JP5785650B2 - 容器の内壁処理方法及び容器の内壁処理装置 - Google Patents

容器の内壁処理方法及び容器の内壁処理装置 Download PDF

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JP5785650B2
JP5785650B2 JP2014227843A JP2014227843A JP5785650B2 JP 5785650 B2 JP5785650 B2 JP 5785650B2 JP 2014227843 A JP2014227843 A JP 2014227843A JP 2014227843 A JP2014227843 A JP 2014227843A JP 5785650 B2 JP5785650 B2 JP 5785650B2
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JP2015127139A (ja
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陽三 丸山
陽三 丸山
隼 大久保
隼 大久保
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泉工業株式会社
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CN110215946A (zh) * 2019-05-29 2019-09-10 西南大学 一种用于微波加热的新型金属试管装置

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JPS56166377A (en) * 1980-05-22 1981-12-21 Sekisui Chem Co Ltd Plasma treating method of hollow body
JPH0625271B2 (ja) * 1986-02-20 1994-04-06 住友電気工業株式会社 チユ−ブの内面プラズマ処理方法
JPS63152973A (ja) * 1986-12-17 1988-06-25 Shinsozai Sogo Kenkyusho:Kk 培養器具または検査用器具及びその製造方法
JPH04117276A (ja) * 1990-09-06 1992-04-17 Sekisui Chem Co Ltd 微生物発育培地用器具
JP3242977B2 (ja) * 1992-03-25 2001-12-25 イーシー化学株式会社 容器内面のプラズマ処理法とこれを用いる装置
JP3697250B2 (ja) * 2000-02-24 2005-09-21 三菱重工業株式会社 プラズマ処理装置及び炭素被覆形成プラスチック容器の製造方法
JP2005105294A (ja) * 2003-09-26 2005-04-21 Mitsubishi Shoji Plast Kk Ｃｖｄ成膜装置及びｃｖｄ膜コーティングプラスチック容器の製造方法

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JP2015129311A (ja) 2015-07-16
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