TWI553978B - 再生環型共振器 - Google Patents
再生環型共振器 Download PDFInfo
- Publication number
- TWI553978B TWI553978B TW099109123A TW99109123A TWI553978B TW I553978 B TWI553978 B TW I553978B TW 099109123 A TW099109123 A TW 099109123A TW 99109123 A TW99109123 A TW 99109123A TW I553978 B TWI553978 B TW I553978B
- Authority
- TW
- Taiwan
- Prior art keywords
- laser beam
- laser
- optical
- discharge chamber
- ring resonator
- Prior art date
Links
- 230000001172 regenerating effect Effects 0.000 title claims description 77
- 230000003287 optical effect Effects 0.000 claims description 188
- 230000003750 conditioning effect Effects 0.000 claims description 14
- 230000001902 propagating effect Effects 0.000 claims description 14
- 238000005286 illumination Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims 6
- 230000008929 regeneration Effects 0.000 claims 1
- 238000011069 regeneration method Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 16
- 238000004458 analytical method Methods 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 230000003252 repetitive effect Effects 0.000 description 7
- 238000001459 lithography Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 210000000887 face Anatomy 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 101100456571 Mus musculus Med12 gene Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08072—Thermal lensing or thermally induced birefringence; Compensation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/083—Ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10084—Frequency control by seeding
- H01S3/10092—Coherent seed, e.g. injection locking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
- H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08081—Unstable resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/083—Ring lasers
- H01S3/0835—Gas ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1053—Control by pressure or deformation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/235—Regenerative amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41334109A | 2009-03-27 | 2009-03-27 | |
| US16429709P | 2009-03-27 | 2009-03-27 | |
| US12/724,681 US8014432B2 (en) | 2009-03-27 | 2010-03-16 | Regenerative ring resonator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201104988A TW201104988A (en) | 2011-02-01 |
| TWI553978B true TWI553978B (zh) | 2016-10-11 |
Family
ID=42781411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099109123A TWI553978B (zh) | 2009-03-27 | 2010-03-26 | 再生環型共振器 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8014432B2 (enExample) |
| EP (1) | EP2412067A4 (enExample) |
| JP (1) | JP5923442B2 (enExample) |
| KR (1) | KR101548286B1 (enExample) |
| TW (1) | TWI553978B (enExample) |
| WO (1) | WO2010111119A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| CN102810810A (zh) | 2012-03-02 | 2012-12-05 | 中国科学院光电研究院 | 单腔双电极放电腔及准分子激光器 |
| US8563956B1 (en) * | 2012-07-28 | 2013-10-22 | Cymer, Llc | Intracavity loss element for power amplifier |
| US8853657B2 (en) | 2012-07-28 | 2014-10-07 | Cymer, Llc | Intracavity loss element for power amplifier |
| JP2014126567A (ja) * | 2012-12-25 | 2014-07-07 | Okamoto Kogaku Kakosho:Kk | 赤外固体レーザー発振装置 |
| WO2014121844A1 (en) * | 2013-02-08 | 2014-08-14 | Carl Zeiss Laser Optics Gmbh | Beam reverser module and optical power amplifier having such a beam reverser module |
