JP5917867B2 - アルミノリン酸ガラス組成物 - Google Patents
アルミノリン酸ガラス組成物 Download PDFInfo
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- JP5917867B2 JP5917867B2 JP2011199356A JP2011199356A JP5917867B2 JP 5917867 B2 JP5917867 B2 JP 5917867B2 JP 2011199356 A JP2011199356 A JP 2011199356A JP 2011199356 A JP2011199356 A JP 2011199356A JP 5917867 B2 JP5917867 B2 JP 5917867B2
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- 239000011521 glass Substances 0.000 title claims description 143
- 239000000203 mixture Substances 0.000 title claims description 64
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 50
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 49
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 22
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 21
- 230000000930 thermomechanical effect Effects 0.000 claims description 18
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 229910052796 boron Inorganic materials 0.000 claims description 11
- 229910052792 caesium Inorganic materials 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 229910052701 rubidium Inorganic materials 0.000 claims description 9
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 8
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 229910052779 Neodymium Inorganic materials 0.000 claims description 6
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 6
- 229910052788 barium Inorganic materials 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 229910052700 potassium Inorganic materials 0.000 claims description 6
- 229910052712 strontium Inorganic materials 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 239000005368 silicate glass Substances 0.000 claims description 5
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 3
- 229910052693 Europium Inorganic materials 0.000 claims description 3
- 229910052689 Holmium Inorganic materials 0.000 claims description 3
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910052771 Terbium Inorganic materials 0.000 claims description 3
- 229910052775 Thulium Inorganic materials 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 22
- 150000001340 alkali metals Chemical class 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- 239000000087 laser glass Substances 0.000 description 18
- 101100380548 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) apg-2 gene Proteins 0.000 description 16
- 102100028829 Heat shock 70 kDa protein 4L Human genes 0.000 description 14
- 101001078634 Homo sapiens Heat shock 70 kDa protein 4L Proteins 0.000 description 14
- 229910019142 PO4 Inorganic materials 0.000 description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 14
