サイバーレーザー株式会社 レーザー共振器及び調節方法
US20040202220A1 (en) 2002-11-05 2004-10-14 Gongxue Hua Master oscillator-power amplifier excimer laser system
WO2004095661A1 (ja) 2003-04-22 2004-11-04 Komatsu Ltd. 露光用２ステ－ジレ－ザ装置
WO2004100328A1 (en) 2003-05-07 2004-11-18 Federalnoye Gosudarstvennoye Unitarnoye Predpriyatiye Nauchno-Proizvodstvennaya Korporatsiya Gosudarstvenniy Opticheskiy Institut Imeni S. I. Vavilova Laser with hybrid-unstable ring resonator
US7184204B2 (en) 2003-07-01 2007-02-27 Lambda Physik Ag Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
JP4367836B2 (ja) * 2003-12-04 2009-11-18 株式会社小松製作所 Ｍｏｐｏ方式２ステージレーザ装置
US7087914B2 (en) 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7366219B2 (en) 2004-11-30 2008-04-29 Cymer, Inc. Line narrowing module
JP2006203008A (ja) * 2005-01-21 2006-08-03 Komatsu Ltd ２ステージレーザシステム
JP2007027624A (ja) * 2005-07-21 2007-02-01 Komatsu Ltd ２ステージ狭帯域化レーザ装置
US7630424B2 (en) 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
EP1952493A4 (en) 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7999915B2 (en) 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7920616B2 (en) 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7715459B2 (en) 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
JP4818871B2 (ja) * 2006-10-20 2011-11-16 株式会社小松製作所 レーザ装置
JP4804313B2 (ja) * 2006-11-17 2011-11-02 株式会社小松製作所 露光装置用狭帯域レーザ装置
US7643528B2 (en) * 2007-09-20 2010-01-05 Cymer, Inc. Immersion lithography laser light source with pulse stretcher

Also Published As

Publication number Publication date
TW201104988A (en) 2011-02-01
WO2010111119A1 (en) 2010-09-30
US8014432B2 (en) 2011-09-06
KR20120003464A (ko) 2012-01-10
KR101548286B1 (ko) 2015-08-28
EP2412067A1 (en) 2012-02-01
EP2412067A4 (en) 2015-06-24
TWI553978B (zh) 2016-10-11
JP2012522376A (ja) 2012-09-20
US20110069733A1 (en) 2011-03-24

Similar Documents

Publication Publication Date Title
JP5923442B2 (ja) 再生リング共振器
US7760788B2 (en) Bandwidth-limited and long pulse master oscillator power oscillator laser systems
US7184204B2 (en) Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
US7227881B2 (en) Master oscillator—power amplifier excimer laser system
JP5506194B2 (ja) レーザシステム
JP6054452B2 (ja) 超高パワーレーザチャンバの光学的改善
US8624209B1 (en) Controlling spatial properties in an excimer ring amplifier
JPH09509010A (ja) 熱的に誘起された複屈折によるレーザビームの減偏光を最小化する装置
JP2005525001A5 (enExample)
JP2005525001A (ja) ビーム伝達及びビーム照準制御を備えるリソグラフィレーザ
JP7103082B2 (ja) 固体レーザ装置
JP2019507501A (ja) 光アイソレータを備えたドライバレーザ装置および該ドライバレーザ装置を備えたｅｕｖビーム生成装置
JP5981652B2 (ja) 電力増幅器向けの共振器内損失要素
CN111326944A (zh) 调q固体激光器
CN119072655A (zh) 具有紫外线损伤减轻的激光频率转换
USRE45957E1 (en) Regenerative ring resonator
KR102581593B1 (ko) 가스 레이저 증폭기, 가스 레이저 장치, euv 광 발생 장치 및 euv 노광 장치
JPH0423480A (ja) 狭帯域レーザ装置
JP2009026932A (ja) 露光用狭帯域レーザ装置
WO2024227820A1 (en) Excimer laser with improved beam uniformity and stability

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130318

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130318

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131227

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140129

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140428

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140508

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140529

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140605

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140630

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20140703

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140707

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140729

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150107

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20150407

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150507

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20150622

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20150714

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151203

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160209

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160322

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160418

R150 Certificate of patent or registration of utility model

Ref document number: 5923442

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250