JP5842837B2 - アクチュエーター、光スキャナーおよび画像形成装置 - Google Patents
アクチュエーター、光スキャナーおよび画像形成装置 Download PDFInfo
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- JP5842837B2 JP5842837B2 JP2013016097A JP2013016097A JP5842837B2 JP 5842837 B2 JP5842837 B2 JP 5842837B2 JP 2013016097 A JP2013016097 A JP 2013016097A JP 2013016097 A JP2013016097 A JP 2013016097A JP 5842837 B2 JP5842837 B2 JP 5842837B2
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- 229910052710 silicon Inorganic materials 0.000 claims description 98
- 239000010703 silicon Substances 0.000 claims description 98
- 238000001579 optical reflectometry Methods 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 97
- 239000000758 substrate Substances 0.000 description 64
- 150000004767 nitrides Chemical class 0.000 description 55
- 238000000034 method Methods 0.000 description 45
- 238000005530 etching Methods 0.000 description 42
- 230000007547 defect Effects 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000001020 plasma etching Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000004380 ashing Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000828 alnico Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
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- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Mechanical Optical Scanning Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013016097A JP5842837B2 (ja) | 2013-01-30 | 2013-01-30 | アクチュエーター、光スキャナーおよび画像形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013016097A JP5842837B2 (ja) | 2013-01-30 | 2013-01-30 | アクチュエーター、光スキャナーおよび画像形成装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011066803A Division JP5842356B2 (ja) | 2011-03-24 | 2011-03-24 | アクチュエーター、光スキャナーおよび画像形成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013084011A JP2013084011A (ja) | 2013-05-09 |
| JP2013084011A5 JP2013084011A5 (enExample) | 2014-05-08 |
| JP5842837B2 true JP5842837B2 (ja) | 2016-01-13 |
Family
ID=48529171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013016097A Active JP5842837B2 (ja) | 2013-01-30 | 2013-01-30 | アクチュエーター、光スキャナーおよび画像形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5842837B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121311809A (zh) * | 2023-06-20 | 2026-01-09 | 富士胶片株式会社 | 微镜器件及光扫描装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3740444B2 (ja) * | 2001-07-11 | 2006-02-01 | キヤノン株式会社 | 光偏向器、それを用いた光学機器、ねじれ揺動体 |
| JP4645067B2 (ja) * | 2004-06-04 | 2011-03-09 | ブラザー工業株式会社 | 反射ミラー製作方法 |
| JP2009069675A (ja) * | 2007-09-14 | 2009-04-02 | Ricoh Co Ltd | 光スキャナ、光走査装置、画像形成装置及び光スキャナの製造方法 |
| JP5521359B2 (ja) * | 2008-03-13 | 2014-06-11 | セイコーエプソン株式会社 | 光偏向器及びその製造方法 |
| JP2009217193A (ja) * | 2008-03-13 | 2009-09-24 | Seiko Epson Corp | 光偏向器及びその製造方法 |
| JP2009294458A (ja) * | 2008-06-05 | 2009-12-17 | Brother Ind Ltd | 光スキャナ |
| JP5655365B2 (ja) * | 2009-08-04 | 2015-01-21 | セイコーエプソン株式会社 | 光偏向器、光偏向器の製造方法および画像表示装置 |
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2013
- 2013-01-30 JP JP2013016097A patent/JP5842837B2/ja active Active
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| Publication number | Publication date |
|---|---|
| JP2013084011A (ja) | 2013-05-09 |
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