JP2012522376A5 - - Google Patents

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Publication number
JP2012522376A5
JP2012522376A5 JP2012502124A JP2012502124A JP2012522376A5 JP 2012522376 A5 JP2012522376 A5 JP 2012522376A5 JP 2012502124 A JP2012502124 A JP 2012502124A JP 2012502124 A JP2012502124 A JP 2012502124A JP 2012522376 A5 JP2012522376 A5 JP 2012522376A5
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JP
Japan
Prior art keywords
laser beam
laser
profile
ring resonator
discharge chamber
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JP2012502124A
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English (en)
Japanese (ja)
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JP5923442B2 (ja
JP2012522376A (ja
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Priority claimed from US12/724,681 external-priority patent/US8014432B2/en
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Publication of JP2012522376A publication Critical patent/JP2012522376A/ja
Publication of JP2012522376A5 publication Critical patent/JP2012522376A5/ja
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Publication of JP5923442B2 publication Critical patent/JP5923442B2/ja
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JP2012502124A 2009-03-27 2010-03-18 再生リング共振器 Active JP5923442B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US41334109A 2009-03-27 2009-03-27
US16429709P 2009-03-27 2009-03-27
US12/413,341 2009-03-27
US61/164,297 2009-03-27
US12/724,681 US8014432B2 (en) 2009-03-27 2010-03-16 Regenerative ring resonator
US12/724,681 2010-03-16
PCT/US2010/027842 WO2010111119A1 (en) 2009-03-27 2010-03-18 Regenerative ring resonator

Publications (3)

Publication Number Publication Date
JP2012522376A JP2012522376A (ja) 2012-09-20
JP2012522376A5 true JP2012522376A5 (enExample) 2013-05-09
JP5923442B2 JP5923442B2 (ja) 2016-05-24

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ID=42781411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012502124A Active JP5923442B2 (ja) 2009-03-27 2010-03-18 再生リング共振器

Country Status (6)

Country Link
US (1) US8014432B2 (enExample)
EP (1) EP2412067A4 (enExample)
JP (1) JP5923442B2 (enExample)
KR (1) KR101548286B1 (enExample)
TW (1) TWI553978B (enExample)
WO (1) WO2010111119A1 (enExample)

Families Citing this family (16)

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Publication number Priority date Publication date Assignee Title
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
CN102810810A (zh) 2012-03-02 2012-12-05 中国科学院光电研究院 单腔双电极放电腔及准分子激光器
US8563956B1 (en) * 2012-07-28 2013-10-22 Cymer, Llc Intracavity loss element for power amplifier
US8853657B2 (en) 2012-07-28 2014-10-07 Cymer, Llc Intracavity loss element for power amplifier
JP2014126567A (ja) * 2012-12-25 2014-07-07 Okamoto Kogaku Kakosho:Kk 赤外固体レーザー発振装置
WO2014121844A1 (en) * 2013-02-08 2014-08-14 Carl Zeiss Laser Optics Gmbh Beam reverser module and optical power amplifier having such a beam reverser module
US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
WO2015111219A1 (ja) * 2014-01-27 2015-07-30 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
KR102116021B1 (ko) * 2015-02-25 2020-05-29 콴타 시스템 에스.피.에이. 서브-나노초 지속기간의 레이저 펄스들을 생성하기 위한 레이저 시스템
KR102070141B1 (ko) * 2015-07-22 2020-01-28 아카데미 오브 옵토-일렉트로닉스, 차이니즈 아카데미 오브 사이언시스 환형 챔버 구조를 가지는 엑시머 레이저 시스템
US9945730B2 (en) 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
US10451890B2 (en) 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
KR102366148B1 (ko) 2017-09-25 2022-02-23 사이머 엘엘씨 가스 방전 광원에서의 불소 검출 방법
CN108535735A (zh) * 2018-04-13 2018-09-14 长春理工大学 用于室内可连续调节的距离模拟装置
US20240283210A1 (en) * 2021-07-15 2024-08-22 Cymer, Llc Pulsed power systems with controlled reactor reset
DE102023135987B4 (de) * 2023-12-20 2025-10-30 Carl Zeiss Smt Gmbh Laserlichtquelle, insbesondere zur Verwendung in einer mikrolithographischen Projektionsbelichtungsanlage

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