JP5829389B2 - Ｅｕｖシステムに用いる反射光学素子 - Google Patents

Ｅｕｖシステムに用いる反射光学素子 Download PDF

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Publication number
JP5829389B2
JP5829389B2 JP2010192235A JP2010192235A JP5829389B2 JP 5829389 B2 JP5829389 B2 JP 5829389B2 JP 2010192235 A JP2010192235 A JP 2010192235A JP 2010192235 A JP2010192235 A JP 2010192235A JP 5829389 B2 JP5829389 B2 JP 5829389B2
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optical element
base body
reflective optical
cooling channel
substrate material
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Japanese (ja)
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JP2011053687A5 (enExample
JP2011053687A (ja
Inventor
キーリー ホルガー
キーリー ホルガー
レ マイレ ミヒェル
レ マイレ ミヒェル
アンデル ヴィリ
アンデル ヴィリ
ホルデラー ヒューバート
ホルデラー ヒューバート
レンゲル アントン
レンゲル アントン
Original Assignee
カール ツァイス レーザー オプティクス ゲーエムベーハー
カール ツァイス レーザー オプティクス ゲーエムベーハー
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Publication of JP2011053687A publication Critical patent/JP2011053687A/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010192235A 2009-08-31 2010-08-30 Ｅｕｖシステムに用いる反射光学素子 Active JP5829389B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US23836409P 2009-08-31 2009-08-31
US61/238364 2009-08-31
DE102009039400.1 2009-08-31
DE102009039400A DE102009039400A1 (de) 2009-08-31 2009-08-31 Reflektives optisches Element zur Verwendung in einem EUV-System

Publications (3)

Publication Number Publication Date
JP2011053687A JP2011053687A (ja) 2011-03-17
JP2011053687A5 JP2011053687A5 (enExample) 2013-08-29
JP5829389B2 true JP5829389B2 (ja) 2015-12-09

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JP2010192235A Active JP5829389B2 (ja) 2009-08-31 2010-08-30 Ｅｕｖシステムに用いる反射光学素子

Country Status (3)

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US (1) US8342701B2 (enExample)
JP (1) JP5829389B2 (enExample)
DE (1) DE102009039400A1 (enExample)

Families Citing this family (39)