| US8624209B1 (en) * | 2013-03-14 | 2014-01-07 | Cymer, Llc | Controlling spatial properties in an excimer ring amplifier |
| WO2015111219A1 (ja) * | 2014-01-27 | 2015-07-30 | ギガフォトン株式会社 | レーザ装置、及び極端紫外光生成システム |
| KR102116021B1 (ko) * | 2015-02-25 | 2020-05-29 | 콴타 시스템 에스.피.에이. | 서브-나노초 지속기간의 레이저 펄스들을 생성하기 위한 레이저 시스템 |
| KR102070141B1 (ko) * | 2015-07-22 | 2020-01-28 | 아카데미 오브 옵토-일렉트로닉스, 차이니즈 아카데미 오브 사이언시스 | 환형 챔버 구조를 가지는 엑시머 레이저 시스템 |
| US9945730B2 (en) | 2016-09-02 | 2018-04-17 | Cymer, Llc | Adjusting an amount of coherence of a light beam |
| US10451890B2 (en) | 2017-01-16 | 2019-10-22 | Cymer, Llc | Reducing speckle in an excimer light source |
| KR102366148B1 (ko) | 2017-09-25 | 2022-02-23 | 사이머 엘엘씨 | 가스 방전 광원에서의 불소 검출 방법 |
| CN108535735A (zh) * | 2018-04-13 | 2018-09-14 | 长春理工大学 | 用于室内可连续调节的距离模拟装置 |
| US20240283210A1 (en) * | 2021-07-15 | 2024-08-22 | Cymer, Llc | Pulsed power systems with controlled reactor reset |
| DE102023135987B4 (de) * | 2023-12-20 | 2025-10-30 | Carl Zeiss Smt Gmbh | Laserlichtquelle, insbesondere zur Verwendung in einer mikrolithographischen Projektionsbelichtungsanlage |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5557630A (en) * | 1995-01-13 | 1996-09-17 | Scaggs; Michael J. | Unstable laser resonator |
| US20080267242A1 (en) * | 2005-11-01 | 2008-10-30 | Cymer, Inc. | Laser system |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5023884A (en) | 1988-01-15 | 1991-06-11 | Cymer Laser Technologies | Compact excimer laser |
| JPH10303480A (ja) * | 1997-04-24 | 1998-11-13 | Amada Eng Center:Kk | 固体レーザー発振器 |
| US5856991A (en) | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
| US7856044B2 (en) * | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
| US6625191B2 (en) | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6496528B2 (en) | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| US6356576B1 (en) | 1999-11-29 | 2002-03-12 | Cymer, Inc. | Deep ultraviolet catadioptric anamorphic telescope |
| US6904073B2 (en) | 2001-01-29 | 2005-06-07 | Cymer, Inc. | High power deep ultraviolet laser with long life optics |
| US6693939B2 (en) | 2001-01-29 | 2004-02-17 | Cymer, Inc. | Laser lithography light source with beam delivery |
| US6912052B2 (en) | 2000-11-17 | 2005-06-28 | Cymer, Inc. | Gas discharge MOPA laser spectral analysis module |
| US7230964B2 (en) | 2001-04-09 | 2007-06-12 | Cymer, Inc. | Lithography laser with beam delivery and beam pointing control |
| US7088758B2 (en) | 2001-07-27 | 2006-08-08 | Cymer, Inc. | Relax gas discharge laser lithography light source |
| US7154928B2 (en) | 2004-06-23 | 2006-12-26 | Cymer Inc. | Laser output beam wavefront splitter for bandwidth spectrum control |
| JP2004039767A (ja) * | 2002-07-02 | 2004-02-05 | Gigaphoton Inc | Ｍｏｐａ式又は注入同期式レーザ装置 |
| JP4162936B2 (ja) | 2002-07-15 | 2008-10-08 | サイバーレーザー株式会社 | レーザー共振器及び調節方法 |
| US20040202220A1 (en) | 2002-11-05 | 2004-10-14 | Gongxue Hua | Master oscillator-power amplifier excimer laser system |
| WO2004095661A1 (ja) | 2003-04-22 | 2004-11-04 | Komatsu Ltd. | 露光用２ステ－ジレ－ザ装置 |
| WO2004100328A1 (en) | 2003-05-07 | 2004-11-18 | Federalnoye Gosudarstvennoye Unitarnoye Predpriyatiye Nauchno-Proizvodstvennaya Korporatsiya Gosudarstvenniy Opticheskiy Institut Imeni S. I. Vavilova | Laser with hybrid-unstable ring resonator |
| US7184204B2 (en) | 2003-07-01 | 2007-02-27 | Lambda Physik Ag | Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime |
