JP5818852B2 - 熱音響装置 - Google Patents
熱音響装置 Download PDFInfo
- Publication number
- JP5818852B2 JP5818852B2 JP2013212653A JP2013212653A JP5818852B2 JP 5818852 B2 JP5818852 B2 JP 5818852B2 JP 2013212653 A JP2013212653 A JP 2013212653A JP 2013212653 A JP2013212653 A JP 2013212653A JP 5818852 B2 JP5818852 B2 JP 5818852B2
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- Prior art keywords
- sound wave
- carbon nanotube
- electrode
- electrodes
- wave generating
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 114
- 239000000758 substrate Substances 0.000 claims description 59
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 239000002041 carbon nanotube Substances 0.000 description 85
- 229910021393 carbon nanotube Inorganic materials 0.000 description 84
- 239000002238 carbon nanotube film Substances 0.000 description 45
- 239000010410 layer Substances 0.000 description 21
- 239000003960 organic solvent Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000017525 heat dissipation Effects 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000000644 propagated effect Effects 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002079 double walled nanotube Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002048 multi walled nanotube Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002109 single walled nanotube Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 206010037660 Pyrexia Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
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- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 238000009792 diffusion process Methods 0.000 description 1
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- 230000001788 irregular Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021404 metallic carbon Inorganic materials 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
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- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R23/00—Transducers other than those covered by groups H04R9/00 - H04R21/00
- H04R23/002—Transducers other than those covered by groups H04R9/00 - H04R21/00 using electrothermic-effect transducer
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Carbon And Carbon Compounds (AREA)
- Circuit For Audible Band Transducer (AREA)
Description
前記共通電極は前記少なくとも一つの第二電極と電気的に接続される
図1を参照すると、本実施例の熱音響装置10は、基板11と、複数の音波発生ユニット12と、複数のスイッチ素子13と、走査集積回路14と、駆動集積回路15と、共通電極16と、を含む。各音波発生ユニット12は、一つのスイッチ素子13と共通電極16とに電気的に接続される。各スイッチ素子13は、走査集積回路14と駆動集積回路15とにそれぞれ電気的に接続される。これにより、各スイッチ素子13は制御信号を受信し、音波発生ユニット12の作動を制御する。
11 基板
12 音波発生ユニット
13 スイッチ素子
14 走査集積回路
15 駆動集積回路
16 共通電極
17 絶縁マット
121 音波発生素子
1212 第一区域
1214 第二区域
122 第一電極
123 絶縁層
124 第二電極
1221 第一連続部
1241 第二連続部
126 凹部
128 突起
141 走査電極
151 駆動電極
Claims (2)
- シリコン基板と、複数の音波発生ユニットと、複数のスイッチ素子と、駆動集積回路と、走査集積回路と、共通電極と、を含む熱音響装置であって、
前記複数の音波発生ユニットは前記シリコン基板の表面に設置され、各音波発生ユニットは音波発生素子と、複数の第一電極と、複数の第二電極と、を含み、
前記シリコン基板の表面に、複数の突起及び複数の凹部が形成され、前記複数の突起及び前記複数の凹部が交互に設置され、
前記音波発生素子は、カーボンナノチューブ構造体を含み、前記シリコン基板の表面に設置され、且つ前記複数の第一電極及び複数の第二電極の間に直列に設置され、前記複数の第一電極及び前記複数の第二電極は、前記突起に対応する位置に交互にそれぞれ設置されて、前記音波発生素子と電気的に接続され、
前記複数のスイッチ素子は前記複数の音波発生ユニットと一対一に対応して設置され、各スイッチ素子は各音波発生ユニットの第一電極と電気的に接続され、
前記駆動集積回路は複数の駆動電極を含み、前記複数のスイッチ素子は駆動電極と第一電極の間に直列に設置され、駆動電極はスイッチ素子によって、音波発生ユニットに駆動電圧を印加し、