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US20080318066A1 (en) * 2007-05-11 2008-12-25 Asml Holding N.V. Optical Component Fabrication Using Coated Substrates
US20080280539A1 (en) * 2007-05-11 2008-11-13 Asml Holding N.V. Optical component fabrication using amorphous oxide coated substrates
DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
JP2013522889A (ja) * 2010-03-18 2013-06-13 イーティーエイチ・チューリッヒ 極紫外線を集める光学コレクタ、そのような光学コレクタを動作させる方法、及びそのようなコレクタを備えるｅｕｖ源
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102011004446A1 (de) * 2011-02-21 2012-08-23 Carl Zeiss Smt Gmbh Gekühltes optisches Element
DE102011015141A1 (de) * 2011-03-16 2012-09-20 Carl Zeiss Laser Optics Gmbh Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement
DE102011005778A1 (de) 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
CA2843478C (en) * 2011-08-01 2018-12-18 Sebastian Scheiding Method for manufacturing a mirror comprising at least one cavity and optical mirror
WO2013113633A1 (en) 2012-01-30 2013-08-08 Asml Netherlands B.V. Lithographic apparatus with a metrology system for measuring a position of a substrate table
WO2013113634A2 (en) 2012-01-30 2013-08-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102012210712A1 (de) * 2012-06-25 2014-01-02 Carl Zeiss Smt Gmbh Verfahren und Kühlsystem zum Kühlen eines optischen Elements für EUV-Anwendungen
DE102012219540A1 (de) * 2012-10-25 2013-10-17 Carl Zeiss Smt Gmbh Optische Anordnung für EUV-Anwendungen mit einer Verbindungsschnittstelle für eine Fluidleitung sowie Verfahren zum Herstellen derselben
DE102013204427A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US20150083938A1 (en) * 2013-09-24 2015-03-26 Carl Zeiss Laser Optics Gmbh Cooler for plasma generation chamber of euv radiation source
DE102014203461A1 (de) * 2014-02-26 2015-03-05 Carl Zeiss Smt Gmbh Kühlbare spiegelanordnung
CN107003621B (zh) * 2014-12-12 2019-01-11 Asml荷兰有限公司 反射器
DE102015100918A1 (de) * 2015-01-22 2016-07-28 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines reflektiven optischen Elements, reflektives optisches Element und Verwendung eines reflektiven optischen Elements
DE102015206114A1 (de) 2015-04-07 2016-05-25 Carl Zeiss Smt Gmbh Kühler zur Verwendung in einer Vorrichtung im Vakuum
DE102015210045A1 (de) * 2015-06-01 2016-06-23 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Kühlkörpers und Kühlkörper für eine Lithographieanlage
WO2017153152A1 (en) 2016-03-07 2017-09-14 Asml Netherlands B.V. Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatus
DE102017201835A1 (de) * 2017-02-06 2017-12-21 Carl Zeiss Smt Gmbh Optische Anordnung mit Durchgangskanal in einem Spiegelsubstrat
DE102017221388A1 (de) 2017-11-29 2018-10-11 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines mit einem Kühlfluid durchströmbaren Bauteils, optisches Element und EUV-Lithographiesystem
DE102018212224A1 (de) 2018-07-23 2020-01-23 Carl Zeiss Smt Gmbh Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle
US11226438B2 (en) 2018-10-03 2022-01-18 Corning Incorporated Reflective optical element
DE102019219179A1 (de) 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element und Lithographiesystem
DE102020204669A1 (de) * 2020-04-14 2021-10-14 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems
WO2022073610A1 (de) 2020-10-08 2022-04-14 Carl Zeiss Smt Gmbh Herstellungsverfahren und messverfahren
DE102020213639A1 (de) * 2020-10-29 2022-05-05 Carl Zeiss Smt Gmbh Optisches Element, insbesondere zur Reflexion von EUV-Strahlung, optische Anordnung und Verfahren zum Herstellen eines optischen Elements
DE102020214466A1 (de) 2020-11-18 2022-05-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Grundkörpers eines optischen Elementes für die Halbleiterlithographie und Grundkörper eines optischen Elementes für die Halbleiterlithographie
DE102020131383A1 (de) * 2020-11-26 2022-06-02 Carl Zeiss Ag Verfahren und Vorrichtung zur Inspektion einer Schweißnaht in einer Baugruppe eines optischen Systems für die Mikrolithographie
KR20240119295A (ko) * 2021-12-14 2024-08-06 칼 짜이스 에스엠테 게엠베하 적어도 하나의 중공 구조체를 생성하기 위한 방법 및 디바이스, 미러, euv 리소그래피 시스템, 유체 공급 디바이스 및 유체를 공급하기 위한 방법
DE102022209397A1 (de) 2022-09-09 2023-08-31 Carl Zeiss Smt Gmbh Lithographiesystem und optisches Element mit durchströmbaren Kanälen
DE102022209791B3 (de) 2022-09-19 2023-07-06 Carl Zeiss Smt Gmbh EUV-Kollektor für eine EUV-Projektionsbelichtungsanlage
DE102023200970A1 (de) * 2023-02-07 2024-08-08 Carl Zeiss Smt Gmbh Optisches element mit polierschicht
DE102023205564A1 (de) * 2023-06-14 2024-12-19 Carl Zeiss Smt Gmbh Verfahren zur Erzeugung einer Temperierhohlstruktur in einem Substrat mit Hilfe eines Bearbeitungslichtstrahls
DE102023211553A1 (de) * 2023-11-20 2025-05-22 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Herstellung eines Elements, Element, insbesondere optisches Element, und Lithografiesystem

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Publication number Publication date
US20110051267A1 (en) 2011-03-03
DE102009039400A8 (de) 2011-06-01
US8342701B2 (en) 2013-01-01
DE102009039400A1 (de) 2011-03-03
JP2011053687A (ja) 2011-03-17

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