JP5802811B1 - ナノ粒子の製造方法 - Google Patents
ナノ粒子の製造方法 Download PDFInfo
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- JP5802811B1 JP5802811B1 JP2014172633A JP2014172633A JP5802811B1 JP 5802811 B1 JP5802811 B1 JP 5802811B1 JP 2014172633 A JP2014172633 A JP 2014172633A JP 2014172633 A JP2014172633 A JP 2014172633A JP 5802811 B1 JP5802811 B1 JP 5802811B1
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- Physical Vapour Deposition (AREA)
Abstract
Description
2 イオン源
3 蒸着源
4 シャッター
5 スリット
6 モーター
7 蒸着物質
8 被蒸着基板
9 不活性ガス導入系
10 真空排気系
11 粉体
12 スクリュー
13 モーター
Claims (2)
- 気相中で蒸着源の熱分解と熱分解した蒸着物質の被蒸着体上への堆積とが行われる蒸着法、イオンプレーティング法、及び、スパッタリング法のいずれか一つの物理蒸着法を用いたナノ粒子製造方法において、前記蒸着物質が前記被蒸着体に連続して蒸着する蒸着時間が少なくとも0.2sec以下であるようにして前記蒸着物質が前記被蒸着体に間欠的に堆積されることを特徴とするナノ粒子製造方法。
- 前記被蒸着体が粉体であることを特徴とする請求項1に記載のナノ粒子製造方法。
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JP2014172633A JP5802811B1 (ja) | 2014-08-27 | 2014-08-27 | ナノ粒子の製造方法 |
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JP2014172633A JP5802811B1 (ja) | 2014-08-27 | 2014-08-27 | ナノ粒子の製造方法 |
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JP5802811B1 true JP5802811B1 (ja) | 2015-11-04 |
JP2016047940A JP2016047940A (ja) | 2016-04-07 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2018134589A (ja) * | 2017-02-21 | 2018-08-30 | 株式会社ジーエル・マテリアルズホールディングス | 電解水の製造原料及びそれを用いた電解液、並びに、その製造原料、その電解液、及び、その電解水の製造方法 |
JP6442574B2 (ja) * | 2017-03-16 | 2018-12-19 | 太平洋セメント株式会社 | ナノ粒子集合体、ナノ粒子焼成物、及びこれらの製造方法 |
WO2019049472A1 (ja) * | 2017-09-07 | 2019-03-14 | 株式会社アルバック | スパッタリング装置 |
JP6456010B1 (ja) * | 2017-09-07 | 2019-01-23 | 株式会社アルバック | スパッタリング装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003277919A (ja) * | 2002-03-20 | 2003-10-02 | Toyota Central Res & Dev Lab Inc | レーザアブレーション方法及び装置 |
JP2008308735A (ja) * | 2007-06-15 | 2008-12-25 | Ulvac Japan Ltd | 同軸型真空アーク蒸着源を用いるナノ粒子の担持方法 |
JP2009173975A (ja) * | 2008-01-22 | 2009-08-06 | Canon Anelva Corp | 金属微粒子の生成方法、金属含有ペーストの製造方法及び金属薄膜配線の形成方法 |
JP2010174271A (ja) * | 2009-01-27 | 2010-08-12 | Dainippon Screen Mfg Co Ltd | ナノ粒子堆積装置およびナノ粒子堆積方法 |
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2014
- 2014-08-27 JP JP2014172633A patent/JP5802811B1/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003277919A (ja) * | 2002-03-20 | 2003-10-02 | Toyota Central Res & Dev Lab Inc | レーザアブレーション方法及び装置 |
JP2008308735A (ja) * | 2007-06-15 | 2008-12-25 | Ulvac Japan Ltd | 同軸型真空アーク蒸着源を用いるナノ粒子の担持方法 |
JP2009173975A (ja) * | 2008-01-22 | 2009-08-06 | Canon Anelva Corp | 金属微粒子の生成方法、金属含有ペーストの製造方法及び金属薄膜配線の形成方法 |
JP2010174271A (ja) * | 2009-01-27 | 2010-08-12 | Dainippon Screen Mfg Co Ltd | ナノ粒子堆積装置およびナノ粒子堆積方法 |
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