- 239000010452 phosphate Substances 0.000 description 14
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 13
- 150000001342 alkaline earth metals Chemical class 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000005365 phosphate glass Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000000155 melt Substances 0.000 description 6
- 229910052761 rare earth metal Inorganic materials 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000003607 modifier Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 150000004645 aluminates Chemical class 0.000 description 3
- 239000005388 borosilicate glass Substances 0.000 description 3
- 238000000295 emission spectrum Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- -1 rare earth ions Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- 229910052691 Erbium Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000005385 borate glass Substances 0.000 description 2
- 150000001642 boronic acid derivatives Chemical class 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000146 host glass Substances 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
- H01S3/175—Solid materials amorphous, e.g. glass phosphate glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/19—Silica-free oxide glass compositions containing phosphorus containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Glass Compositions (AREA)
- Lasers (AREA)
Description
SiO2 0.00〜12.00
B2O3 0.00〜15.00
Al2O3 6.00〜11.00
P2O5 55.00〜67.00
Li2O 0.50〜26.00
K2O 0.00〜 4.00
Na2O 0.00〜 4.00
Rb2O 0.00〜 4.00
Cs2O 0.00〜 4.00
MgO 0.00〜25.00
ZnO 0.00〜 6.00
TiO2 0.00〜 6.00
La2O3 0.00〜10.00
Nd2O3 0.00〜 6.00
R2O(R=Li、Na、K、Rb、Cs) 0.50〜26.00
MO(M=Mg、Ca、Sr、Ba、Zn) 0.00〜25.00
を含み、
Ln2O3(Ln=Nd、Yb、又は他のレーザ発振希土類イオン)が、>0.00mol%〜10.00mol%(例えば0.01mol%〜10.00mol%又は0.01mol%〜6.00mol%)であり、
R2Oが8.0mol%〜26.0mol%であり、かつ、MOが0.0mol%〜6.0mol%であるか、又はR2Oが0.5mol%〜8.0mol%であり、かつ、MOが6.0mol%〜25.0mol%であり、
SiO2、B2O3及びAl2O3の合計が6.0mol%〜28.0mol%であり、
R2Oが≧16.0mol%である場合、Al2O3が6.0mol%〜10.0mol%であり、かつ、SiO2、B2O3及びAl2O3の合計が6.0mol%〜15.0mol%である。
SiO2 0.00〜12.00
B2O3 0.00〜15.00
Al2O3 6.00〜11.00
P2O5 55.00〜67.00
Li2O 0.50〜26.00
K2O 0.00〜 4.00
Na2O 0.00〜 4.00
Rb2O 0.00〜 4.00
Cs2O 0.00〜 4.00
MgO 0.00〜25.00
ZnO 0.00〜 6.00
TiO2 0.00〜 6.00
La2O3 0.00〜10.00
Nd2O3 0.00〜 6.00
R2O(R=Li、Na、K、Rb、Cs) 0.50〜26.00
MO(M=Mg、Ca、Sr、Ba、Zn) 0.00〜25.00
を含み、
Ln2O3(Ln=Nd、Yb、又は他のレーザ発振希土類イオン)が、>0.00mol%〜10.00mol%(例えば0.01mol%〜10.00mol%又は0.01mol%〜6.00mol%)であり、
R2Oが8.0mol%〜26.0mol%であり、かつ、MOが0.0mol%〜6.0mol%であるか、又はR2Oが0.5mol%〜8.0mol%であり、かつ、MOが6.0mol%〜25.0mol%であり、
SiO2及びB2O3の合計が3mol%〜20mol%であり、かつ、SiO2、B2O3及びAl2O3の合計が6.0mol%〜28.0mol%であり、
R2Oが≧16.0mol%である場合、Al2O3が6.0mol%〜10.0mol%であり、かつ、SiO2、B2O3及びAl2O3の合計が6.0mol%〜15.0mol%である。
