JP5871478B2 - Substrate holder and substrate processing apparatus - Google Patents

Description

  The present invention relates to a semiconductor wafer, a liquid crystal display substrate, a plasma display glass substrate, an FED (Field Emission Display) substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, a photomask substrate, and a solar cell. A plurality of substrates, such as glass substrates for use, which are arranged in a horizontal position in an upright position and held therein, and have a substrate holder that is immersed in the processing liquid stored in the processing tank, and the substrate holder. The present invention relates to a substrate processing apparatus that performs processing such as cleaning, etching, and drying on a single substrate.

Chemical solution or pure water such as hydrofluoric acid (HF), phosphoric acid (H ₃ PO ₄ ) or sulfuric acid (H ₂ SO ₄ ), ammonia hydrogen peroxide (NH ₃ , H ₂ O ₂ ), etc. stored in the treatment tank In a substrate processing apparatus that performs processing such as cleaning and etching by immersing a substrate in the processing solution, the substrate holder is held in a processing tank while a plurality of substrates are held by a substrate holder (lifter). It is movable between the inside and the upper position. First, by placing the substrate holder in the treatment tank, the substrate is treated by immersing the substrate in the treatment liquid in the treatment tank, and when the immersion treatment in the substrate with the treatment liquid is completed, the substrate holder is processed. The substrate is pulled upward from the inside of the tank, and a dry gas such as IPA (isopropyl alcohol) or nitrogen (N ₂ ) gas is supplied to the substrate to dry the substrate. The substrate holder used in this series of processes has a configuration that can hold a plurality of substrates (for example, 50 substrates) arranged in a horizontal direction in a standing posture without contacting each other .

  A conventional substrate holder has a moving member that is vertically arranged and supported so as to be movable between the inside and the outside of a processing tank, and one end portion of which is fixed to the lower end portion of the moving member and is arranged in the horizontal direction. A plurality of substrate holding frames (for example, three) provided, a fixed frame fixed to the other end of each of these substrate holding frames and disposed in a vertical direction, and fixed to each substrate holding frame. A plurality of substrate holding grooves that engage with the lower edge of the substrate; and a holding member that holds the plurality of substrates arranged in a horizontal direction in a standing posture with a slight gap therebetween. I have. The plurality of substrate holding frames include a central substrate holding frame fixed to the center of the lower end portion of the moving member, and left and right fixed to the left and right of the lower end portion of the lifter member. There are a total of three substrate holding frames.

  Conventionally, two left and right holding members are fixed to each substrate support frame by a fixture (bolts and nuts) among the plurality of substrate support frames. That is, there are six holding members in one substrate holder, and these holding members hold the lower end portion of the substrate at six places. In addition, the board | substrate holding frame and the holding member are formed with the screw hole for inserting the volt | bolt of a fixing tool in the horizontal direction (for example, refer patent document 1).

JP 2007-36189 A

  However, in the conventional substrate holder, when the substrate holder holding a plurality of substrates is immersed in the processing liquid stored in the processing tank, the holding is fixed to the substrate support frame by the fixing tool. The processing liquid enters the screw hole of the member. Then, when the substrate holder is lifted from the inside of the processing tank to the upper position and the drying gas is supplied to the substrate to dry the substrate, the droplets of the processing liquid that have entered the screw holes of the holding member are, for example, the substrate holding frame. There is a problem that unevenness of drying occurs in the vicinity of the holding member on the surface of the substrate due to the droplets of the processing liquid coming out between the holding member and the like. In particular, when the drying process of the substrate is performed under reduced pressure, the droplets of the processing liquid easily come out on the substrate surface due to the pressure difference between the screw hole and the processing atmosphere.

  The present invention has been made in view of the circumstances as described above, and when drying a plurality of substrates, a substrate holder capable of preventing the occurrence of uneven drying on the substrate surface, and a substrate provided with the substrate holder An object is to provide a processing apparatus.