前記走査集積回路は複数の走査電極を含み、該走査電極は前記スイッチ素子と電気的に接続され、前記走査電極は前記スイッチ素子によって、前記駆動電極が前記音波発生ユニットに駆動電圧を印加することを制御し、
前記共通電極は前記複数の第二電極と電気的に接続されることを特徴とする熱音響装置。 - 前記カーボンナノチューブ構造体の前記凹部と対応する部分は、懸架して設置され、
前記凹部の深さは100μm〜200μmであることを特徴とする請求項1に記載の熱音響装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210587688.9A CN103905964B (zh) | 2012-12-29 | 2012-12-29 | 热致发声装置 |
CN201210587688.9 | 2012-12-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014131258A JP2014131258A (ja) | 2014-07-10 |
JP5818852B2 true JP5818852B2 (ja) | 2015-11-18 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013212653A Active JP5818852B2 (ja) | 2012-12-29 | 2013-10-10 | 熱音響装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8873775B2 (ja) |
JP (1) | JP5818852B2 (ja) |
CN (1) | CN103905964B (ja) |
TW (1) | TWI492220B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201918079A (zh) * | 2017-10-17 | 2019-05-01 | 友達光電股份有限公司 | 音效系統 |
US11172829B2 (en) * | 2020-04-21 | 2021-11-16 | Endra Life Sciences Inc. | Thermoacoustic transducer with integrated switch |
CN113676797B (zh) * | 2021-08-25 | 2024-03-01 | 福州京东方光电科技有限公司 | 一种发声装置以及显示系统 |
CN114225247B (zh) * | 2021-12-06 | 2022-11-01 | 大连理工大学 | 基于碳纳米管薄膜热声效应的柔性可变频超声治疗探头 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04180744A (ja) | 1990-11-16 | 1992-06-26 | Hitachi Ltd | 超音波診断装置 |
JP3571887B2 (ja) * | 1996-10-18 | 2004-09-29 | キヤノン株式会社 | アクティブマトリクス基板及び液晶装置 |
JP2005304692A (ja) | 2004-04-20 | 2005-11-04 | Toshiba Corp | 超音波画像診断装置 |
JP4073890B2 (ja) * | 2004-04-22 | 2008-04-09 | シャープ株式会社 | 薄膜回路基板、及びそれを備えた圧電式スピーカ装置及び表示装置並びに音源内蔵型表示装置 |
US8068624B2 (en) * | 2008-04-28 | 2011-11-29 | Beijing Funate Innovation Technology Co., Ltd. | Thermoacoustic device |
CN101820571B (zh) * | 2009-02-27 | 2013-12-11 | 清华大学 | 扬声器系统 |
TWI356396B (en) * | 2008-06-27 | 2012-01-11 | Hon Hai Prec Ind Co Ltd | Acoustic device |
CN101715160B (zh) * | 2008-10-08 | 2013-02-13 | 清华大学 | 柔性发声装置及发声旗帜 |
US8176787B2 (en) * | 2008-12-17 | 2012-05-15 | General Electric Company | Systems and methods for operating a two-dimensional transducer array |
CN101783995B (zh) * | 2009-01-15 | 2014-03-05 | 北京富纳特创新科技有限公司 | 热致发声装置 |
CN101771922B (zh) * | 2008-12-30 | 2013-04-24 | 清华大学 | 发声装置 |
TWI382772B (zh) * | 2009-01-16 | 2013-01-11 | Beijing Funate Innovation Tech | 熱致發聲裝置 |
CN102056065B (zh) * | 2009-11-10 | 2014-11-12 | 北京富纳特创新科技有限公司 | 发声装置 |
JP2012205198A (ja) * | 2011-03-28 | 2012-10-22 | Yamaha Corp | 熱音響装置 |
US8811632B2 (en) | 2011-03-29 | 2014-08-19 | Tsinghua University | Thermoacoustic device |
CN102724619A (zh) | 2011-03-29 | 2012-10-10 | 清华大学 | 热致发声装置及电子装置 |
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2012
- 2012-12-29 CN CN201210587688.9A patent/CN103905964B/zh active Active
-
2013
- 2013-01-11 TW TW102101001A patent/TWI492220B/zh active
- 2013-06-20 US US13/923,327 patent/US8873775B2/en active Active
- 2013-10-10 JP JP2013212653A patent/JP5818852B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
CN103905964B (zh) | 2017-11-14 |
TWI492220B (zh) | 2015-07-11 |
US20140185840A1 (en) | 2014-07-03 |
US8873775B2 (en) | 2014-10-28 |
CN103905964A (zh) | 2014-07-02 |
TW201427442A (zh) | 2014-07-01 |
JP2014131258A (ja) | 2014-07-10 |
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