10.00mol%のSiO2(±2.00mol%)、
8.00mol%のB2O3(±2.00mol%)、
8.80mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
10.80mol%のLi2O(±2.00mol%)、
<1.0mol%のMgO、
<1.0mol%のLa2O3、
0.1mol%〜1.00mol%のNd2O3又はYb2O3(±0.50mol%)、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、ガラス組成物が提供される。
8.50mol%のSiO2(±2.00mol%)、
5.00mol%のB2O3(±2.00mol%)、
10.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
12.00mol%のLi2O(±2.00mol%)、
<1.0mol%のMgO、
<1.0mol%のLa2O3、
0.1mol%〜1.00mol%のNd2O3又はYb2O3(±0.50mol%)、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、ガラス組成物が提供される。
7.00mol%のSiO2(±2.00mol%)、
7.00mol%のB2O3(±2.00mol%)、
8.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
10.00mol%のLi2O(±2.00mol%)、
5.00mol%のMgO(±1.00mol%)、
<1.0mol%のLa2O3、
0.1mol%〜1.00mol%のNd2O3又はYb2O3(±0.50mol%)、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、ガラス組成物が提供される。
4.00mol%のSiO2(±2.00mol%)、
5.00mol%のB2O3(±2.00mol%)、
9.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
1.50mol%のLi2O(±2.00mol%)、
15.00mol%のMgO(±2.00mol%)、
<1.0mol%のLa2O3、
0.2mol%〜1.00mol%のNd2O3又はYb2O3(±0.50mol%)、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、ガラス組成物が提供される。
<3.0mol%のSiO2、
7.00mol%のB2O3(±2.00mol%)、
10.00mol%のAl2O3(±1.00mol%)、
60.00mol%のP2O5(±3.50mol%)、
1.50mol%のLi2O(±2.00mol%)、
15.00mol%のMgO(±2.00mol%)、
5.00mol%のZnO(±1.00mol%)、
<1.0mol%のLa2O3、
0.3mol%〜1.00mol%のNd2O3又はYb2O3(±0.50mol%)、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、ガラス組成物が提供される。
FOMTM=K90℃KIC(1−ν)/(αE)
(式中、
K90℃は、90℃で測定される熱伝導率(W/mK)であり、
KICは押込み破壊靭性であり、
νはポワソン比であり、
Eはヤング率(GPa)であり、
αは20℃〜300℃に対する線熱膨張係数(10−7/K)である)。
FOMLaser=σemτRad/(n2Δλeff)
(式中、
σemは最大放出断面積(×10−20cm2)であり、
τRadは放射寿命(マイクロ秒)であり、
n2は非線形屈折率であり、
Δλeffは有効発光帯域幅(nm)である)。
(1)少なくとも0.9W/m1/2、好ましくは少なくとも1.1W/m1/2、特に少なくとも1.2W/m1/2、とりわけ少なくとも1.3W/m1/2、例えば0.9W/m1/2〜1.8W/m1/2の熱機械性能指数(FOMTM)、
(2)少なくとも2.5×10−20cm2、好ましくは少なくとも2.8×10−20cm2、特に少なくとも3.0×10−20cm2、とりわけ少なくとも3.2×10−20cm2、例えば2.5×10−20cm2〜4.5×10−20cm2の最大放出断面積(σem)
を有する。
Claims (26)
- アルミノリン酸ガラス組成物であって、(mol%で):
SiO2 0.00より多く7.00まで
B2O3 0.00より多く15.00まで
Al2O3 6.00〜9.00
P2O5 55.00〜67.00
Li2O 0.50〜26.00
K2O 0.00〜 4.00
Na2O 0.00〜 4.00
Rb2O 0.00〜 4.00
Cs2O 0.00〜 4.00
MgO 0.00〜 5.00
ZnO 0.00〜 5.00
TiO2 0.00〜 6.00
La2O3 0.00〜10.00
Nd2O3 0.00〜 6.00
R2O(R=Li、Na、K、Rb、Cs) 8.00〜26.00
MO(M=Mg、Ca、Sr、Ba、Zn) 0.00〜 5.00
を含み、
Ln2O3(Ln=Nd、Yb、Er、Pr、Sm、Eu、Tb、Dy、Ho、Tm)が、>0.00mol%〜10.00mol%であり、
SiO2、B2O3及びAl2O3の合計が6.0mol%〜28.0mol%であり、
R2Oが≧16.0mol%である場合、SiO2、B2O3及びAl2O3の合計が6.0mol%〜15.0mol%であり、
前記ガラス組成物がSiO2とB2O3の両方を含有する、
アルミノリン酸ガラス組成物。 - SiO2及びB2O3の合計が3mol%〜20mol%である、請求項1に記載のアルミノリン酸ガラス組成物。
- 10.00mol%のSiO2(±2.00mol%)、
8.00mol%のB2O3(±2.00mol%)、
8.80mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
10.80mol%のLi2O(±2.00mol%)、
<1.0mol%のMgO、
