JP5764932B2 - 光触媒装置 - Google Patents
光触媒装置 Download PDFInfo
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- JP5764932B2 JP5764932B2 JP2011009733A JP2011009733A JP5764932B2 JP 5764932 B2 JP5764932 B2 JP 5764932B2 JP 2011009733 A JP2011009733 A JP 2011009733A JP 2011009733 A JP2011009733 A JP 2011009733A JP 5764932 B2 JP5764932 B2 JP 5764932B2
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- photocatalytic
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- 230000001699 photocatalysis Effects 0.000 title claims description 87
- 239000004065 semiconductor Substances 0.000 claims description 78
- 239000010410 layer Substances 0.000 claims description 66
- 150000004767 nitrides Chemical class 0.000 claims description 55
- 239000002346 layers by function Substances 0.000 claims description 45
- 239000011941 photocatalyst Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 42
- 239000010409 thin film Substances 0.000 claims description 42
- 239000010408 film Substances 0.000 claims description 34
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000005036 potential barrier Methods 0.000 claims description 10
- 230000001681 protective effect Effects 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052792 caesium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 16
- 239000010703 silicon Substances 0.000 description 16
- 238000005868 electrolysis reaction Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000006479 redox reaction Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 238000006555 catalytic reaction Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 229910002601 GaN Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910010421 TiNx Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- Catalysts (AREA)
Description
2H+ → H2↑ + 2h ・・・(1)
なお、光触媒面での正孔の移動が更に容易であるように、光触媒機能層14内の正孔のポテンシャルを下げるため、光触媒機能層14をp型にすることが好ましい。
上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
10…光触媒装置
11…半導体基板
12…バッファ層
13…窒化物半導体層
14…光触媒機能層
15…薄膜
16…接続電極
17…保護膜
100…反応容器
110…反応溶液
120…光反射ミラー
141…表面
200…対向電極
300…ミラーレンズ
Claims (6)
- 窒化物半導体からなる光触媒機能層と、
前記光触媒機能層の表面の全面を覆って20nm以下の膜厚で配置された、金属酸化膜、金属窒化膜及び金属酸窒化膜のいずれかからなり、電子及び正孔が前記光触媒機能層の内部から前記表面に移動しやすいように前記光触媒機能層の前記表面上で発生する表面準位電荷によるポテンシャル障壁の高さを低くする薄膜と
を備えることを特徴とする光触媒装置。 - 前記薄膜が、Cs、Hf、W、Ta、Rh、Ru、Nb、Mo、V、Cr、Al及びInのいずれか又はこれらの合金の、金属酸化膜、金属窒化膜及び金属酸窒化膜のいずれかであることを特徴とする請求項1に記載の光触媒装置。
- 前記光触媒機能層の前記表面に凹凸が形成されていることを特徴とする請求項1又は2に記載の光触媒装置。
- 前記光触媒機能層が、光透過性を有する半導体基板上に配置された、前記光触媒機能層よりもバンドギャップエネルギーが大きい窒化物半導体層上に配置されていることを特徴とする請求項1乃至3のいずれか1項に記載の光触媒装置。
- 前記半導体基板及び前記窒化物半導体層が導電性を有することを特徴とする請求項4に記載の光触媒装置。
- 前記薄膜の表面に、前記薄膜が浸される溶液と前記薄膜との反応を抑制する保護膜が形成されていることを特徴とする請求項1乃至5のいずれか1項に記載の光触媒装置。
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JP2011009733A JP5764932B2 (ja) | 2011-01-20 | 2011-01-20 | 光触媒装置 |
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JP2012148250A JP2012148250A (ja) | 2012-08-09 |
JP5764932B2 true JP5764932B2 (ja) | 2015-08-19 |
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JP6920656B2 (ja) | 2017-06-07 | 2021-08-18 | パナソニックIpマネジメント株式会社 | 半導体電極及びそれを備えたデバイス、並びに、半導体電極の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3601532B2 (ja) * | 1999-08-05 | 2004-12-15 | 株式会社豊田中央研究所 | 光触媒物質、光触媒体およびこれらの製造方法 |
JP2007239048A (ja) * | 2006-03-09 | 2007-09-20 | Univ Of Electro-Communications | 光エネルギー変換装置及び半導体光電極 |
JP4783686B2 (ja) * | 2006-07-07 | 2011-09-28 | 独立行政法人科学技術振興機構 | Iii−v族窒化物半導体、光触媒半導体素子、光触媒酸化還元反応装置および光電気化学反応実行方法 |
JP5540554B2 (ja) * | 2009-04-17 | 2014-07-02 | ソニー株式会社 | 光触媒装置及びガス発生装置 |
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