In order to achieve the above-described object, the invention described in claim 1 is a substrate holder that holds a plurality of substrates arranged in an upright posture, and the inside of the treatment tank in which a treatment liquid is stored and the treatment. A movable member movable between an upper position of the tank, a plurality of substrate holding frames fixed to the movable member and arranged in a horizontal direction along an arrangement direction of the plurality of substrates, and a lower end portion of the substrate A holding member that contacts the substrate and a first hole formed in the substrate holding frame and a second hole formed in the holding member are inserted, and the holding member is inserted into the substrate holding frame. And a washer between the holding member and the fixing member, and the holding member has a linear notch for flowing a processing liquid below the second hole. It formed continuously from the second hole, the treatment liquid at the bottom of the washer It is characterized in that the notch flows is formed.

The invention according to claim 2 is a substrate holder for holding a plurality of substrates arranged in an upright posture, between the inside of the processing tank in which the processing liquid is stored and the upper position of the processing tank. A movable member that is movable at a position, a plurality of substrate holding frames that are fixed to the moving member and arranged in a horizontal direction along the arrangement direction of the plurality of substrates, and a substrate that is in contact with the lower end of the substrate to hold the substrate A fixing member for inserting the holding member into the substrate holding frame by inserting a holding member, a first hole formed in the substrate holding frame, and a second hole formed in the holding member; A washer is provided between the holding member and the fixture, and the holding member has a straight cutout portion for allowing the processing liquid to flow downward from the second hole. It is formed, at the bottom of the washer, and the treatment liquid to the holding member side A groove flow is formed, which is characterized in.

Furthermore, the invention according to claim 4 is a substrate processing apparatus for processing a substrate by immersing in a processing liquid, a processing tank for storing the processing liquid, a processing liquid supply means for supplying the processing liquid to the processing tank, The substrate holder according to claim 1 or 2 is provided.

  According to the substrate holder and the substrate processing apparatus according to the present invention, since the cutout portion through which the processing liquid flows is formed below the second hole of the holding member attached to the substrate holding frame by the fixture, There is no accumulation of droplets of the treatment liquid in the second hole, and when drying a plurality of substrates, there is a remarkable effect that drying unevenness generated on the substrate surface due to the droplets of the treatment liquid can be prevented. .

It is typical sectional drawing which shows an example of schematic structure of the substrate processing apparatus which concerns on embodiment of this invention. It is the expanded sectional view which looked at the principal part of the substrate holder which is a component of a substrate processing apparatus from the front. It is a side view shown in the state where a principal part of a substrate holder was partially fractured. It is the elements on larger scale of the right side board | substrate holding frame of the board | substrate holder which concerns on 1st Embodiment. It is a figure of the holding member and washer of a substrate holder concerning a 1st embodiment. It is the elements on larger scale of the right side board | substrate holding frame of the board | substrate holder which concerns on 2nd Embodiment. It is a figure of the holding member and washer of a substrate holder concerning a 2nd embodiment.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of a substrate holder and a substrate processing apparatus according to the present invention will be described with reference to the drawings.

<Configuration of substrate processing apparatus>
First, a substrate processing apparatus according to an embodiment of the present invention will be described. FIG. 1 is a schematic cross-sectional view showing an example of a schematic configuration of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a front view of a main part of a substrate holder that is a component of the substrate processing apparatus. FIG. 3 is a side view showing the main part of the substrate holder partially broken.

  As shown in FIG. 1, this substrate processing apparatus is a batch type substrate cleaning / drying apparatus that collectively processes a plurality of substrates such as wafers. The substrate processing apparatus includes a processing tank 10 for storing a processing liquid, and a lifter 12 that holds and holds a plurality of substrates W (for example, 50 substrates) arranged in a horizontal direction in a standing posture without contacting each other. ing. The lifter 12 carries the substrate W into the processing tank 10 and immerses the substrate W in the processing liquid in the processing tank 10, and pulls up the substrate W from the processing liquid in the processing tank 10. The substrate W is unloaded to the upper position. The lifter 12 corresponds to the substrate holder of the present invention.

A pair of discharge pipes 14 are provided in the lower part of the processing tank 10. A plurality of ejection holes (not shown) for jetting the processing liquid into the processing tank 10 are provided in the discharge pipe 14 along the longitudinal direction. Are formed horizontally. The discharge pipe 14 is supplied with a treatment liquid to a supply source (not shown) of a treatment liquid such as a chemical liquid such as hydrofluoric acid (HF), phosphoric acid (H ₃ PO ₄ ), sulfuric acid (H ₂ SO ₄ ), or pure water. The pipe 16 is connected in communication. The pair of discharge pipes 14 and the processing liquid supply pipe 16 correspond to the processing liquid supply means of the present invention.

