TWI563353B - - Google Patents

Info

Publication number
TWI563353B
TWI563353B TW104140693A TW104140693A TWI563353B TW I563353 B TWI563353 B TW I563353B TW 104140693 A TW104140693 A TW 104140693A TW 104140693 A TW104140693 A TW 104140693A TW I563353 B TWI563353 B TW I563353B
Authority
TW
Taiwan
Application number
TW104140693A
Other languages
Chinese (zh)
Other versions
TW201631414A (zh
Inventor
Shinichirou Fuchigami
Yasunori Suzuki
Yoshihide Kosano
Akari Kodama
Original Assignee
Panasonic Ip Man Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Ip Man Co Ltd filed Critical Panasonic Ip Man Co Ltd
Publication of TW201631414A publication Critical patent/TW201631414A/zh
Application granted granted Critical
Publication of TWI563353B publication Critical patent/TWI563353B/zh

Links

TW104140693A 2015-01-27 2015-12-04 光阻剝離液 TW201631414A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015012926A JP5885045B1 (ja) 2015-01-27 2015-01-27 レジスト剥離液とその製造方法

Publications (2)

Publication Number Publication Date
TW201631414A TW201631414A (zh) 2016-09-01
TWI563353B true TWI563353B (ko) 2016-12-21

Family

ID=55457030

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104140693A TW201631414A (zh) 2015-01-27 2015-12-04 光阻剝離液

Country Status (2)

Country Link
JP (1) JP5885045B1 (ko)
TW (1) TW201631414A (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6551787B2 (ja) * 2015-09-28 2019-07-31 パナソニックＩｐマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284506A (ja) * 1999-03-31 2000-10-13 Sharp Corp フォトレジスト剥離剤組成物および剥離方法
JP2004252369A (ja) * 2003-02-21 2004-09-09 Mitsubishi Gas Chem Co Inc 水あめを含有する表面処理剤
KR20080051250A (ko) * 2006-12-05 2008-06-11 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
KR20080054714A (ko) * 2006-12-13 2008-06-19 동우 화인켐 주식회사 레지스트 박리용 알칼리 조성물
KR20080076016A (ko) * 2007-02-14 2008-08-20 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5575318B1 (ja) * 2013-09-02 2014-08-20 パナソニック株式会社 レジスト剥離液

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284506A (ja) * 1999-03-31 2000-10-13 Sharp Corp フォトレジスト剥離剤組成物および剥離方法
JP2004252369A (ja) * 2003-02-21 2004-09-09 Mitsubishi Gas Chem Co Inc 水あめを含有する表面処理剤
KR20080051250A (ko) * 2006-12-05 2008-06-11 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
KR20080054714A (ko) * 2006-12-13 2008-06-19 동우 화인켐 주식회사 레지스트 박리용 알칼리 조성물
KR20080076016A (ko) * 2007-02-14 2008-08-20 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤

Also Published As

Publication number Publication date
JP2016138951A (ja) 2016-08-04
JP5885045B1 (ja) 2016-03-15
TW201631414A (zh) 2016-09-01

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