JP5774413B2 - 半導体装置の駆動方法 - Google Patents

半導体装置の駆動方法 Download PDF

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Publication number
JP5774413B2
JP5774413B2 JP2011182321A JP2011182321A JP5774413B2 JP 5774413 B2 JP5774413 B2 JP 5774413B2 JP 2011182321 A JP2011182321 A JP 2011182321A JP 2011182321 A JP2011182321 A JP 2011182321A JP 5774413 B2 JP5774413 B2 JP 5774413B2
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Prior art keywords
transistor
potential
wiring
wirings
semiconductor device
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JP2011182321A
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Japanese (ja)
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JP2012160247A5 (cg-RX-API-DMAC7.html
JP2012160247A (ja
Inventor
広樹 井上
広樹 井上
加藤　清
清 加藤
隆徳 松嵜
隆徳 松嵜
修平 長塚
修平 長塚
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2011182321A priority Critical patent/JP5774413B2/ja
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Publication of JP2012160247A5 publication Critical patent/JP2012160247A5/ja
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0433—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and one or more separate select transistors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Dram (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Non-Volatile Memory (AREA)
JP2011182321A 2010-08-26 2011-08-24 半導体装置の駆動方法 Expired - Fee Related JP5774413B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011182321A JP5774413B2 (ja) 2010-08-26 2011-08-24 半導体装置の駆動方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2010189587 2010-08-26
JP2010189587 2010-08-26
JP2011005766 2011-01-14
JP2011005766 2011-01-14
JP2011182321A JP5774413B2 (ja) 2010-08-26 2011-08-24 半導体装置の駆動方法

Publications (3)

Publication Number Publication Date
JP2012160247A JP2012160247A (ja) 2012-08-23
JP2012160247A5 JP2012160247A5 (cg-RX-API-DMAC7.html) 2014-09-25
JP5774413B2 true JP5774413B2 (ja) 2015-09-09

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Family Applications (1)

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JP2011182321A Expired - Fee Related JP5774413B2 (ja) 2010-08-26 2011-08-24 半導体装置の駆動方法

Country Status (5)

Country Link
US (1) US8339837B2 (cg-RX-API-DMAC7.html)
JP (1) JP5774413B2 (cg-RX-API-DMAC7.html)
KR (1) KR101903785B1 (cg-RX-API-DMAC7.html)
CN (1) CN102385929B (cg-RX-API-DMAC7.html)
TW (1) TWI539609B (cg-RX-API-DMAC7.html)

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KR101851817B1 (ko) 2010-09-03 2018-04-24 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 구동 방법
JP2013137853A (ja) 2011-12-02 2013-07-11 Semiconductor Energy Lab Co Ltd 記憶装置および記憶装置の駆動方法
JP6012450B2 (ja) 2011-12-23 2016-10-25 株式会社半導体エネルギー研究所 半導体装置の駆動方法
WO2014142043A1 (en) * 2013-03-14 2014-09-18 Semiconductor Energy Laboratory Co., Ltd. Method for driving semiconductor device and semiconductor device
CN104299651B (zh) * 2013-07-16 2017-06-06 上海华虹宏力半导体制造有限公司 闪存的位线选择管电路
CN105960633B (zh) * 2014-02-07 2020-06-19 株式会社半导体能源研究所 半导体装置、装置及电子设备
KR102414469B1 (ko) * 2014-03-14 2022-06-30 가부시키가이샤 한도오따이 에네루기 켄큐쇼 회로 시스템
JP7152386B2 (ja) * 2017-03-03 2022-10-12 株式会社半導体エネルギー研究所 半導体装置
CN119947090A (zh) 2017-11-24 2025-05-06 株式会社半导体能源研究所 半导体装置及动态逻辑电路
CN111542883B (zh) * 2017-12-27 2025-02-14 株式会社半导体能源研究所 存储装置
JP2019164868A (ja) * 2018-03-20 2019-09-26 東芝メモリ株式会社 半導体記憶装置
CN119380776A (zh) 2018-03-29 2025-01-28 株式会社半导体能源研究所 存储装置及电子设备
US11426818B2 (en) 2018-08-10 2022-08-30 The Research Foundation for the State University Additive manufacturing processes and additively manufactured products
CN109887536A (zh) * 2019-02-13 2019-06-14 上海新储集成电路有限公司 一种非易失性存储单元结构
US10872666B2 (en) 2019-02-22 2020-12-22 Micron Technology, Inc. Source line management for memory cells with floating gates
CN114303241B (zh) 2019-08-28 2025-11-18 美光科技公司 具有双晶体管垂直存储器单元及共享沟道区域的存储器装置
US11335684B2 (en) 2019-08-28 2022-05-17 Micron Technology, Inc. Memory device having 2-transistor memory cell and access line plate
CN118251010B (zh) * 2024-05-11 2025-02-28 北京超弦存储器研究院 半导体器件及其制造方法、电子设备

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KR20140061553A (ko) 2009-10-29 2014-05-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR102451852B1 (ko) 2009-11-20 2022-10-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR101823861B1 (ko) 2009-11-20 2018-01-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 불휘발성 래치 회로와 논리 회로, 및 이를 사용한 반도체 장치
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KR102167820B1 (ko) 2009-12-25 2020-10-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 메모리 장치
KR101760537B1 (ko) 2009-12-28 2017-07-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR101772150B1 (ko) 2009-12-28 2017-08-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 기억 장치와 반도체 장치
KR101842413B1 (ko) 2009-12-28 2018-03-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
CN102742002B (zh) * 2010-02-12 2015-01-28 株式会社半导体能源研究所 半导体器件及其驱动方法
US8582348B2 (en) * 2010-08-06 2013-11-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for driving semiconductor device
US8422272B2 (en) * 2010-08-06 2013-04-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and driving method thereof

Also Published As

Publication number Publication date
KR20120041113A (ko) 2012-04-30
CN102385929B (zh) 2016-01-20
TWI539609B (zh) 2016-06-21
US8339837B2 (en) 2012-12-25
US20120051116A1 (en) 2012-03-01
CN102385929A (zh) 2012-03-21
JP2012160247A (ja) 2012-08-23
KR101903785B1 (ko) 2018-10-02
TW201225305A (en) 2012-06-16

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