JP5754699B2 - 半導体リソグラフィ用光源装置 - Google Patents

半導体リソグラフィ用光源装置 Download PDF

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Publication number
JP5754699B2
JP5754699B2 JP2010222493A JP2010222493A JP5754699B2 JP 5754699 B2 JP5754699 B2 JP 5754699B2 JP 2010222493 A JP2010222493 A JP 2010222493A JP 2010222493 A JP2010222493 A JP 2010222493A JP 5754699 B2 JP5754699 B2 JP 5754699B2
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Prior art keywords
light source
source device
cavity resonator
cavity
light
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JP2010222493A
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Japanese (ja)
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JP2012079857A5 (https=
JP2012079857A (ja
Inventor
正視 大西
正視 大西
ヒューグラス ワヒード
ヒューグラス ワヒード
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Kansai University
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Kansai University
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010222493A 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置 Expired - Fee Related JP5754699B2 (ja)

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JP2010222493A JP5754699B2 (ja) 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置

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JP2010222493A JP5754699B2 (ja) 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置

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JP2012079857A JP2012079857A (ja) 2012-04-19
JP2012079857A5 JP2012079857A5 (https=) 2013-10-17
JP5754699B2 true JP5754699B2 (ja) 2015-07-29

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3073487B1 (ja) 1999-02-16 2000-08-07 新東株式会社 隅瓦焼成用保持台

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016043313A1 (ja) * 2014-09-19 2016-03-24 学校法人関西大学 Ｅｕｖ光源装置
WO2016043318A1 (ja) * 2014-09-19 2016-03-24 学校法人関西大学 Ｅｕｖ光源装置およびｅｕｖ光発生方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6226752A (ja) * 1985-07-29 1987-02-04 Yoshiaki Arata 高強度軟ｘ線発生方法
US6075838A (en) * 1998-03-18 2000-06-13 Plex Llc Z-pinch soft x-ray source using diluent gas
JP4578901B2 (ja) * 2004-09-09 2010-11-10 株式会社小松製作所 極端紫外光源装置
JP2008130230A (ja) * 2006-11-16 2008-06-05 Ushio Inc 極端紫外光光源装置
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
JP5162365B2 (ja) * 2008-08-05 2013-03-13 学校法人 関西大学 半導体リソグラフィ用光源

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3073487B1 (ja) 1999-02-16 2000-08-07 新東株式会社 隅瓦焼成用保持台

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