JP5805055B2 - Horizontal conveyance type electroplating equipment - Google Patents

Horizontal conveyance type electroplating equipment Download PDF

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JP5805055B2
JP5805055B2 JP2012256981A JP2012256981A JP5805055B2 JP 5805055 B2 JP5805055 B2 JP 5805055B2 JP 2012256981 A JP2012256981 A JP 2012256981A JP 2012256981 A JP2012256981 A JP 2012256981A JP 5805055 B2 JP5805055 B2 JP 5805055B2
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oxygen gas
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正次 長倉
正次 長倉
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丸仲工業株式会社
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本発明は、プリント基板等の板状の被メッキ物を水平搬送させながら電解メッキ処理する水平搬送式の電解メッキ装置であり、電解メッキ処理中に陽極から発生する酸素ガス泡の泡付着に起因するメッキ被膜のばらつきを解消し、均一なメッキ被膜の形成を可能する技術に関する。   The present invention is a horizontal transport type electroplating apparatus that performs electrolytic plating while horizontally transporting a plate-like object to be plated such as a printed circuit board, resulting from adhesion of bubbles of oxygen gas bubbles generated from an anode during the electrolytic plating process. The present invention relates to a technique that eliminates variations in the plating film to be formed and enables the formation of a uniform plating film.

特許文献1に、電解室内の電解浴中に上部陽極と下部陽極を配設し、電解浴中の上部陽極と下部陽極の間を板状の被メッキ物が水平状態で連続的に通過されることによって、板状の被メッキ物の表面に金属を電着する電解処理装置が公開されている。   In Patent Document 1, an upper anode and a lower anode are disposed in an electrolytic bath in an electrolytic chamber, and a plate-like object to be plated is continuously passed between the upper anode and the lower anode in the electrolytic bath in a horizontal state. Thus, an electrolytic treatment apparatus for electrodepositing a metal on the surface of a plate-like object to be plated has been disclosed.

このような電解処理装置では、陽極として特に不溶性陽極を用いた場合、この陽極から大量の酸素ガスが発生し、この酸素ガスは電解浴中で大量の酸素ガス泡となって電解浴中に混ざり拡散される。電解浴中に混ざり拡散された泡は上下の陽極間を水平搬送させながら電解メッキ処理される板状の被メッキ物の表面に滞留し付着される。特に水平搬送される板状の被メッキ物の下面部は酸素ガス泡の上昇現象で大量の酸素ガス泡が滞留され易い。水平搬送される板状の被メッキ物の表面に滞留し付着した大量の酸素ガス泡は、メッキ処理される被メッキ物の表面と電解浴の接触を妨げ、被メッキ物の表面に均一なメッキ被膜を形成するのに大きな妨げとなっている。   In such an electrolytic treatment apparatus, particularly when an insoluble anode is used as the anode, a large amount of oxygen gas is generated from the anode, and this oxygen gas becomes a large amount of oxygen gas bubbles in the electrolytic bath and is mixed in the electrolytic bath. Diffused. Bubbles mixed and diffused in the electrolytic bath stay on and adhere to the surface of the plate-shaped object to be electroplated while being conveyed horizontally between the upper and lower anodes. In particular, a large amount of oxygen gas bubbles tend to stay on the lower surface of the plate-like object to be horizontally conveyed due to the rising phenomenon of oxygen gas bubbles. A large amount of oxygen gas bubbles staying and adhering to the surface of the plate-shaped object to be horizontally conveyed interferes with the contact between the surface of the object to be plated and the electrolytic bath, and the surface of the object to be plated is uniformly plated. This is a great hindrance to the formation of the film.

本発明者は、このような泡付着に起因した弊害を解消することを目的としたメッキ装置を開発し提案した(特許文献2)。この特許文献2の装置は、水平搬送される板状の被メッキ物の板面に付着した酸素ガス泡を斜め噴流吐出管の斜め噴流で搬送通路の側部方向に直接噴き飛ばし、噴き飛ばされ上昇現象で電解浴中を上昇した酸素ガス泡を電解メッキ処理槽の側部のオーバーフロー口から槽外に流出するようにしたものである。   The present inventor has developed and proposed a plating apparatus for the purpose of eliminating the adverse effects caused by such bubble adhesion (Patent Document 2). In the apparatus of Patent Document 2, oxygen gas bubbles adhering to the plate surface of a plate-like object to be horizontally conveyed are directly blown off in the direction of the side of the conveyance passage by an oblique jet of an oblique jet discharge pipe, and then blown off. Oxygen gas bubbles that have risen in the electrolytic bath due to the rising phenomenon flow out of the tank from the overflow port on the side of the electrolytic plating tank.

しかし、特許文献2の泡除去手段では、酸素ガス泡が被メッキ物の板面の近くで拡散してしまい、泡付着に起因した弊害を完全に解消できるものではなかった。また、泡(酸素ガス泡)を酸素ガスとして液外に効率的に排出できないものであった。   However, in the bubble removing means of Patent Document 2, the oxygen gas bubbles diffuse near the plate surface of the object to be plated, and the adverse effects caused by the bubble adhesion cannot be completely eliminated. Further, bubbles (oxygen gas bubbles) cannot be efficiently discharged out of the liquid as oxygen gas.

特開昭63−76898号公報JP-A-63-76898 実用新案登録第3173836号公報Utility Model Registration No. 317336

本発明は、このような実情に鑑み、電解浴中の上下の陽極間をプリント基板等の板状の被メッキ物が水平姿勢で水平方向に搬送通過される過程でこの被メッキ物の表面に電解メッキする水平電解メッキ装置において、電解メッキ処理中に陽極から発生する酸素ガス泡を所定位置に効率的に集め、集めた酸素ガス泡を液中から液外に酸素ガスとして効率的に排出できるようにし、電解メッキ処理中に陽極から発生する酸素ガス泡が液中に拡散し混合されてしまう弊害を解消し、よって、メッキ処理される被メッキ物の表面に泡が付着される弊害に起因したメッキ被膜のばらつきを解消し、板状の被メッキ物の表面に均一なメッキ被膜を形成できるようにすることを技術課題とするものである。   In view of such circumstances, the present invention provides a plate-like object to be plated, such as a printed circuit board, which is transported in a horizontal position between the upper and lower anodes in the electrolytic bath in the horizontal direction. In a horizontal electrolytic plating apparatus that performs electrolytic plating, oxygen gas bubbles generated from the anode during the electrolytic plating process can be efficiently collected at a predetermined position, and the collected oxygen gas bubbles can be efficiently discharged from the liquid to the outside as oxygen gas. In this way, the problem that oxygen gas bubbles generated from the anode during the electrolytic plating process are diffused and mixed in the liquid is eliminated, and thus the problem is that the bubbles adhere to the surface of the object to be plated. An object of the present invention is to eliminate the unevenness of the plated film and to form a uniform plated film on the surface of the plate-shaped object to be plated.

