JP5826282B2 - リン含有酸基及びアルコキシシラン基を含むフッ素化組成物 - Google Patents
リン含有酸基及びアルコキシシラン基を含むフッ素化組成物 Download PDFInfo
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- JP5826282B2 JP5826282B2 JP2013537686A JP2013537686A JP5826282B2 JP 5826282 B2 JP5826282 B2 JP 5826282B2 JP 2013537686 A JP2013537686 A JP 2013537686A JP 2013537686 A JP2013537686 A JP 2013537686A JP 5826282 B2 JP5826282 B2 JP 5826282B2
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- 239000000203 mixture Substances 0.000 title claims description 65
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- 229910052698 phosphorus Inorganic materials 0.000 title claims description 15
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- 239000011574 phosphorus Substances 0.000 title claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 32
- 229910052739 hydrogen Inorganic materials 0.000 claims description 29
- 239000001257 hydrogen Substances 0.000 claims description 29
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 24
- 125000002947 alkylene group Chemical group 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
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- 238000005260 corrosion Methods 0.000 claims description 13
- 230000007797 corrosion Effects 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 229920000642 polymer Polymers 0.000 claims description 10
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical group C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
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- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
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- 239000006184 cosolvent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
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- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 2
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- 230000003068 static effect Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 2
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 description 1
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- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
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- KSJBMDCFYZKAFH-UHFFFAOYSA-N 2-(2-sulfanylethylsulfanyl)ethanethiol Chemical compound SCCSCCS KSJBMDCFYZKAFH-UHFFFAOYSA-N 0.000 description 1
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- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005003 perfluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
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- 125000003226 pyrazolyl group Chemical group 0.000 description 1
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- SXHLENDCVBIJFO-UHFFFAOYSA-M sodium;2-[2-(2-dodecoxyethoxy)ethoxy]ethyl sulfate Chemical compound [Na+].CCCCCCCCCCCCOCCOCCOCCOS([O-])(=O)=O SXHLENDCVBIJFO-UHFFFAOYSA-M 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/02—Homopolymers or copolymers of monomers containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y10T428/31699—Ester, halide or nitrile of addition polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31935—Ester, halide or nitrile of addition polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41028010P | 2010-11-04 | 2010-11-04 | |
| US61/410,280 | 2010-11-04 | ||
| PCT/US2011/056988 WO2012061021A1 (en) | 2010-11-04 | 2011-10-20 | Fluorinated composition comprising phosphorus containing acid group and alkoxy silane group |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014500896A JP2014500896A (ja) | 2014-01-16 |
| JP2014500896A5 JP2014500896A5 (enExample) | 2014-11-27 |
| JP5826282B2 true JP5826282B2 (ja) | 2015-12-02 |
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| EP (2) | EP2635614B1 (enExample) |
| JP (1) | JP5826282B2 (enExample) |
| CN (1) | CN103180353B (enExample) |
| WO (1) | WO2012061021A1 (enExample) |
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|---|---|---|---|---|
| KR101611006B1 (ko) * | 2013-08-13 | 2016-04-08 | 제일모직주식회사 | 광경화 조성물 및 이를 사용하여 제조된 봉지화된 장치 |
| KR20170042683A (ko) | 2014-08-19 | 2017-04-19 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 양친매성 중합체, 코팅 조성물, 및 방법 |
| KR101947421B1 (ko) * | 2014-10-20 | 2019-02-14 | (주)엘지하우시스 | 표면코팅용 수성 조성물 및 이를 적용한 자동차용 시트 |
| US10167356B2 (en) | 2014-12-18 | 2019-01-01 | 3M Innovative Properties Company | Fluorinated polymers comprising phosphonic moieties |
| EP3070133B1 (fr) * | 2015-03-18 | 2019-02-20 | The Swatch Group Research and Development Ltd. | Pièce d'horlogerie ou de bijouterie comprenant une surface recouverte d'un agent épilame et procédé d'épilamage d'un tel substrat |
| JP6488890B2 (ja) * | 2015-06-03 | 2019-03-27 | 信越化学工業株式会社 | フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品 |