  A drainage port 18 is provided at the bottom of the treatment tank 10, and a drainage pipe 20 is connected to the drainage port 18 in communication therewith. An outer tank 22 into which the processing liquid overflowing from the upper part of the processing tank 10 flows is provided on the outer periphery of the upper part of the processing tank 10, and a drain pipe 24 is connected to a drain port provided at the bottom of the outer tank 22. One end on the upstream side is connected in communication.

  A pair of supply nozzles 23 that supply dry gas to an upper position of the processing tank 10 are provided above the processing tank 10. The pair of supply nozzles 23 are connected to a supply source (not shown) such as IPA (isopropyl alcohol) and nitrogen (N 2) gas through a gas supply pipe 25.

  As shown in FIGS. 2 and 3, the lifter 12 has a plate-shaped moving member 26 arranged in the vertical direction, and one end is fixed to the lower end portion of the moving member 26 and arranged in the horizontal direction. A plurality of substrate holding frames 28 and 30 and a fixed frame 32 are provided. In the illustrated example of FIG. 2, the substrate holding frame 28 is fixed at the center of the lower end portion of the moving member 26, and the pair of substrate holding frames 30, 30 are left and right toward the paper surface of the lower end portion of the moving member 26. Respectively. The other end of each of the substrate holding frames 28 and 30 is fixed integrally with the fixed frame 32 arranged in the vertical direction, and the substrate holding frames 28 and 30 are fixed to the substrate W and 30. First holding members 34 a and 36 a and second holding members 34 b and 36 b that are in contact with the lower end portion and hold the lower end of the substrate W are provided. The moving member 26, the substrate holding frames 28 and 30 and the fixed frame 32 constituting the lifter 12 are each formed of SiC. The first holding members 34a, 36a, the second holding members 34b, 36b, and the fixture 38 are made of, for example, a fluororesin such as PTFE, PFA, PVDF, PCTFE, PEEK, etc., which has excellent chemical resistance to the processing liquid. Is formed.

The moving member 26 can be moved up and down between the inside of the processing tank 10 and the upper position of the processing tank 10 by a support / moving mechanism (not shown). When processing such as cleaning / etching with a processing solution is performed on the substrate W in the processing tank 10, the moving member 26 is moved into the processing tank 10 by the support / moving mechanism. When drying the substrate W at a position above the processing tank 10, the moving member 26 is moved to a position above the processing tank 10 by the support / movement mechanism. Further, as shown in FIG. 3, the first holding members 34a and 36a and the second holding members 34b and 36b respectively have a plurality of substrate holding grooves 40a, 40b, 42a, and 42b that engage with the lower edge of the substrate W. The first holding members 34a and 36a and the second holding members 34b and 36b can hold a plurality of substrates W arranged in a horizontal direction at a constant pitch with a slight gap therebetween. it can.

<First Embodiment>
Next, the substrate holder according to the first embodiment will be described. Since the three substrate holding frames 28 and 30 have a substantially common form, the first embodiment will be described below by taking the right substrate holding frame 30 as an example when viewed from the direction shown in FIG. . 4 is a partially enlarged view of the substrate holding frame 30 on the right side of the substrate holder according to the first embodiment when viewed from the direction shown in FIG. 2, and FIGS. 5A and 5B are views of the first embodiment. FIG. 5C is a view of the substrate holder washer 37a (37b) according to the first embodiment.

  The first holding member 36a and the second holding member 36b fixed to the substrate holding frame 30 are made of an elongated thin plate material, and as shown in FIG. It is fixed by bolts 38a and nuts 38b. A first washer 37a is sandwiched between the first holding member 36a on the left side of FIG. 4 and the nut 38b. Further, a second washer 37b is sandwiched between the second holding member 36b on the right side of FIG. 4 and the bolt 38a. That is, from the one direction side (left side in FIG. 4), the bolts 38a in the order of the first washer 37a, the first holding member 36a, the substrate holding frame 30, the second holding member 36b, and the second washer 37b. And a nut 38b.

