JP5832670B2 - 電力用半導体装置 - Google Patents
電力用半導体装置 Download PDFInfo
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- JP5832670B2 JP5832670B2 JP2014556352A JP2014556352A JP5832670B2 JP 5832670 B2 JP5832670 B2 JP 5832670B2 JP 2014556352 A JP2014556352 A JP 2014556352A JP 2014556352 A JP2014556352 A JP 2014556352A JP 5832670 B2 JP5832670 B2 JP 5832670B2
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- trench
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims description 10
- 239000011295 pitch Substances 0.000 description 18
- 239000000758 substrate Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000004088 simulation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
Description
以下においては、本発明の実施の形態1として、耐圧クラスが600Vである縦型のトレンチIGBTに本発明を適用した場合を例にして説明する。図1は、本発明の実施の形態1に係るトレンチIGBTの構成を模式的に示す断面図である。
次に、図1〜図4を用いて、本実施の形態1に係るトレンチIGBTの製造方法について説明する。なお、図2(a)〜図4(a)は、製造工程ごとのトレンチIGBTの構成を示す平面図であり、図2(b)〜図4(b)は、当該構成を示す断面図である。
次に、以上のような本実施の形態1に係るトレンチIGBT(以下「新規トレンチIGBT」と呼ぶこともある)の作用及び効果について、それと関連する従来のトレンチIGBT(以下「関連トレンチIGBT」と呼ぶこともある)と比較しながら説明する。
図8は、本発明の実施の形態2に係るトレンチIGBTの構成を模式的に示す断面図である。なお、本実施の形態2に係るトレンチIGBTにおいて、実施の形態1で説明した構成要素と同一または類似するものについては同じ符号を付し、異なる点を中心に以下説明する。
Claims (1)
- 第1導電型を有する第1ベース領域と、
前記第1ベース領域上に形成された、第2導電型を有する第2ベース領域と、
前記第2ベース領域上に交互に隣接して形成された、前記第1導電型を有するエミッタ領域、及び、前記第2導電型を有するコンタクト領域と、
各前記エミッタ領域の表面から前記第2ベース領域を貫通し、前記第1ベース領域の一部にまで届くように設けられた溝に、ゲート絶縁膜を介して埋め込み形成された複数のゲート電極と、
前記ゲート電極間に位置する予め定められたピッチごとの前記エミッタ領域を除いて、各前記エミッタ領域及び各前記コンタクト領域と接続されたエミッタ電極と、
前記第1ベース領域の裏面上に順に形成された、前記第1導電型を有するバッファ領域、及び、前記第2導電型を有するコレクタ領域と
を備え、
前記エミッタ電極と接続されていない前記エミッタ領域同士の間に、前記エミッタ電極と接続された複数の前記コンタクト領域が存在する、電力用半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014556352A JP5832670B2 (ja) | 2013-01-08 | 2013-12-18 | 電力用半導体装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013000881 | 2013-01-08 | ||
JP2013000881 | 2013-01-08 | ||
JP2014556352A JP5832670B2 (ja) | 2013-01-08 | 2013-12-18 | 電力用半導体装置 |
PCT/JP2013/083834 WO2014109188A1 (ja) | 2013-01-08 | 2013-12-18 | 電力用半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5832670B2 true JP5832670B2 (ja) | 2015-12-16 |
JPWO2014109188A1 JPWO2014109188A1 (ja) | 2017-01-19 |
Family
ID=51166847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014556352A Active JP5832670B2 (ja) | 2013-01-08 | 2013-12-18 | 電力用半導体装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5832670B2 (ja) |
WO (1) | WO2014109188A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10892351B2 (en) | 2016-09-20 | 2021-01-12 | Kabushiki Kaisha Toshiba | Semiconductor device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020129622A (ja) * | 2019-02-08 | 2020-08-27 | 富士電機株式会社 | 半導体装置の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004022941A (ja) * | 2002-06-19 | 2004-01-22 | Toshiba Corp | 半導体装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10173175A (ja) * | 1996-12-09 | 1998-06-26 | Toshiba Corp | 半導体装置及び半導体装置の製造方法 |
JP2009004707A (ja) * | 2007-06-25 | 2009-01-08 | Sanyo Electric Co Ltd | 絶縁ゲート型半導体装置 |
-
2013
- 2013-12-18 JP JP2014556352A patent/JP5832670B2/ja active Active
- 2013-12-18 WO PCT/JP2013/083834 patent/WO2014109188A1/ja active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004022941A (ja) * | 2002-06-19 | 2004-01-22 | Toshiba Corp | 半導体装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10892351B2 (en) | 2016-09-20 | 2021-01-12 | Kabushiki Kaisha Toshiba | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPWO2014109188A1 (ja) | 2017-01-19 |
WO2014109188A1 (ja) | 2014-07-17 |
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