JP2012079857A5 - - Google Patents

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Publication number
JP2012079857A5
JP2012079857A5 JP2010222493A JP2010222493A JP2012079857A5 JP 2012079857 A5 JP2012079857 A5 JP 2012079857A5 JP 2010222493 A JP2010222493 A JP 2010222493A JP 2010222493 A JP2010222493 A JP 2010222493A JP 2012079857 A5 JP2012079857 A5 JP 2012079857A5
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JP
Japan
Prior art keywords
cavity resonator
light source
source device
electromagnetic wave
internal space
Prior art date
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Application number
JP2010222493A
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English (en)
Japanese (ja)
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JP2012079857A (ja
JP5754699B2 (ja
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Priority to JP2010222493A priority Critical patent/JP5754699B2/ja
Priority claimed from JP2010222493A external-priority patent/JP5754699B2/ja
Publication of JP2012079857A publication Critical patent/JP2012079857A/ja
Publication of JP2012079857A5 publication Critical patent/JP2012079857A5/ja
Application granted granted Critical
Publication of JP5754699B2 publication Critical patent/JP5754699B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010222493A 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置 Expired - Fee Related JP5754699B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010222493A JP5754699B2 (ja) 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010222493A JP5754699B2 (ja) 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置

Publications (3)

Publication Number Publication Date
JP2012079857A JP2012079857A (ja) 2012-04-19
JP2012079857A5 true JP2012079857A5 (https=) 2013-10-17
JP5754699B2 JP5754699B2 (ja) 2015-07-29

Family

ID=46239771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010222493A Expired - Fee Related JP5754699B2 (ja) 2010-09-30 2010-09-30 半導体リソグラフィ用光源装置

Country Status (1)

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JP (1) JP5754699B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3073487B1 (ja) 1999-02-16 2000-08-07 新東株式会社 隅瓦焼成用保持台
WO2016043313A1 (ja) * 2014-09-19 2016-03-24 学校法人関西大学 Ｅｕｖ光源装置
WO2016043318A1 (ja) * 2014-09-19 2016-03-24 学校法人関西大学 Ｅｕｖ光源装置およびｅｕｖ光発生方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6226752A (ja) * 1985-07-29 1987-02-04 Yoshiaki Arata 高強度軟ｘ線発生方法
US6075838A (en) * 1998-03-18 2000-06-13 Plex Llc Z-pinch soft x-ray source using diluent gas
JP4578901B2 (ja) * 2004-09-09 2010-11-10 株式会社小松製作所 極端紫外光源装置
JP2008130230A (ja) * 2006-11-16 2008-06-05 Ushio Inc 極端紫外光光源装置
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
JP5162365B2 (ja) * 2008-08-05 2013-03-13 学校法人 関西大学 半導体リソグラフィ用光源

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