JP5885045B1 - レジスト剥離液とその製造方法 - Google Patents

レジスト剥離液とその製造方法 Download PDF

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Publication number
JP5885045B1
JP5885045B1 JP2015012926A JP2015012926A JP5885045B1 JP 5885045 B1 JP5885045 B1 JP 5885045B1 JP 2015012926 A JP2015012926 A JP 2015012926A JP 2015012926 A JP2015012926 A JP 2015012926A JP 5885045 B1 JP5885045 B1 JP 5885045B1
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Japan
Prior art keywords
mass
resist
film
stripping solution
pyrrolidine
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JP2015012926A
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Japanese (ja)
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JP2016138951A (ja
Inventor
真一郎 淵上
真一郎 淵上
靖紀 鈴木
靖紀 鈴木
善秀 小佐野
善秀 小佐野
明里 児玉
明里 児玉
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Panasonic Intellectual Property Management Co Ltd
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Panasonic Intellectual Property Management Co Ltd
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Priority to JP2015012926A priority Critical patent/JP5885045B1/ja
Priority to TW104140693A priority patent/TW201631414A/zh
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Publication of JP5885045B1 publication Critical patent/JP5885045B1/ja
Publication of JP2016138951A publication Critical patent/JP2016138951A/ja
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2015012926A 2015-01-27 2015-01-27 レジスト剥離液とその製造方法 Active JP5885045B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015012926A JP5885045B1 (ja) 2015-01-27 2015-01-27 レジスト剥離液とその製造方法
TW104140693A TW201631414A (zh) 2015-01-27 2015-12-04 光阻剝離液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015012926A JP5885045B1 (ja) 2015-01-27 2015-01-27 レジスト剥離液とその製造方法

Publications (2)

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JP5885045B1 true JP5885045B1 (ja) 2016-03-15
JP2016138951A JP2016138951A (ja) 2016-08-04

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ID=55457030

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JP2015012926A Active JP5885045B1 (ja) 2015-01-27 2015-01-27 レジスト剥離液とその製造方法

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JP (1) JP5885045B1 (ko)
TW (1) TW201631414A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117761969A (zh) * 2023-12-25 2024-03-26 四川熔增环保科技有限公司 一种剥离液及其制备方法与应用

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6551787B2 (ja) * 2015-09-28 2019-07-31 パナソニックＩｐマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284506A (ja) * 1999-03-31 2000-10-13 Sharp Corp フォトレジスト剥離剤組成物および剥離方法
JP2004252369A (ja) * 2003-02-21 2004-09-09 Mitsubishi Gas Chem Co Inc 水あめを含有する表面処理剤
KR20080051250A (ko) * 2006-12-05 2008-06-11 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
KR20080054714A (ko) * 2006-12-13 2008-06-19 동우 화인켐 주식회사 레지스트 박리용 알칼리 조성물
KR20080076016A (ko) * 2007-02-14 2008-08-20 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤
WO2015029277A1 (ja) * 2013-09-02 2015-03-05 パナソニックＩｐマネジメント株式会社 レジスト剥離液

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284506A (ja) * 1999-03-31 2000-10-13 Sharp Corp フォトレジスト剥離剤組成物および剥離方法
JP2004252369A (ja) * 2003-02-21 2004-09-09 Mitsubishi Gas Chem Co Inc 水あめを含有する表面処理剤
KR20080051250A (ko) * 2006-12-05 2008-06-11 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
KR20080054714A (ko) * 2006-12-13 2008-06-19 동우 화인켐 주식회사 레지스트 박리용 알칼리 조성물
KR20080076016A (ko) * 2007-02-14 2008-08-20 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤
WO2015029277A1 (ja) * 2013-09-02 2015-03-05 パナソニックＩｐマネジメント株式会社 レジスト剥離液

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117761969A (zh) * 2023-12-25 2024-03-26 四川熔增环保科技有限公司 一种剥离液及其制备方法与应用

Also Published As

Publication number Publication date
TW201631414A (zh) 2016-09-01
TWI563353B (ko) 2016-12-21
JP2016138951A (ja) 2016-08-04

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