上記した課題を解決するため、本発明(請求項1の発明)は、エンドレスに周回駆動される対の搬送駆動手段が板状の被メッキ物の搬送通路を間にして離間して配設され、この搬送駆動手段に複数のクランプをそれぞれ取付けあり、この複数のクランプで平行な両側縁部をもつ板状の被メッキ物の両側縁部を掴持し、電解メッキ処理槽の電解メッキ液の液中を被メッキ物の板面が上下になる水平姿勢で水平方向に連続搬送する搬送装置と、前記電解メッキ処理槽の電解メッキ液の液中に配設され、前記搬送装置で水平搬送される被メッキ物の水平な搬送通過面の上下位置に該搬送通過面と互いに平行に配設され、且つ搬送通過方向に一定の間隔を空けて並べて配設された複数の板状の上部陽極と下部陽極をそれぞれ備え、この上部陽極と下部陽極の間を前記クランプから陰極電流(カソード電流)を給電された被メッキ物が水平に通過されることによって、この被メッキ物の表面にメッキ被膜を形成する水平搬送式電解メッキ装置において、前記被メッキ物の水平な搬送通過面と前記下部陽極の間にこの下部陽極の対向面(上面)から被メッキ物の水平な搬送通過面を上下方向に隔離する下部隔膜を配設すると共に、前記被メッキ物の水平な搬送通過面と前記上部陽極の間にこの上部陽極の対向面(下面)から被メッキ物の水平な搬送通過面を上下方向に隔離する上部隔膜を配設し、この各隔膜は陽極からの金属イオンを通過させるが陽極から発生する酸素ガス泡は通過させない材質の膜で形成してあり、前記下部陽極の片側の側部の近傍に液流発生手段を配設すると共に、この下部陽極の反対側の側部の近傍に泡集合排出装置を配設し、前記液流発生手段は、下部陽極から発生する泡(酸素ガス泡)がこの下部陽極とこの下部陽極の上方に離間配置された下部隔膜との間の離間ゾーンを通って該液流発生手段の配設位置とは反対側の側部方向の外側に向けて緩やかに移動される液流を発生(吐出する)する液流吐出手段とし、前記泡集合排出装置は、下部陽極と下部隔膜との間の前記離間ゾーンに向けて泡(酸素ガス泡)受け入れ口を開口した泡集合部と、この泡集合部に集められた泡を泡集合部から電解メッキ液の液面より上方(空中)に酸素ガスとして排出する上下方向の排出通路を備えたガス排出部と、前記下部隔膜の側部と前記泡集合部の間をその上部において遮蔽する遮蔽部を備えたことを特徴とする水平搬送式電解メッキ装置を提供する。 In order to solve the above-described problems, the present invention (invention of claim 1) is configured such that a pair of conveyance driving means that are driven endlessly is disposed with a conveyance path for a plate-shaped object to be spaced apart. A plurality of clamps are respectively attached to the transport drive means, and the plurality of clamps hold both side edges of the plate-like object having parallel side edges, and the electrolytic plating solution for the electrolytic plating tank Is disposed in the electrolytic plating solution in the electrolytic plating bath, and is transported horizontally by the transport device. A plurality of plate-like upper anodes disposed in parallel with the transport passage surface at a vertical position of a horizontal transport passage surface of the object to be plated and arranged side by side with a certain interval in the transport passage direction With a lower anode and a lower anode respectively. In the horizontal conveyance type electroplating apparatus for forming a plating film on the surface of the object to be plated by horizontally passing the object to be plated supplied with a cathode current (cathode current) from the clamp between the anodes, A lower diaphragm is provided between the horizontal transport passage surface of the object to be plated and the lower anode to vertically separate the horizontal transport passage surface of the object to be plated from the facing surface (upper surface) of the lower anode. An upper diaphragm is disposed between the horizontal transport passage surface of the object to be plated and the upper anode to vertically separate the horizontal transport passage surface of the object to be plated from the opposing surface (lower surface) of the upper anode. The diaphragm is formed of a film made of a material that allows metal ions from the anode to pass but does not allow oxygen gas bubbles generated from the anode to pass through. The liquid flow generating means is disposed in the vicinity of one side of the lower anode. ,this A bubble collecting / discharging device is disposed in the vicinity of the side portion on the opposite side of the partial anode, and the liquid flow generating means is configured such that bubbles (oxygen gas bubbles) generated from the lower anode are separated above the lower anode and the lower anode. A liquid flow that gently moves toward the outside in the side direction opposite to the position where the liquid flow generating means is disposed is generated (discharged) through a separation zone between the lower diaphragm and the disposed lower diaphragm. The bubble collecting and discharging device is a liquid discharge means, and the bubble collecting and discharging device collects a bubble collecting portion having a bubble (oxygen gas bubble) receiving port opened toward the separation zone between the lower anode and the lower diaphragm, and the bubble collecting portion. A gas discharge portion having a vertical discharge passage for discharging the generated bubbles from the bubble collection portion as oxygen gas above (in the air) above the surface of the electrolytic plating solution, a side portion of the lower diaphragm, and a bubble collection portion Horizontal transportation characterized by having a shielding part that shields the gap at the top A feed type electroplating apparatus is provided.

この発明によれば、各下部陽極から発生する泡(酸素ガス泡)が被メッキ物の水平な搬送通過面の方向へ拡散し移動するのを下部隔膜で遮断できると共に、各上部陽極から発生する泡(酸素ガス泡)が被メッキ物の水平な搬送通過面の方向へ拡散し移動するのを上部隔膜で遮断でき、水平搬送されながらメッキされる被メッキ物の近くに泡(酸素ガス泡)が滞留する弊害を防止でき、被メッキ物に泡(酸素ガス泡)が付着する弊害を解消できる。しかも、隔膜(上部隔膜、下部隔膜)を配設したことによって、陽極(上部陽極、下部陽極)として不溶性アノードを使用した際に生じるメッキ添加剤(光沢剤など)の消耗を軽減できる。 According to this invention, bubbles (oxygen gas bubbles) generated from each lower anode can be blocked by the lower diaphragm from diffusing and moving in the direction of the horizontal transport passage surface of the object to be plated, and are generated from each upper anode. The upper diaphragm can prevent bubbles (oxygen gas bubbles) from diffusing and moving in the direction of the horizontal conveyance passage of the object to be plated, and bubbles (oxygen gas bubbles) near the object to be plated while being horizontally conveyed Can be prevented, and the problem of bubbles (oxygen gas bubbles) adhering to the object to be plated can be eliminated. In addition, by providing the diaphragm (upper diaphragm, lower diaphragm), it is possible to reduce the consumption of plating additives (such as brightener) that occurs when an insoluble anode is used as the anode (upper anode, lower anode).

更に、この発明によれば、下部陽極から発生する泡(酸素ガス泡)は液流発生手段の液流で下部陽極と下部隔膜の間の離間ゾーンから一方の側部方向の外側に向けて緩やかに移動され、移動された泡は泡集合排出装置の泡(酸素ガス泡)受け入れ口から泡集合部に集められ、泡集合部に集められた泡(酸素ガス泡)はガス排出部から酸素ガスとして液面より上方(空中)に排出される。これによって、下部陽極から発生する泡(酸素ガス泡)が下部隔膜の下面側に滞留する弊害を解消できる。Furthermore, according to the present invention, bubbles (oxygen gas bubbles) generated from the lower anode are gradually flown from the separation zone between the lower anode and the lower diaphragm toward the outside in one side direction by the liquid flow of the liquid flow generating means. The moved bubbles are collected in the bubble collecting part from the bubble (oxygen gas bubble) receiving port of the bubble collecting and discharging device, and the bubbles (oxygen gas bubbles) collected in the bubble collecting part are oxygen gas from the gas discharging part. Is discharged above the liquid level (in the air). This eliminates the adverse effect that bubbles (oxygen gas bubbles) generated from the lower anode stay on the lower surface side of the lower diaphragm.

また、上記した課題を解決するため、本発明(請求項2の発明)は、前記上部陽極の上面側にこの上部陽極から発生する泡(酸素ガス泡)を電解メッキ液の液面より上方(空中)に酸素ガスとして排出する泡集合排出フードを各上部陽極に対応させてそれぞれ取付け、この泡集合排出フードは、上部陽極の上面側に泡集合室を画成するべく該上部陽極の上面を被う被い部と、この被い部の中央部に突出形成され、電解メッキ液の液面より上方にガス排出口を開口させた排出部を備え、前記被い部の被い面を前記排出部に向けて上方に傾斜させた傾斜面としたことを特徴とする水平搬送式電解メッキ装置を提供する。   In order to solve the above-described problem, the present invention (invention of claim 2) is configured so that bubbles (oxygen gas bubbles) generated from the upper anode on the upper surface side of the upper anode are above the surface of the electrolytic plating solution ( A bubble collection exhaust hood that discharges as oxygen gas is attached to each upper anode in the air, and this foam collection discharge hood has an upper surface of the upper anode to define a bubble collection chamber on the upper surface side of the upper anode. A covering portion, and a discharge portion that protrudes from the center portion of the covering portion and has a gas discharge opening above the liquid surface of the electrolytic plating solution, and the covering surface of the covering portion is Provided is a horizontal conveyance type electroplating apparatus characterized by having an inclined surface that is inclined upward toward the discharge portion.

この発明によれば、各上部陽極から発生する泡(酸素ガス泡)は各上部陽極に取付けた泡集合排出フードの泡集合室の傾斜面に沿って電解メッキ液の液中を中央の排出部に向け上昇し、中央の排出部に集められる。排出部に集められた泡(酸素ガス泡)は排出口から酸素ガスとして液面より上方(空中)に排出される。   According to the present invention, bubbles (oxygen gas bubbles) generated from each upper anode are discharged through the center of the electrolytic plating solution along the inclined surface of the bubble collecting chamber of the bubble collecting discharge hood attached to each upper anode. Rises toward the center and is collected in the central discharge. Bubbles (oxygen gas bubbles) collected in the discharge section are discharged from the discharge port as oxygen gas above the liquid level (in the air).