  As shown in FIG. 4, the substrate holding frame 30 is formed with through holes 30a for bolts 38a. The through holes 30a are formed in four locations in the horizontal direction along the longitudinal direction of the substrate holding frame 30 (not shown). The through hole 30a corresponds to the first hole of the present invention.

  FIG. 5A shows a partial side view of the first holding member 36a of the substrate holder according to the first embodiment. A through hole 36c for the bolt 38a is formed in the lower portion of the first holding member 36a. The through holes 36c are formed in four locations in the horizontal direction along the longitudinal direction of the first holding member 36a (not shown). Further, a linear notch 36e is formed below the through hole 36c in the first holding member 36a. The through hole 36c corresponds to the second hole of the present invention.

  FIG. 5B shows a partial side view of the second holding member 36b of the substrate holder according to the first embodiment. The second holding member 36b has a slightly longer shape in the height direction than the first holding member 36a. A through hole 36d for the bolt 38a is formed in the lower portion of the second holding member 36b. The through holes 36d are formed in four locations in the horizontal direction (not shown) along the longitudinal direction of the second holding member 36b. Further, a linear notch 36f is formed below the through hole 36d in the second holding member 36b. The through hole 36d corresponds to the second hole of the present invention.

  FIG. 5C is a side view of the washer. Both the first washer 37a and the second washer 37b have a common shape. The first washer 37a and the second washer 37b have a circular ring shape. A straight notch 37c is formed in the lower part of the first washer 37a, and a straight notch 37d is formed in the lower part of the second washer 37b.

  As described above, in the first embodiment, the lower portions of the first holding member 36a and the second holding member 36b are formed with a plurality of through holes 36c and 36d for the bolts 38a, and A straight cutout 36e is formed below the through hole 36c in the first holding member 36a, and a straight cutout 36f is formed below the through hole 36d in the second holding member 36b. Therefore, droplets of the processing liquid do not collect in the through hole 36c and the through hole 36d. Therefore, when drying the plurality of substrates W, drying unevenness on the surface of the substrate W caused by the droplets of the processing liquid can be prevented.

  In addition, since a straight notch 37c is formed in the lower part of the first washer 37a and a straight notch 37d is formed in the lower part of the second washer 37b, the notch 37c is formed from the through hole 36c and the through hole 36d. And the droplet of a process liquid can be discharged | emitted smoothly through the notch part 37d.

<Second Embodiment>
Next, a substrate holder according to the second embodiment will be described. Since the three substrate holding frames 28 and 30 have a substantially common form, in the second embodiment, the right substrate holding frame 30 as viewed from the direction shown in FIG. 2 will be described as an example. To do. 6 is a partially enlarged view of the substrate holding frame 30 on the right side when viewed from the direction shown in FIG. 2 of the substrate holder according to the second embodiment. FIGS. 7 (a) and 7 (b) are diagrams illustrating the second embodiment. The holding members 36a and 36b of the substrate holder according to the embodiment and FIG. 7C are views of the washer 37a (37b) of the substrate holder according to the second embodiment.

  The first holding member 36a and the second holding member 36b fixed to the substrate holding frame 30 are made of an elongated thin plate material, and as shown in FIG. It is fixed by bolts 38a and nuts 38b. A first washer 37a is sandwiched between the first holding member 36a on the left side of FIG. 6 and the nut 38b. In addition, a second washer 37b is sandwiched between the second holding member 36b on the right side of FIG. 6 and the bolt 38a. That is, from the one direction side (left side in FIG. 6), the bolt 38a in the order of the first washer 37a, the first holding member 36a, the substrate holding frame 30, the second holding member 36b, and the second washer 37b. And a nut 38b.

  As shown in FIG. 6, the substrate holding frame 30 is formed with through holes 30a for bolts 38a. The through holes 30a are formed in four locations in the horizontal direction along the longitudinal direction of the substrate holding frame 30 (not shown). The through hole 30a corresponds to the first hole of the present invention.

  FIG. 7A shows a partial side view of the first holding member 36a of the substrate holder according to the second embodiment. A through hole 36c for the bolt 38a is formed in the lower portion of the first holding member 36a. The through holes 36c are formed in four locations in the horizontal direction along the longitudinal direction of the first holding member 36a (not shown). Further, a linear notch 36e is formed below the through hole 36c in the first holding member 36a. The through hole 36c corresponds to the second hole of the present invention.