<1.0mol%のLa2O3、
0.1mol%〜1.50mol%のNd2O3又はYb2O3、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、アルミノリン酸ガラス組成物。 - 8.50mol%のSiO2(±2.00mol%)、
5.00mol%のB2O3(±2.00mol%)、
10.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
12.00mol%のLi2O(±2.00mol%)、
<1.0mol%のMgO、
<1.0mol%のLa2O3、
0.1mol%〜1.50mol%のNd2O3又はYb2O3、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、アルミノリン酸ガラス組成物。 - 7.00mol%のSiO2(±2.00mol%)、
7.00mol%のB2O3(±2.00mol%)、
8.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
10.00mol%のLi2O(±2.00mol%)、
5.00mol%のMgO(±1.00mol%)、
<1.0mol%のLa2O3、
0.4mol%〜1.50mol%のNd2O3又はYb2O3、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、アルミノリン酸ガラス組成物。 - 4.00mol%のSiO2(±2.00mol%)、
5.00mol%のB2O3(±2.00mol%)、
9.00mol%のAl2O3(±1.00mol%)、
61.20mol%のP2O5(±3.50mol%)、
1.50mol%〜3.50mol%のLi2O、
15.00mol%のMgO(±2.00mol%)、
<1.0mol%のLa2O3、
0.5mol%〜1.50mol%のNd2O3又はYb2O3、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、アルミノリン酸ガラス組成物。 - <3.0mol%のSiO2、
7.00mol%のB2O3(±2.00mol%)、
10.00mol%のAl2O3(±1.00mol%)、
60.00mol%のP2O5(±3.50mol%)、
1.50mol%〜3.50mol%のLi2O、
15.00mol%のMgO(±2.00mol%)、
5.00mol%のZnO(±1.00mol%)、
<1.0mol%のLa2O3、
0.6mol%〜1.50mol%のNd2O3又はYb2O3、及び
0.10mol%のAs2O3(±0.05mol%)
を含む、アルミノリン酸ガラス組成物。 - 7mol%〜26mol%のLi2Oを含有し、SiO2及びB2O3の量の合計が3mol%〜20mol%であり、SiO2、B2O3及びAl2O3の量の合計が10.0mol%〜28.0mol%である、請求項1に記載のガラス組成物。
- 57mol%〜65mol%のP2O5を含有する、請求項1に記載のガラス組成物。
- 59mol%〜62mol%のP2O5を含有する、請求項1に記載のガラス組成物。
- 3.0mol%〜10.0mol%のSiO2を含有する、請求項1に記載のガラス組成物。
- 3.0mol%〜9.0mol%のB2O3を含有する、請求項1に記載のガラス組成物。
- 6.0mol%〜10.0mol%のAl2O3を含有する、請求項1に記載のガラス組成物。
- 1.0mol%〜7.0mol%のLa2O3を含有する、請求項1に記載のガラス組成物。
- Na2O、K2O、Rb2O及びCs2Oを合わせた総量が、0.0mol%〜4.0mol%である、請求項1に記載のガラス組成物。
- TiO2の量が0.0mol%〜1.0mol%である、請求項1に記載のガラス組成物。
- 熱機械性能指数値であるFOMTMが少なくとも0.9W/m1/2である、請求項1に記載のガラス組成物。
- 最大放出断面積であるσemが少なくとも2.5×10−20cm2である、請求項1に記載のガラス組成物。
- 固体利得媒質と励起源とを備える固体レーザシステムにおいて、前記固体利得媒質が、請求項1に記載の組成物を有するガラスである、固体レーザシステム。
- 請求項1に記載のガラス組成物を、フラッシュランプにより励起するか、又はダイオードにより励起する、レーザビームパルスを発生させる方法。
- 3〜12mol%のSiO2を含有する、請求項1に記載のガラス組成物。
- 5〜12mol%のSiO2を含有する、請求項1に記載のガラス組成物。
- 5〜12mol%のSiO2とB2O3の両方を含有する、請求項1に記載のガラス組成物。
- 3〜15mol%のB2O3を含有する、請求項1に記載のガラス組成物。
- 5〜15mol%のB2O3を含有する、請求項1に記載のガラス組成物。
- アルミノリン酸ガラス組成物であって、(mol%で):
SiO2 3.00〜7.00
B2O3 3.00〜15.00
Al2O3 6.00〜9.00
P2O5 55.00〜67.00
Li2O 0.50〜26.00
K2O 0.00〜 4.00
Na2O 0.00〜 4.00
Rb2O 0.00〜 4.00
Cs2O 0.00〜 4.00
MgO 0.00〜 6.00
ZnO 0.00〜 6.00
TiO2 0.00〜 6.00
La2O3 0.00〜10.00
Nd2O3 0.00〜 6.00
R2O(R=Li、Na、K、Rb、Cs) 8.00〜26.00
MO(M=Mg、Ca、Sr、Ba、Zn) 0.00〜 6.00
を含み、
Ln2O3(Ln=Nd、Yb、Er、Pr、Sm、Eu、Tb、Dy、Ho、Tm)が、>0.00mol%〜10.00mol%であり、
SiO2、B2O3及びAl2O3の合計が12.0mol%〜28.0mol%であり、
R2Oが≧16.0mol%である場合、SiO2、B2O3及びAl2O3の合計が12.0mol%〜15.0mol%である、
アルミノリン酸ガラス組成物。
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