また、上記した課題を解決するため、本発明(請求項3の発明)は、一単位の前記下部陽極と下部隔膜を搬送方向の前後で二つの範囲に区分けし、区分けした二つの範囲に対応させて設けた液流発生手段を互いに反対側の前記下部陽極の片側の側部の近傍にそれぞれ配設すると共に、この液流発生手段の配設位置とは反対側の下部陽極の側部の近傍に泡集合排出装置をそれぞれ配設し、前記液流発生手段は、下部陽極から発生する酸素ガス泡がこの下部陽極とこの下部陽極の上方に離間配置された下部隔膜との間の離間ゾーンを通って該液流発生手段の配設位置とは反対側の側部方向の外側に向けて緩やかに移動される液流を発生する液流吐出手段とし、前記泡集合排出装置は、下部陽極と下部隔膜との間の前記離間ゾーンに向けて酸素ガス泡受け入れ口を開口した泡集合部と、この泡集合部に集められた泡を泡集合部から電解メッキ液の液面より上方に酸素ガスとして排出する上下方向の排出通路を備えたガス排出部と、前記下部隔膜の側部と前記泡集合部の間をその上部において遮蔽する遮蔽部を備えたことを特徴とする、水平搬送式電解メッキ装置を提供する。 In order to solve the above problems, the present invention (the invention of claim 3) divides the unit of the lower anode and the lower diaphragm into two ranges before and after the conveying direction, and corresponds to the divided two ranges. Liquid flow generating means provided in the vicinity of one side of the lower anode opposite to each other, and the side of the lower anode opposite to the position of the liquid flow generating means. A bubble collecting and discharging device is provided in the vicinity, and the liquid flow generating means is a separation zone between an oxygen gas bubble generated from the lower anode and a lower diaphragm in which the lower anode is spaced above the lower anode. A liquid flow discharge means for generating a liquid flow that is gently moved toward the outside in the side direction opposite to the position where the liquid flow generation means is disposed. Oxygen gas towards the spacing zone between the lower diaphragm and the lower diaphragm A bubble collecting part having an opening in the receiving port, and a gas discharge part having a vertical discharge passage for discharging bubbles collected in the bubble collecting part as oxygen gas from the foam collecting part above the liquid surface of the electrolytic plating solution; A horizontal transport type electroplating apparatus is provided, comprising a shielding part that shields between the side part of the lower diaphragm and the bubble collecting part at the upper part thereof.

また、本発明では、前記液流発生手段が、搬送方向に管路を延ばした液流吐出管を下部陽極の側部の近傍に配設し、この液流吐出管に搬送方向に間隔をおいて複数の吐出ノズルを形成し、この吐出ノズルを該吐出ノズルから下部陽極と下部隔膜との間の前記離間ゾーンに向けてメッキ液を吐出するものとし、この吐出し液流によって前記離間ゾーン内を一方の側部から反対側の側部の方向に向けて流れる緩やかな液流を発生(吐出する)する液流吐出手段としたことを特徴としている。   Further, in the present invention, the liquid flow generating means is provided with a liquid flow discharge pipe extending in the transport direction in the vicinity of the side of the lower anode, and the liquid flow discharge pipe is spaced in the transport direction. A plurality of discharge nozzles are formed, and the plating solution is discharged from the discharge nozzles toward the separation zone between the lower anode and the lower diaphragm, and the discharge liquid flow causes the inside of the separation zone to be discharged. Is a liquid flow discharge means that generates (discharges) a gentle liquid flow that flows from one side toward the opposite side.

本発明によれば、電解浴中の上下の陽極間をプリント基板等の板状の被メッキ物が水平姿勢で水平方向に搬送通過される過程でこの被メッキ物の板面に電解メッキする水平電解メッキ装置において、電解メッキ処理中に陽極から発生する酸素ガス泡を所定位置に効率的に集め、集めた酸素ガス泡を液中から液外に酸素ガスとして効率的に排出できるため、電解メッキ処理中に陽極から発生する酸素ガス泡が液中に拡散され混合されてしまう弊害を防止できる。よって、電解メッキ処理中に被メッキ物の表面に泡が付着される弊害に起因したメッキ被膜のばらつきを解消でき、板状の被メッキ物の表面に均一なメッキ被膜を形成できる。   According to the present invention, a plate-like object to be plated such as a printed circuit board is conveyed horizontally in a horizontal posture between the upper and lower anodes in the electrolytic bath. In electroplating equipment, oxygen gas bubbles generated from the anode during the electroplating process can be efficiently collected at a predetermined position, and the collected oxygen gas bubbles can be efficiently discharged from the liquid to the outside as oxygen gas. The adverse effect of oxygen gas bubbles generated from the anode during the treatment being diffused and mixed in the liquid can be prevented. Therefore, it is possible to eliminate variations in the plating film due to the adverse effect of bubbles adhering to the surface of the object to be plated during the electrolytic plating process, and to form a uniform plating film on the surface of the plate-like object to be plated.

本発明の実施形態を示す全体の概略平面図である。1 is an overall schematic plan view showing an embodiment of the present invention. 本発明の実施形態を示す一部縦断側面図である。It is a partially vertical side view showing an embodiment of the present invention. 本発明の実施形態を部分的に示す拡大平面図である。It is an enlarged plan view which shows an embodiment of the present invention partially. 本発明の実施形態を部分的に示す一部縦断した拡大正面図である。It is the enlarged front view which carried out the longitudinal cross-section partially showing the embodiment of the present invention.

本発明の実施形態を図面に基づいて説明する。図1〜図4の水平搬送式電解メッキ装置は、エンドレスに周回駆動される対の搬送駆動手段4,4が板状の被メッキ物P(例えばプリント配線基板などで孔や凹部を形成してある板状物を含む。)の搬送通路2を間にして離間して配設され、この搬送駆動手段4に複数のクランプ5をそれぞれ取付けあり、この複数のクランプ5で平行な両側縁部をもつ板状の被メッキ物Pの両側縁部を掴持し、電解メッキ処理槽1の電解メッキ液Wの液中を被メッキ物Pの板面が上下になる水平姿勢で水平方向に連続搬送する搬送装置3と、前記電解メッキ処理槽1の電解メッキ液Wの液中に配設され、前記搬送装置3で水平搬送される被メッキ物Pの水平な搬送通過面PLの上下位置に該搬送通過面PLと互いに平行に配設され、且つ搬送通過方向に一定の間隔を空けて並べて配設された複数の板状(ラス板などの有孔板状を含む)の上部陽極20と下部陽極21をそれぞれ備え、この上部陽極20と下部陽極21の間を前記クランプ5から陰極電流(カソード電流)を給電された被メッキ物Pが水平に通過されることによって、この被メッキ物Pの表面にメッキ被膜を形成するものである。 Embodiments of the present invention will be described with reference to the drawings. In the horizontal conveyance type electroplating apparatus shown in FIGS. 1 to 4, a pair of conveyance driving means 4 and 4 which are driven endlessly are formed with plate-like objects to be plated P (for example, a printed wiring board or the like, forming holes or recesses). A plurality of clamps 5 are respectively attached to the transport driving means 4, and both side edges parallel to each other with the plurality of clamps 5. The both sides of the plate-like object P having a surface are held, and the electrolytic plating solution W in the electroplating bath 1 is continuously in the horizontal position in a horizontal posture in which the plate surface of the object P is vertically moved. The transfer device 3 for transfer and the electrolytic plating solution W in the electrolytic plating treatment tank 1 are disposed in the upper and lower positions of the horizontal transfer passage surface PL of the object P to be horizontally transferred by the transfer device 3. It is arranged in parallel with the transport passage surface PL and is one in the transport passage direction. A plurality of plate-like (including a perforated plate shape such as lath plate) upper and lower anodes 20 and 21 arranged in a row are provided respectively, and the space between the upper and lower anodes 20 and 21 is described above. The plating object P to which the cathode current (cathode current) is fed from the clamp 5 is horizontally passed to form a plating film on the surface of the object to be plated P.

図1は、板状の被メッキ物Pが板面を上下にした水平状態で左側から搬入駆動ローラなどの搬入手段6で電解メッキ処理槽1に供給され、該処理槽1を該水平状態で連続的に矢印Aの方向に搬送させて通過し、電解メッキ処理後に処理槽1から搬出駆動ローラなどの搬出手段7で右方向へ搬出される、装置の概略平面図を示している。なお、水平状態の被メッキ物Pを電解メッキ処理槽1に搬入する横長の搬入口(図示せず。)、水平状態の被メッキ物Pを電解メッキ処理槽1から搬出する横長の搬出口(図示せず。)には、この搬入口と搬出口に対応する処理槽1の内側に上下二段のシールローラ8を水平に配設し、電解メッキ液Wが搬入口や搬出口から漏れないようにシールされている。なお図2において符号9はメッキ処理槽1の側壁に形成したオーバーフロー口であり、電解メッキ液Wの液面高さを調節している。   FIG. 1 shows that a plate-like object P is supplied from the left side to an electrolytic plating tank 1 by a loading means 6 such as a loading drive roller in a horizontal state with the plate surface up and down. FIG. 2 shows a schematic plan view of the apparatus that is continuously conveyed in the direction of arrow A, passes through, and is discharged to the right from the processing tank 1 by an unloading means 7 such as an unloading drive roller after electrolytic plating. A horizontally long inlet (not shown) for loading the object P to be plated in the horizontal state into the electrolytic plating tank 1, and a horizontally long outlet for unloading the object P in the horizontal state from the electrolytic plating tank 1 ( (Not shown), two upper and lower seal rollers 8 are horizontally disposed inside the processing tank 1 corresponding to the carry-in port and the carry-out port, so that the electrolytic plating solution W does not leak from the carry-in port or the carry-out port. So that it is sealed. In FIG. 2, reference numeral 9 is an overflow port formed on the side wall of the plating tank 1, and adjusts the level of the electrolytic plating solution W.