| CN108137798B (zh) * | 2015-10-09 | 2020-06-09 | 信越化学工业株式会社 | 含有氟代氧化亚烷基的聚合物改性膦酸衍生物、以及对应的表面处理剂和表面处理方法 |
| EP3290451B1 (fr) * | 2016-09-01 | 2021-08-18 | The Swatch Group Research and Development Ltd. | Substrat comprenant une surface recouverte d'un agent épilame et procédé d'épilamage d'un tel substrat |
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| US2732398A (en) | 1953-01-29 | 1956-01-24 | cafiicfzsojk | |
| US2803615A (en) | 1956-01-23 | 1957-08-20 | Minnesota Mining & Mfg | Fluorocarbon acrylate and methacrylate esters and polymers |
| US3250808A (en) | 1963-10-31 | 1966-05-10 | Du Pont | Fluorocarbon ethers derived from hexafluoropropylene epoxide |
| US4147685A (en) * | 1977-01-28 | 1979-04-03 | General Electric Company | Primer compositions for adhering silicone compositions |
| JPS60262870A (ja) * | 1984-06-12 | 1985-12-26 | Dainippon Ink & Chem Inc | 表面処理剤 |
| EP0340753A3 (en) * | 1988-05-06 | 1990-05-02 | Showa Denko Kabushiki Kaisha | Surface treating agent |
| JPH02258885A (ja) * | 1989-03-31 | 1990-10-19 | Showa Denko Kk | 含フッ素表面処理剤 |
| US5883147A (en) * | 1994-01-04 | 1999-03-16 | Japan Institute Of Advanced Dentistry | Photopolymerizable adhesive composition |
| US5468784A (en) * | 1994-02-23 | 1995-11-21 | Tamura Kaken Corporation | Photopolymerizable resin composition |
| US5851674A (en) | 1997-07-30 | 1998-12-22 | Minnesota Mining And Manufacturing Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| WO1999037626A1 (en) | 1998-01-27 | 1999-07-29 | Minnesota Mining And Manufacturing Company | Fluorochemical benzotriazoles |
| EP2082995B1 (en) | 1999-10-27 | 2012-08-08 | 3M Innovative Properties Company | Method of reducing the surface tension, of forming a stable foam and to increase the wetting of a coating |
| US6566439B2 (en) * | 2000-02-04 | 2003-05-20 | Sony Chemicals Corporation | Lowly-adhesive coating material |
| EP1311637B8 (en) | 2000-08-18 | 2006-06-28 | 3M Innovative Properties Company | Fluoroalkyl (meth)acrylate copolymer coating compositions |
| KR100801820B1 (ko) * | 2002-11-19 | 2008-02-11 | 삼성전자주식회사 | 표면수식된 탄소나노튜브를 이용한 패턴 형성방법 |
| TW583226B (en) * | 2002-12-17 | 2004-04-11 | Ind Technology Res Inst Materi | Formulation in preparing solid electrolytic capacitor and process thereof |
| CN100558735C (zh) * | 2003-08-21 | 2009-11-11 | 3M创新有限公司 | 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物 |
| EP1698644B1 (en) * | 2003-11-21 | 2013-02-27 | DIC Corporation | Fluorine-containing photocuring composition |
| US6995222B2 (en) | 2003-12-17 | 2006-02-07 | 3M Innovative Properties Company | Coating compositions with reactive fluorinated copolymers having pendant perfluoropolyether groups |
| US7321018B2 (en) | 2003-12-23 | 2008-01-22 | 3M Innovative Properties Company | Compositions for aqueous delivery of fluorinated oligomeric silanes |
| US7148360B2 (en) | 2004-01-30 | 2006-12-12 | 3M Innovative Properties Company | Perfluoropolyether benzotriazole compounds |
| WO2008077060A1 (en) * | 2006-12-19 | 2008-06-26 | Dow Global Technologies, Inc. | Improved composites and methods for conductive transparent substrates |
| FR2910475B1 (fr) * | 2006-12-22 | 2009-02-20 | Arkema France | Copolymeres a base d'unites methacrylates, leur procede de preparation et leurs utilisations |
| EP2444428B1 (en) | 2007-06-06 | 2013-07-24 | 3M Innovative Properties Company | Fluorinated compositions and surface treatments made therefrom |
| US20080315459A1 (en) | 2007-06-21 | 2008-12-25 | 3M Innovative Properties Company | Articles and methods for replication of microstructures and nanofeatures |
| JP2009098658A (ja) * | 2007-09-25 | 2009-05-07 | Fujifilm Corp | 光学フィルム、偏光板、及び画像表示装置 |
| US7923133B2 (en) * | 2007-12-21 | 2011-04-12 | 3M Innovative Properties Company | Coatings and methods for particle reduction |
| US8299139B1 (en) * | 2009-09-08 | 2012-10-30 | Ovation Polymer Technology And Engineered Materials, Inc. | Process and reactor for synthesis of ultra-high molecular weight acrylic polymers |
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- 2011-10-20 WO PCT/US2011/056988 patent/WO2012061021A1/en not_active Ceased
- 2011-10-20 JP JP2013537686A patent/JP5826282B2/ja not_active Expired - Fee Related
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- 2011-10-20 EP EP14193882.9A patent/EP2851376B1/en not_active Not-in-force
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| US20130216837A1 (en) | 2013-08-22 |
| WO2012061021A1 (en) | 2012-05-10 |
| EP2851376A1 (en) | 2015-03-25 |
| CN103180353A (zh) | 2013-06-26 |
| EP2635614A1 (en) | 2013-09-11 |
| JP2014500896A (ja) | 2014-01-16 |
| EP2635614B1 (en) | 2015-08-12 |
| US8679636B2 (en) | 2014-03-25 |
| EP2851376B1 (en) | 2016-04-20 |
| CN103180353B (zh) | 2016-02-17 |
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