| JP4367836B2 (ja) * | 2003-12-04 | 2009-11-18 | 株式会社小松製作所 | Ｍｏｐｏ方式２ステージレーザ装置 |
| US7087914B2 (en) | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
| US7366219B2 (en) | 2004-11-30 | 2008-04-29 | Cymer, Inc. | Line narrowing module |
| JP2006203008A (ja) * | 2005-01-21 | 2006-08-03 | Komatsu Ltd | ２ステージレーザシステム |
| JP2007027624A (ja) * | 2005-07-21 | 2007-02-01 | Komatsu Ltd | ２ステージ狭帯域化レーザ装置 |
| US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| EP1952493A4 (en) | 2005-11-01 | 2017-05-10 | Cymer, LLC | Laser system |
| US7999915B2 (en) | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US7920616B2 (en) | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US7715459B2 (en) | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US7643529B2 (en) | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| JP4818871B2 (ja) * | 2006-10-20 | 2011-11-16 | 株式会社小松製作所 | レーザ装置 |
| JP4804313B2 (ja) * | 2006-11-17 | 2011-11-02 | 株式会社小松製作所 | 露光装置用狭帯域レーザ装置 |
| US7643528B2 (en) * | 2007-09-20 | 2010-01-05 | Cymer, Inc. | Immersion lithography laser light source with pulse stretcher |
-
2010
- 2010-03-16 US US12/724,681 patent/US8014432B2/en not_active Ceased
- 2010-03-18 WO PCT/US2010/027842 patent/WO2010111119A1/en not_active Ceased
- 2010-03-18 KR KR1020117025233A patent/KR101548286B1/ko active Active
- 2010-03-18 JP JP2012502124A patent/JP5923442B2/ja active Active
- 2010-03-18 EP EP10756630.9A patent/EP2412067A4/en not_active Withdrawn
- 2010-03-26 TW TW099109123A patent/TWI553978B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5557630A (en) * | 1995-01-13 | 1996-09-17 | Scaggs; Michael J. | Unstable laser resonator |
| US20080267242A1 (en) * | 2005-11-01 | 2008-10-30 | Cymer, Inc. | Laser system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201104988A (en) | 2011-02-01 |
| WO2010111119A1 (en) | 2010-09-30 |
| US8014432B2 (en) | 2011-09-06 |
| JP5923442B2 (ja) | 2016-05-24 |
| KR20120003464A (ko) | 2012-01-10 |
| KR101548286B1 (ko) | 2015-08-28 |
| EP2412067A1 (en) | 2012-02-01 |
| EP2412067A4 (en) | 2015-06-24 |
| JP2012522376A (ja) | 2012-09-20 |
| US20110069733A1 (en) | 2011-03-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI553978B (zh) | 再生環型共振器 | |
| US7184204B2 (en) | Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime | |
| JP5506194B2 (ja) | レーザシステム | |
| US7227881B2 (en) | Master oscillator—power amplifier excimer laser system | |
| JP5100990B2 (ja) | 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置 | |
| US8559099B2 (en) | Laser beam amplifier and laser apparatus using the same | |
| JP2005525001A5 (enExample) | ||
| US8624209B1 (en) | Controlling spatial properties in an excimer ring amplifier | |
| US20170338620A1 (en) | Laser device | |
| JP5657139B2 (ja) | Ｃｏ２レーザ装置およびｃｏ２レーザ加工装置 | |
| CN111934183A (zh) | 一种准分子激光器线宽和e95主动控制装置及方法 | |
| JP5981652B2 (ja) | 電力増幅器向けの共振器内損失要素 | |
| US20130223468A1 (en) | Excimer laser device | |
| WO2000074183A1 (fr) | Dispositif laser ultraviolet | |
| US8853657B2 (en) | Intracavity loss element for power amplifier | |
| US20170149199A1 (en) | Laser device | |
| USRE45957E1 (en) | Regenerative ring resonator | |
| US9407052B2 (en) | Amplifier, laser apparatus, and extreme ultraviolet light generation system | |
| WO2024227820A1 (en) | Excimer laser with improved beam uniformity and stability |