前記搬送装置3は、板状の被メッキ物Pの搬送通路2を間にした両側にエンドレスに周回駆動される駆動チェーン10(駆動ベルトでも良い。)を備えた搬送駆動手段4,4をそれぞれ配設し、この搬送駆動手段4(駆動チェーン10)に等間隔をおいて多数のクランプ5(図1では、クランプ5を駆動チェーン10の一部範囲のみで表示したが、駆動チェーン10の全範囲に亘り等間隔に取付けてある。)を取付け、前記搬送通路2を間にして互いに平行な内側の直線駆動経路部を移動する複数のクランプ5で平行な両側縁部をもつ板状の被メッキ物Pの両側縁部を上下方向から掴持し、該被メッキ物Pの板面を上下にした水平状態で電解メッキ処理槽1の電解メッキ液Wの液中を一方向(矢印A方向)に連続的に水平搬送するように構成されている。搬送駆動手段4(駆動チェーン10)は、スプロケット11,11に掛けられ、搬送駆動用モータ(図示せず。)によって一方のスプロケット11を回転駆動させて、エンドレスに周回駆動されるように成っている。搬送通路2を間にした両側に設けた搬送駆動手段4(駆動チェーン10)は、等速度で周回駆動されるように成っている。この搬送装置3,3による板状の被メッキ物Pの搬送速度は、1分当たり0.5m〜2mとしてあり、被メッキ物Pのメッキ処理条件によって可変としてある。   The conveying device 3 includes conveying driving means 4 and 4 each having a driving chain 10 (or a driving belt) that is driven endlessly on both sides of the conveying path 2 of the plate-shaped object P. A large number of clamps 5 (in FIG. 1, the clamps 5 are shown only in a partial range of the drive chain 10) are arranged at regular intervals on the transport drive means 4 (drive chain 10). Are attached at equal intervals over the range), and a plurality of clamps 5 that move parallel linear drive path portions with the conveying path 2 in between, and a plate-like object having both side edges parallel to each other. The both side edges of the plated product P are gripped from above and below, and the electrolytic plating solution W in the electrolytic plating bath 1 is unidirectionally (in the direction of arrow A) in a horizontal state with the plate surface of the plated product P up and down. ) Constructed to transport continuously horizontally It has been. The transport drive means 4 (drive chain 10) is hung on the sprockets 11 and 11, and is driven to rotate endlessly by rotating one of the sprockets 11 by a transport drive motor (not shown). Yes. The conveyance drive means 4 (drive chain 10) provided on both sides with the conveyance path 2 in between are configured to be driven around at a constant speed. The conveying speed of the plate-like object P to be conveyed by the conveying devices 3 and 3 is 0.5 m to 2 m per minute, and is variable depending on the plating process conditions of the object P to be plated.

前記クランプ5は、図2にその概略構成を示したように、上方部分が空中で陰極電流を給電され、下方部分が電解メッキ処理槽1の電解メッキ液Wの液中を移動可能な位置に配される上下方向に長い構造を有し、下端部に板状の被メッキ物Pの側縁部を上下方向において掴持及び開放するクランプ接点部12(上クランプ接点部と下クランプ接点部)を備えている。このクランプ接点部12を除く通電材から成るクランプ5の液中での液接触部分は絶縁被覆処理してある。図2に示したクランプ5は、前記搬送駆動手段4(駆動チェーン10)に取付けられる共に後述する固定ガイドレール(給電レール)13に係合される固定側クランプ杆14(この固定側クランプ杆14の下端部に下クランプ接点部を形成してある。)と、この固定側クランプ杆14に上下動自在に保持される可動側クランプ杆15を備え、この可動側クランプ杆15の下端部に形成した上クランプ接点部は、圧縮バネ16のバネ圧によって下動され、常態においてクランプ接点部12(上クランプ接点部と下クランプ接点部)を上下方向に閉じた状態に制御してある。搬送通路2の始端部位置と終端部位置におけるクランプ移動経路に高低差のあるクランプ開閉ガイド(図示せず)を配設し、クランプ5がクランプ開閉ガイド位置を通過する際に、クランプの上方部分に設けたクランプ開閉ガイド係合部材(図示せず)がクランプ開閉ガイドの高位ガイド面部に係合され、前記圧縮バネ16のバネ圧に抗して前記可動側クランプ杆15の上クランプ接点部を固定側クランプ杆14の下クランプ接点部から離間されるように上動させ、クランプ接点部12を上下方向に離間させた開状態に制御するように構成されている。これによって、板状の被メッキ物Pの搬送通路2の始端部を通過するクランプ5を開状態から被メッキ物Pの側縁部をクランプ可能な閉状態に制御し、被メッキ物Pの搬送通路2の終端部を通過するクランプ5を閉状態から被メッキ物の側縁部を開放可能な開状態に制御できるようにしている。   As shown in the schematic configuration of FIG. 2, the clamp 5 is fed with a cathode current in the air, and the lower part is in a position where it can move in the electrolytic plating solution W in the electrolytic plating bath 1. A clamp contact portion 12 (upper clamp contact portion and lower clamp contact portion) that has a long structure in the vertical direction and that grips and releases the side edge of the plate-like object P in the vertical direction at the lower end portion It has. The liquid contact portion in the liquid of the clamp 5 made of a current-carrying material excluding the clamp contact portion 12 is subjected to insulation coating. The clamp 5 shown in FIG. 2 is attached to the transport driving means 4 (drive chain 10) and is fixed to a fixed guide rail 14 (this fixed side clamp rod 14) which is engaged with a fixed guide rail (power supply rail) 13 described later. The lower clamp contact portion is formed at the lower end of the movable side clamp rod 15), and the movable side clamp rod 15 is provided on the fixed side clamp rod 14 so as to be movable up and down. The upper clamp contact portion is moved downward by the spring pressure of the compression spring 16, and the clamp contact portion 12 (upper clamp contact portion and lower clamp contact portion) is normally controlled to be closed in the vertical direction. A clamp opening / closing guide (not shown) having a height difference is disposed in the clamp movement path at the start position and the end position of the conveyance path 2, and when the clamp 5 passes the clamp opening / closing guide position, the upper portion of the clamp A clamp opening / closing guide engaging member (not shown) provided on the upper side of the clamp opening / closing guide is engaged with a higher guide surface portion of the clamp opening / closing guide, and the upper clamp contact portion of the movable side clamp rod 15 is against the spring pressure of the compression spring 16. It is configured to move upward so as to be separated from the lower clamp contact portion of the fixed-side clamp rod 14 and to control the clamp contact portion 12 to be opened in the vertical direction. As a result, the clamp 5 passing through the starting end of the conveyance path 2 for the plate-shaped object P is controlled from an open state to a closed state in which the side edge of the object P can be clamped, and the object P is conveyed. The clamp 5 passing through the end portion of the passage 2 can be controlled from a closed state to an open state in which the side edge of the object to be plated can be opened.

図2に示した断面矩形状の導電金属材からなる固定ガイドレール(給電レール)13は、前記搬送駆動手段4(駆動チェーン10)の内側の直線駆動経路部の下方位置に該直線駆動経路部と平行に配置してある。この固定ガイドレール(給電レール)13は搬送通路2の範囲にわたって延ばされている。内側の直線駆動経路部を移動するクランプ5は、この固定ガイドレール(給電レール)13に摺動接触されガイドされながら移動される。図示の実施例では前記固定ガイドレール13を給電レールとして機能させ、この固定ガイドレール(給電レール)13から導電性のクランプ5を通じて被メッキ物Pに陰極電流を給電するようにしてある。   A fixed guide rail (feeding rail) 13 made of a conductive metal material having a rectangular cross section shown in FIG. 2 is arranged at a position below the linear drive path inside the transport drive means 4 (drive chain 10). Are arranged in parallel. The fixed guide rail (power supply rail) 13 extends over the range of the conveyance path 2. The clamp 5 that moves on the inner linear drive path is slidably contacted with the fixed guide rail (power supply rail) 13 and moved while being guided. In the illustrated embodiment, the fixed guide rail 13 functions as a power supply rail, and the cathode current is supplied from the fixed guide rail (power supply rail) 13 to the object P to be plated through the conductive clamp 5.