  FIG. 7B is a partial side view of the second holding member 36b of the substrate holder according to the second embodiment. The second holding member 36b has a slightly longer shape in the height direction than the first holding member 36a. A through hole 36d for the bolt 38a is formed in the lower portion of the second holding member 36b. The through holes 36d are formed in four locations in the horizontal direction (not shown) along the longitudinal direction of the second holding member 36b. Further, a linear notch 36f is formed below the through hole 36d in the second holding member 36b. The through hole 36d corresponds to the second hole of the present invention.

  FIG. 7C is a side view of the washer. Both the first washer 37a and the second washer 37b have a common shape. The first washer 37a and the second washer 37b have a circular ring shape. A straight groove 37e is formed below the first washer 37a, and a straight groove 37f is formed below the second washer 37b.

  As described above, in the second embodiment, a plurality of through holes 36c and through holes 36d for the bolts 38a are formed in the lower portions of the first holding member 36a and the second holding member 36b. A straight cutout 36e is formed below the through hole 36c in the first holding member 36a, and a straight cutout 36f is formed below the through hole 36d in the second holding member 36b. Therefore, droplets of the processing liquid do not collect in the through hole 36c and the through hole 36d. Therefore, when drying the plurality of substrates W, drying unevenness on the surface of the substrate W caused by the droplets of the processing liquid can be prevented.

  Further, since the linear groove 37e is formed in the lower part of the first washer 37a and the linear groove 37f is formed in the lower part of the second washer 37b, the groove 37e and the groove 37f from the through hole 36c and the through hole 36d are formed. The liquid droplets of the processing liquid can be smoothly discharged through.

10 Treatment tank 12 Lifter (substrate holder)
14 Discharge pipe (treatment liquid supply means)
16 Treatment liquid supply pipe (treatment liquid supply means)
18 Drainage port 20 Drainage tube 23 Supply nozzle 26 Moving member 28, 30 Substrate holding frame 30a Through hole (first hole)
32 Fixed frame 34a, 36a First holding member 34b, 36b Second holding member 36c, 36d Through hole (second hole)
36e, 36f Notch 37a First washer 37b Second washer 37c, 37d Notch 37e, 37f Groove 38 Fixture 38a Bolt 38b Nut 40a, 40b, 42a, 42b Substrate holding groove W Substrate

Claims (3)

In a substrate holder that holds a plurality of substrates arranged in an upright position,
A movable member that is movable between the inside of the treatment tank in which the treatment liquid is stored and the upper position of the treatment tank;
A plurality of substrate holding frames fixed to the moving member and disposed in a horizontal direction along an arrangement direction of the plurality of substrates;
A holding member that holds the substrate in contact with the lower end of the substrate;
A fixture for attaching the holding member to the substrate holding frame by inserting the first hole formed in the substrate holding frame and the second hole formed in the holding member ;
A washer between the holding member and the fixture ;
The holding member is continuously formed with a straight cutout from the second hole for allowing the processing liquid to flow below the second hole .
A substrate holder, wherein a notch through which a processing liquid flows is formed in a lower part of the washer . In a substrate holder that holds a plurality of substrates arranged in an upright position,
A movable member that is movable between the inside of the treatment tank in which the treatment liquid is stored and the upper position of the treatment tank;
A plurality of substrate holding frames fixed to the moving member and disposed in a horizontal direction along an arrangement direction of the plurality of substrates;
A holding member that holds the substrate in contact with the lower end of the substrate;
A fixture for attaching the holding member to the substrate holding frame by inserting the first hole formed in the substrate holding frame and the second hole formed in the holding member;
A washer between the holding member and the fixture ,
The holding member is continuously formed with a straight cutout from the second hole for allowing the processing liquid to flow below the second hole.
A substrate holder, wherein a groove through which a processing solution flows is formed below the washer and on the holding member side. In a substrate processing apparatus for processing a substrate by immersing it in a processing solution,
A treatment tank for storing the treatment liquid;
Treatment liquid supply means for supplying a treatment liquid to the treatment tank;
A substrate processing apparatus, characterized in that it comprises a substrate holder according to claim 1 or claim 2.