JP5923382B2 - 残留塩素測定装置 - Google Patents
残留塩素測定装置 Download PDFInfo
- Publication number
- JP5923382B2 JP5923382B2 JP2012114113A JP2012114113A JP5923382B2 JP 5923382 B2 JP5923382 B2 JP 5923382B2 JP 2012114113 A JP2012114113 A JP 2012114113A JP 2012114113 A JP2012114113 A JP 2012114113A JP 5923382 B2 JP5923382 B2 JP 5923382B2
- Authority
- JP
- Japan
- Prior art keywords
- drive shaft
- shaft
- contacted
- residual chlorine
- shaft portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims description 24
- 229910052801 chlorine Inorganic materials 0.000 title claims description 24
- 239000000460 chlorine Substances 0.000 title claims description 24
- 229910052709 silver Inorganic materials 0.000 claims description 20
- 239000004332 silver Substances 0.000 claims description 19
- 238000001514 detection method Methods 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 239000000314 lubricant Substances 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 18
- 230000003287 optical effect Effects 0.000 description 11
- 230000008054 signal transmission Effects 0.000 description 8
- 230000002159 abnormal effect Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000012488 sample solution Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
- G01N27/38—Cleaning of electrodes
Landscapes
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Rotary Switch, Piano Key Switch, And Lever Switch (AREA)
Description
2 ・・・作用電極(回転式センサ)
3 ・・・対電極
4 ・・・電極回転機構
41 ・・・モータ
42 ・・・回転駆動軸
422x・・・取付軸部
422z・・・軸本体部
5 ・・・信号伝達機構
51 ・・・固定接触子
52 ・・・被接触軸部
Claims (5)
- 試料液に含まれる残留塩素を測定する回転式センサと、
前記回転式センサを回転させる回転駆動軸と、
前記回転駆動軸に接触して、前記回転式センサの検出信号を前記回転駆動軸を介して取得する固定接触子とを備え、
前記回転駆動軸における前記固定接触子と接触する被接触軸部が、銀から形成された中空部材又は中実部材により構成されており、
前記固定接触子が、板状の弾性部材と、当該弾性部材の表面において前記回転駆動軸の回転方向に沿った方向に延び設けられ、前記回転駆動軸に接触する線状部材とを有することを特徴とする残留塩素測定装置。 - 前記固定接触子が、前記線状部材を複数有する請求項1記載の残留塩素測定装置。
- 前記被接触軸部が、円筒状をなす中空部材から構成されており、
前記回転駆動軸が、一端部に前記被接触軸部が挿入して取り付けられる取付軸部を有し、他端部に前記回転式センサが接続される軸本体を有しており、
前記軸本体に前記被接触軸部が着脱可能に構成されている請求項1又は2記載の残留塩素測定装置。 - 前記取付軸部の外周面に雄ねじ部が形成されており、
前記被接触軸部の内周面に前記雄ねじ部に着脱可能に螺合する雌ねじ部が形成されている請求項3記載の残留塩素測定装置。 - 前記固定接触子及び前記被接触軸部の間に導電性を有する潤滑剤が介在して設けられている請求項1乃至4の何れかに記載の残留塩素測定装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012114113A JP5923382B2 (ja) | 2012-05-18 | 2012-05-18 | 残留塩素測定装置 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2012114113A JP5923382B2 (ja) | 2012-05-18 | 2012-05-18 | 残留塩素測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013242170A JP2013242170A (ja) | 2013-12-05 |
JP5923382B2 true JP5923382B2 (ja) | 2016-05-24 |
Family
ID=49843198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012114113A Active JP5923382B2 (ja) | 2012-05-18 | 2012-05-18 | 残留塩素測定装置 |
Country Status (1)
Country | Link |
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JP (1) | JP5923382B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6337459B2 (ja) * | 2013-12-16 | 2018-06-06 | 東亜ディーケーケー株式会社 | 酸化還元電流測定装置 |
KR101796524B1 (ko) * | 2017-03-16 | 2017-11-10 | 한창기전 주식회사 | 자동세정기능이 구비된 전기화학식 용존오존 측정시스템 |
KR101796447B1 (ko) * | 2017-03-16 | 2017-11-13 | 한창기전 주식회사 | 자동세정기능이 구비된 전기화학식 잔류염소 측정시스템 |
JP7302556B2 (ja) * | 2020-09-03 | 2023-07-04 | 横河電機株式会社 | 測定装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4605626A (en) * | 1985-05-01 | 1986-08-12 | Rohrback Technology Corporation | Electrochemical system with rotating electrode/sparger assembly |
JPH0716993Y2 (ja) * | 1985-05-21 | 1995-04-19 | 日本防蝕工業株式会社 | 回転式多点同時電位測定装置 |
JPH0217653U (ja) * | 1988-07-22 | 1990-02-05 | ||
JPH0515113A (ja) * | 1991-06-28 | 1993-01-22 | Fuji Electric Co Ltd | 回転電機のスリツプリング |
JPH0552805A (ja) * | 1991-08-23 | 1993-03-02 | Mitsui Eng & Shipbuild Co Ltd | 回転型電量分析用検出器 |
JPH0569674U (ja) * | 1992-02-24 | 1993-09-21 | 横河電機株式会社 | 残留塩素計の検出部の構造 |
JPH10143791A (ja) * | 1996-11-12 | 1998-05-29 | Toshiba Corp | スリップリング機構 |
JP4372657B2 (ja) * | 2004-10-05 | 2009-11-25 | 三菱電機株式会社 | スリップリング装置 |
JP4858164B2 (ja) * | 2006-12-28 | 2012-01-18 | 横河電機株式会社 | 電気伝達機構およびこれを利用した残留塩素計 |
-
2012
- 2012-05-18 JP JP2012114113A patent/JP5923382B2/ja active Active
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JP2013242170A (ja) | 2013-12-05 |
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