板状(ラス板などの有孔板状を含む)の陽極(上部陽極20、下部陽極21)として、この実施例では、供給電源(図示せず。)に接続されている不溶性アノード(イリジウムやチタンなど)を用いている。この板状の上部陽極20と下部陽極21は、それぞれ複数の単位から構成され、複数の板状の上部陽極20と下部陽極21は、電解メッキ液Wの液中を水平搬送される板状の被メッキ物Pの水平な搬送通過面PLの上下位置に該被メッキ物Pの板面と平行に配設され、かつ該被メッキ物Pの搬送方向に一定の間隔を空けて並べて配設されている。前記電解メッキ処理槽1の電解メッキ液W中に金属イオンを析出する上下の陽極20,21の間を前記クランプ5を通じて陰極電流(カソード電流)を給電された板状の被メッキ物Pが水平に通過される過程でその表面に電気メッキ処理が施される。   In this embodiment, a plate-like anode (including a perforated plate such as a lath plate) (upper anode 20, lower anode 21) is used as an insoluble anode (iridium or iridium) connected to a power supply (not shown). Titanium etc.) are used. The plate-like upper anode 20 and lower anode 21 are each composed of a plurality of units, and the plurality of plate-like upper anode 20 and lower anode 21 are plate-like that are horizontally transported in the solution of the electrolytic plating solution W. Arranged parallel to the plate surface of the object to be plated P at the upper and lower positions of the horizontal conveying passage surface PL of the object to be plated P, and arranged side by side with a certain interval in the conveying direction of the object to be plated P. ing. A plate-shaped object P to which a cathode current (cathode current) is fed through the clamp 5 is horizontally provided between the upper and lower anodes 20 and 21 for depositing metal ions in the electrolytic plating solution W of the electrolytic plating bath 1. In the process of being passed through, the surface is subjected to electroplating.

図1,3,4に示したように、板状の被メッキ物Pの搬送通過面PLに向けて上下位置からメッキ液を吐出する噴流吐出管22を液中に配設してある。この噴流吐出管22は、搬送方向と直交する方向に管路を延ばし、この管路に間隔をおいて複数の吐出ノズル(図示せず。)を形成し、この複数の吐出ノズルから搬送通過面PLの全幅に向けてメッキ液を吐出するようにしてある。この噴流吐出管22は、搬送方向に一定の間隔を開けて複数並べて配設した各上部陽極20の間、搬送方向に一定の間隔を開けて複数並べて配設した各下部陽極21の間にそれぞれ配設してある。この噴流吐出管22の管路の中間部に形成した吐出ノズルから真下又は真上に向けてメッキ液を吐出するようにし、この噴流吐出管22の管路の両側部に形成した吐出ノズルから外側方向に斜めに向けてメッキ液を吐出するようにしてある。   As shown in FIGS. 1, 3, and 4, a jet discharge pipe 22 that discharges a plating solution from above and below is disposed in the liquid toward the transport passage surface PL of the plate-like object P to be plated. The jet discharge pipe 22 extends a pipe line in a direction orthogonal to the transport direction, forms a plurality of discharge nozzles (not shown) at intervals in the pipe path, and the transport passage surface extends from the plurality of discharge nozzles. The plating solution is discharged toward the entire width of PL. The jet discharge pipes 22 are arranged between the upper anodes 20 arranged in a plurality at a predetermined interval in the transport direction and between the lower anodes 21 arranged in a plurality at a predetermined interval in the transport direction. It is arranged. The plating solution is discharged from the discharge nozzle formed in the middle part of the pipe of the jet discharge pipe 22 directly below or directly above, and the outer side from the discharge nozzle formed on both sides of the pipe of the jet discharge pipe 22 The plating solution is discharged obliquely in the direction.

背景技術で述べたように、このような電解処理装置では、陽極として特に不溶性陽極を用いた場合、この陽極から大量の酸素ガスが発生し、この酸素ガスは電解浴中で大量の酸素ガス泡となって電解浴W中に混ざり拡散される。電解浴中に混ざり拡散された泡は上下の陽極間を水平搬送させながら電解メッキ処理される板状の被メッキ物の表面に滞留し付着される。特に水平搬送される板状の被メッキ物の下面部は酸素ガス泡の上昇現象で大量の酸素ガス泡が滞留され易い。水平搬送される板状の被メッキ物の表面に滞留し付着した大量の酸素ガス泡は、メッキ処理される被メッキ物の表面と電解浴の接触を妨げ、被メッキ物の表面に均一なメッキ被膜を形成するのに大きな妨げとなっている。   As described in the background art, in such an electrolytic processing apparatus, when an insoluble anode is used as the anode, a large amount of oxygen gas is generated from the anode, and this oxygen gas is generated in a large amount of oxygen gas bubbles in the electrolytic bath. And mixed and diffused in the electrolytic bath W. Bubbles mixed and diffused in the electrolytic bath stay on and adhere to the surface of the plate-shaped object to be electroplated while being conveyed horizontally between the upper and lower anodes. In particular, a large amount of oxygen gas bubbles tend to stay on the lower surface of the plate-like object to be horizontally conveyed due to the rising phenomenon of oxygen gas bubbles. A large amount of oxygen gas bubbles staying and adhering to the surface of the plate-shaped object to be horizontally conveyed interferes with the contact between the surface of the object to be plated and the electrolytic bath, and the surface of the object to be plated is uniformly plated. This is a great hindrance to the formation of the film.

この問題を解決するため、本発明は以下の新規な手段を採用した。   In order to solve this problem, the present invention employs the following novel means.

本発明は、前記被メッキ物Pの水平な搬送通過面PLと前記下部陽極21の間にこの下部陽極21の対向面(上面)から被メッキ物Pの水平な搬送通過面PLを上下方向に隔離する下部隔膜26を配設すると共に、前記被メッキ物Pの水平な搬送通過面PLと前記上部陽極20の間にこの上部陽極20の対向面(下面)から被メッキ物Pの水平な搬送通過面PLを上下方向に隔離する上部隔膜25を配設した。   In the present invention, the horizontal transfer passage surface PL of the object to be plated P is vertically moved from the opposite surface (upper surface) of the lower anode 21 between the horizontal transfer passage surface PL of the object P to be plated and the lower anode 21. A lower diaphragm 26 to be isolated is disposed, and the object to be plated P is horizontally conveyed from the opposing surface (lower surface) of the upper anode 20 between the object to be plated P's horizontal conveying passage surface PL and the upper anode 20. An upper diaphragm 25 that isolates the passage surface PL in the vertical direction is provided.

この各隔膜25,26は陽極からの金属イオンを通過させるが陽極から発生する泡(酸素ガス泡)やスライムは通過させない材質の微孔性薄膜で形成した。この実施例では、この各隔膜25,26として、合成繊維(ポリプロピレン等)の微孔性薄膜を用いている。隔膜として微孔性薄膜を用いた場合、膜の周囲を固定枠材27で固定し、また必要に応じて隔膜面の変形を補正する補強リブを取り付ける。   Each of the diaphragms 25 and 26 is formed of a microporous thin film made of a material that allows metal ions from the anode to pass therethrough but does not allow bubbles (oxygen gas bubbles) and slime generated from the anode to pass through. In this embodiment, as each of the diaphragms 25 and 26, a microporous thin film of synthetic fiber (polypropylene or the like) is used. When a microporous thin film is used as the diaphragm, the periphery of the film is fixed with a fixing frame member 27, and a reinforcing rib for correcting the deformation of the diaphragm surface is attached if necessary.

この発明によれば、各下部陽極21から発生する泡(酸素ガス泡)が被メッキ物Pの水平な搬送通過面PLの方向へ拡散し移動するのを下部隔膜26で遮断できると共に、各上部陽極20から発生する泡(酸素ガス泡)が被メッキ物Pの水平な搬送通過面PLの方向へ拡散し移動するのを上部隔膜25で遮断でき、水平搬送されながらメッキされる被メッキ物Pの近くに泡(酸素ガス泡)が滞留する弊害を防止でき、被メッキ物Pに泡(酸素ガス泡)が付着する弊害を解消できる。しかも、隔膜(上部隔膜25、下部隔膜26)を配設したことによって、陽極(上部陽極20、下部陽極21)として不溶性アノードを使用した際に生じるメッキ添加剤(光沢剤など)の消耗を軽減できる。   According to this invention, bubbles (oxygen gas bubbles) generated from the respective lower anodes 21 can be blocked by the lower diaphragm 26 from diffusing and moving in the direction of the horizontal transport passage surface PL of the object P to be plated, and The upper substrate 25 can block the bubbles (oxygen gas bubbles) generated from the anode 20 from diffusing and moving in the direction of the horizontal conveyance passage surface PL of the object P, and the object P to be plated while being horizontally conveyed. It is possible to prevent the adverse effect of bubbles (oxygen gas bubbles) staying near the substrate, and to eliminate the adverse effect of bubbles (oxygen gas bubbles) adhering to the substrate P. In addition, by providing the diaphragm (upper diaphragm 25, lower diaphragm 26), consumption of plating additives (such as brighteners) generated when an insoluble anode is used as the anode (upper anode 20, lower anode 21) is reduced. it can.

また、本発明は、前記上部陽極20の上面側にこの上部陽極20から発生する泡(酸素ガス泡)を電解メッキ液Wの液面より上方(空中)に酸素ガスとして排出するプラスチック製の泡集合排出フード30を各上部陽極20に対応させてそれぞれ取付けてある。この泡集合排出フード30は、上部陽極20の上面側に泡集合室32を画成するべく該上部陽極20の上面を被う被い部31と、この被い部31の中央部に突出形成され、電解メッキ液Wの液面より上方にガス排出口34を開口させた排出部33を備え、前記被い部31の被い面を前記排出部33に向けて上方に傾斜させた傾斜面35としたことを特徴としている。なお、図1は理解を容易にするため泡集合排出フード30を一つ省略して図示してある。   In the present invention, the bubble (oxygen gas bubble) generated from the upper anode 20 on the upper surface side of the upper anode 20 is discharged as oxygen gas above the liquid surface of the electroplating solution W (in the air) as a plastic bubble. A collective discharge hood 30 is attached to each upper anode 20. The foam collecting and discharging hood 30 is formed so as to cover the upper surface of the upper anode 20 to define a foam collecting chamber 32 on the upper surface side of the upper anode 20, and to protrude from the center of the covering portion 31. An inclined surface provided with a discharge portion 33 having a gas discharge port 34 opened above the liquid surface of the electrolytic plating solution W, and the cover surface of the cover portion 31 is inclined upward toward the discharge portion 33. It is characterized by being 35. In FIG. 1, one foam assembly discharge hood 30 is omitted for easy understanding.

この発明によれば、各上部陽極20から発生する泡(酸素ガス泡)は各上部陽極に取付けた泡集合排出フード30の泡集合室32の傾斜面35に沿って電解メッキ液Wの液中を中央の排出部33に向け上昇し、中央の排出部33に集められる。排出部33に集められた泡(酸素ガス泡)は排出口34から酸素ガスとして液面より上方(空中)に排出される。   According to the present invention, bubbles (oxygen gas bubbles) generated from each upper anode 20 are contained in the electrolytic plating solution W along the inclined surface 35 of the bubble collecting chamber 32 of the bubble collecting discharge hood 30 attached to each upper anode. Are raised toward the central discharge portion 33 and collected in the central discharge portion 33. Bubbles (oxygen gas bubbles) collected in the discharge part 33 are discharged from the discharge port 34 as oxygen gas above the liquid level (in the air).

また、本発明は、前記下部陽極21の片側の側部の近傍に液流発生手段40を配設すると共に、この下部陽極21の反対側の側部の近傍に泡集合排出装置50を配設したことを特徴としている。   Further, according to the present invention, the liquid flow generating means 40 is disposed in the vicinity of one side portion of the lower anode 21, and the bubble collecting / discharging device 50 is disposed in the vicinity of the opposite side portion of the lower anode 21. It is characterized by that.

前記液流発生手段40は、下部陽極21から発生する泡(酸素ガス泡)がこの下部陽極21とこの下部陽極21の上方に離間配置された下部隔膜26との間の離間ゾーン41を通って該液流発生手段40の配設位置とは反対側の側部方向の外側に向けて緩やかに移動される液流を発生(吐出する)する液流吐出手段としてある。図2では、左側に配設した液流発生手段40で左側から右側に緩やかに流れる液流を発生させ、下部陽極21から発生する泡(酸素ガス泡)が離間ゾーン41を通って右側方向に緩やかに移動される現象を示している。   The liquid flow generating means 40 passes through a separation zone 41 between the lower anode 21 and the lower diaphragm 26 spaced above the lower anode 21 in which bubbles (oxygen gas bubbles) generated from the lower anode 21 pass. The liquid flow discharge means generates (discharges) a liquid flow that is gently moved toward the outside in the side direction opposite to the position where the liquid flow generation means 40 is disposed. In FIG. 2, a liquid flow gently flowing from the left side to the right side is generated by the liquid flow generating means 40 disposed on the left side, and bubbles (oxygen gas bubbles) generated from the lower anode 21 pass through the separation zone 41 in the right direction. This shows the phenomenon of slow movement.

この液流発生手段40は、図2〜図4に示した実施形態では、搬送方向に管路を延ばしたプラスチック製の液流吐出管42を下部陽極21の側部の近傍に配設し、この液流吐出管42に搬送方向に間隔をおいて複数の吐出ノズル(図示せず。)を形成し、この吐出ノズルを該吐出ノズルから下部陽極21と下部隔膜26との間の前記離間ゾーン41に向けてメッキ液を吐出するものとし、この吐出し液流によって前記離間ゾーン41内を一方の側部から反対側の側部の方向に向けて流れる緩やかな液流を発生(吐出する)する液流吐出手段としてある。   In the embodiment shown in FIGS. 2 to 4, the liquid flow generating means 40 is provided with a plastic liquid flow discharge pipe 42 extending in the transport direction in the vicinity of the side of the lower anode 21, A plurality of discharge nozzles (not shown) are formed in the liquid flow discharge pipe 42 at intervals in the transport direction, and the discharge nozzles are connected to the separation zone between the lower anode 21 and the lower diaphragm 26. It is assumed that the plating solution is discharged toward 41, and this discharging solution flow generates (discharges) a gradual liquid flow that flows in the spacing zone 41 from one side to the opposite side. As a liquid flow discharge means.

前記泡集合排出装置50は、下部陽極21と下部隔膜26との間の前記離間ゾーン41に向けて泡受け入れ口52を開口した泡集合部51と、この泡集合部51に集められた泡を泡集合部51から電解メッキ液Wの液面より上方(空中)に酸素ガスとして排出する上下方向の排出通路53を備えたガス排出部54と、前記下部隔膜26の側部と前記泡集合部51の間をその上部において遮蔽する遮蔽部55を備えたことを特徴としている。前記排出通路53には排出通路53の上部を塞ぐフィルター56を設け、このフィルター56は酸素ガスの通過を許容するが、電解メッキ液Wの上方向への噴出を防ぐ働きをもっている。なお、図4に示したように、泡集合部51は搬送通過方向に長く広く形成し、排出通路53は泡集合部51から徐々に狭くなる様に形成してある。   The foam collecting / discharging device 50 includes a foam collecting part 51 having a foam receiving port 52 opened toward the separation zone 41 between the lower anode 21 and the lower diaphragm 26, and bubbles collected in the foam collecting part 51. A gas discharge part 54 having a vertical discharge passage 53 for discharging oxygen gas as an oxygen gas above the surface of the electrolytic plating solution W from the bubble collecting part 51, the side of the lower diaphragm 26, and the bubble collecting part It is characterized by having a shielding part 55 that shields between 51 at the upper part. The discharge passage 53 is provided with a filter 56 that closes the upper portion of the discharge passage 53, and this filter 56 allows oxygen gas to pass through, but functions to prevent upward spraying of the electrolytic plating solution W. As shown in FIG. 4, the bubble collecting portion 51 is formed long and wide in the transport passage direction, and the discharge passage 53 is formed so as to gradually narrow from the bubble collecting portion 51.

この発明によれば、下部陽極21から発生する泡(酸素ガス泡)は液流発生手段40の液流で下部陽極21と下部隔膜26の間の離間ゾーン41から一方の側部方向の外側に向けて緩やかに移動され、移動された泡は泡集合排出装置50の泡受け入れ口52から泡集合部51に集められ、泡集合部51に集められた泡(酸素ガス泡)は排出通路53を通ってガス排出部54から酸素ガスとして液面より上方(空中)に排出される。これによって、下部陽極から発生する泡(酸素ガス泡)が下部隔膜の下面側に滞留する弊害を解消できる。   According to the present invention, bubbles (oxygen gas bubbles) generated from the lower anode 21 are flown from the separation zone 41 between the lower anode 21 and the lower diaphragm 26 to the outside in one side direction by the liquid flow of the liquid flow generating means 40. The bubbles that have been moved gently toward the bubble collecting port 51 are collected in the bubble collecting unit 51 from the bubble receiving port 52 of the bubble collecting and discharging device 50, and the bubbles (oxygen gas bubbles) collected in the bubble collecting unit 51 pass through the discharge passage 53. Then, the gas is discharged from the gas discharge portion 54 as oxygen gas above the liquid level (in the air). This eliminates the adverse effect that bubbles (oxygen gas bubbles) generated from the lower anode stay on the lower surface side of the lower diaphragm.

隔膜として微孔性薄膜を用いた場合、膜の周囲を固定枠材27で固定し、また必要に応じて隔膜面の変形を補正する補強リブを取り付けている。特に下部隔膜26では固定枠材27やリブに泡が滞留されやすい。しかし、本発明の液流発生手段40の液流で下部陽極から発生する泡(酸素ガス泡)は外側に向けて移動されるため、下部陽極から発生する泡(酸素ガス泡)が下部隔膜の下面側に滞留する弊害を解消できる。   When a microporous thin film is used as the diaphragm, the periphery of the film is fixed with a fixing frame member 27, and reinforcing ribs for correcting the deformation of the diaphragm surface are attached as necessary. In particular, in the lower diaphragm 26, bubbles are likely to stay in the fixed frame member 27 and the ribs. However, since the bubbles (oxygen gas bubbles) generated from the lower anode in the liquid flow of the liquid flow generating means 40 of the present invention are moved outward, the bubbles (oxygen gas bubbles) generated from the lower anode are transferred to the lower diaphragm. The adverse effect of staying on the lower surface side can be eliminated.

図3の実施例では、一単位の前記下部陽極21と下部隔膜26を搬送方向の前後で略均等な二つの範囲に区分けし、区分けした二つの範囲に対応させて設けた液流発生手段40,40(吐出ノズル)を互いに反対側の前記下部陽極21の片側の側部の近傍にそれぞれ配設すると共に、この液流発生手段40,40の配設位置とは反対側の下部陽極21の側部の近傍に泡集合排出装置50,50をそれぞれ配設してある。これによって、一単位の下部陽極21と下部隔膜26の範囲において、液流発生手段40,40の液流を互いに反対側の方向に向けた液流(図3に矢印で示した)としている。そして、液流発生手段40,40の液流で移動された泡を受け入れる泡集合排出装置50も互いに反対側に配設してある。もちろん、搬送通過方向に並べた複数の下部陽極21と下部隔膜26の範囲では、左右交互に反対方向に向けた液流が連続する。   In the embodiment of FIG. 3, the unit of the lower anode 21 and the lower diaphragm 26 are divided into two substantially equal ranges before and after in the transport direction, and the liquid flow generating means 40 provided corresponding to the two divided ranges. , 40 (discharge nozzles) are disposed in the vicinity of one side of the lower anode 21 opposite to each other, and the position of the lower anode 21 on the side opposite to the position where the liquid flow generating means 40, 40 are disposed. In the vicinity of the side portions, foam collecting and discharging devices 50 and 50 are provided, respectively. Thereby, in the range of the lower anode 21 and the lower diaphragm 26 of one unit, the liquid flows of the liquid flow generating means 40, 40 are made to be liquid flows (indicated by arrows in FIG. 3) in opposite directions. Also, the foam collecting / discharging device 50 for receiving the bubbles moved by the liquid flow of the liquid flow generating means 40, 40 is disposed on the opposite side. Of course, in the range of the plurality of lower anodes 21 and the lower diaphragm 26 arranged in the transport passage direction, the liquid flow is alternately directed in the opposite direction on the left and right.

このように、一単位の下部陽極21と下部隔膜26の範囲において、液流発生手段40の液流方向を左右交互の流れとした場合、下部陽極21から発生する泡(酸素ガス泡)が下部隔膜26の下面側に滞留する弊害をより効果的に解消できる。   In this way, when the liquid flow direction of the liquid flow generating means 40 is alternated between left and right within the range of the lower anode 21 and the lower diaphragm 26 as one unit, bubbles (oxygen gas bubbles) generated from the lower anode 21 are lower. The harmful effect of staying on the lower surface side of the diaphragm 26 can be eliminated more effectively.

なお、図2では、液流の紛らわしさを避けるため、左側に配設した液流発生手段40で左側から右側に矢印方向に緩やかに流れる液流のみ図示し、離間ゾーン41にある泡(酸素ガス泡)を左側から右側方向に緩やかに移動させている現象のみ図示してある。もちろん、図2において、右側に配設した液流発生手段40では右側から左側に緩やかに流れる液流となり、離間ゾーン41にある泡(酸素ガス泡)を右側から左側方向に緩やかに移動させる。   In FIG. 2, only the liquid flow that gently flows in the direction of the arrow from the left side to the right side by the liquid flow generation means 40 disposed on the left side is shown in order to avoid the confusion of the liquid flow. Only the phenomenon in which the gas bubbles are gently moved from the left to the right is shown. Of course, in FIG. 2, the liquid flow generating means 40 disposed on the right side forms a liquid flow that gently flows from the right side to the left side, and bubbles (oxygen gas bubbles) in the separation zone 41 are gently moved from the right side to the left side.

1 電解メッキ処理槽
W 電解メッキ液
P 被メッキ物
PL 搬送通過面
2 搬送通路
3 搬送装置
4,4 搬送駆動手段
5 クランプ
10 駆動チェーン
12 クランプ接点部
13 固定ガイドレール(給電レール)
20 上部陽極
21 下部陽極
22 噴流吐出管
25 上部隔膜
26 下部隔膜
30 泡集合排出フード
31 被い部
32 泡集合室
33 排出部
34 ガス排出口
35 傾斜面
40 液流発生手段
41 離間ゾーン
42 液流吐出管
50 泡集合排出装置
51 泡集合部
52 泡受け入れ口
53 排出通路
54 ガス排出部
55 遮蔽部
56 フィルター
DESCRIPTION OF SYMBOLS 1 Electroplating processing tank W Electrolytic plating liquid P To-be-plated object PL Conveyance passage surface 2 Conveyance path 3 Conveyance device 4,4 Conveyance drive means 5 Clamp 10 Drive chain 12 Clamp contact part 13 Fixed guide rail (power supply rail)
DESCRIPTION OF SYMBOLS 20 Upper anode 21 Lower anode 22 Jet discharge pipe 25 Upper diaphragm 26 Lower diaphragm 30 Foam collection discharge hood 31 Cover part 32 Foam collection chamber 33 Discharge part 34 Gas discharge port 35 Inclined surface 40 Liquid flow generation means 41 Separation zone 42 Liquid flow Discharge pipe 50 Foam assembly discharge device 51 Foam assembly portion 52 Foam receiving port 53 Discharge passage 54 Gas exhaust portion 55 Shielding portion 56 Filter

Claims (4)

エンドレスに周回駆動される対の搬送駆動手段が板状の被メッキ物の搬送通路を間にして離間して配設され、この搬送駆動手段に複数のクランプをそれぞれ取付けあり、この複数のクランプで平行な両側縁部をもつ板状の被メッキ物の両側縁部を掴持し、電解メッキ処理槽の電解メッキ液の液中を被メッキ物の板面が上下になる水平姿勢で水平方向に連続搬送する搬送装置と、前記電解メッキ処理槽の電解メッキ液の液中に配設され、前記搬送装置で水平搬送される被メッキ物の水平な搬送通過面の上下位置に該搬送通過面と互いに平行に配設され、且つ搬送通過方向に一定の間隔を空けて並べて配設された複数の板状の上部陽極と下部陽極をそれぞれ備え、この上部陽極と下部陽極の間を前記クランプから陰極電流を給電された被メッキ物が水平に通過されることによって、この被メッキ物の表面にメッキ被膜を形成する水平搬送式電解メッキ装置において、前記被メッキ物の水平な搬送通過面と前記下部陽極の間にこの下部陽極の対向面から被メッキ物の水平な搬送通過面を上下方向に隔離する下部隔膜を配設すると共に、前記被メッキ物の水平な搬送通過面と前記上部陽極の間にこの上部陽極の対向面から被メッキ物の水平な搬送通過面を上下方向に隔離する上部隔膜を配設し、この各隔膜は陽極からの金属イオンを通過させるが陽極から発生する酸素ガス泡は通過させない材質の膜で形成してあり、前記下部陽極の片側の側部の近傍に液流発生手段を配設すると共に、この下部陽極の反対側の側部の近傍に泡集合排出装置を配設し、前記液流発生手段は、下部陽極から発生する酸素ガス泡がこの下部陽極とこの下部陽極の上方に離間配置された下部隔膜との間の離間ゾーンを通って該液流発生手段の配設位置とは反対側の側部方向の外側に向けて緩やかに移動される液流を発生する液流吐出手段とし、前記泡集合排出装置は、下部陽極と下部隔膜との間の前記離間ゾーンに向けて酸素ガス泡受け入れ口を開口した泡集合部と、この泡集合部に集められた泡を泡集合部から電解メッキ液の液面より上方に酸素ガスとして排出する上下方向の排出通路を備えたガス排出部と、前記下部隔膜の側部と前記泡集合部の間をその上部において遮蔽する遮蔽部を備えたことを特徴とする水平搬送式電解メッキ装置。 A pair of conveyance drive means that are driven around the endlessly are disposed with a conveyance path for the plate-like object to be plated in between, and a plurality of clamps are respectively attached to the conveyance drive means. Grab both side edges of a plate-shaped object having both side edges parallel to each other in the horizontal position with the plate surface of the object to be plated up and down in the electrolytic plating solution in the electrolytic plating bath A transfer device that is continuously transferred to the electrolytic plating solution in the electrolytic plating bath, and the transfer passage surface is positioned above and below a horizontal transfer passage surface of an object to be plated that is horizontally transferred by the transfer device. And a plurality of plate-like upper and lower anodes arranged parallel to each other and arranged at a certain interval in the transport passage direction, respectively, and between the upper anode and the lower anode from the clamp Plated with cathode current In a horizontal conveyance type electroplating apparatus for forming a plating film on the surface of the object to be plated by horizontally passing, the lower anode is disposed between the horizontal conveyance passage surface of the object to be plated and the lower anode. A lower diaphragm for vertically separating the horizontal transfer passage surface of the object to be plated from the facing surface is disposed, and the surface facing the upper anode is disposed between the horizontal transfer passage surface of the object to be plated and the upper anode. An upper diaphragm that vertically separates the horizontal transfer passage surface of the object to be plated is provided, and each diaphragm is formed of a film made of a material that allows metal ions from the anode to pass but does not allow oxygen gas bubbles generated from the anode to pass. The liquid flow generating means is disposed in the vicinity of one side portion of the lower anode, and the bubble collecting / discharging device is disposed in the vicinity of the side portion on the opposite side of the lower anode to generate the liquid flow. Means originate from the lower anode Oxygen gas bubbles that pass through the separation zone between the lower anode and the lower diaphragm spaced above the lower anode, and to the outside in the side direction opposite to the position where the liquid flow generating means is disposed. A liquid discharge means for generating a liquid flow that is gently moved toward the surface. And a gas discharge part having a vertical discharge passage for discharging bubbles collected in the bubble collection part as oxygen gas from the foam collection part above the surface of the electrolytic plating solution, and a side part of the lower diaphragm A horizontal conveyance type electroplating apparatus , comprising a shielding portion that shields between the foam assembly portion and the bubble collecting portion at an upper portion thereof . 前記上部陽極の上面側にこの上部陽極から発生する酸素ガス泡を電解メッキ液の液面より上方に酸素ガスとして排出する泡集合排出フードをそれぞれ取付け、この泡集合排出フードは、上部陽極の上面側に泡集合室を画成するべく該上部陽極の上面を被う被い部と、この被い部の中央部に突出形成され、電解メッキ液の液面より上方にガス排出口を開口させた排出部を備え、前記被い部の被い面を前記排出部に向けて上方に傾斜させた傾斜面としたことを特徴とする、請求項1に記載の水平搬送式電解メッキ装置。   A foam assembly exhaust hood for exhausting oxygen gas bubbles generated from the upper anode as oxygen gas above the liquid surface of the electroplating solution is attached to the upper surface side of the upper anode, respectively. A covering portion covering the upper surface of the upper anode to define a bubble collecting chamber on the side, and a protruding portion formed in the central portion of the covering portion, with a gas outlet opening above the liquid surface of the electrolytic plating solution The horizontal conveyance type electroplating apparatus according to claim 1, further comprising: a discharge portion, wherein a covering surface of the covering portion is inclined upward toward the discharge portion. エンドレスに周回駆動される対の搬送駆動手段が板状の被メッキ物の搬送通路を間にして離間して配設され、この搬送駆動手段に複数のクランプをそれぞれ取付けてあり、この複数のクランプで平行な両側縁部をもつ板状の被メッキ物の両側縁部を掴持し、電解メッキ処理槽の電解メッキ液の液中を被メッキ物の板面が上下になる水平姿勢で水平方向に連続搬送する搬送装置と、前記電解メッキ処理槽の電解メッキ液の液中に配設され、前記搬送装置で水平搬送される被メッキ物の水平な搬送通過面の上下位置に該搬送通過面と互いに平行に配設され、且つ搬送通過方向に一定の間隔を空けて並べて配設された複数の板状の上部陽極と下部陽極をそれぞれ備え、この上部陽極と下部陽極の間を前記クランプから陰極電流を給電された被メッキ物が水平に通過されることによって、この被メッキ物の表面にメッキ被膜を形成する水平搬送式電解メッキ装置において、前記被メッキ物の水平な搬送通過面と前記下部陽極の間にこの下部陽極の対向面から被メッキ物の水平な搬送通過面を上下方向に隔離する下部隔膜を配設すると共に、前記被メッキ物の水平な搬送通過面と前記上部陽極の間にこの上部陽極の対向面から被メッキ物の水平な搬送通過面を上下方向に隔離する上部隔膜を配設し、この各隔膜は陽極からの金属イオンを通過させるが陽極から発生する酸素ガス泡は通過させない材質の膜で形成してあり、一単位の前記下部陽極と下部隔膜を搬送方向の前後で二つの範囲に区分けし、区分けした二つの範囲に対応させて設けた液流発生手段を互いに反対側の前記下部陽極の片側の側部の近傍にそれぞれ配設すると共に、この液流発生手段の配設位置とは反対側の下部陽極の側部の近傍に泡集合排出装置をそれぞれ配設し、前記液流発生手段は、下部陽極から発生する酸素ガス泡がこの下部陽極とこの下部陽極の上方に離間配置された下部隔膜との間の離間ゾーンを通って該液流発生手段の配設位置とは反対側の側部方向の外側に向けて緩やかに移動される液流を発生する液流吐出手段とし、前記泡集合排出装置は、下部陽極と下部隔膜との間の前記離間ゾーンに向けて酸素ガス泡受け入れ口を開口した泡集合部と、この泡集合部に集められた泡を泡集合部から電解メッキ液の液面より上方に酸素ガスとして排出する上下方向の排出通路を備えたガス排出部と、前記下部隔膜の側部と前記泡集合部の間をその上部において遮蔽する遮蔽部を備えたことを特徴とする水平搬送式電解メッキ装置。 A pair of conveyance drive means that are driven around the endlessly are disposed with a conveyance path for the plate-like object to be plated in between, and a plurality of clamps are respectively attached to the conveyance drive means. Grab both side edges of a plate-shaped object having both side edges parallel to each other in the horizontal position with the plate surface of the object to be plated up and down in the electrolytic plating solution in the electrolytic plating bath A transfer device that is continuously transferred to the electrolytic plating solution in the electrolytic plating bath, and the transfer passage surface is positioned above and below a horizontal transfer passage surface of an object to be plated that is horizontally transferred by the transfer device. And a plurality of plate-like upper and lower anodes arranged parallel to each other and arranged at a certain interval in the transport passage direction, respectively, and between the upper anode and the lower anode from the clamp Plated with cathode current In a horizontal conveyance type electroplating apparatus for forming a plating film on the surface of the object to be plated by horizontally passing, the lower anode is disposed between the horizontal conveyance passage surface of the object to be plated and the lower anode. A lower diaphragm for vertically separating the horizontal transfer passage surface of the object to be plated from the facing surface is disposed, and the surface facing the upper anode is disposed between the horizontal transfer passage surface of the object to be plated and the upper anode. An upper diaphragm that vertically separates the horizontal transfer passage surface of the object to be plated is provided, and each diaphragm is formed of a film made of a material that allows metal ions from the anode to pass but does not allow oxygen gas bubbles generated from the anode to pass. The lower anode and the lower diaphragm of one unit are divided into two ranges before and after the conveying direction, and the liquid flow generating means provided corresponding to the two divided ranges is provided on the opposite side of the lower anode. one side The foam assembly discharging device is disposed in the vicinity of the side portion of the lower anode on the opposite side to the position where the liquid flow generating means is disposed, respectively, in the vicinity of the side portions, Oxygen gas bubbles generated from the lower anode pass through the separation zone between the lower anode and the lower diaphragm spaced above the lower anode, and the side opposite to the position where the liquid flow generating means is disposed A liquid discharge means for generating a liquid flow that is gently moved toward the outside of the direction, and the bubble collecting and discharging device has an oxygen gas bubble receiving port toward the separation zone between the lower anode and the lower diaphragm. An open bubble collecting portion, a gas discharge portion having a vertical discharge passage for discharging bubbles collected in the bubble collecting portion as oxygen gas above the liquid surface of the electrolytic plating solution from the bubble collecting portion, and the lower portion Between the side of the diaphragm and the foam assembly at the top A horizontal conveyance type electroplating apparatus comprising a shielding portion for shielding. 前記液流発生手段が、搬送方向に管路を延ばした液流吐出管を下部陽極の側部の近傍に配設し、この液流吐出管に搬送方向に間隔をおいて複数の吐出ノズルを形成し、この吐出ノズルを該吐出ノズルから下部陽極と下部隔膜との間の前記離間ゾーンに向けてメッキ液を吐出するものとし、この吐出し液流によって前記離間ゾーン内を一方の側部から反対側の側部の方向に向けて流れる緩やかな液流を発生する液流吐出手段としたことを特徴とする、請求項1から3のいずれかの請求項に記載の水平搬送式電解メッキ装置。 The liquid flow generating means is provided with a liquid flow discharge pipe extending in the transport direction in the vicinity of the side of the lower anode, and a plurality of discharge nozzles are provided in the liquid flow discharge pipe at intervals in the transport direction. The discharge nozzle is used to discharge the plating solution from the discharge nozzle toward the separation zone between the lower anode and the lower diaphragm, and the inside of the separation zone is caused from one side by the discharge liquid flow. The horizontal conveyance type electroplating apparatus according to any one of claims 1 to 3, wherein the apparatus is a liquid discharge means that generates a gentle liquid flow that flows in the direction of the opposite side portion. .
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